JPS6332513B2 - - Google Patents
Info
- Publication number
- JPS6332513B2 JPS6332513B2 JP5357580A JP5357580A JPS6332513B2 JP S6332513 B2 JPS6332513 B2 JP S6332513B2 JP 5357580 A JP5357580 A JP 5357580A JP 5357580 A JP5357580 A JP 5357580A JP S6332513 B2 JPS6332513 B2 JP S6332513B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- alignment treatment
- treatment agent
- film
- masking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 29
- 239000003795 chemical substances by application Substances 0.000 claims description 27
- 238000011282 treatment Methods 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 21
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 17
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 12
- 230000000873 masking effect Effects 0.000 claims description 11
- 239000004973 liquid crystal related substance Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 12
- 239000007864 aqueous solution Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 239000000565 sealant Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- BLFRQYKZFKYQLO-UHFFFAOYSA-N 4-aminobutan-1-ol Chemical compound NCCCCO BLFRQYKZFKYQLO-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
Description
【発明の詳細な説明】
本発明は液晶素子の基板上の特定部分のみ配向
処理剤の溶液で処理したい場合のコーテイング法
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a coating method when it is desired to treat only a specific portion of a substrate of a liquid crystal element with a solution of an alignment treatment agent.
硝子、セラミツクス、金属、プラステイツク等
の基板上にある特定の部分にある溶液をコートす
る必要がある場合、該特定部分のみ穴を開けたメ
タルマスクを該基板上に置き、該溶液をスプレー
する方法や、コートを希望する場所以外の部分を
マスク用のインクを印刷し、硬化処理をした後希
望の溶液をスピンナー、浸漬法、スプレー法等で
コートし、その後マスクインクを溶剤除去する方
法、基板全面に液をコートした後コート希望部分
上にマスクインクを印刷し硬化処理をした後不要
部分についた該コート膜をエツチングで除去し、
次にマスクインクを溶剤除去する方法、又スクリ
ーン印刷やオフセツト印刷等の印刷技術を用いた
方法等が考えられる。 When it is necessary to coat a specific part of a substrate such as glass, ceramics, metal, plastic, etc. with a solution, a metal mask with holes made only in the specific part is placed on the substrate and the solution is sprayed. Another method is to print mask ink on areas other than the desired areas, cure it, coat with the desired solution using a spinner, dipping method, spray method, etc., and then remove the mask ink with a solvent. After coating the entire surface with the liquid, mask ink is printed on the areas desired to be coated, and after curing treatment, the coating film attached to unnecessary areas is removed by etching.
Next, there may be a method of removing the mask ink with a solvent, or a method using printing techniques such as screen printing or offset printing.
メタルマスク法は簡単ではあるが、コート液が
マスクの裏側に廻り込みコート膜のパターン精度
が特に悪くなる欠点がある。 Although the metal mask method is simple, it has the drawback that the coating liquid gets around to the back side of the mask, resulting in particularly poor pattern accuracy of the coating film.
マスクインク法、全面コート後エツチング除去
法はパターニング精度が高く半導体を始め多くの
分野で使用されているが、工程が長く又溶剤を用
いる為装置的に高価になる欠点がある。 The mask ink method and the etching removal method after full-surface coating have high patterning accuracy and are used in many fields including semiconductors, but they have the drawback of being long in process and expensive in terms of equipment because they use solvents.
印刷法は一度にパターニングが可能であり有効
である為印刷適性が充分な液をコートする場合は
多く使用されているが、印刷不可能な低粘度の液
をコートする場合には用いる事ができない。 The printing method allows patterning at once and is effective, so it is often used when coating a liquid with sufficient printability, but it cannot be used when coating a low-viscosity liquid that cannot be printed. .
以上の様に印刷不可能な低粘性の液を簡便かつ
ある程度の精度をもつてパターニングコートする
方法は現在の処見当らない。 As mentioned above, there is currently no method for pattern coating a low viscosity liquid that cannot be printed easily and with a certain degree of accuracy.
また、液晶素子の配向処理剤による層は、その
層を形成後に、その上に別の物質を積層してパタ
ーニングすると、その積層した物質を除去した後
に、悪影響が生じ易く、所望の配向性能が得られ
にくいという問題点も有していた。 In addition, if a layer made of an alignment treatment agent for a liquid crystal element is formed and then another substance is layered on top of it and patterned, an adverse effect tends to occur after the layered material is removed, and the desired alignment performance may not be achieved. Another problem was that it was difficult to obtain.
本発明者は、かかる問題点の認識に基づき種々
検討した結果、印刷不可能な低粘性液体をも簡便
に基体上にパターニングしてコーテイングする方
法を見い出しここに提供する。 As a result of various studies based on the recognition of such problems, the present inventors have discovered and hereby provide a method for easily patterning and coating even a low viscosity liquid that cannot be printed on a substrate.
本発明は液晶素子の基板上の配向処理剤のコー
ト希望部分以外の場所に機械的に容易に剥離可能
なマスキング用のフイルムをコートし、希望の配
向処理剤の溶液を基板全面にコートした後、マス
キング用のフイルムを機械的に剥離して、希望の
部分のみに配向処理剤を残す液晶素子の部分コー
テイング法に関するもので、このマスク工程をパ
ツクマスキングと呼ぶ。 In the present invention, a masking film that can be easily peeled off mechanically is coated on the substrate of a liquid crystal element in areas other than the areas where the alignment treatment agent is desired to be coated, and then a solution of the desired alignment treatment agent is coated on the entire surface of the substrate. , relates to a partial coating method for liquid crystal elements in which the masking film is mechanically peeled off to leave the alignment agent only in the desired areas, and this masking process is called pack masking.
本発明におけるパツクマスキング法による部分
コーテイング法は、液晶素子の基板の配向処理剤
による表面処理の工程に用いて有効なものであ
る。 The partial coating method using the pack masking method in the present invention is effective when used in the step of surface treatment using an alignment treatment agent for the substrate of a liquid crystal element.
例えば垂直配向液晶素子を作る場合、表示面内
の基板上は垂直配向処理が必要であるが、基板全
面を垂直配向処理するとシール剤が接触する部分
も一緒に表面処理されてしまう。一般に垂直配向
処理剤は基板の表面エネルギーを減少させる性質
がある為、該処理剤でコートされた基板をエポキ
シ樹脂等のシール剤で接着した場合、接着力が著
るしく弱くなり、信頼性の低い素子となつてしま
う。又、シール剤の接触する部分に該処理剤の上
からシランカツプリング剤等をコートしてもあま
り有効ではない。 For example, when manufacturing a vertically aligned liquid crystal element, vertical alignment treatment is required on the substrate within the display surface, but if the entire surface of the substrate is vertically aligned, the surface that comes into contact with the sealant will also be surface treated. In general, vertical alignment treatment agents have the property of reducing the surface energy of the substrate, so if a substrate coated with this treatment agent is bonded with a sealant such as epoxy resin, the adhesive strength will be significantly weakened and reliability will be reduced. It becomes a low element. Also, it is not very effective to coat the processing agent with a silane coupling agent or the like on the area that comes into contact with the sealant.
該垂直処理剤としては例えば、ハイドロカーボ
ンアルコキシシラン等のアルコール溶液等が使用
されるが、基板表面にごく薄い層がコートされれ
ば有効な為通常数10〜数100m％程度の濃度の物
が使用される。その程度の溶液は数センチポイズ
しかない為印刷法では当然コートできない。 For example, an alcohol solution such as hydrocarbon alkoxysilane is used as the vertical treatment agent, but it is effective if a very thin layer is coated on the substrate surface, so it is usually used at a concentration of several 10 to several 100 m%. used. Since such a solution has only a few centipoises, it cannot naturally be coated using the printing method.
かかる場合、シール剤の接触する部分やリード
取出し部分にパツクマスク剤をコートし、乾燥し
てフイルム化した後、垂直配向処理剤をスピンナ
ー法等で全面にコートする。その後パツクマスク
剤としてのフイルムを機械的に剥離すればシール
部及びリード取出し部等は垂直配向処理剤がコー
トされていない為、該基板を周辺シールした場合
シールの信頼性が保たれる。 In such a case, a pack masking agent is coated on the areas in contact with the sealing agent and lead extraction areas, and after drying to form a film, a vertical alignment treatment agent is coated on the entire surface using a spinner method or the like. If the film used as a pack mask agent is then mechanically peeled off, the reliability of the seal can be maintained when the substrate is peripherally sealed, since the sealing area, lead extraction area, etc. are not coated with the vertical alignment treatment agent.
また、本発明のコーテイング法によれば、配向
処理剤による層を形成後に、その上に別の物質を
積層してパターニングする必要がないため、配向
処理剤による層が汚染されにくく、配向性能が劣
化しにくい。 Furthermore, according to the coating method of the present invention, there is no need to layer and pattern another substance on top of the layer formed by the alignment treatment agent, so the layer formed by the alignment treatment agent is less likely to be contaminated and the alignment performance is improved. Not easy to deteriorate.
特定部分に処理される物は垂直配向処理剤に限
らず、水平配向処理に用いられるポリイミド樹脂
膜を作る為の溶液等にも使用でき、その他、液晶
素子の基板の内面に形成される表面処理層も含ま
れるのは言うまでもない。 Products that can be used to treat specific areas are not limited to vertical alignment treatment agents, but can also be used for solutions such as those used to create polyimide resin films used in horizontal alignment treatment, as well as other surface treatments that are formed on the inner surfaces of liquid crystal element substrates. Needless to say, layers are also included.
本発明におけるパツクマスキング剤は基板に塗
布後、フイルム化して、機械的に容易に剥離可能
な物質であれば良く、特に限定されるものではな
い。例えばポリビニルアルコール系樹脂
（PVA）、アクリル系樹脂、シリコン系樹脂等の
有機物も含まれ、その内特にPVAがこの目的に
適している。 The masking agent used in the present invention is not particularly limited as long as it can be formed into a film after being applied to a substrate and can be easily peeled off mechanically. Examples include organic materials such as polyvinyl alcohol resin (PVA), acrylic resin, and silicone resin, among which PVA is particularly suitable for this purpose.
PVAは水溶性の樹脂で接着剤、衣類の合成の
りや女性の顔のパツク材の原料としても多く使用
されており、PVAの水溶液がある程度乾燥する
と柔軟なフイルムとなりコートされた物体から剥
離可能な状態となる。 PVA is a water-soluble resin that is often used as a raw material for adhesives, synthetic glue for clothing, and women's face packs. When an aqueous PVA solution dries to a certain extent, it becomes a flexible film that can be peeled off from the coated object. state.
PVAの種類には重合度、ケン化度、他物質と
の組合せ等により種々の物があるが特に限定され
るものではない。 There are various types of PVA depending on the degree of polymerization, degree of saponification, combination with other substances, etc., but there are no particular limitations.
例えばゴーセノールGH−20（日本合成化学工
業社製）等が例示される。 For example, Gohsenol GH-20 (manufactured by Nippon Gosei Kagaku Kogyo Co., Ltd.) is exemplified.
PVAの水溶液としては５〜30％程度の物が使
用できるが特に10〜20％の濃度のものが適当であ
る。該PVA水溶液を基板にコートする工程は特
に限定されるものではなく、ハケぬり法、デイス
ペンサー法、印刷法等が適用できる。該PVA水
溶液を基板にコートした後40℃〜60℃で10分〜60
分間乾燥する事により柔軟なフイルムが形成され
る。乾燥工程が短かすぎるとフイルムが形成され
ず機械的に一度に剥離が困難となり、長すぎると
フイルムが硬くなる上基板との接着が強くなり剥
離困難となる。 An aqueous solution of PVA with a concentration of about 5 to 30% can be used, but one with a concentration of 10 to 20% is particularly suitable. The step of coating the substrate with the PVA aqueous solution is not particularly limited, and a brushing method, a dispenser method, a printing method, etc. can be applied. After coating the PVA aqueous solution on the substrate, heat at 40℃ to 60℃ for 10 minutes to 60 minutes.
A flexible film is formed by drying for minutes. If the drying process is too short, no film will be formed and it will be difficult to mechanically peel it all at once; if it is too long, the film will become hard and the adhesion to the upper substrate will be strong, making it difficult to peel.
該PVAフイルムの基板との接着力を低減させ
る為には添加物を加える事が有効であり、例えば
界面活性剤、エチレングリコール、プロピレング
リコール、グリセリン等のグリコール類、エタノ
ールアミン、ブタノールアミン等のアルコールア
ミン類、澱粉、CMC等が有効である。該添加物
を該PVA水溶液に10ｍ％〜30％添加する事によ
り乾燥後の基板との接着力を弱める事ができ、機
械的剥離が容易となる。 It is effective to add additives to reduce the adhesive strength of the PVA film to the substrate, such as surfactants, glycols such as ethylene glycol, propylene glycol, and glycerin, and alcohols such as ethanolamine and butanolamine. Amines, starch, CMC, etc. are effective. By adding 10 m% to 30% of the additive to the PVA aqueous solution, the adhesive force with the dried substrate can be weakened, making mechanical peeling easier.
実施例
88mlの水にグリセリン1.2ｇ添加し、PVA（ゴ
ーセノールGH−20）の粉末12ｇを撹拌しつつ添
加し溶解させPVA水溶液を作つた。第１図ａに
示すように該PVA水溶液１をデイスペンサー２
を用いて液晶素子の基板３の内面のシール部分に
相当する外周部分に塗布した。次いで該基板を50
℃の乾燥機に30分間入れて該水溶液を乾燥してフ
イルム４にした。次いでｂに示す如く基板上に垂
直配向処理剤のアルコール溶液５をスピンナー法
でコートした後、ｃに示す様に該フイルムをピン
セツトで剥離し、300℃30分の硬化処理を行なつ
た結果、基板の中央部分にのみ該垂直配向処理剤
６のコートをすることができた。Example 1.2 g of glycerin was added to 88 ml of water, and 12 g of PVA (Gohsenol GH-20) powder was added and dissolved with stirring to prepare a PVA aqueous solution. As shown in Figure 1a, the PVA aqueous solution 1 is dispensed into the dispenser 2.
The solution was applied to the outer circumferential portion corresponding to the sealed portion on the inner surface of the substrate 3 of the liquid crystal element. Then the substrate was
The aqueous solution was dried to form Film 4 by placing it in a dryer at .degree. C. for 30 minutes. Next, as shown in b, an alcoholic solution 5 of a vertical alignment agent was coated on the substrate using a spinner method, and as shown in c, the film was peeled off with tweezers and hardened at 300°C for 30 minutes. The vertical alignment treatment agent 6 could be coated only on the central portion of the substrate.
第１図ａ，ｂ，ｃは実施例に係るコーテイング
工程を示す側面図である。
１……PVA水溶液、２……デイスペンサー、
３……基板、４……PVAフイルム、５……垂直
配向処理剤のアルコール溶液、６……垂直配向処
理剤。
FIGS. 1A, 1B, and 1C are side views showing the coating process according to the embodiment. 1...PVA aqueous solution, 2...dispenser,
3... Substrate, 4... PVA film, 5... Alcohol solution of vertical alignment treatment agent, 6... Vertical alignment treatment agent.
Claims (1)
溶液をコーテイングする部分コーテイング法にお
いて、コーテイング希望の部分以外の場所を機械
的に剥離可能な物質によるフイルムでマスキング
した後、基板全面に該配向処理剤の溶液のコーテ
イングを行ない、次にマスキングに用いたフイル
ムを機械的に剥離し、部分的に配向処理剤による
層に覆われた液晶素子の基板を形成することを特
徴とする部分コーテイング法。 ２ マスキングに用いられるフイルムの材質がポ
リビニルアルコール系樹脂である特許請求の範囲
第１項記載の部分コーテイング法。 ３ 基板のシール部にマスキング用のフイルムを
設けて、シール部に配向処理剤による層を形成し
ないようにした特許請求の範囲第１項または第２
項記載の部分コーテイング法。[Claims] 1. In a partial coating method in which only a portion of the substrate of a liquid crystal element is coated with a solution of an alignment treatment agent, after masking the area other than the desired coating with a film made of a mechanically removable substance, The method is characterized in that the entire surface of the substrate is coated with a solution of the alignment treatment agent, and then the film used for masking is mechanically peeled off to form a substrate of a liquid crystal element partially covered with a layer of the alignment treatment agent. Partial coating method. 2. The partial coating method according to claim 1, wherein the material of the film used for masking is polyvinyl alcohol resin. 3. Claim 1 or 2, in which a masking film is provided on the seal portion of the substrate so that no layer of alignment agent is formed on the seal portion.
Partial coating method described in section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5357580A JPS56150462A (en) | 1980-04-24 | 1980-04-24 | Partial coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5357580A JPS56150462A (en) | 1980-04-24 | 1980-04-24 | Partial coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56150462A JPS56150462A (en) | 1981-11-20 |
| JPS6332513B2 true JPS6332513B2 (en) | 1988-06-30 |
Family
ID=12946622
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5357580A Granted JPS56150462A (en) | 1980-04-24 | 1980-04-24 | Partial coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56150462A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0431057Y2 (en) * | 1989-04-14 | 1992-07-27 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5936253U (en) * | 1983-06-22 | 1984-03-07 | 株式会社日立製作所 | Boiling cooling device |
| JP3956392B2 (en) | 2001-09-10 | 2007-08-08 | 株式会社ホンダアクセス | Body support equipment |
| JP6329006B2 (en) * | 2014-06-10 | 2018-05-23 | 太洋塗料株式会社 | Release paint application nozzle, building material manufacturing method, and release paint application method |
| JP6671335B2 (en) * | 2017-12-28 | 2020-03-25 | 株式会社小森コーポレーション | Functional film patterning method and electronic device manufacturing method |
| JP7016832B2 (en) * | 2019-04-19 | 2022-02-07 | 信越化学工業株式会社 | Patterning method of polysilazane hardened film |
-
1980
- 1980-04-24 JP JP5357580A patent/JPS56150462A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0431057Y2 (en) * | 1989-04-14 | 1992-07-27 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56150462A (en) | 1981-11-20 |
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