JPS6428810A - Device for forming film - Google Patents
Device for forming filmInfo
- Publication number
- JPS6428810A JPS6428810A JP18232987A JP18232987A JPS6428810A JP S6428810 A JPS6428810 A JP S6428810A JP 18232987 A JP18232987 A JP 18232987A JP 18232987 A JP18232987 A JP 18232987A JP S6428810 A JPS6428810 A JP S6428810A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- electrode
- frequency application
- application electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B9/00—Making granules
- B29B9/02—Making granules by dividing preformed material
- B29B9/06—Making granules by dividing preformed material in the form of filamentary material, e.g. combined with extrusion
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To make it possible to form a film on a substrate with a large area at a high film-formation speed by a method wherein, in an in-line film-formation device in which a thin film is continuously formed, a high-frequency application electrode having a specific narrow width is used. CONSTITUTION:A thin film is continuously formed on a substrate by allowing the substrate, retained by a substrate retaining jig 5, to proceed in the glow discharge generated between a high-frequency application electrode 1 and an earthing electrode 2. At that time, the length (L) of the high-frequency application electrode in the proceeding direction of the substrate is made shorter than the length (l) in the proceeding direction of the retaining jig 5, and the electrode is formed in the narrow width in the range of 0.5-10cm. As a result, a homogenous film can be formed at high speed on the substrate having a large area.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62182329A JP2667665B2 (en) | 1987-07-23 | 1987-07-23 | Film forming equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62182329A JP2667665B2 (en) | 1987-07-23 | 1987-07-23 | Film forming equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6428810A true JPS6428810A (en) | 1989-01-31 |
JP2667665B2 JP2667665B2 (en) | 1997-10-27 |
Family
ID=16116403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62182329A Expired - Fee Related JP2667665B2 (en) | 1987-07-23 | 1987-07-23 | Film forming equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2667665B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6936310B1 (en) | 1999-04-02 | 2005-08-30 | Sharp Kabushiki Kaisha | Plasma processing method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS565972A (en) * | 1979-06-27 | 1981-01-22 | Canon Inc | Film forming method |
JPS62208623A (en) * | 1986-03-03 | 1987-09-12 | Mitsubishi Electric Corp | Semiconductor device manufacture apparatus |
-
1987
- 1987-07-23 JP JP62182329A patent/JP2667665B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS565972A (en) * | 1979-06-27 | 1981-01-22 | Canon Inc | Film forming method |
JPS62208623A (en) * | 1986-03-03 | 1987-09-12 | Mitsubishi Electric Corp | Semiconductor device manufacture apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6936310B1 (en) | 1999-04-02 | 2005-08-30 | Sharp Kabushiki Kaisha | Plasma processing method |
Also Published As
Publication number | Publication date |
---|---|
JP2667665B2 (en) | 1997-10-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |