JPS6332725B2 - - Google Patents

Info

Publication number: JPS6332725B2
Authority: JP; Japan
Prior art keywords: silicon; alkali; aluminum; producing high; silicofluoride
Prior art date: 1980-06-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

JP8464980A

Other languages

English (en)

Japanese (ja)

Other versions

JPS5711815A (en

Inventor

Hajime Kato

Shinichi Sasaki

Koichi Sato

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Onoda Chemical Industry Co Ltd

Original Assignee

Onoda Chemical Industry Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1980-06-24

Filing date

1980-06-24

Publication date

1988-07-01

1980-06-24 Application filed by Onoda Chemical Industry Co Ltd filed Critical Onoda Chemical Industry Co Ltd

1980-06-24 Priority to JP8464980A priority Critical patent/JPS5711815A/ja

1982-01-21 Publication of JPS5711815A publication Critical patent/JPS5711815A/ja

1988-07-01 Publication of JPS6332725B2 publication Critical patent/JPS6332725B2/ja

Status Granted legal-status Critical Current

Links

229910052710 silicon Inorganic materials 0.000 claims description 74
239000010703 silicon Substances 0.000 claims description 74
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 71
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 39
239000003513 alkali Substances 0.000 claims description 33
229910052782 aluminium Inorganic materials 0.000 claims description 28
239000011734 sodium Substances 0.000 claims description 19
238000004519 manufacturing process Methods 0.000 claims description 17
229910052751 metal Inorganic materials 0.000 claims description 16
239000002184 metal Substances 0.000 claims description 16
239000000047 product Substances 0.000 claims description 15
239000000203 mixture Substances 0.000 claims description 13
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 11
238000006243 chemical reaction Methods 0.000 claims description 11
238000010438 heat treatment Methods 0.000 claims description 11
229910052708 sodium Inorganic materials 0.000 claims description 10
239000002994 raw material Substances 0.000 claims description 9
230000005496 eutectics Effects 0.000 claims description 7
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
239000002253 acid Substances 0.000 claims description 6
KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims description 5
229910052744 lithium Inorganic materials 0.000 claims description 5
238000002156 mixing Methods 0.000 claims description 5
IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims description 4
239000006227 byproduct Substances 0.000 claims description 4
238000000034 method Methods 0.000 claims description 4
239000012266 salt solution Substances 0.000 claims description 4
238000002844 melting Methods 0.000 claims description 3
230000008018 melting Effects 0.000 claims description 3
229910004298 SiO 2 Inorganic materials 0.000 claims description 2
239000000463 material Substances 0.000 claims description 2
239000000126 substance Substances 0.000 claims description 2
150000003839 salts Chemical class 0.000 claims 3
238000004064 recycling Methods 0.000 claims 1
230000002194 synthesizing effect Effects 0.000 claims 1
229910016569 AlF 3 Inorganic materials 0.000 description 26
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 18
PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 16
239000011775 sodium fluoride Substances 0.000 description 8
235000013024 sodium fluoride Nutrition 0.000 description 8
239000000843 powder Substances 0.000 description 7
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
229910052700 potassium Inorganic materials 0.000 description 6
239000003153 chemical reaction reagent Substances 0.000 description 5
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
239000000243 solution Substances 0.000 description 4
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
238000010306 acid treatment Methods 0.000 description 3
239000012298 atmosphere Substances 0.000 description 3
238000001816 cooling Methods 0.000 description 3
239000010439 graphite Substances 0.000 description 3
229910002804 graphite Inorganic materials 0.000 description 3
239000011591 potassium Substances 0.000 description 3
150000003376 silicon Chemical class 0.000 description 3
238000011282 treatment Methods 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
229910001111 Fine metal Inorganic materials 0.000 description 2
229910000676 Si alloy Inorganic materials 0.000 description 2
238000000354 decomposition reaction Methods 0.000 description 2
230000007423 decrease Effects 0.000 description 2
239000000706 filtrate Substances 0.000 description 2
229940104869 fluorosilicate Drugs 0.000 description 2
239000007789 gas Substances 0.000 description 2
239000004570 mortar (masonry) Substances 0.000 description 2
239000002245 particle Substances 0.000 description 2
238000000859 sublimation Methods 0.000 description 2
230000008022 sublimation Effects 0.000 description 2
WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
229910052783 alkali metal Inorganic materials 0.000 description 1
150000001340 alkali metals Chemical class 0.000 description 1
DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
238000013329 compounding Methods 0.000 description 1
229910001610 cryolite Inorganic materials 0.000 description 1
230000005611 electricity Effects 0.000 description 1
239000011888 foil Substances 0.000 description 1
239000008187 granular material Substances 0.000 description 1
239000012535 impurity Substances 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
239000011707 mineral Substances 0.000 description 1
235000010755 mineral Nutrition 0.000 description 1
239000012299 nitrogen atmosphere Substances 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
239000002686 phosphate fertilizer Substances 0.000 description 1
229910052573 porcelain Inorganic materials 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
238000000746 purification Methods 0.000 description 1
230000035484 reaction time Effects 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
238000000926 separation method Methods 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
239000004575 stone Substances 0.000 description 1
238000006467 substitution reaction Methods 0.000 description 1
239000000758 substrate Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Landscapes

Silicon Compounds (AREA)

JP8464980A 1980-06-24 1980-06-24 Preparation of high purity silicon Granted JPS5711815A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP8464980A JPS5711815A (en)	1980-06-24	1980-06-24	Preparation of high purity silicon

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP8464980A JPS5711815A (en)	1980-06-24	1980-06-24	Preparation of high purity silicon

Publications (2)

Publication Number	Publication Date
JPS5711815A JPS5711815A (en)	1982-01-21
JPS6332725B2 true JPS6332725B2 (ko)	1988-07-01

Family

ID=13836546

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP8464980A Granted JPS5711815A (en)	1980-06-24	1980-06-24	Preparation of high purity silicon

Country Status (1)

Country	Link
JP (1)	JPS5711815A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN103395785A (zh) *	2013-07-18	2013-11-20	贵州省产品质量监督检验院	一种钠还原氟硅酸钠制备多晶硅的方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3310828A1 (de) *	1983-03-24	1984-09-27	Bayer Ag, 5090 Leverkusen	Verfahren zur herstellung von silicium
JPH0741995B2 (ja) *	1988-07-06	1995-05-10	日鉄鉱業株式会社	ベルトコンベヤ輸送システムにおける粉じん飛散防止方法及び装置

1980
- 1980-06-24 JP JP8464980A patent/JPS5711815A/ja active Granted

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN103395785A (zh) *	2013-07-18	2013-11-20	贵州省产品质量监督检验院	一种钠还原氟硅酸钠制备多晶硅的方法
CN103395785B (zh) *	2013-07-18	2014-12-31	贵州省产品质量监督检验院	一种钠还原氟硅酸钠制备多晶硅的方法

Also Published As

Publication number	Publication date
JPS5711815A (en)	1982-01-21

Publication	Publication Date	Title
US4241037A (en)	1980-12-23	Process for purifying silicon
CN109941998B (zh)	2022-08-05	一种相分离去合金化提纯硅的方法
JPS62502319A (ja)	1987-09-10	固体材料の精製方法
Lynch	2009	Winning the global race for solar silicon
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JPH04175216A (ja)	1992-06-23	高純度六フツ化リン酸化合物の製造方法
US4985069A (en)	1991-01-15	Induction slag reduction process for making titanium
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CN102807220B (zh)	2014-12-17	一种硅的提纯方法
US4446120A (en)	1984-05-01	Method of preparing silicon from sodium fluosilicate
CN110612269B (zh)	2023-04-28	用于生产商业级硅的方法
JP2010535149A (ja)	2010-11-18	高純度元素シリコンの製造方法
EP1805106A1 (en)	2007-07-11	Method of production of pure silicon
JP2004051453A (ja)	2004-02-19	Ｓｉ製造方法
US4668286A (en)	1987-05-26	Process for making zero valent titanium from an alkali metal fluotitanate
US2172969A (en)	1939-09-12	Process for obtaining silicon from its compounds
JPS6332725B2 (ko)	1988-07-01
US3148131A (en)	1964-09-08	Process for the purification of silicon
RU2155158C1 (ru)	2000-08-27	Способ получения моноизотопного кремния si28
US4704264A (en)	1987-11-03	Process for production of silane
JPS58115016A (ja)	1983-07-08	微粉末炭化珪素の製造方法
UA73847C2 (en)	2005-09-15	A method for preparing silicon tetrafluoride, a method for isolation of the silicon tetrafluoride from oxygen and highly volatile admixtures, a method for preparing silicon powder from the silicon tetrafluoride
JPH0417883B2 (ko)	1992-03-26
JP2507938B2 (ja)	1996-06-19	高純度Ｓｉ−Ｂ合金の製造法
US2998302A (en)	1961-08-29	Preparation of titanium diboride