JPS6380546U - - Google Patents

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図ａ，ｂはこの考案の一実施例を示す平面
図、第２図ａ，ｂはそれぞれ第１図ａ，ｂの透明
領域と不透明領域を反転させた状態を示す平面図
、第３図ａ，ｂは従来のフオトマスクの目合せマ
ークの形状の一例を示す平面図、第４図ａ，ｂは
それぞれ第３図ａ，ｂの透明領域と不透明領域を
反転させた状態を示す平面図である。 １……十字形図形、２……正方形図形。なお、
図中同一符号は同一または相当する部分を示す。 Figures 1a and b are plan views showing one embodiment of this invention, Figures 2a and b are plan views showing the transparent and opaque areas of Figures 1a and b respectively inverted, and Figure 3 Figures a and b are plan views showing an example of the shape of the alignment mark of a conventional photomask, and Figures 4 a and b are plan views showing a state in which the transparent and opaque areas of Figures 3 a and b are reversed, respectively. It is. 1...Cross shape, 2...Square shape. In addition,
The same reference numerals in the figures indicate the same or corresponding parts.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] フオトリソグラフイに用いるフオトマスクのマ
スク合せ用の目合せマークで、一つの図形のほか
に該図形の境界線とある間隔を隔てて平行な境界
線をもつ図形を備え、前工程のフオトマスクに対
して上記両図形の相対峙する境界線が同一方向に
ずれる状態に設けられ、該目合せマークを付した
フオトマスクをポジレジスト用、ネガレジスト用
の一方から他方へ変更する場合に書き直す必要の
ないことを特徴とする目合せマーク。 It is an alignment mark for mask alignment of a photomask used in photolithography, and includes one figure and a figure with a boundary line parallel to the boundary line of the figure at a certain interval, and is used for the photomask in the previous process. The boundary lines of the above-mentioned two figures facing each other are shifted in the same direction, and there is no need to rewrite the photomask with alignment marks when changing from one for positive resist to the other for negative resist. A distinctive alignment mark.