JPS6411326A - Projection aligner - Google Patents
Projection alignerInfo
- Publication number
- JPS6411326A JPS6411326A JP62168024A JP16802487A JPS6411326A JP S6411326 A JPS6411326 A JP S6411326A JP 62168024 A JP62168024 A JP 62168024A JP 16802487 A JP16802487 A JP 16802487A JP S6411326 A JPS6411326 A JP S6411326A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- fly
- optical axis
- eyed
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Abstract
PURPOSE:To prevent specles from being generated upon pattern transcription even if laser beams of short wavelength and narrow band width are used so as to obtain high resolution and to prevent light quantity loss, by interposing a fly-eyed lens between an illumination light source and a projection lens and rotating this fly-eyed lens around an axis approximately parallel to an optical axis. CONSTITUTION:A luminous flux 12 emitted from a laser 11 is shaped by a cylindrical lens 13, and made to pass through the lens 13, and its direction is changed by a reflection mirror 14. Further the flux is guided into an illumination optical system consisting of a cylindrical lens 15, a fly-eyed lens 16, a condenser lens 17, a diaphragm 18, and the like. Light from the illumination optical system is radiated on a reticle 19. A circuit pattern to be transcribed is pictured in advance on the reticle 19, and it is reduced to one tenth and transcribed on a wafer 21 by a projection lens 20. The lens 16 is wholly formed in a columnar shape and it is supported to be freely rotatable with an axis of its column being aligned to an optical axis. The fly-eyed lens 16 is installed in such composition that a plurality of miniature lenses are arranged inside a plane perpendicular to the optical axis and individual lenses are disposed with the amount of shift corresponding to a fourth wavelength in the direction of the optical axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62168024A JPS6411326A (en) | 1987-07-06 | 1987-07-06 | Projection aligner |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62168024A JPS6411326A (en) | 1987-07-06 | 1987-07-06 | Projection aligner |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6411326A true JPS6411326A (en) | 1989-01-13 |
Family
ID=15860400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62168024A Pending JPS6411326A (en) | 1987-07-06 | 1987-07-06 | Projection aligner |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6411326A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2666939A1 (en) * | 1990-09-19 | 1992-03-20 | Hitachi Ltd | Laser oscillator and device for fabricating a semiconductor using the said oscillator |
| KR20020032295A (en) * | 2000-10-25 | 2002-05-03 | 다나카 아키히로 | Sequential exposure apparatus for substrate |
| JP2003156710A (en) * | 2001-11-22 | 2003-05-30 | Toshiba Corp | Laser beam source device |
| WO2008114502A1 (en) * | 2007-03-19 | 2008-09-25 | Panasonic Corporation | Laser illuminating device and image display device |
| KR20190084067A (en) | 2016-12-01 | 2019-07-15 | 도요보 가부시키가이샤 | Organic solvent recovery system and organic solvent recovery method |
-
1987
- 1987-07-06 JP JP62168024A patent/JPS6411326A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2666939A1 (en) * | 1990-09-19 | 1992-03-20 | Hitachi Ltd | Laser oscillator and device for fabricating a semiconductor using the said oscillator |
| KR20020032295A (en) * | 2000-10-25 | 2002-05-03 | 다나카 아키히로 | Sequential exposure apparatus for substrate |
| JP2003156710A (en) * | 2001-11-22 | 2003-05-30 | Toshiba Corp | Laser beam source device |
| WO2008114502A1 (en) * | 2007-03-19 | 2008-09-25 | Panasonic Corporation | Laser illuminating device and image display device |
| JP4880746B2 (en) * | 2007-03-19 | 2012-02-22 | パナソニック株式会社 | Laser illumination device and image display device |
| US8192030B2 (en) | 2007-03-19 | 2012-06-05 | Panasonic Corporation | Laser illuminating device and image display device |
| KR20190084067A (en) | 2016-12-01 | 2019-07-15 | 도요보 가부시키가이샤 | Organic solvent recovery system and organic solvent recovery method |
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