JPS6443369A - Liquid discharge device - Google Patents
Liquid discharge deviceInfo
- Publication number
- JPS6443369A JPS6443369A JP20061787A JP20061787A JPS6443369A JP S6443369 A JPS6443369 A JP S6443369A JP 20061787 A JP20061787 A JP 20061787A JP 20061787 A JP20061787 A JP 20061787A JP S6443369 A JPS6443369 A JP S6443369A
- Authority
- JP
- Japan
- Prior art keywords
- valve
- suck back
- check valve
- downstream side
- forcibly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Nozzles (AREA)
- Coating Apparatus (AREA)
Abstract
PURPOSE:To discharge stably by providing a suck back valve on the downstream side of a discharge valve, also providing a check valve between the downstream side of the suck back valve and a discharge needle and closing forcibly the check valve by the action of the suck back function. CONSTITUTION:A suck back valve 3 is provided on the downstream side of a check valve 2, and a check valve 6 is provided between the downstream side of said valve 3 and a discharge needle 4 in a manner to close forcibly the check valve 6 in complicance with the action of such back suction. Said valve 6 is consisted of a cylindrical body 7, a rigid ball 8 installed in the cylindrical body 7 and a compression coil spring 9 to encourage the rigid ball 8 in the inflow side. At the time of suck back, the rigid ball 8 of the valve 6 is pulled in forcibly to shut off securely jointly with the elasticity of the spring 9. As a result, the arrangement works for not only adjusting the suck back comparatively easily, but also lessening the spraying and dripping of liquid, and also response characteristics and stability can be enhanced.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20061787A JPS6443369A (en) | 1987-08-11 | 1987-08-11 | Liquid discharge device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20061787A JPS6443369A (en) | 1987-08-11 | 1987-08-11 | Liquid discharge device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6443369A true JPS6443369A (en) | 1989-02-15 |
Family
ID=16427353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20061787A Pending JPS6443369A (en) | 1987-08-11 | 1987-08-11 | Liquid discharge device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6443369A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04294538A (en) * | 1991-03-22 | 1992-10-19 | Rohm Co Ltd | Chemical liquid supply device in chemical liquid coating device |
JPH0556276U (en) * | 1991-12-27 | 1993-07-27 | マークテック株式会社 | Marking gun |
JP2011131188A (en) * | 2009-12-25 | 2011-07-07 | Tokyo Electron Ltd | Chemical liquid supply nozzle and chemical liquid supply method |
-
1987
- 1987-08-11 JP JP20061787A patent/JPS6443369A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04294538A (en) * | 1991-03-22 | 1992-10-19 | Rohm Co Ltd | Chemical liquid supply device in chemical liquid coating device |
JPH0556276U (en) * | 1991-12-27 | 1993-07-27 | マークテック株式会社 | Marking gun |
JP2011131188A (en) * | 2009-12-25 | 2011-07-07 | Tokyo Electron Ltd | Chemical liquid supply nozzle and chemical liquid supply method |
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