JPS6157290A - High purity water making apparatus and sterilization method thereof - Google Patents
High purity water making apparatus and sterilization method thereofInfo
- Publication number
- JPS6157290A JPS6157290A JP59178131A JP17813184A JPS6157290A JP S6157290 A JPS6157290 A JP S6157290A JP 59178131 A JP59178131 A JP 59178131A JP 17813184 A JP17813184 A JP 17813184A JP S6157290 A JPS6157290 A JP S6157290A
- Authority
- JP
- Japan
- Prior art keywords
- filter
- deionized water
- purity water
- bacteria
- ion exchange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Accommodation For Nursing Or Treatment Tables (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Treatment Of Water By Ion Exchange (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は製薬業等で使用される高純度水を製造する装置
およびその装置を滅菌する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an apparatus for producing high-purity water used in the pharmaceutical industry, etc., and a method for sterilizing the apparatus.
（従来技術）
この種の装置ではイオン交換装置からの脱イオン水を退
外濾過膜等の濾過膜を有する濾過器で濾過して高ｌ１ｉ
ｒ！度水とするのが一般的である。(Prior art) In this type of device, deionized water from an ion exchange device is filtered with a filter having a filtration membrane such as an expulsion filtration membrane.
r! It is common to use boiling water.
しかしなから従来の装置では１り１えば２５℃程度の低
温で脱イオン水を濾過するので、濾過の途中に１ｆＡ菌
が増殖するという不具合がある。However, since conventional devices filter deionized water at a low temperature of, for example, 25° C., there is a problem in that 1fA bacteria multiply during the filtration process.
また濾過器を滅菌する場合に濾過膜が高温で損傷するの
で蒸気を使用することができず、例えばポルマリン等の
薬品を使用しているが、この薬品が残留して高純度水中
に混入し、製造された高純度水を生化学工業に使用する
と生菌を死滅させるという問題がある。In addition, when sterilizing a filter, steam cannot be used because the filtration membrane is damaged by high temperatures, so chemicals such as Polmarine are used, but this chemical remains and mixes into the high-purity water. When the produced high-purity water is used in the biochemical industry, there is a problem in that it kills living bacteria.
（発明の目的）
第１発明は濾過の途中で細菌の増殖を防止し得る８粍腹
水ｎＡ造装置を提供することを目的とじている。(Object of the Invention) The first object of the invention is to provide an apparatus for producing ascites that can prevent the proliferation of bacteria during filtration.
第２光朗は濾過膜を損傷しない温度の蒸気で濾過器を滅
菌し得る高純度水＋Ａ造装置を提供づ゛ることを目的ど
している。The purpose of the second Koro is to provide a high-purity water+A production device that can sterilize a filter with steam at a temperature that does not damage the filter membrane.
第３発明は濾過膜をＩＵ傷眩ずに濾過器を滅菌し得る高
純度水製造装置の滅α１方法を提供することを目的とし
ている。A third object of the present invention is to provide a method for sterilizing a high purity water production apparatus, which can sterilize a filter without damaging the filter membrane by IU.
（発明の（Ｉ１１成）
第１発明は、イオン交換装置から供給される脱イオン水
を退外濾過膜を使用した濾過器で濾過する高純度水製造
装置において、イオン交換装置と濾過器の間に、濾過器
に流入する脱イオン水を細菌が増殖しない温度に加熱す
る加熱器を設けたことを特徴とする高純度水製造装置で
ある。((I11) of the invention) The first invention provides a high-purity water production device that filters deionized water supplied from an ion exchange device with a filter using an extrafiltration membrane, between the ion exchange device and the filter. The high-purity water production device is characterized in that it is equipped with a heater that heats deionized water flowing into the filter to a temperature at which bacteria do not proliferate.
第２発明は、イオン交換装置から供給される脱イオン水
を選外′ａ過膜を使用した濾過器で濾過する高純度水！
！造装置において、濾過器を減圧する減圧殿描を設けた
ことを特徴とする高純度水製造装置である。The second invention is high-purity water that is obtained by filtering deionized water supplied from an ion exchange device with a filter using a selective filtration membrane!
! This is a high-purity water production device characterized by being equipped with a vacuum evacuator for reducing the pressure of a filter.
第３発明は、退外濾過膜を使用した濾過器を有する高純
度水製造装置の内部を減圧して低沸点大し、１ｒａｔ過
器の濾過膜を損傷せず且つ細菌全増殖させない温度で滅
菌すること’ｋｆｉ＋徴とする高純度水製造装置の滅菌
方法である。The third invention is to reduce the pressure inside a high-purity water production device having a filter using an expulsion filtration membrane to increase the low boiling point, and sterilize it at a temperature that does not damage the filtration membrane of the 1-rat filter and does not cause total bacterial growth. This is a method for sterilizing high-purity water production equipment using KFI+ characteristics.
（実施例〕
本発明による高純度水Ｂ造装置を示す第１図において、
１０はイオン交換装置である。イオン交換装置ＩＯには
配管１２が接続されておシ、配管１２はイオン交換装置
１０に原水を供給するもの流側端部１４ｂは高純度水全
使用する設備たとえば細枠Ｍ気良造装置（図示せず）に
高純度水を供給するよりになっている。(Example) In FIG. 1 showing a high-purity water B production apparatus according to the present invention,
10 is an ion exchange device. A piping 12 is connected to the ion exchanger IO, and the piping 12 supplies raw water to the ion exchanger 10. The downstream end 14b is connected to equipment that uses all high-purity water, such as a narrow-frame M-air construction equipment (Fig. (not shown) by supplying high-purity water.
主起ｖ１４には上流側から原人に滅菌器１６、自動弁１
８、フィルタ２０．熱交換器２２、クッションタンク２
４、ポンプ２６、フィルタ２８、 ′自動弁８０、
熱交換器３２（加熱器〕、測温抵抗体８４、自動弁８６
、濾過装置８８、連成計４０゜自動弁４２、熱交換器４
４、測温抵抗体４６、自動弁４８が介装されている。The master v14 has a sterilizer 16 and an automatic valve 1 from the upstream side.
8. Filter 20. Heat exchanger 22, cushion tank 2
4, pump 26, filter 28, 'automatic valve 80,
Heat exchanger 32 (heater), resistance temperature detector 84, automatic valve 86
, filtration device 88, compound gauge 40° automatic valve 42, heat exchanger 4
4. A temperature sensing resistor 46 and an automatic valve 48 are installed.
ｆ／Ｒ菌器１６はイオン文換装ｇｔ、ＩＯでイオン交換
された後の脱イオン水に混入している細菌を殺菌するも
の、である。The f/R sterilizer 16 is an ion exchange device gt, which sterilizes bacteria mixed in deionized water after ion exchange with IO.
自動弁１８．８０．８６．４２．４８は夫々８万切換弁
であり、図中で黒塗のボートは閉止されている。Automatic valves 18, 80, 86, 42, and 48 are 80,000 switching valves, and the black boats in the figure are closed.
フィルタ２０は滅菌器１６で殺菌された死菌を粗取除く
ためのものである。The filter 20 is for roughly removing dead bacteria sterilized in the sterilizer 16.
熱交換器２２は主配管１４全流れる脱イオン水を予熱す
るものである。The heat exchanger 22 preheats the deionized water flowing through the main pipe 14.
クッションタンク２４は脱イオン水全貯留してポンプ２
Ｇがａコ遇器に安定して、一定士の脱イオン水’ｆｃＭ
、通させるためのものである。The cushion tank 24 stores all the deionized water and pumps the pump 2.
G is stable in a co-operation device, and a certain amount of deionized water'fcM
, is for passing.
熱交換器３２には一過後の高純度水を冷却する熱交換器
４４の冷却水管４４ａから供給される冷却水と蒸気配管
５０からの蒸気を混合弁５２で混合した加熱源水の供給
全配管３２ａｔ−通じて受け、主配管１４全流れる脱イ
オン水を細菌が増殖しない温度すなわち日本薬局方で規
定式れている８０’Ｃにまで過熱するものである。測温
抵抗体８４からの信号に蒸気配管５０の調整弁５０ａに
伝達され、脱イオン水の温度が８０°Ｃから許容範−を
越えて変動すると調整弁５Ｇａ ｋ調整して脱イオン水
の温度ｔ−８０°Ｃに維持する機能を有している。熱交
換器３２に通った後の加熱源水は配管３２Ｎ）から熱交
換器２２に供給され、配管３２（ｊから排出されるよう
になっている。The heat exchanger 32 has all the piping for supplying heating source water, which is made by mixing the cooling water supplied from the cooling water pipe 44a of the heat exchanger 44 that cools the high-purity water after passing through and the steam from the steam piping 50 using the mixing valve 52. 32at-, and the deionized water flowing through the main pipe 14 is heated to a temperature at which bacteria do not proliferate, that is, 80'C as prescribed by the Japanese Pharmacopoeia. A signal from the resistance temperature sensor 84 is transmitted to the regulating valve 50a of the steam pipe 50, and when the temperature of the deionized water changes from 80°C beyond the allowable range, the regulating valve 5Ga k adjusts the temperature of the deionized water. It has the function of maintaining the temperature at t-80°C. After passing through the heat exchanger 32, the heating source water is supplied to the heat exchanger 22 from a pipe 32N) and is discharged from a pipe 32J.
濾過装置３８は１＠又は複数個の濾過器３８ａと１個の
補助濾過器３８ｂからな）、両値過器８８ａ、８８１）
は濾過膜８８Ｃｊ ’ｘ−有している。濾過Ｂｍ ８８
Ｃは例えば限外濾過膜等の比較的熱に弱＜ ９０’Ｃ！
以上の温度には耐えられないが８０’Ｃ程度の温度には
耐え得る材質で作ら九ている。濾過器３８ａには配管ａ
８ｆが設けら九ておシ、濾過器８８ａで濾過できなｈ脱
イオン水を配管８８０を通じて補助濾過器３８ｂに流入
させ、補助濾過器３８１）で濾過した脱イオン水は配Ｗ
３８ｄ ｆ通じてクッションタンク２４に還流させ、
補助−過器３８ｂでに過できない脱イオン水全配管３Ｆ
３ｅから排出するようになっている。配管８８ｄには自
動弁５４が介装され、配管３８ｅには開閉弁５６が介装
されている。自動弁５４には配管５４ａが接続されてい
る。The filtration device 38 consists of one or more filters 38a and one auxiliary filter 38b), dual filters 88a, 881)
has a filter membrane 88Cj'x-. Filtration Bm 88
C is relatively heat-resistant, such as ultrafiltration membranes <90'C!
It is made of a material that cannot withstand temperatures above 80'C, but can withstand temperatures of around 80'C. The filter 38a has a pipe a
8f is provided, the deionized water that cannot be filtered by the filter 88a flows into the auxiliary filter 38b through the pipe 880, and the deionized water that has been filtered by the auxiliary filter 381 is distributed to the auxiliary filter 381).
38d f to be refluxed to the cushion tank 24,
All deionized water piping 3F that cannot be passed through the auxiliary filter 38b
It is designed to be discharged from 3e. An automatic valve 54 is installed in the pipe 88d, and an on-off valve 56 is installed in the pipe 38e. A pipe 54a is connected to the automatic valve 54.
主配管１４のクッションタンク２４とポンプ２Ｇとの間
にはドレン配管５８の一端が接続され、ドレン配管５８
の他端は開口している。ドレン配管５８の途中には配管
ａｓｃｔ 、 ａａｅ 、 ５４ａ ｉＥ接続さｎてお
）、自動弁８６からの配管８６ａもドレン配管５８に接
続されている。One end of a drain pipe 58 is connected between the cushion tank 24 of the main pipe 14 and the pump 2G.
The other end is open. In the middle of the drain pipe 58, pipes asct, aae, 54a iE are connected, and a pipe 86a from an automatic valve 86 is also connected to the drain pipe 58.
自動弁４２にはリターン配Ｗ ａｚａが設けられておシ
、リターン配管４２ａｔｆＬクツシヨンタン゛り２４と
熱交換器２２との間の主配管１４に接続され、濾過装置
３８で濾過した高純度水の使用量が急激に減少した時に
高純度水を主配管１４に還流させるようになっている。The automatic valve 42 is provided with a return piping 42, which is connected to the main piping 14 between the atfL cushion tank 24 and the heat exchanger 22, and is connected to the main piping 14 between the atfL cushion tank 24 and the heat exchanger 22. High purity water is returned to the main pipe 14 when the amount decreases rapidly.
自動弁４８には配管４８ａの一端が接続されておシ、配
管４８ａの他端はドレン配管５８に接続されている。配
管４８ａの途中には配管６Ｇの一端が接続され、配管６
０の他端は蒸気エジェクタ６２に接続されている。蒸気
エジェクタ６２には配管５（１１１７を通じて蒸気が供
給され、この蒸気の圧力で濾過器３８内ｔＰｆｒ足の圧
力、１ｒｉｌえは沸点が約８０°Ｃになる３９０−ＥＩ
ｇまで減圧するようになっている。６２ａは蒸気エジェ
クタ６２からの排出水上流す配管であシ、配管６２ａは
自動弁３０の配管３０ａに接続されている。配管６０に
は開閉弁６Ｑａが介装ぢれ、配管５０１）には調整弁５
０Ｃが介装さ九ておシ、調整弁５０（３は連成計４０か
らの信号で制御でれている。One end of a pipe 48a is connected to the automatic valve 48, and the other end of the pipe 48a is connected to a drain pipe 58. One end of the pipe 6G is connected to the middle of the pipe 48a, and the pipe 6G
0 is connected to a steam ejector 62. Steam is supplied to the steam ejector 62 through the pipe 5 (1117), and the pressure of this steam is tPfr inside the filter 38, and the boiling point is about 80°C for 1 ril 390-EI.
It is designed to reduce the pressure to g. Reference numeral 62a is a pipe for discharging water discharged from the steam ejector 62, and the pipe 62a is connected to the pipe 30a of the automatic valve 30. An on-off valve 6Qa is installed in the pipe 60, and a regulating valve 5 is installed in the pipe 501).
0C is interposed, and the regulating valve 50 (3 is controlled by the signal from the compound meter 40).
以上の蒸気エジェクタ６２等で減圧槻構６４が形成され
ている。A decompression mechanism 64 is formed by the steam ejector 62 and the like described above.
次に動作を説明する。高純度水ｉ造装誼の運転中に濾過
装置３８に流入する脱イオン水は熱交換器３２で８０″
Ｃに加熱されてお）、濾過器８８ａ内に貯留している間
にｇ！！、量なから混入している脱イオン水中の細菌は
増殖せず、πｌ：Ａ膜３８０ を通過したｒｌｉ過後の
高純度水には、ｍｍおよびイオン成分等の不純物は殆ん
ど混入しておらず、製造後の高純度水は純度が高い。Next, the operation will be explained. During the operation of the high-purity water production system, deionized water flowing into the filtration device 38 is passed through the heat exchanger 32 to
C), and while stored in the filter 88a, g! ! Due to the amount, the bacteria in the deionized water that is mixed in does not grow, and the high purity water after RLI that has passed through the πl:A membrane 380 contains almost no impurities such as mm and ionic components. First, high-purity water after production has high purity.
また設備の運転を一時休止して再起動する時や長期間の
運転後には設備内部を滅菌する必要がある。この時の滅
菌方法はＷｌ、ｉ！装［８８以外の高温に耐え得る部分
と、高温には耐えられない濾過装置８８部分に分けて滅
菌上行なうものである。Furthermore, it is necessary to sterilize the inside of the equipment when the equipment is temporarily stopped and restarted, or after a long period of operation. The sterilization method at this time is Wl, i! The sterilization process is carried out separately for the parts other than the filtration device 88 that can withstand high temperatures, and the filtration device 88 that cannot withstand high temperatures.
まず濾過装置８８以外の部分を濾過する場合には第２図
に示すように、自動弁１８の主配管１４の上流側に接続
でれたボートを閉止し、自動弁４８の主配管１４下流側
に接続されたボートを閉止し、自動５Ｐ８６．４２．５
４０濾過装置８８に接続されたホートラ閉止した後に、
蒸気配管５０から１２１°Ｃの蒸気全自動弁１８を通じ
て例えば８０分間流通させ、内部を滅菌する。First, when filtering parts other than the filtration device 88, as shown in FIG. 2, the boat connected to the upstream side of the main piping 14 of the automatic valve 18 is closed, and the Close the boat connected to the automatic 5P86.42.5
40 After closing the hole connected to the filtration device 88,
Steam at 121° C. is allowed to flow from the steam pipe 50 through the fully automatic valve 18 for, for example, 80 minutes to sterilize the inside.
次に濾過器８８部分を滅菌する場合には第３図に示すよ
うに、自動弁３０の主配管１４の上流側に接続とれたボ
ートを閉止し、自動弁４８の主配管１４の下流側に接続
されたボート’ｔ−閉止し、開閉弁６０ａ ｋ開弁じ、
自動弁５４（Ｚ）配管８８（ｌに接続されたボートを閉
止し、開閉％５６’ｉ閉弁して濾過器８８と熱交換器８
２を隔離した後に配管５０１）から蒸気エジェクタ６２
に蒸気を供給し、蒸気の運動エネルギで濾過器３８部分
を３９０ｇＨｇまで減圧する。濾過器８８内部が３９０
ｍ Ｈｇまで減圧されると、減圧に使用量の蒸気全熱
交換器３２に供給して過昇濾過膜の全表面均一に通過す
る量の蒸気を自己発生させ、この自己蒸発による蒸気が
濾過器８８部分を流通する。８０’Ｃの蒸気は過昇Ｈ〆
過膜３８０を損傷することなく、しかも滅菌に要する熱
量はエンタルピが高いので十分に保有している。したが
って減圧によシ自己蒸発した８０°Ｃの蒸気全濾過器３
８部分に流通させることによ）α旦過器３８部分が滅菌
される。Next, when sterilizing the filter 88 part, as shown in FIG. 3, close the boat connected to the upstream side of the main piping 14 of the automatic valve 30, and The connected boat't-closed, the on-off valve 60a k opened,
Automatic valve 54 (Z) Closes the boat connected to piping 88 (l), closes the valve 56'i and closes the filter 88 and heat exchanger 8.
2) from the steam ejector 62 after isolating the pipe 501)
The pressure in the filter 38 section is reduced to 390 gHg by the kinetic energy of the steam. The inside of the filter 88 is 390
When the pressure is reduced to m Hg, the amount of steam used for depressurization is supplied to the total heat exchanger 32 to self-generate an amount of steam that uniformly passes over the entire surface of the permeating filtration membrane, and the steam resulting from this self-evaporation passes through the filter. 88 portions are distributed. The steam at 80'C does not damage the overheated H filter membrane 380, and has a sufficient amount of heat required for sterilization due to its high enthalpy. Therefore, the 80°C vapor self-evaporated by reduced pressure
8) sterilizes the α-passenger 38 section.
（発明の効果）
（１）第１発明による高純度水製造装置は、イオン交換
装置ｌＯと濾過装置３８との間の主配管１４較熱交換器
３２（加熱器）を設けて、濾過装置３８に流入する脱イ
オン水を細菌が増殖しない温度、すなわち前記実施例で
は日本薬局方にＭ、定石れている８０°Ｃに加熱したの
で、脱イオン水中して微量なから混入している細菌が濾
過中に増殖することはなく、製造後の高純度水の純度を
向上させるこができる。(Effects of the Invention) (1) The high-purity water production device according to the first invention is provided with a main pipe 14 calibrating heat exchanger 32 (heater) between the ion exchange device IO and the filtration device 38, and the filtration device 38 Since the deionized water flowing into the water was heated to a temperature at which bacteria do not proliferate, that is, in the above example, it was heated to 80°C, which is defined as M in the Japanese Pharmacopoeia, so that even a trace amount of bacteria may be present in the deionized water. It does not grow during filtration and can improve the purity of high-purity water after production.
また濾過装置３８で取除く細菌の士が減少するので、Ｍ
ＡＭ８８ｃの寿命や点検期間が延長できる。In addition, since the number of bacteria removed by the filtration device 38 is reduced, M
The lifespan and inspection period of AM88c can be extended.
（２）第２発明による高純度水製造装置および第８発明
による高純度水装造装置の滅菌方法は、濾過膜［８８の
内部を減圧する減圧Ｉａ構６４′ｆ：設け、濾過膜ｆＲ
３８の内部を減圧機４ｇ６４で減圧して濾過膜８８Ｑを
損傷せず且つ細菌を増殖式せない温度、すなわち８０°
Ｃの蒸気で滅菌するようにしたので、従来のようにホル
マリン等の薬品が残留する恐れもなく、−また高温に弱
い濾過膜８８Ｃを損傷すること全防止しなから濾過装置
３８を滅菌することができ、ひいては製造でれた高純度
水の純度を向上させることができる。(2) The method for sterilizing the high-purity water production apparatus according to the second invention and the high-purity water production apparatus according to the eighth invention includes: providing a reduced pressure Ia structure 64'f for reducing the pressure inside the filtration membrane [88];
The inside of 38 is depressurized with a pressure reducer 4g64 to maintain a temperature that does not damage the filtration membrane 88Q and does not allow bacteria to grow, that is, 80°.
Since sterilization is carried out with C steam, there is no risk of chemicals such as formalin remaining as in the conventional case, and the filtration device 38 can be sterilized without damaging the filtration membrane 88C, which is sensitive to high temperatures. This in turn makes it possible to improve the purity of the produced high-purity water.
（別の＊ｍ例）
（１） 濾過膜Ｂ８Ｑは過昇濾過膜に限らず、例えば
逆侵透膜やウルトラフィルタと呼称されるものでもよい
。(Another *m example) (1) The filtration membrane B8Q is not limited to a permeation filtration membrane, and may be, for example, a membrane called a reverse osmosis membrane or an ultrafilter.
第１図はＭ１発明および第２発明を適用した高純度水製
造装置の構造略図、第２図および第３図はそれぞれ第１
図の装置で第８発明の滅菌方法で実施した場合を示す構
造略図でるる。１０・・・イオン交換装置、１４・・・
主配管、８２・・・熱交換器（加熱器）、３８・・・−
過装置、３８ｃ・・・Ｍ過膜、５０・・・蒸気配管、Ｇ
２・・・蒸気エジェクタ、６４・・・減圧機構Figure 1 is a schematic structural diagram of a high-purity water production apparatus to which the M1 invention and the second invention are applied, and Figures 2 and 3 are the
This is a schematic structural diagram showing the case where the sterilization method of the eighth invention is carried out using the apparatus shown in the figure. 10... Ion exchange device, 14...
Main piping, 82... Heat exchanger (heater), 38...-
filtration device, 38c...M filtration membrane, 50...steam piping, G
2... Steam ejector, 64... Pressure reduction mechanism
Claims (3)
濾過膜を使用した濾過器で濾過する高純度水製造装置に
おいて、イオン交換装置と濾過器の間に、濾過器に流入
する脱イオン水を細菌が増殖しない温度に加熱する加熱
器を設けたことを特徴とする高純度水製造装置。(1) In a high-purity water production device in which deionized water supplied from an ion exchange device is filtered by a filter using an expulsion filtration membrane, the deionized water flowing into the filter is placed between the ion exchange device and the filter. A high-purity water production device characterized by being equipped with a heater that heats water to a temperature at which bacteria do not grow.
濾過膜を使用した濾過器で濾過する高純度水製造装置に
おいて、濾過器を減圧する減圧機構を設けたことを特徴
とする高純度水製造装置。(2) A high-purity water production device that filters deionized water supplied from an ion exchange device using a filter using an expulsion filtration membrane, which is characterized by being equipped with a pressure reduction mechanism that reduces the pressure of the filter. Water production equipment.
造装置の内部を減圧して低沸点化し、濾過器の濾過膜を
損傷せず且つ細菌を増殖させない温度で滅菌することを
特徴とする高純度水製造装置の滅菌方法。(3) The inside of a high-purity water production device having a filter using an expulsion filtration membrane is depressurized to lower the boiling point, and sterilized at a temperature that does not damage the filtration membrane of the filter and do not allow bacteria to grow. Sterilization method for high-purity water production equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59178131A JPS6157290A (en) | 1984-08-27 | 1984-08-27 | High purity water making apparatus and sterilization method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59178131A JPS6157290A (en) | 1984-08-27 | 1984-08-27 | High purity water making apparatus and sterilization method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6157290A true JPS6157290A (en) | 1986-03-24 |
Family
ID=16043189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59178131A Pending JPS6157290A (en) | 1984-08-27 | 1984-08-27 | High purity water making apparatus and sterilization method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6157290A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62266193A (en) * | 1986-05-13 | 1987-11-18 | Japan Organo Co Ltd | Treatment of terminal filter membrane apparatus |
| JPS63258700A (en) * | 1987-04-15 | 1988-10-26 | Toray Ind Inc | Ultrapure water making system |
| JPH0871567A (en) * | 1994-09-01 | 1996-03-19 | Kobe Steel Ltd | Movable water-purifying facility |
| JP2008246303A (en) * | 2007-03-29 | 2008-10-16 | Sumitomo Chemical Co Ltd | Photocatalyst dispersion body and manufacturing method of the same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51132183A (en) * | 1975-05-14 | 1976-11-17 | Daicel Chem Ind Ltd | A membrane separating apparatus having heat exchanger |
| JPS5814905A (en) * | 1981-07-17 | 1983-01-28 | Toray Ind Inc | Separation apparatus by reverse osmosis |
| JPS60110390A (en) * | 1983-11-21 | 1985-06-15 | Kuraray Co Ltd | Aseptic water preparing apparatus |
-
1984
- 1984-08-27 JP JP59178131A patent/JPS6157290A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51132183A (en) * | 1975-05-14 | 1976-11-17 | Daicel Chem Ind Ltd | A membrane separating apparatus having heat exchanger |
| JPS5814905A (en) * | 1981-07-17 | 1983-01-28 | Toray Ind Inc | Separation apparatus by reverse osmosis |
| JPS60110390A (en) * | 1983-11-21 | 1985-06-15 | Kuraray Co Ltd | Aseptic water preparing apparatus |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62266193A (en) * | 1986-05-13 | 1987-11-18 | Japan Organo Co Ltd | Treatment of terminal filter membrane apparatus |
| JPS63258700A (en) * | 1987-04-15 | 1988-10-26 | Toray Ind Inc | Ultrapure water making system |
| JPH0871567A (en) * | 1994-09-01 | 1996-03-19 | Kobe Steel Ltd | Movable water-purifying facility |
| JP2008246303A (en) * | 2007-03-29 | 2008-10-16 | Sumitomo Chemical Co Ltd | Photocatalyst dispersion body and manufacturing method of the same |
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