JPS6450392A - Manufacture of transparent thin film el element - Google Patents

Manufacture of transparent thin film el element

Info

Publication number
JPS6450392A
JPS6450392A JP62207788A JP20778887A JPS6450392A JP S6450392 A JPS6450392 A JP S6450392A JP 62207788 A JP62207788 A JP 62207788A JP 20778887 A JP20778887 A JP 20778887A JP S6450392 A JPS6450392 A JP S6450392A
Authority
JP
Japan
Prior art keywords
thin film
transparent electrode
annealing
sputtering
luminous layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62207788A
Other languages
Japanese (ja)
Inventor
Yoshihiro Endo
Akio Inohara
Hiroshi Kishishita
Hisashi Kamiide
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP62207788A priority Critical patent/JPS6450392A/en
Publication of JPS6450392A publication Critical patent/JPS6450392A/en
Pending legal-status Critical Current

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Landscapes

  • Electroluminescent Light Sources (AREA)

Abstract

PURPOSE:To reduce the manufacturing processes and to improve the productivity by using the annealing of a rear side transparent electrode for annealing a luminous layer concurrently. CONSTITUTION:A front side transparent electrode (ITO thin film) 2 is formed on a glass substrate 1 in a reactive sputtering in Ar+O2 atmosphere by using an IT target. After that, a vacuum annealing is applied at 400 to 650 deg.C, and the transparent electrode 2 is made into strip form by etching. Over the transparent electrode 2, the first insulating thin film 3 which consists of SiO2, Si3N4, and the like, is formed in a sputtering, a vacuum evaporation, or the like. Then, a luminous layer 4 is formed by using ZnSi:Mn sintered pellets in an electron beam vacuum evaporation. After that, the second insulating thin film 5 which consists of Si3N4, Al2O3, and the like is formed in the manner same as the first insulating thin film 3. Then, as a rear side transparent electrode 6, an ITO thin film is formed by reactive-sputtering an IT target in Ar+O2 atmosphere. Following that, the transparent electrode 6 is made into strip form with an etching solution including hydrochloric acid, and annealed in a vacuum. Since this annealing is used for annealing the ZnS of the luminous layer 4 concurrently, the condition is preferable to be 570 to 650 deg.C.
JP62207788A 1987-08-20 1987-08-20 Manufacture of transparent thin film el element Pending JPS6450392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62207788A JPS6450392A (en) 1987-08-20 1987-08-20 Manufacture of transparent thin film el element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62207788A JPS6450392A (en) 1987-08-20 1987-08-20 Manufacture of transparent thin film el element

Publications (1)

Publication Number Publication Date
JPS6450392A true JPS6450392A (en) 1989-02-27

Family

ID=16545511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62207788A Pending JPS6450392A (en) 1987-08-20 1987-08-20 Manufacture of transparent thin film el element

Country Status (1)

Country Link
JP (1) JPS6450392A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03205786A (en) * 1990-01-08 1991-09-09 Fuji Electric Co Ltd Manufacture of double insulating thin film electroluminescence device
JPH04148634A (en) * 1990-10-09 1992-05-21 Keiichiro Murofushi Device for drawing noodle line

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03205786A (en) * 1990-01-08 1991-09-09 Fuji Electric Co Ltd Manufacture of double insulating thin film electroluminescence device
JPH04148634A (en) * 1990-10-09 1992-05-21 Keiichiro Murofushi Device for drawing noodle line

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