JPS6410245A - Pattern forming method - Google Patents
Pattern forming methodInfo
- Publication number
- JPS6410245A JPS6410245A JP16575487A JP16575487A JPS6410245A JP S6410245 A JPS6410245 A JP S6410245A JP 16575487 A JP16575487 A JP 16575487A JP 16575487 A JP16575487 A JP 16575487A JP S6410245 A JPS6410245 A JP S6410245A
- Authority
- JP
- Japan
- Prior art keywords
- film
- developer
- photosensitive resin
- contrastenhanced
- allowing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To reduce a faulty development due to the application of a contrastenhanced film by allowing to prewet processing said film with a thinner developer than that is used for the development of a resist. CONSTITUTION:A photosensitive resin is applied on a substrate, and a water soluble org. film contg. a compd. having fading and bleaching properties is formed on the photosensitive resin film, and the photosensitive resin film and said water soluble org. film are selectively exposed, followed by allowing to prewet processing with a first developer. The photosensitive resin film and the water soluble org. film laminated on said resin film, which are selectively exposed and have two layer structure, are developed at the same time with an 2nd developer which has a concentration thicker than that of the 1st developer, followed by removing the water-soluble org. film. Namely, the dissolving speed of the contrastenhanced film 3 accelerates by allowing to prewet processing with the thinner developer than that used for the resist, whereby a contrastenhanced effect is fully displayed without generating variance in the dissolving speed of the resist layer 2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16575487A JPS6410245A (en) | 1987-07-02 | 1987-07-02 | Pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16575487A JPS6410245A (en) | 1987-07-02 | 1987-07-02 | Pattern forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6410245A true JPS6410245A (en) | 1989-01-13 |
Family
ID=15818426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16575487A Pending JPS6410245A (en) | 1987-07-02 | 1987-07-02 | Pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6410245A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06224178A (en) * | 1992-09-21 | 1994-08-12 | Internatl Business Mach Corp <Ibm> | Microminiature structure and its assembly method |
US8080364B2 (en) | 2003-05-09 | 2011-12-20 | Panasonic Corporation | Pattern formation method |
-
1987
- 1987-07-02 JP JP16575487A patent/JPS6410245A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06224178A (en) * | 1992-09-21 | 1994-08-12 | Internatl Business Mach Corp <Ibm> | Microminiature structure and its assembly method |
US8080364B2 (en) | 2003-05-09 | 2011-12-20 | Panasonic Corporation | Pattern formation method |
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