JPS6410245A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS6410245A
JPS6410245A JP16575487A JP16575487A JPS6410245A JP S6410245 A JPS6410245 A JP S6410245A JP 16575487 A JP16575487 A JP 16575487A JP 16575487 A JP16575487 A JP 16575487A JP S6410245 A JPS6410245 A JP S6410245A
Authority
JP
Japan
Prior art keywords
film
developer
photosensitive resin
contrastenhanced
allowing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16575487A
Other languages
Japanese (ja)
Inventor
Masataka Endo
Masaru Sasako
Kazufumi Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16575487A priority Critical patent/JPS6410245A/en
Publication of JPS6410245A publication Critical patent/JPS6410245A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To reduce a faulty development due to the application of a contrastenhanced film by allowing to prewet processing said film with a thinner developer than that is used for the development of a resist. CONSTITUTION:A photosensitive resin is applied on a substrate, and a water soluble org. film contg. a compd. having fading and bleaching properties is formed on the photosensitive resin film, and the photosensitive resin film and said water soluble org. film are selectively exposed, followed by allowing to prewet processing with a first developer. The photosensitive resin film and the water soluble org. film laminated on said resin film, which are selectively exposed and have two layer structure, are developed at the same time with an 2nd developer which has a concentration thicker than that of the 1st developer, followed by removing the water-soluble org. film. Namely, the dissolving speed of the contrastenhanced film 3 accelerates by allowing to prewet processing with the thinner developer than that used for the resist, whereby a contrastenhanced effect is fully displayed without generating variance in the dissolving speed of the resist layer 2.
JP16575487A 1987-07-02 1987-07-02 Pattern forming method Pending JPS6410245A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16575487A JPS6410245A (en) 1987-07-02 1987-07-02 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16575487A JPS6410245A (en) 1987-07-02 1987-07-02 Pattern forming method

Publications (1)

Publication Number Publication Date
JPS6410245A true JPS6410245A (en) 1989-01-13

Family

ID=15818426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16575487A Pending JPS6410245A (en) 1987-07-02 1987-07-02 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS6410245A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06224178A (en) * 1992-09-21 1994-08-12 Internatl Business Mach Corp <Ibm> Microminiature structure and its assembly method
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06224178A (en) * 1992-09-21 1994-08-12 Internatl Business Mach Corp <Ibm> Microminiature structure and its assembly method
US8080364B2 (en) 2003-05-09 2011-12-20 Panasonic Corporation Pattern formation method

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