JPS6324296B2 - - Google Patents
Info
- Publication number
- JPS6324296B2 JPS6324296B2 JP7096179A JP7096179A JPS6324296B2 JP S6324296 B2 JPS6324296 B2 JP S6324296B2 JP 7096179 A JP7096179 A JP 7096179A JP 7096179 A JP7096179 A JP 7096179A JP S6324296 B2 JPS6324296 B2 JP S6324296B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- cathode
- electrode
- linear hot
- hot cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 65
- 238000000605 extraction Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 7
- 239000000470 constituent Substances 0.000 claims 1
- 230000005684 electric field Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 241000276425 Xiphophorus maculatus Species 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J31/00—Cathode ray tubes; Electron beam tubes
- H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
- H01J31/10—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes
- H01J31/12—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes with luminescent screen
- H01J31/123—Flat display tubes
- H01J31/125—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection
- H01J31/126—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection using line sources
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Description
【発明の詳細な説明】
本発明は画像表示装置用陰極構体に関し、特に
線状熱陰極を用いた陰極構体において電子ビーム
を偏向させても線状熱陰極に沿つて時間的に均一
な板状電子ビーム放出を得ることを目的とする。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a cathode assembly for an image display device, and in particular, in a cathode assembly using a linear hot cathode, even if an electron beam is deflected, a temporally uniform plate-like structure is formed along the linear hot cathode. The purpose is to obtain electron beam emission.
平板状電子源から電子ビームを得、マトリツク
ス制御電極によつて電子ビームを制御し加速して
螢光体に照射して文字または画像を得る平板状表
示装置においては、必要な場所に均一かつ電流密
度の高い電子源が要求される。発明者らはこのよ
うな要求、すなわち均一かつ高い電流密度を得る
という要求に対しては、特開昭54−143063号およ
び特開昭54−143062号で均一で電流密度の高い板
状電子ビームを得る陰極体を開示し、必要な場所
に電子ビームを得るという要求に対しては、特開
昭55−83133号および特開昭55−69941号に陰極自
体に電子ビームを偏向できる機能を有する陰極構
体を開示した。本発明は、さらに陰極から放出し
た電子ビームを制御する電極の配置、構成をくふ
うすることによつて、以前よりもより均一な板状
電子ビーム放出を得ようとするものである。 A flat display device obtains an electron beam from a flat electron source, controls and accelerates the electron beam using a matrix control electrode, and irradiates a phosphor to produce characters or images. A dense electron source is required. In order to meet this requirement, that is, to obtain a uniform and high current density, the inventors have developed a plate-shaped electron beam with a uniform and high current density in Japanese Patent Application Laid-open Nos. 54-143063 and 1982-143062. In response to the requirement to disclose a cathode body that obtains the electron beam and obtain the electron beam to the required location, Japanese Patent Application Laid-Open No. 55-83133 and Japanese Patent Application Laid-Open No. 55-69941 have a function to deflect the electron beam to the cathode itself. A cathode structure is disclosed. The present invention further attempts to obtain more uniform plate-like electron beam emission than before by improving the arrangement and configuration of the electrodes that control the electron beam emitted from the cathode.
第１図は、従来からの陰極自体に電子ビーム偏
向機能を有する陰極構体を示す。同図は紙面に垂
直に伸びる陰極構体の断面図である。１は熱電子
を放出する線状熱陰極、２は上記陰極１に対して
負の電圧が印加されている背面電極である。３は
電極を装着する基板である。４ａ，４ｂおよび５
ａ，５ｂは電子ビームを偏向するための電極対で
ある。６は電子ビームを取り出すための電極であ
り、８はこの電極６に設けられた貫通孔である。 FIG. 1 shows a conventional cathode structure in which the cathode itself has an electron beam deflection function. The figure is a cross-sectional view of the cathode structure extending perpendicularly to the plane of the paper. 1 is a linear hot cathode that emits thermoelectrons; 2 is a back electrode to which a negative voltage is applied to the cathode 1; 3 is a substrate on which electrodes are mounted. 4a, 4b and 5
a and 5b are a pair of electrodes for deflecting the electron beam. 6 is an electrode for extracting an electron beam, and 8 is a through hole provided in this electrode 6.
次に上記陰極構体の動作を説明する。 Next, the operation of the cathode assembly will be explained.
偏向電極対４ａ，４ｂおよび５ａ，５ｂには駆
動回路によりバイアス電圧に偏向電圧が重畳され
た電圧が印加されている。線状熱陰極１より放出
された電子ビームは、この偏向電極対４ａ，４ｂ
および５ａ，５ｂにより板状に集束、偏向されて
電子ビーム取り出し電極６の貫通孔８よりとり出
される。７はこのようにして取り出された板状電
子ビームをあらわす。 A voltage in which a deflection voltage is superimposed on a bias voltage is applied to the deflection electrode pairs 4a, 4b and 5a, 5b by a drive circuit. The electron beam emitted from the linear hot cathode 1 is directed to the deflection electrode pair 4a, 4b.
The electron beam is focused and deflected into a plate shape by 5a and 5b, and taken out from the through hole 8 of the electron beam extraction electrode 6. 7 represents the plate-shaped electron beam extracted in this way.
前記従来例においては、電子ビーム７を大幅に
偏向させる場合、線状熱陰極１の表面には、電子
ビーム取り出し電極６による電界と偏向電極対４
ａ，４ｂまたは５ａ，５ｂの正極による電界とが
重畳される。このように、偏向の際に線状熱陰極
１の表面は偏向電極対から電界の影響をうけるた
め、偏向した場合の線状熱陰極１からの電子放出
量は、偏向しない場合の電子放出量より多くなり
このため表示画像に濃淡が生じたり、電子ビーム
の収束性が若干悪くなる欠点があつた。 In the conventional example, when the electron beam 7 is to be significantly deflected, the surface of the linear hot cathode 1 is exposed to the electric field generated by the electron beam extraction electrode 6 and the deflection electrode pair 4.
The electric field due to the positive electrodes a, 4b or 5a, 5b is superimposed. In this way, during deflection, the surface of the linear hot cathode 1 is affected by the electric field from the deflection electrode pair, so the amount of electrons emitted from the linear hot cathode 1 when deflected is equal to the amount of electrons emitted when not deflected. As a result, there are disadvantages in that the displayed image becomes shaded and the convergence of the electron beam is slightly deteriorated.
本発明は上記欠点を除去するためなされたもの
で、絶縁性基板表面に電子ビームを集束するため
の電極、電子ビームを取り出すための電極および
電子ビームを偏向させるための電極を順次設けた
電極基板を相対向させて配置した構成の陰極構体
を提供するものである。 The present invention has been made to eliminate the above-mentioned drawbacks, and is an electrode substrate in which an electrode for focusing an electron beam, an electrode for taking out the electron beam, and an electrode for deflecting the electron beam are sequentially provided on the surface of an insulating substrate. The present invention provides a cathode assembly having a structure in which the two electrodes are arranged facing each other.
以下、図面をもとに本発明を詳細に説明する。 Hereinafter, the present invention will be explained in detail based on the drawings.
第２図は、本発明による表示装置用陰極構体の
一実施例であり、紙面に対して垂直に伸びる陰極
構体の断面図を示している。１は、たとえば１０
ミクロンから数10ミクロン径のタングステン線の
表面に酸化物電子放射材料を電着法等によつて塗
着した陰極である。１０ａ，１０ｂは電子ビーム
を線状熱陰極に沿つて板状に集束させるための集
束電極である。１１ａ、１１ｂは電子ビームを取
り出すための電極である。１２ａ，１２ｂは電子
ビーム１３を左右に偏向するための電極である。 FIG. 2 is an embodiment of a cathode assembly for a display device according to the present invention, and shows a cross-sectional view of the cathode assembly extending perpendicularly to the plane of the paper. 1 is, for example, 10
This cathode is made by coating the surface of a tungsten wire with a diameter of microns to several tens of microns with an oxide electron emitting material by electrodeposition. 10a and 10b are focusing electrodes for focusing the electron beam into a plate shape along the linear hot cathode. 11a and 11b are electrodes for extracting the electron beam. 12a and 12b are electrodes for deflecting the electron beam 13 left and right.
次に本発明の一実施例である上記陰極構体の動
作を説明する。 Next, the operation of the cathode assembly, which is an embodiment of the present invention, will be explained.
集束電極１０ａ，１０ｂには、線状熱陰極１に
対して負の一定の電圧が印加され、電子ビーム取
り出し電極１１ａ，１１ｂには正の一定電圧が印
加されている。このため線状熱陰極１を頂点とす
るつり鐘状の等電位面が形成されている。線状熱
陰極１から放出された電子ビームはこのつり鐘状
等電位面に対応する電気力線によつて陰極構体の
中央部に集束され、紙面に垂直な板状電子ビーム
が形成される。さらに、電子ビームはバイアス電
圧と偏向電圧とが重畳された電圧が印加された偏
向電極１２ａ，１２ｂによつて左右へ偏向された
後、陰極構体の出口からとり出される。 A constant negative voltage with respect to the linear hot cathode 1 is applied to the focusing electrodes 10a and 10b, and a constant positive voltage is applied to the electron beam extraction electrodes 11a and 11b. Therefore, a bell-shaped equipotential surface with the linear hot cathode 1 at its apex is formed. The electron beam emitted from the linear hot cathode 1 is focused at the center of the cathode structure by electric lines of force corresponding to this bell-shaped equipotential surface, forming a plate-shaped electron beam perpendicular to the plane of the paper. Further, the electron beam is deflected to the left and right by deflection electrodes 12a and 12b to which a voltage in which a bias voltage and a deflection voltage are superimposed is applied, and then taken out from the exit of the cathode structure.
上記偏向の方法は、たとえば左から右に順次偏
向するための鋸歯状波または段階波電圧を偏向電
極に印加し、電子ビームの偏向と同期して前記板
状電子ビームの通過を制御する電極を陰極構体の
出口に設ければ画像に対応した電子ビームを得る
ことができる。 The above deflection method involves applying a sawtooth wave or step wave voltage to the deflection electrode for sequentially deflecting the electron beam from left to right, and applying an electrode to control the passage of the plate-shaped electron beam in synchronization with the deflection of the electron beam. If it is provided at the exit of the cathode assembly, an electron beam corresponding to the image can be obtained.
上記の電極構成を有する陰極構体において、線
状熱陰極１は、一定電位の背面電極２、集束電極
１０ａ，１０ｂおよび電子ビーム取り出し電極１
１ａ，１１ｂに包囲されており、特に電子ビーム
取り出し電極１１ａ，１１ｂは、偏向電極１２
ａ，１２ｂの電位変化による影響が線状熱陰極１
に及ぶのを防止する作用をするため、線状熱陰極
１の表面の電界は電子ビームの偏向作用によつて
変化することがない。 In the cathode structure having the above electrode configuration, the linear hot cathode 1 includes a back electrode 2 having a constant potential, focusing electrodes 10a and 10b, and an electron beam extraction electrode 1.
1a, 11b, in particular, the electron beam extraction electrodes 11a, 11b are surrounded by the deflection electrode 12.
The effect of potential changes on a and 12b is linear hot cathode 1.
Therefore, the electric field on the surface of the linear hot cathode 1 does not change due to the deflection of the electron beam.
すなわち、線状熱陰極１からの電子ビーム電流
値は、一定の正電位が印加された電子ビーム取り
出し電極１１ａ，１１ｂによつて一定に定まり、
従来例のごとく、偏向電極に印加する偏向電圧に
よつて電子ビーム電流値が変化することがなく、
均一な輝度の画像が得られる。さらに、電子ビー
ム取り出し電極によつて加速される電子ビームの
エネルギーが大きいため、従来例のように電子ビ
ームの集束性が悪くなることもない。 That is, the electron beam current value from the linear hot cathode 1 is fixed at a constant value by the electron beam extraction electrodes 11a and 11b to which a constant positive potential is applied.
Unlike the conventional example, the electron beam current value does not change due to the deflection voltage applied to the deflection electrode.
An image with uniform brightness can be obtained. Furthermore, since the energy of the electron beam accelerated by the electron beam extraction electrode is large, the convergence of the electron beam does not deteriorate as in the conventional example.
次に他の実施例について説明する。 Next, other embodiments will be described.
線状熱陰極１は電子ビーム偏向電極１２ａ，１
２ｂ電支ビーム取り出し電極１１ａ，１１ｂによ
つて隔離されている必要がありまた、線状熱陰極
１は周囲のすべての電極から等間隔を保つことが
望ましい。これらを考慮して、均一な電子ビーム
の得られる線状熱陰極１と電極との関係を実験的
に求めると次のような結果が得られた。 The linear hot cathode 1 is an electron beam deflection electrode 12a, 1
It is necessary that the wire hot cathode 1 be isolated by the 2b electric beam extraction electrodes 11a and 11b, and it is desirable that the linear hot cathode 1 be maintained at equal intervals from all surrounding electrodes. Taking these into consideration, we experimentally determined the relationship between the linear hot cathode 1 and the electrodes to obtain a uniform electron beam, and the following results were obtained.
すなわち、線状熱陰極１を相対向する電子ビー
ム集束電極１０ａ，１０ｂの中央部に架張し、両
内側面に形成した電子ビームひき出し電極１１
ａ，１１ｂの中心と線状熱陰極１とを結ぶ二等辺
三角形の頂角が100゜以下になるように電極配置を
すれば、ほぼ均一な電子ビームが得られた。 That is, a linear hot cathode 1 is stretched across the center of opposing electron beam focusing electrodes 10a and 10b, and electron beam extraction electrodes 11 are formed on both inner surfaces.
By arranging the electrodes so that the apex angle of the isosceles triangle connecting the centers of a and 11b and the linear hot cathode 1 was 100° or less, a substantially uniform electron beam was obtained.
次に複数の陰極構成単位の配列を他の実施例と
して示す。 Next, the arrangement of a plurality of cathode structural units will be shown as another example.
第２図は、複数個並列に配置した陰極構体の一
部断面図であるが、同図のように多数の陰極構成
単位を複数個並列して配置し、最初の実施例で示
した電子ビーム制御方法を各陰極構成単位に順次
適用することによつて、二次元的に広がる平板状
電子源を得ることができる。また、第２図に示す
ように、絶縁性基板３の表面に電子ビーム集束電
極１０ａ，１０ｂ、電子ビーム取り出し電極１１
ａ，１１ｂおよび電子ビーム偏向電極１２ａ，１
２ｂを形成する電極構成によつて、簡単に隣接す
る陰極構成単位を連続的に配置できる。 FIG. 2 is a partial cross-sectional view of a cathode structure in which a plurality of cathode units are arranged in parallel. By sequentially applying the control method to each cathode structural unit, a two-dimensionally expanding flat plate electron source can be obtained. Further, as shown in FIG.
a, 11b and electron beam deflection electrodes 12a, 1
The electrode configuration forming 2b allows adjacent cathode structural units to be easily arranged in succession.
以上のように本発明は、３種類の電極を設け、
線状熱陰極と上記３種類の電極の配置を適正にえ
らぶことにより、電子ビームの放出方向を偏向さ
せても線状熱陰極に沿つて収束性、均一性のすぐ
れた電子ビームが得られる効果を有する。また、
電極を絶縁性基板に形成する構成にすることによ
り隣接する陰極構成単位を連続的に容易に設置で
きるため、製造が簡単になり工業的価値が大き
い。 As described above, the present invention provides three types of electrodes,
By appropriately selecting the arrangement of the linear hot cathode and the three types of electrodes mentioned above, an electron beam with excellent convergence and uniformity can be obtained along the linear hot cathode even if the electron beam emission direction is deflected. has. Also,
By configuring the electrodes to be formed on an insulating substrate, adjacent cathode structural units can be easily installed in succession, which simplifies manufacturing and has great industrial value.
第１図は従来の一実施例である画像表示装置用
陰極構体の断面図、第２図は本発明の一実施例で
ある画像表示装置用陰極構体の断面図である。
１……線状熱陰極、２……背面電極、３……基
板、４ａ，４ｂ，５ａ，５ｂ……電子ビーム偏向
電極、６……電子ビームとり出し電極、７……板
状電子ビーム、８……貫通孔、１０ａ，１０ｂ…
…電子ビーム集束電極、１１ａ，１１ｂ……電子
ビーム取り出し電極、１２ａ，１２ｂ……電子ビ
ーム偏向電極。
FIG. 1 is a sectional view of a cathode assembly for an image display device, which is an embodiment of the conventional art, and FIG. 2 is a sectional view of a cathode assembly for an image display device, which is an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Linear hot cathode, 2... Back electrode, 3... Substrate, 4a, 4b, 5a, 5b... Electron beam deflection electrode, 6... Electron beam extraction electrode, 7... Platy electron beam, 8...Through hole, 10a, 10b...
...Electron beam focusing electrode, 11a, 11b...Electron beam extraction electrode, 12a, 12b...Electron beam deflection electrode.
Claims (1)
状熱陰極をはさむ互いに平行な１対の相対向する
絶縁性基板と上記絶縁性基板上に間隔をおいて順
次設けられた電子ビーム集束電極と電子ビームひ
き出し電極と電子ビーム偏向電極とから成り、前
記電子ビーム集束電極、電子ビーム引出し電極お
よび電子ビーム偏向電極の各電極が、線状熱陰極
と平行して延在し、各電極間に同様に平行する間
隔を形成して成る陰極構成単位を有することを特
徴とする画像表示装置用陰極構成。 ２ 線状熱陰極が相対向する電子ビーム集束電極
の中央部に架張されるとともに、電子ビーム引き
出し電極の中心と、前記線状熱陰極とを結ぶ二等
辺三角形の頂角が100゜以下である陰極構成単位を
有することを特徴とする特許請求の範囲第１項に
記載の画像表示装置用陰極構体。 ３ 陰極構成単位が複数個並列に連続配置されて
いることを特徴とする特許請求の範囲第１項また
は第２項に記載の画像表示装置用陰極構体。[Claims] 1. A linear hot cathode stretched in a straight line, a pair of mutually opposing insulating substrates that are parallel to each other and sandwiching the linear hot cathode, and spaced apart on the insulating substrates. It consists of an electron beam focusing electrode, an electron beam extraction electrode, and an electron beam deflection electrode provided in sequence, and each of the electron beam focusing electrode, electron beam extraction electrode, and electron beam deflection electrode is parallel to the linear hot cathode. 1. A cathode structure for an image display device, characterized in that the cathode unit has a cathode unit extending in parallel with parallel spacing between each electrode. 2. A linear hot cathode is stretched across the center of opposing electron beam focusing electrodes, and the apex angle of an isosceles triangle connecting the center of the electron beam extraction electrode and the linear hot cathode is 100° or less. The cathode assembly for an image display device according to claim 1, characterized in that it has a certain cathode constituent unit. 3. The cathode structure for an image display device according to claim 1 or 2, characterized in that a plurality of cathode structural units are arranged in series in parallel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7096179A JPS55163756A (en) | 1979-06-05 | 1979-06-05 | Cathode frame body for picture image display unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7096179A JPS55163756A (en) | 1979-06-05 | 1979-06-05 | Cathode frame body for picture image display unit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55163756A JPS55163756A (en) | 1980-12-20 |
| JPS6324296B2 true JPS6324296B2 (en) | 1988-05-20 |
Family
ID=13446612
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7096179A Granted JPS55163756A (en) | 1979-06-05 | 1979-06-05 | Cathode frame body for picture image display unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55163756A (en) |
-
1979
- 1979-06-05 JP JP7096179A patent/JPS55163756A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55163756A (en) | 1980-12-20 |
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