JPS5521170A - Semiconductor memory - Google Patents
Semiconductor memoryInfo
- Publication number
- JPS5521170A JPS5521170A JP9433878A JP9433878A JPS5521170A JP S5521170 A JPS5521170 A JP S5521170A JP 9433878 A JP9433878 A JP 9433878A JP 9433878 A JP9433878 A JP 9433878A JP S5521170 A JPS5521170 A JP S5521170A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- capacitor
- diffusion layer
- transistor
- memory cells
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
Landscapes
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To raise an integration rate by arranging a capacitor of adjacent memory cells above and under a standard potential electrode put on a common use. CONSTITUTION:A N-type impurity diffusion layer 221 and 222 formed on a P-type silicon substrate 1 forms a source region or a drain of transistor T21 and T22 and a data line. A N-type impurity diffusion layer 23 forms a source or a drain region of the transistor T22. A field diffusion layer film 24 and channel stopper 25 are serves to separate a pair of memory cells substantially. An inversion layer 28 is induced by an electrode 27 on the substrate surface immediately under it, a capacitor C21 is formed. A capacitor C22 is formed between an electrode 30 and electrode 27. A gate electrode 32 is arranged on an insulation film 33, and a word line 36 is connected through a contact hole 37 to the gate electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9433878A JPS5521170A (en) | 1978-08-02 | 1978-08-02 | Semiconductor memory |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9433878A JPS5521170A (en) | 1978-08-02 | 1978-08-02 | Semiconductor memory |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5521170A true JPS5521170A (en) | 1980-02-15 |
Family
ID=14107494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9433878A Pending JPS5521170A (en) | 1978-08-02 | 1978-08-02 | Semiconductor memory |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5521170A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4641166A (en) * | 1982-12-20 | 1987-02-03 | Fujitsu Limited | Semiconductor memory device having stacked capacitor-type memory cells |
US4649406A (en) * | 1982-12-20 | 1987-03-10 | Fujitsu Limited | Semiconductor memory device having stacked capacitor-type memory cells |
-
1978
- 1978-08-02 JP JP9433878A patent/JPS5521170A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4641166A (en) * | 1982-12-20 | 1987-02-03 | Fujitsu Limited | Semiconductor memory device having stacked capacitor-type memory cells |
US4649406A (en) * | 1982-12-20 | 1987-03-10 | Fujitsu Limited | Semiconductor memory device having stacked capacitor-type memory cells |
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