JPS6417859A - Method for controlling refractive index in plane direction - Google Patents

Method for controlling refractive index in plane direction

Info

Publication number
JPS6417859A
JPS6417859A JP17543387A JP17543387A JPS6417859A JP S6417859 A JPS6417859 A JP S6417859A JP 17543387 A JP17543387 A JP 17543387A JP 17543387 A JP17543387 A JP 17543387A JP S6417859 A JPS6417859 A JP S6417859A
Authority
JP
Japan
Prior art keywords
substrate
ion beams
ion
plural
refractive indices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17543387A
Other languages
Japanese (ja)
Inventor
Ichiro Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Aviation Electronics Industry Ltd
Original Assignee
Japan Aviation Electronics Industry Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Aviation Electronics Industry Ltd filed Critical Japan Aviation Electronics Industry Ltd
Priority to JP17543387A priority Critical patent/JPS6417859A/en
Publication of JPS6417859A publication Critical patent/JPS6417859A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

PURPOSE:To form vapor deposited films having light refractive indices which are different in the plane direction on a substrate by concentrating the ion beams of plural materials having different absolute refractive indices on the substrate and scanning the beams on the substrate while controlling ion currents. CONSTITUTION:The materials having the different absolute refractive indices are ionized by plural ion guns 21a-21c to the ion beams 22a-22c which are condensed as convergent ion beams 24a-24c respectively by magnetic lenses 23a-23c to one point on the substrate 13 so that the mixture composed of the convergent ion beams 24a-24c is deposited by evaporation on the substrate 13. The substrate 13 and the condensing point of the plural ion beams are relatively moved in this case so that the predetermined region on the substrate is scanned by the ion beams. The mixing ratios of the plural materials on the plane direction of the substrate 13 are controlled by controlling the relative ion currents between the plural ion beams during this scanning, by which the vapor deposited film having the different light refractive indices is formed on the substrate.
JP17543387A 1987-07-13 1987-07-13 Method for controlling refractive index in plane direction Pending JPS6417859A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17543387A JPS6417859A (en) 1987-07-13 1987-07-13 Method for controlling refractive index in plane direction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17543387A JPS6417859A (en) 1987-07-13 1987-07-13 Method for controlling refractive index in plane direction

Publications (1)

Publication Number Publication Date
JPS6417859A true JPS6417859A (en) 1989-01-20

Family

ID=15996015

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17543387A Pending JPS6417859A (en) 1987-07-13 1987-07-13 Method for controlling refractive index in plane direction

Country Status (1)

Country Link
JP (1) JPS6417859A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1168833A2 (en) * 2000-06-21 2002-01-02 Matsushita Electric Industrial Co., Ltd. CCD imaging apparatus
JP2006057117A (en) * 2004-08-17 2006-03-02 Ishikawajima Harima Heavy Ind Co Ltd Combinatorial device manufacturing equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744746A (en) * 1980-08-29 1982-03-13 Toyota Motor Corp Controlling device of air-fuel ratio

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744746A (en) * 1980-08-29 1982-03-13 Toyota Motor Corp Controlling device of air-fuel ratio

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1168833A2 (en) * 2000-06-21 2002-01-02 Matsushita Electric Industrial Co., Ltd. CCD imaging apparatus
JP2006057117A (en) * 2004-08-17 2006-03-02 Ishikawajima Harima Heavy Ind Co Ltd Combinatorial device manufacturing equipment

Similar Documents

Publication Publication Date Title
JPS5522704A (en) Multilayer antireflecting film
JPS6417859A (en) Method for controlling refractive index in plane direction
JPS561018A (en) Light beam scanner
JPS6473069A (en) Production of aluminum nitride film
JPS57208523A (en) Telecentric variable magnification lighting system
JPS6411203A (en) Lighting device
JPS5619030A (en) Production of liquid crystal display element
JPS5789731A (en) Focusing screen
JPS54162452A (en) Manufacture of semiconductor and its unit
JPS64913A (en) Luminator
JPS56107460A (en) Electron lens
JPS5782806A (en) Formation of thin film having distribution of composition
JPS6424422A (en) Formation of fine pattern
JPS6479718A (en) Zoom lens
JPS5238944A (en) Optical system for scanning
JPS5645827A (en) Forming method for transparent ferroelectric thin film
JPS5688103A (en) Diffraction grating
JPS56150126A (en) Heat treatment
JPS6462456A (en) Formation of thin silicon nitride film
JPS57106114A (en) Ion beam sputtering apparatus
JPS5657001A (en) Reflection preventing film
JPS5567721A (en) Light beam scanner
JPS6482440A (en) Illuminating angle setting method for focusing ion beam device
JPS6459311A (en) Automatic focusing camera
JPS6442323A (en) Production of thin film of ferroelectrics