JPS6342787A - Automatic hot sterilizing device for ultrapure water feed line - Google Patents
Automatic hot sterilizing device for ultrapure water feed lineInfo
- Publication number
- JPS6342787A JPS6342787A JP18531486A JP18531486A JPS6342787A JP S6342787 A JPS6342787 A JP S6342787A JP 18531486 A JP18531486 A JP 18531486A JP 18531486 A JP18531486 A JP 18531486A JP S6342787 A JPS6342787 A JP S6342787A
- Authority
- JP
- Japan
- Prior art keywords
- pure water
- water
- piping
- heat exchanger
- sterilization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001954 sterilising effect Effects 0.000 title claims abstract description 24
- 229910021642 ultra pure water Inorganic materials 0.000 title claims description 13
- 239000012498 ultrapure water Substances 0.000 title claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 121
- 238000004659 sterilization and disinfection Methods 0.000 claims abstract description 22
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 230000001105 regulatory effect Effects 0.000 claims description 5
- 230000002411 adverse Effects 0.000 abstract description 3
- 238000011268 retreatment Methods 0.000 abstract 1
- 239000012528 membrane Substances 0.000 description 13
- 238000004140 cleaning Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000003507 refrigerant Substances 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 3
- 241000894006 Bacteria Species 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000008213 purified water Substances 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- 235000014036 Castanea Nutrition 0.000 description 1
- 241001070941 Castanea Species 0.000 description 1
- 241000257465 Echinoidea Species 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 238000000108 ultra-filtration Methods 0.000 description 1
Landscapes
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は一次側純水製造装置で得た純水を、ユースポイ
ントの直前で再度処理する二次側給水系路を熱水殺菌処
理するための装置に係り、特に殺菌に用いる熱純水の温
度あるいは温度と圧力を配管系路に悪影響を与えないよ
うに自動的に制御して二次側給水系路の耐久性並びに信
頼性を向上した超純水給水系路の自動熱殺菌装置に関す
る。[Detailed Description of the Invention] [Field of Industrial Application] The present invention performs hot water sterilization treatment on a secondary water supply system in which pure water obtained in a primary water purification device is reprocessed immediately before the point of use. In particular, it improves the durability and reliability of the secondary water supply system by automatically controlling the temperature or temperature and pressure of hot pure water used for sterilization so as not to adversely affect the piping system. This invention relates to an automatic heat sterilizer for ultrapure water supply lines.
近年、LSIや超LSIを生産する電子工業における半
導体ウェハーまたはチップ(以下半導体ウェハーという
)の洗浄用水として、微粒子、コロイダル物質、高分子
有機物、発熱性物質等を可及的に除去した超純水が用い
られている。In recent years, ultrapure water from which fine particles, colloidal substances, polymeric organic substances, exothermic substances, etc. have been removed as much as possible has been used as water for cleaning semiconductor wafers or chips (hereinafter referred to as semiconductor wafers) in the electronics industry that produces LSIs and VLSIs. is used.
このような半導体ウェハーの洗浄用水は通常、次のよう
な方法で製造される。Such water for cleaning semiconductor wafers is usually produced by the following method.
すなわち、原水を凝集沈澱装置、砂濾過器、活性炭濾過
器、逆浸透膜装置、2床3塔式純水製造装置、混床式ポ
リシャー、精密フィルター等の一次側給水装置で処理し
て純水を得、次いで半導体ウェハーを洗浄する直前で、
前記一次側純水を、第3図に示すような二次側給水装置
で処理している。In other words, raw water is treated with a primary water supply device such as a coagulation sedimentation device, sand filter, activated carbon filter, reverse osmosis membrane device, two-bed three-column pure water production device, mixed-bed polisher, precision filter, etc. to produce pure water. immediately before cleaning the semiconductor wafer.
The primary pure water is treated with a secondary water supply device as shown in FIG.
二次側給水装置では、一旦純水槽1に貯留した純水2を
、混床式ポリシャー3、紫外線照射装置4、精密濾過膜
装置や超濾過膜装置あるいは逆浸透膜装置のような膜装
置5を通して処理し、−次処理純水中に残留するイオン
、微粒子、コロイダル物質等を可及的に除去して半導体
ウニ/)−の洗浄に適する超純水とするものである。In the secondary water supply system, pure water 2 once stored in a pure water tank 1 is transferred to a mixed bed polisher 3, an ultraviolet irradiation device 4, and a membrane device 5 such as a precision filtration membrane device, an ultrafiltration membrane device, or a reverse osmosis membrane device. This process removes as much as possible of ions, fine particles, colloidal substances, etc. remaining in the purified water for subsequent treatment, thereby producing ultrapure water suitable for cleaning semiconductor sea urchins.
なお、紫外線照射装置4は混床式ポリシャー3の前段に
設置されることもあり、また膜装置5の透過水である超
純水はユースポイント配管6によって、第3図の一点鎖
線で囲んだユースポイント7まで移送し、ここで洗浄用
水として使用に供され、残余の透過水は戻し配管8を通
して純水槽1に戻す。Note that the ultraviolet irradiation device 4 may be installed before the mixed-bed polisher 3, and the ultrapure water that is the permeated water of the membrane device 5 is passed through the use point piping 6 as shown in the dashed line in Fig. 3. The permeated water is transported to a use point 7, where it is used as cleaning water, and the remaining permeated water is returned to the pure water tank 1 through a return pipe 8.
このように、二次側給水装置ではその被処理水が一次側
給水装置で得られる純水であるにも拘らず、またユース
ポイント直前で紫外線照射を行っているにも拘らず、長
時間の超純水給水を続行すると、超純水中に生栗や微粒
子の漏洩量が増加し許容限度を超えてしまう。In this way, even though the water to be treated in the secondary water supply system is pure water obtained from the primary water supply system, and even though ultraviolet rays are irradiated just before the point of use, If the ultrapure water supply continues, the amount of raw chestnuts and fine particles leaking into the ultrapure water will increase and exceed the allowable limit.
この原因は超純水中に僅かに存在し、紫外線に耐性を有
する一般細菌が膜装置5や以後のユースポイント配管6
等に次第に繁殖してくるためと考えられる。The cause of this is a small amount of common bacteria that exist in ultrapure water and are resistant to ultraviolet rays.
This is thought to be because they gradually reproduce.
膜装置5やユースポイント配管6等が汚染された場合、
洗浄用水として不通となるため、何らかの殺菌処理を施
す必要が生ずるが、従来は殺菌処理方法として、過酸化
水素水や次亜塩素酸ソーダ溶液等の酸化剤を用いる方法
と、特願昭61−74265号に示されているユースポ
イント配管をも含めた熱水による洗浄方法とが行われて
いる。If the membrane device 5, use point piping 6, etc. are contaminated,
Since the water cannot be used for cleaning, it becomes necessary to perform some kind of sterilization treatment, but conventional sterilization methods include methods using oxidizing agents such as hydrogen peroxide solution and sodium hypochlorite solution, and a method using a patent application filed in 1983- No. 74265 discloses a cleaning method using hot water that also includes point-of-use piping.
二次側給水系路の殺菌処理方法として前記したような薬
品を用いた場合、膜装置や配管系統を劣化させるという
問題があるほか、殺菌処理後の洗浄に多量の純水を使用
するので経済的に不利になるという問題がある。When using the above-mentioned chemicals as a method of sterilizing the secondary water supply system, there is a problem of deterioration of the membrane device and piping system, and it is not economical because a large amount of pure water is used for cleaning after sterilization. There is a problem of being at a financial disadvantage.
一方、ユースポイント配管部をも含めた熱水による洗浄
方法によった場合、薬品処理に伴う不具合点を解決でき
るという利点を有するが、次に示すような新たな問題点
が生ずる。On the other hand, when a hot water cleaning method is used including the point-of-use piping, it has the advantage of being able to solve the problems associated with chemical treatment, but new problems arise as shown below.
すなわち、熱交換器のような加熱手段で加熱された熱純
水は70℃以上の高温となるのであるが、この温度や配
管内圧力の管理は、従来オペレーターによる手動操作に
よって行われていたため、急激な温度上昇や下降により
配管類に過度な膨張・収縮が加わるほか、急激な温度上
昇に伴う管内圧力の上昇等により配管類の耐久性を悪(
するという欠点があった。また−人為操作のためオペレ
ーターミスが生ずる危険性もあり、非省力的であるとい
う問題点があった。In other words, thermally purified water heated by a heating means such as a heat exchanger reaches a high temperature of 70°C or higher, but this temperature and the pressure inside the pipes have traditionally been controlled manually by operators. In addition to excessive expansion and contraction of piping due to rapid temperature rises and falls, the durability of piping may be adversely affected due to increases in pressure inside the pipes due to rapid temperature rises.
There was a drawback to that. In addition, there is a risk of operator error occurring due to manual operation, and there is a problem that it is not labor-saving.
本発明の目的は、前記した従来の熱水殺菌処理に伴う問
題点を除去し、殺菌に用いる熱純水の温度あるいは温度
と圧力を配管系路に影響を与えないよう自動的に制御し
て二次側給水系路の耐久性を向上すると共に、自動化に
よりオペレーターミス等をなくした超純水給水系路の自
動熱殺菌装置を提供することにある。An object of the present invention is to eliminate the problems associated with the conventional hot water sterilization treatment described above, and to automatically control the temperature or temperature and pressure of hot pure water used for sterilization so as not to affect the piping system. An object of the present invention is to provide an automatic heat sterilizer for an ultrapure water supply system that improves the durability of a secondary water supply system and eliminates operator errors through automation.
本発明を詳述すれば、一次側純水製造装置で得た純水を
、ユースポイントの直前で再度処理する二次側給水系路
を熱水殺菌処理するための装置において、一次側純水製
造装置で得た純水を加熱するための熱交換器と、この熱
交換器に熱媒を供給する熱媒供給管と、熱交換器に至る
当該熱媒供給管に付設した温度調節弁と、二次側給水系
路の配管適所に付設した純水の温度検出器と、この温度
検出器からの信号に基づき前記温度調節弁を自動的に制
御する制御回路を有する自動調節器とを具備してなるこ
とを特徴とする超純水給水系路の自動熱殺菌装置であり
、場合によっては、二次側給水系路の配管適所に圧力調
節弁及び圧力検出器を付設し、当該圧力調節弁と圧力検
出器を前記自動調節器に計装的に結合させるようにした
ものであ〔作 用〕
以下、本発明装置の具体的構成並びに作用を図面に基づ
き詳細に説明する。To describe the present invention in detail, in an apparatus for hot water sterilization of a secondary water supply system in which pure water obtained in a primary pure water production apparatus is reprocessed immediately before the point of use, A heat exchanger for heating pure water obtained in a manufacturing device, a heat medium supply pipe that supplies a heat medium to this heat exchanger, and a temperature control valve attached to the heat medium supply pipe leading to the heat exchanger. , equipped with a pure water temperature detector attached to an appropriate position in the piping of the secondary water supply system line, and an automatic regulator having a control circuit that automatically controls the temperature control valve based on a signal from the temperature detector. This is an automatic heat sterilizer for an ultrapure water supply system, and in some cases, a pressure control valve and a pressure detector are attached to appropriate positions in the piping of the secondary side water supply system to control the pressure. A valve and a pressure detector are connected to the automatic regulator in an instrumentation manner. [Function] Hereinafter, the specific structure and function of the device of the present invention will be explained in detail with reference to the drawings.
第1図は本発明の実施態様の一例のフローを示す説明図
であり、図中10は一次側純水製造装置で得た純水11
を貯留させておく純水槽を示す。FIG. 1 is an explanatory diagram showing a flow of an example of an embodiment of the present invention, and in the figure, 10 is pure water 11 obtained from a primary side pure water production device.
This shows a pure water tank that stores water.
この純水槽10から始まる二次側給水系路は、先づ、純
水槽10内の純水を配管を通して混床式ポリシャー12
、紫外線照射装置13、膜装置14で処理し、その透過
水をユースポイント配管15を介してユースポイント1
6にまで導き、ここで半導体ウェハーの洗浄用水として
使用されるようになっている。費消されなかった超純水
は戻し配管17を介して純水槽10内に戻され、繰り返
し使用されるようになっている。The secondary water supply system starting from this pure water tank 10 first passes the pure water in the pure water tank 10 through piping to the mixed bed polisher 12.
, the ultraviolet irradiation device 13 and the membrane device 14, and the permeated water is sent to the use point 1 via the use point piping 15.
6, where it is used as water for cleaning semiconductor wafers. The unconsumed ultrapure water is returned to the pure water tank 10 via the return pipe 17 and is used repeatedly.
なお、図示しないが、膜装置14における非透過水も非
透過水循環配管を介して純水槽10に戻される構造とな
っている。Although not shown, the structure is such that the non-permeated water in the membrane device 14 is also returned to the pure water tank 10 via the non-permeated water circulation piping.
二次側給水系路を熱水殺菌処理するための装置は、一次
側純水製造装置で得た純水11を加熱するための熱交換
器18と、この熱交換器18に温水又はスチームのよう
な熱媒を供給する熱媒供給管19と、熱交換器18に至
る熱媒供給管19に付設した温度調節弁20と、二次側
給水系路の配管適所に付設した純水の温度検出器21と
、この温度検出器21からの信号に基づき前記温度調節
弁20を自動的に制御する制御回路を有する自動調節器
22とからなるもので、この実施例における熱交換器1
8は純水槽10から混床式ポリシャー12に至る管路中
に付設されている。The device for hot water sterilization treatment of the secondary water supply system includes a heat exchanger 18 for heating the pure water 11 obtained by the primary pure water production device, and a heat exchanger 18 for heating the pure water 11 obtained by the primary pure water production device, and for supplying hot water or steam to the heat exchanger 18. The heat medium supply pipe 19 that supplies the heat medium, the temperature control valve 20 attached to the heat medium supply pipe 19 leading to the heat exchanger 18, and the temperature control valve 20 of pure water attached to the appropriate position of the piping of the secondary water supply system path. The heat exchanger 1 in this embodiment consists of a detector 21 and an automatic regulator 22 having a control circuit that automatically controls the temperature control valve 20 based on a signal from the temperature detector 21.
8 is attached in a conduit leading from the pure water tank 10 to the mixed bed type polisher 12.
なお、配管内の圧力を必要に応じコントロールするため
、二次側給水系路の配管適所、すなわち、この実施例に
おいては膜装置14からユースポイント16に至るユー
スポイント配管15の管路中に純水の圧力調節弁23と
圧力検出器24を付設してあり、圧力検出器24からの
信号に基づき、前記自動調節器22によって圧力調節弁
23が自動的に制御されるようになっている。なお、使
用される配管が二弗化樹脂パイプ(TVDF)のように
耐圧性に優れているものである場合は、前記圧力調節機
構を削除することができる。In addition, in order to control the pressure inside the piping as necessary, a pure water is added to the appropriate place in the piping of the secondary water supply system, that is, in this embodiment, in the piping of the use point piping 15 from the membrane device 14 to the use point 16. A water pressure regulating valve 23 and a pressure detector 24 are attached, and the pressure regulating valve 23 is automatically controlled by the automatic regulator 22 based on a signal from the pressure detector 24. Note that if the piping used has excellent pressure resistance, such as a difluoride resin pipe (TVDF), the pressure adjustment mechanism can be omitted.
その他、図中の25は熱媒供給管19に付設した自動弁
、26は必要に応じ熱媒供給管19に合流するように配
設した例えば、常温水等を冷媒として用いる冷媒供給管
、27は当該冷媒供給管に付設した自動弁であり、当該
自動弁25及び27は共に前記自動調節器22によって
開閉が制御されるようになっている。In addition, 25 in the figure is an automatic valve attached to the heat medium supply pipe 19, 26 is a refrigerant supply pipe arranged to join the heat medium supply pipe 19 as necessary, for example, using room temperature water as a refrigerant, 27 is an automatic valve attached to the refrigerant supply pipe, and opening and closing of both the automatic valves 25 and 27 are controlled by the automatic regulator 22.
28は混床式ポリシャー12の入口側と出口側を結ぶバ
イパス管であり、バイパス管28と混床式ポリシャー1
2の入口側には、それぞれ弁29゜30が配設されてい
る。また、31はユースポイント16後段の戻し配管1
7中に付設した純水戻し弁、32は熱水ブロー配管33
中に付設した熱水ブロー弁をそれぞれ示すものである。28 is a bypass pipe that connects the inlet side and the outlet side of the mixed bed type polisher 12, and the bypass pipe 28 and the mixed bed type polisher 1
Valves 29 and 30 are disposed on the inlet sides of the valves 2 and 2, respectively. In addition, 31 is the return pipe 1 after the use point 16
Pure water return valve attached to 7, 32 is hot water blow piping 33
Each figure shows the hot water blow valve installed inside.
次に、本発明装置における熱水による殺菌処理は以下の
ように行われる。Next, sterilization treatment using hot water in the apparatus of the present invention is performed as follows.
先づ、自動調節器22からの信号によって純水戻し弁3
1を閉、熱水ブロー弁32を開とし、加熱工程に入る。First, the pure water return valve 3 is activated by a signal from the automatic regulator 22.
1 is closed, the hot water blow valve 32 is opened, and the heating process begins.
加熱工程では、自動調節器22からの信号によって熱媒
自動弁25を自動的に開き、熱媒を熱交換器18に供給
するが、その際、温度検出器21からの検温結果に基づ
き、自動調節器22の演算指令により温度調節弁20は
、予め設定された温度上昇カーブに沿って純水が加熱さ
れるよう自動制御される。なお、熱純水から混床式ポリ
シャー12を保護するため、熱水殺菌処理の際は、弁3
0を閉し、弁29を開いて熱純水をバイパス管28を通
すようにするのはいうまでもない。In the heating process, the heat medium automatic valve 25 is automatically opened in response to a signal from the automatic controller 22 and the heat medium is supplied to the heat exchanger 18. The temperature control valve 20 is automatically controlled by the calculation command from the regulator 22 so that the pure water is heated along a preset temperature increase curve. In order to protect the mixed bed polisher 12 from hot pure water, valve 3 must be closed during hot water sterilization.
Needless to say, the valve 29 is opened to allow hot pure water to pass through the bypass pipe 28.
熱純水の通流により、給水系路内の圧力が次第に上昇し
てくるが、この圧力変化は圧力検出器24にて自動調節
器22に伝達され、所定圧力以上となった場合は、配管
類保護のため圧力調節弁23を使用して必要に応じ圧力
をコントロールするものである。熱純水の通流により、
膜装置14やユースポイント16配管部に付着している
生菌や微粒子等は殺菌除去され、熱水ブロー配管33を
通って系外に排出される。The pressure in the water supply system gradually rises due to the flow of hot pure water, but this pressure change is transmitted to the automatic regulator 22 by the pressure detector 24, and if the pressure exceeds a predetermined value, For protection, a pressure regulating valve 23 is used to control the pressure as necessary. By passing hot pure water,
Living bacteria, particles, etc. adhering to the membrane device 14 and the piping section of the use point 16 are sterilized and removed, and are discharged to the outside of the system through the hot water blow piping 33.
洗浄時間は、少なくとも30分以上とすることが必要で
、通常は60分前後熱殺菌処理を継続する。そして、所
定時間の経過後、第1図に示す実施例の場合、熱媒自動
弁25を冷媒自動弁27に切り換え、温度調節弁20を
制御して予め決められた温度下降カーブに沿って純水を
冷却し、純水供給温度まで下げる。The cleaning time must be at least 30 minutes or longer, and the heat sterilization treatment is usually continued for about 60 minutes. After a predetermined period of time has elapsed, in the case of the embodiment shown in FIG. Cool the water down to the pure water supply temperature.
以上の操作はいずれも自動調節器22を使用して自動的
に処理するものである。なお、熱媒の供給量を温度調節
弁20によって減少させるのみで予め決められた温度下
降カーブに沿って純水を冷却し得る場合は、前記冷媒の
供給を省略することができるものである。All of the above operations are automatically processed using the automatic regulator 22. Note that if the pure water can be cooled along a predetermined temperature drop curve by simply reducing the supply amount of the heat medium using the temperature control valve 20, the supply of the refrigerant can be omitted.
第1図に示すフローにて、第2図に示す温度上昇・下降
カーブに沿って熱水殺菌処理を行った。Hot water sterilization treatment was performed according to the flow shown in FIG. 1 and along the temperature rise/fall curve shown in FIG. 2.
加熱工程において、自動調節器22の温度調節弁20へ
の演算指令の定数P(比例帯)、I (積分時間)値が
、各温度により異なるため、工程を3段階とし、加熱I
、加熱■及び加熱■とした。In the heating process, the constant P (proportional band) and I (integral time) values of the calculation command to the temperature control valve 20 of the automatic controller 22 differ depending on each temperature, so the process is divided into three stages, and the heating I
, heating ■, and heating ■.
各段階毎のPの値は、それぞれ80%、100%、12
0%とした。また、Iの値をそれぞれ5秒、20秒、2
0秒とした。The values of P for each stage are 80%, 100%, and 12, respectively.
It was set to 0%. Also, the values of I are set to 5 seconds, 20 seconds, and 2, respectively.
It was set to 0 seconds.
圧力に関しては、常に1.2 kg/cdを維持するよ
うにした。The pressure was always maintained at 1.2 kg/cd.
その結果、毎回同じ条件で熱水殺菌処理を行っても配管
類に何らの異常も認められず、充分な熱水殺菌処理を自
動的に行うことが可能となった。As a result, no abnormality was observed in the piping even if hot water sterilization was performed under the same conditions each time, and it became possible to perform sufficient hot water sterilization automatically.
以上説明した如く、本発明装置によれば、殺菌に用いる
熱純水の温度を給水系路に影響を与えないよう理想的な
温度上昇・下降カーブに従って自動的に制御することが
できるので、二次側給水系路の耐久性が飛躍的に向上す
るものである。As explained above, according to the device of the present invention, the temperature of the hot pure water used for sterilization can be automatically controlled according to the ideal temperature rise/fall curve so as not to affect the water supply line. This dramatically improves the durability of the next water supply system.
また、配管内の圧力調節も自動的になされるので、従来
のように操作ミスによって配管類に破損を生ずるといっ
た不具合点をも解消することができるものである。In addition, since the pressure inside the pipes is automatically adjusted, it is possible to eliminate the problem of damage to the pipes due to operational errors, which was the case in the past.
第1図は本発明装置の実施態様の一例を示すフローの説
明図、第2図は純水の加熱工程における温度上昇・下降
カーブを示すグラフ、第3図は従来の二次側給水装置の
フローの説明図である。
10:純水槽 11:純 水
12;混床式ポリシャー
13:紫外線照射装置
14:膜装置
15ニユースポイント配管
16:ユースポイントFig. 1 is an explanatory diagram of a flow showing an example of an embodiment of the device of the present invention, Fig. 2 is a graph showing temperature rise and fall curves in the heating process of pure water, and Fig. 3 is a diagram of a conventional secondary water supply device. It is an explanatory diagram of a flow. 10: Pure water tank 11: Pure water 12; Mixed bed polisher 13: Ultraviolet irradiation device 14: Membrane device 15 News point piping 16: Use point
Claims (2)
トの直前で再度処理する二次側給水系路を熱水殺菌処理
するための装置において、一次側純水製造装置で得た純
水を加熱するための熱交換器と、この熱交換器に熱媒を
供給する熱媒供給管と、熱交換器に至る当該熱媒供給管
に付設した温度調節弁と、二次側給水系路の配管適所に
付設した純水の温度検出器と、この温度検出器からの信
号に基づき前記温度調節弁を自動的に制御する制御回路
を有する自動調節器とを具備してなることを特徴とする
超純水給水系路の自動熱殺菌装置。(1) In a device for hot water sterilization of the secondary water supply system where the pure water obtained from the primary pure water production equipment is treated again just before the point of use, the pure water obtained from the primary pure water production equipment is A heat exchanger for heating pure water, a heat medium supply pipe that supplies a heat medium to this heat exchanger, a temperature control valve attached to the heat medium supply pipe leading to the heat exchanger, and a secondary side water supply. The system is equipped with a pure water temperature detector attached to a proper place in the piping of the system, and an automatic regulator having a control circuit that automatically controls the temperature control valve based on a signal from the temperature detector. Features: Automatic heat sterilization equipment for ultrapure water supply lines.
検出器を付設し、当該圧力調節弁と圧力検出器を前記自
動調節器に計装的に結合させた特許請求の範囲第1項記
載の超純水給水系路の自動熱殺菌装置。(2) A pressure regulating valve and a pressure detector are attached to appropriate positions in the piping of the secondary water supply system, and the pressure regulating valve and the pressure detector are instrumentedly connected to the automatic regulator. Automatic heat sterilization device for ultrapure water supply system according to item 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61185314A JPH0645024B2 (en) | 1986-08-08 | 1986-08-08 | Automatic heat sterilizer for ultrapure water supply system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61185314A JPH0645024B2 (en) | 1986-08-08 | 1986-08-08 | Automatic heat sterilizer for ultrapure water supply system |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6342787A true JPS6342787A (en) | 1988-02-23 |
JPH0645024B2 JPH0645024B2 (en) | 1994-06-15 |
Family
ID=16168678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61185314A Expired - Lifetime JPH0645024B2 (en) | 1986-08-08 | 1986-08-08 | Automatic heat sterilizer for ultrapure water supply system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0645024B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL9101527A (en) * | 1991-09-10 | 1993-04-01 | Paul Kerst | Device and method for decontaminating water for use in the agrarian sector |
US5879849A (en) * | 1996-07-01 | 1999-03-09 | Ricoh Company, Ltd. | Developing device using one component developer |
JP2008521593A (en) * | 2004-11-30 | 2008-06-26 | レギオフリーウォーター システムズ ベスローテン フェンノートシャップ | Water supply system arranged for killing pathogens, operating device and method for killing pathogens in water supply systems |
JP2013119060A (en) * | 2011-12-07 | 2013-06-17 | Kurita Water Ind Ltd | Ultrapure water production method and apparatus |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4718449U (en) * | 1971-03-31 | 1972-11-01 | ||
JPS6087887A (en) * | 1983-10-19 | 1985-05-17 | Shinwa Control Kk | Piping of water-flow system and its sterilizing method |
JPS61103592A (en) * | 1984-10-27 | 1986-05-22 | Toshiba Corp | Manufacturing apparatus of demineralized water |
-
1986
- 1986-08-08 JP JP61185314A patent/JPH0645024B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4718449U (en) * | 1971-03-31 | 1972-11-01 | ||
JPS6087887A (en) * | 1983-10-19 | 1985-05-17 | Shinwa Control Kk | Piping of water-flow system and its sterilizing method |
JPS61103592A (en) * | 1984-10-27 | 1986-05-22 | Toshiba Corp | Manufacturing apparatus of demineralized water |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL9101527A (en) * | 1991-09-10 | 1993-04-01 | Paul Kerst | Device and method for decontaminating water for use in the agrarian sector |
US5879849A (en) * | 1996-07-01 | 1999-03-09 | Ricoh Company, Ltd. | Developing device using one component developer |
JP2008521593A (en) * | 2004-11-30 | 2008-06-26 | レギオフリーウォーター システムズ ベスローテン フェンノートシャップ | Water supply system arranged for killing pathogens, operating device and method for killing pathogens in water supply systems |
JP2013119060A (en) * | 2011-12-07 | 2013-06-17 | Kurita Water Ind Ltd | Ultrapure water production method and apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPH0645024B2 (en) | 1994-06-15 |
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