JPS6445660A - Manufacturing method of thermal head - Google Patents

Manufacturing method of thermal head

Info

Publication number
JPS6445660A
JPS6445660A JP20371387A JP20371387A JPS6445660A JP S6445660 A JPS6445660 A JP S6445660A JP 20371387 A JP20371387 A JP 20371387A JP 20371387 A JP20371387 A JP 20371387A JP S6445660 A JPS6445660 A JP S6445660A
Authority
JP
Japan
Prior art keywords
layer
abrasion
membrane
resistant
patterned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20371387A
Other languages
Japanese (ja)
Inventor
Masahiro Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP20371387A priority Critical patent/JPS6445660A/en
Publication of JPS6445660A publication Critical patent/JPS6445660A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/56—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds
    • C07C45/57—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom
    • C07C45/60—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom in six-membered rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/56—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds
    • C07C45/57—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/56—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds
    • C07C45/57—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom
    • C07C45/59—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds from heterocyclic compounds with oxygen as the only heteroatom in five-membered rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electronic Switches (AREA)

Abstract

PURPOSE:To increase the positional precision of an abrasion-resistant layer and enable miniaturization of chips by forming an abrasion-resistant membrane layer which can be etched, over the entire surface of an insulative substrate with a thermal resistor layer and a wiring pattern by using high frequency sputtering process. CONSTITUTION:A thermal resistor layer 3 consisting of a crystal silicon layer added with boron, and an electrode wiring material layer, for instance, are formed on an alumina substrate having a glazed layer 2, and are patterned to a prearranged form. Thus a wiring pattern 4 is obtained. Next, a membrane 5' consisting of a mixture of silicon oxide nitride (SiOxNy) as a main component and a metal is formed in a thickness of more than 5mum by means of high-frequency sputtering process. In this way, highly abrasion-resistant membrane can be obtained. Photoregist is applied over the membrane 5' and is patterned. This patterned photoregist is further selectively etched, as a mask, with dilute hydrofluoric and nitric acid to obtain an abrasion-resistant layer of prearranged form 5.
JP20371387A 1987-08-17 1987-08-17 Manufacturing method of thermal head Pending JPS6445660A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20371387A JPS6445660A (en) 1987-08-17 1987-08-17 Manufacturing method of thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20371387A JPS6445660A (en) 1987-08-17 1987-08-17 Manufacturing method of thermal head

Publications (1)

Publication Number Publication Date
JPS6445660A true JPS6445660A (en) 1989-02-20

Family

ID=16478616

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20371387A Pending JPS6445660A (en) 1987-08-17 1987-08-17 Manufacturing method of thermal head

Country Status (1)

Country Link
JP (1) JPS6445660A (en)

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