JPS6428240A - Optical quartz glass member - Google Patents

Optical quartz glass member

Info

Publication number
JPS6428240A
JPS6428240A JP62180927A JP18092787A JPS6428240A JP S6428240 A JPS6428240 A JP S6428240A JP 62180927 A JP62180927 A JP 62180927A JP 18092787 A JP18092787 A JP 18092787A JP S6428240 A JPS6428240 A JP S6428240A
Authority
JP
Japan
Prior art keywords
quartz glass
ingot
glass member
afford
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62180927A
Other languages
Japanese (ja)
Other versions
JPH0535688B2 (en
Inventor
Tatsumasa Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Priority to JP62180927A priority Critical patent/JPS6428240A/en
Publication of JPS6428240A publication Critical patent/JPS6428240A/en
Publication of JPH0535688B2 publication Critical patent/JPH0535688B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1469—Means for changing or stabilising the shape or form of the shaped article or deposit
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2203/00—Fibre product details, e.g. structure, shape
    • C03B2203/10—Internal structure or shape details
    • C03B2203/22—Radial profile of refractive index, composition or softening point

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain an optical quartz glass member useful as a laser stepper device, etc., within a given optical wavelength band, by forming the quartz glass member having hardly any difference in refractive index without emitting fluorescence by irradiation with a low-pressure mercury lamp from a specific mass of quartz glass. CONSTITUTION:High-purity SiCl4 is hydrolyzed and molten in an oxyhydrogen flame to provide a quartz glass ingot 1. Operation to heat the resultant glass ingot 1 to the softening point or above and cool the ingot is repeatedly carried out and the softening direction by its own weight is changed for each heating to remove striae in the three coordinate directions of the quartz glass ingot. The obtained ingot 1 is subsequently heated at about 1,000 deg.C to remove strain and afford a mass 2 of quartz glass, which is then cut to desired dimensions and afford the aimed optical quartz glass member 3, used within a given optical wavelength band at about <=400nm and capable of exhibiting homogeneity of <=5X10<-6> DELTAn difference in refractive index of a light transmitting region without emitting fluorescence even if irradiated with a low-pressure mercury lamp having about 254nm wavelength corresponding to KrF laser at about 250nm wavelength in a darkroom.
JP62180927A 1987-07-22 1987-07-22 Optical quartz glass member Granted JPS6428240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62180927A JPS6428240A (en) 1987-07-22 1987-07-22 Optical quartz glass member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62180927A JPS6428240A (en) 1987-07-22 1987-07-22 Optical quartz glass member

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6180500A Division JP2639514B2 (en) 1994-07-11 1994-07-11 Laser lithography equipment

Publications (2)

Publication Number Publication Date
JPS6428240A true JPS6428240A (en) 1989-01-30
JPH0535688B2 JPH0535688B2 (en) 1993-05-27

Family

ID=16091712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62180927A Granted JPS6428240A (en) 1987-07-22 1987-07-22 Optical quartz glass member

Country Status (1)

Country Link
JP (1) JPS6428240A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0388742A (en) * 1989-06-09 1991-04-15 Shinetsu Sekiei Kk Synthetic silica glass optical body and production therefor
US5719698A (en) * 1993-02-10 1998-02-17 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
JP2004339050A (en) * 2003-04-26 2004-12-02 Carl-Zeiss-Stiftung Flame hydrolysis method for producing glass body of doped quartz glass
WO2004078663A3 (en) * 2003-03-06 2005-06-30 Heraeus Quarzglas Optical synthetic quartz glass and method for producing the same
WO2006088236A1 (en) * 2005-02-18 2006-08-24 Asahi Glass Co., Ltd. Process for producing synthetic quartz glass, jig for synthetic-quartz-glass production, and synthetic quartz glass for optical member

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039535A (en) * 1983-08-12 1985-03-01 Toshiba Ceramics Co Ltd Screening method of quartz glass
JPS6134668A (en) * 1984-07-27 1986-02-18 Casio Comput Co Ltd Kana (japanese syllabary) to kanji (chinese character) converting system
JPS6145824A (en) * 1984-08-01 1986-03-05 Nippon Kiki Kogyo Kk Load handling apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6039535A (en) * 1983-08-12 1985-03-01 Toshiba Ceramics Co Ltd Screening method of quartz glass
JPS6134668A (en) * 1984-07-27 1986-02-18 Casio Comput Co Ltd Kana (japanese syllabary) to kanji (chinese character) converting system
JPS6145824A (en) * 1984-08-01 1986-03-05 Nippon Kiki Kogyo Kk Load handling apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0388742A (en) * 1989-06-09 1991-04-15 Shinetsu Sekiei Kk Synthetic silica glass optical body and production therefor
US5719698A (en) * 1993-02-10 1998-02-17 Nikon Corporation Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
WO2004078663A3 (en) * 2003-03-06 2005-06-30 Heraeus Quarzglas Optical synthetic quartz glass and method for producing the same
US7312170B2 (en) 2003-03-06 2007-12-25 Heraeus Quarzglas Gmbh & Co. Kg Optical synthetic quartz glass and method for producing the same
JP2004339050A (en) * 2003-04-26 2004-12-02 Carl-Zeiss-Stiftung Flame hydrolysis method for producing glass body of doped quartz glass
WO2006088236A1 (en) * 2005-02-18 2006-08-24 Asahi Glass Co., Ltd. Process for producing synthetic quartz glass, jig for synthetic-quartz-glass production, and synthetic quartz glass for optical member
US7992413B2 (en) 2005-02-18 2011-08-09 Asahi Glass Company, Limited Process for producing synthetic quartz glass

Also Published As

Publication number Publication date
JPH0535688B2 (en) 1993-05-27

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