JPS6414953A - Mis type semiconductor memory device - Google Patents
Mis type semiconductor memory deviceInfo
- Publication number
- JPS6414953A JPS6414953A JP62171497A JP17149787A JPS6414953A JP S6414953 A JPS6414953 A JP S6414953A JP 62171497 A JP62171497 A JP 62171497A JP 17149787 A JP17149787 A JP 17149787A JP S6414953 A JPS6414953 A JP S6414953A
- Authority
- JP
- Japan
- Prior art keywords
- groove
- transistor
- substrate
- memory cell
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/39—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench
- H10B12/395—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor and the transistor being in a same trench the transistor being vertical
Landscapes
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To reduce the substrate occupying area of memory cell by forming a transfer gate transistor of memory cell with the gate electrode formed cylindrically at the side wall surface within the vertical groove of substrate and the capacitance part integrally with the transistor in the same groove with the transfer gate transistor or other groove cascade connected thereto. CONSTITUTION:A MIS type semiconductor memory device comprises a P-type silicon substrate 1, a belt type active element region 3 and a vertical type one transistor memory cell consisting of transfer gate transistor having the groove capacitance part formed by stacking dielectric material film 12 and n-type impurity diffused layer 14 to the side wall surface of lower stage groove of groove having wide opening bored within a silicon substrate just under the active element region 3, drain regions 6a, 6b, 6c... and common source region 5, gate insulation film 8 and gate electrodes 7'a, 7'b, 7'c.... The gate electrodes 7'a, 7'b, 7'c, ... are connected with word lines 7a, 7b, 7c,... on the substrate and the inside of groove having wide opening is filled with polysilicon film 10 to become the capacitance part electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62171497A JPS6414953A (en) | 1987-07-08 | 1987-07-08 | Mis type semiconductor memory device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62171497A JPS6414953A (en) | 1987-07-08 | 1987-07-08 | Mis type semiconductor memory device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6414953A true JPS6414953A (en) | 1989-01-19 |
Family
ID=15924196
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62171497A Pending JPS6414953A (en) | 1987-07-08 | 1987-07-08 | Mis type semiconductor memory device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6414953A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009047230A (en) * | 2007-08-20 | 2009-03-05 | Aisin Aw Co Ltd | Transmission case |
-
1987
- 1987-07-08 JP JP62171497A patent/JPS6414953A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009047230A (en) * | 2007-08-20 | 2009-03-05 | Aisin Aw Co Ltd | Transmission case |
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