JPS6445660A - Manufacturing method of thermal head - Google Patents
Manufacturing method of thermal headInfo
- Publication number
- JPS6445660A JPS6445660A JP20371387A JP20371387A JPS6445660A JP S6445660 A JPS6445660 A JP S6445660A JP 20371387 A JP20371387 A JP 20371387A JP 20371387 A JP20371387 A JP 20371387A JP S6445660 A JPS6445660 A JP S6445660A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- abrasion
- membrane
- resistant
- patterned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/56—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds
- C07C45/57—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom
- C07C45/60—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom in six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/56—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds
- C07C45/57—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/56—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds
- C07C45/57—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom
- C07C45/59—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom in five-membered rings
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Electronic Switches (AREA)
Abstract
PURPOSE:To increase the positional precision of an abrasion-resistant layer and enable miniaturization of chips by forming an abrasion-resistant membrane layer which can be etched, over the entire surface of an insulative substrate with a thermal resistor layer and a wiring pattern by using high frequency sputtering process. CONSTITUTION:A thermal resistor layer 3 consisting of a crystal silicon layer added with boron, and an electrode wiring material layer, for instance, are formed on an alumina substrate having a glazed layer 2, and are patterned to a prearranged form. Thus a wiring pattern 4 is obtained. Next, a membrane 5' consisting of a mixture of silicon oxide nitride (SiOxNy) as a main component and a metal is formed in a thickness of more than 5mum by means of high-frequency sputtering process. In this way, highly abrasion-resistant membrane can be obtained. Photoregist is applied over the membrane 5' and is patterned. This patterned photoregist is further selectively etched, as a mask, with dilute hydrofluoric and nitric acid to obtain an abrasion-resistant layer of prearranged form 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20371387A JPS6445660A (en) | 1987-08-17 | 1987-08-17 | Manufacturing method of thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20371387A JPS6445660A (en) | 1987-08-17 | 1987-08-17 | Manufacturing method of thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6445660A true JPS6445660A (en) | 1989-02-20 |
Family
ID=16478616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20371387A Pending JPS6445660A (en) | 1987-08-17 | 1987-08-17 | Manufacturing method of thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6445660A (en) |
-
1987
- 1987-08-17 JP JP20371387A patent/JPS6445660A/en active Pending
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