JPS6324015A - Apparatus for producing steel sheet - Google Patents
Apparatus for producing steel sheetInfo
- Publication number
- JPS6324015A JPS6324015A JP16564686A JP16564686A JPS6324015A JP S6324015 A JPS6324015 A JP S6324015A JP 16564686 A JP16564686 A JP 16564686A JP 16564686 A JP16564686 A JP 16564686A JP S6324015 A JPS6324015 A JP S6324015A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- thickness
- steel sheet
- zone
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 16
- 239000010959 steel Substances 0.000 title claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 46
- 229910000976 Electrical steel Inorganic materials 0.000 claims abstract description 34
- 238000007740 vapor deposition Methods 0.000 claims abstract description 20
- 238000001816 cooling Methods 0.000 claims abstract description 12
- 238000005096 rolling process Methods 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 238000002791 soaking Methods 0.000 claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 238000005019 vapor deposition process Methods 0.000 claims description 6
- 239000012467 final product Substances 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims description 4
- 238000004804 winding Methods 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 20
- 229910052710 silicon Inorganic materials 0.000 abstract description 20
- 239000010703 silicon Substances 0.000 abstract description 20
- 239000012159 carrier gas Substances 0.000 abstract description 2
- 229910003910 SiCl4 Inorganic materials 0.000 abstract 1
- 238000007664 blowing Methods 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
- 239000007789 gas Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 230000001590 oxidative effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 206010040844 Skin exfoliation Diseases 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004299 exfoliation Methods 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 229910017384 Fe3Si Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Chemical Vapour Deposition (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は、鋼板、特に、電磁材料用の電気鉄板として
用いられる鋼板の製造装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an apparatus for manufacturing steel plates, particularly steel plates used as electrical iron plates for electromagnetic materials.
変圧器等の鉄心用電気鉄板には、高珪素鋼板が使用され
ている。高珪素鋼板においては、珪素の含有量が多いほ
ど鉄損が低減し、そして、珪素の含有量が約６．５ｗｔ
％になると、 磁気歪がほぼ０となると共に最大透磁率
がピークＶζなる。このように高珪素鋼板は、優れた磁
気特性を有する。High-silicon steel plates are used for electrical iron plates for cores of transformers and the like. In high-silicon steel sheets, the higher the silicon content, the lower the iron loss, and the silicon content is approximately 6.5wt.
%, the magnetostriction becomes almost 0 and the maximum permeability reaches the peak Vζ. In this way, high-silicon steel sheets have excellent magnetic properties.
従来、上記高珪素鋼板の製造方法として、次の方法、所
謂、滲珪処理法が知られている。即ち、普通鋼板または
４ ｖｒｔ、φ以下の珪素を含有する低珪素鋼板（以下
、母材板と云う）に対し、４塩化珪素ガスを含有する無
酸化ガス中において、高温度下でＣＶＤ法（化学気相蒸
着法）により蒸着処理を施し、これにより、母材板の表
面に珪素を蒸着し、次いで、４塩化珪素ガスを含有しな
い無酸化ガス中において、蒸着した珪素を母材板中に拡
散させ、かくして、母材板中に珪素を浸透させる。Conventionally, as a method for manufacturing the above-mentioned high-silicon steel sheet, the following method, the so-called silicon bleed treatment method, has been known. That is, a normal steel plate or a low-silicon steel plate containing silicon of 4 vrt, φ or less (hereinafter referred to as the base material plate) is subjected to the CVD method ( A vapor deposition process is performed using a chemical vapor deposition method (chemical vapor deposition method), whereby silicon is vapor-deposited on the surface of the base plate, and then the deposited silicon is deposited into the base plate in an oxidizing gas that does not contain silicon tetrachloride gas. Diffusion, thus penetrating the silicon into the base plate.
しかし、上述した方法によって高珪素鋼板を製造する場
合、母材板に蒸着処理を施す過程で、母材板の板厚が減
少する。従って、最終製品として高珪素鋼板の板厚が目
標板厚より薄くなってしまう。However, when manufacturing a high-silicon steel plate by the above-described method, the thickness of the base material plate decreases during the process of performing vapor deposition treatment on the base material plate. Therefore, the thickness of the high-silicon steel plate as a final product becomes thinner than the target thickness.
母材板中の珪素濃度と板厚減少率との関係を第３図に示
す。第３図の結果は、３ｗｔ％の珪素を含有した、板厚
０．５３ｍｍの低珪素鋼板からなる母材板の表面にＣＶ
Ｄ法により珪素？蒸着したときのものである。FIG. 3 shows the relationship between the silicon concentration in the base material plate and the plate thickness reduction rate. The results shown in Figure 3 show that CV
Silicon by D method? This is what happened when it was vapor deposited.
第３図から明らかなように、母材板中の珪素濃度が高く
なるにつれて板厚減少率も高くなることがわかる。As is clear from FIG. 3, it can be seen that as the silicon concentration in the base material plate increases, the plate thickness reduction rate also increases.
上記板厚が減少する理由は、次の通υである。The reason for the decrease in the plate thickness is as follows.
ＣＶＤ法による蒸着処理は、下記反応式、５Ｆｅ ＋
５ｉＣＪ４−＋ Ｆｅ３Ｓｉ ＋ ２ＦｅＣ４に従って
行なわれる。即ち、母材板中に１個の８１原子が浸入す
ると、２個のＦｅ原子がｐｅＣ１□ガスとなって母材板
中がち出て行く。このようにして、母材板の板厚が減少
するのである。The vapor deposition process using the CVD method uses the following reaction formula, 5Fe +
5iCJ4-+Fe3Si+2FeC4. That is, when one 81 atom enters into the base material plate, two Fe atoms become peC1□ gas and escape from the base material plate. In this way, the thickness of the base plate is reduced.
従って、目標板厚を有する高珪素鋼板を上述した方法に
よって製造するには、蒸着処理による板厚減少分を見込
んだ板厚を有する母材板を使用する必要がある。Therefore, in order to manufacture a high-silicon steel plate having a target thickness by the method described above, it is necessary to use a base material plate having a thickness that takes into account the reduction in thickness due to the vapor deposition process.
しかし、高珪素鋼板の板厚が多種類に及ぶ場・急には（
電気鉄板の板厚は、 ＪＺＳ 規格によって０．３５
１１！および０．５＝に標進化されているバ板厚の異な
る多種類の母材板を用意する必要がある。However, in cases where the high silicon steel plate has many different thicknesses, or suddenly (
The thickness of electric iron plates is 0.35 according to the JZS standard.
11! It is necessary to prepare many types of base material plates with different thicknesses, each of which has a target value of 0.5.
そこで、１種類の板厚を有する母材板から、板厚の異な
る多種類の高珪素鋼板を滲珪処理法てよって各々連続的
に製造することができる鋼板の製造装置の開発が望まれ
ているが、かかる装置はまだ提案されていない。Therefore, it is desired to develop a steel sheet manufacturing apparatus that can continuously manufacture many types of high-silicon steel sheets with different thicknesses from a base material sheet with one type of sheet thickness by using the silicon exfoliation treatment method. However, such a device has not yet been proposed.
従って、この発明の目的は、１種類の板厚を有する母材
板から、板厚の異なる多種類の高珪素鋼板を滲珪処理法
によって各々連続的に製造することができる、鋼板の製
造装置を提供することにある。Therefore, an object of the present invention is to provide a steel sheet manufacturing apparatus that can continuously manufacture many types of high-silicon steel sheets having different thicknesses from a base material sheet having one type of sheet thickness by using a silicon exfoliation treatment method. Our goal is to provide the following.
この発明は、コイル状に巻かれた低珪素鋼板からなる母
材板を繰り出すためのアンコイラ−と、前記アンコイラ
−に続いて設けられた。前記母材板の板厚を、最終製品
としての高珪素鋼板の目標板厚に応じて調験する念めの
圧延機と、前記圧延機に続いて設けられた、前記母材板
を加熱するための加熱帯と、前記加熱帯に続いて設けら
れた、前記加熱帯内で加熱された前記母材板にＣＶ Ｄ
法により蒸着処理を施すための蒸着帯と、前記蒸着帯に
続いて設けられた、前記蒸着帯同で前記母材板の表面に
蒸着された珪素を前記母材板中に拡散させて、高珪素鋼
板を得るための均熱帯と、前記均熱帯に続いて設けられ
た、前記高珪素鋼板を冷却するための冷却帯と、前記冷
却帯に続いて設けられた、前記冷却帯内で冷却された前
記高珪素鋼板を巻き取るためのコイラーとがらナリ、前
記圧延機は、前記アンコイラ−から繰り出された母材板
の板厚が、前記高珪素鋼板の目標板厚に、前記蒸着４暮
滞内で施される蒸着処理によって減少す。The present invention includes an uncoiler for unwinding a base plate made of a low-silicon steel plate wound into a coil, and an uncoiler provided subsequent to the uncoiler. A rolling mill is installed to examine the thickness of the base material plate according to the target thickness of the high-silicon steel plate as a final product, and a rolling mill is provided following the rolling mill to heat the base material plate. and a heating zone provided following the heating zone to apply CVD to the base material plate heated within the heating zone.
A vapor deposition zone for performing vapor deposition treatment by a method, and a vapor deposition zone provided subsequent to the vapor deposition zone, in which the silicon deposited on the surface of the base material plate in the same vapor deposition zone is diffused into the base material plate to form a high-silicon material. A soaking zone for obtaining a steel plate; a cooling zone provided following the soaking zone for cooling the high silicon steel plate; and a cooling zone provided following the cooling zone. A coiler for winding up the high-silicon steel plate and a ratchet, and the rolling mill are configured to adjust the thickness of the base material plate fed out from the uncoiler to the target thickness of the high-silicon steel plate within four days of the vapor deposition. Decreased by the vapor deposition process applied.
る前記母材板の板厚減少分をプラスした板厚と等しくな
るように、前記アンコイラ−から繰り出された前記母材
板を圧延することに特徴を有するものである。The present invention is characterized in that the base material plate fed out from the uncoiler is rolled so that the thickness becomes equal to the thickness of the base material plate plus the thickness reduction of the base material plate.
次に、この発明の、鋼板の製造装置の一芙施態様を図面
を参照しながら説明する６、
第１図は、この発明の、鋼板の製造装置の一実施態様を
示すブロック図である。Next, one embodiment of the steel plate manufacturing apparatus of the present invention will be described with reference to the drawings.6 FIG. 1 is a block diagram showing one embodiment of the steel plate manufacturing apparatus of the present invention.
第１図において、アンコイラ−１は、低珪素鋼板からな
るコイル状に巻かれた母材板２を繰り出す。圧延機３ば
、アンコイラ−１から繰り出された母材板２の板厚が、
最終製品としての高珪素鋼板４の目標板厚に、後述する
蒸着養瞳帯内で施される蒸着処理によって減少する母材
板２の板厚減少分をプラスした板厚と等しくなるように
母材板２を圧延する。In FIG. 1, an uncoiler 1 unwinds a base material plate 2 made of a low-silicon steel plate and wound into a coil shape. The thickness of the base material plate 2 fed out from the rolling mill 3 and uncoiler 1 is
The target thickness of the high-silicon steel plate 4 as a final product is adjusted to be equal to the thickness of the base material plate 2, which is reduced by the vapor deposition treatment performed in the vapor deposition pupil zone, which will be described later. The material plate 2 is rolled.
加熱帯５は、後述する蒸着帯内で母材板２にＣＶＤ法に
より蒸着が行なえるように、母材板２を１】００〜１２
００℃に加熱する。蒸着帯６ば、母材板２の表面に向け
て吹付はノズルからアルゴンガス等のキャリヤガスと共
にＳ ｉ Ｃ４ガスを吹き付け、前述した反応式に従っ
て無酸化雰囲気下で母材板２の表面に珪素を蒸着する。The heating zone 5 has a base material plate 2 of 1]00 to 12 so that vapor deposition can be performed on the base material plate 2 by the CVD method in the vapor deposition zone described later.
Heat to 00°C. In the vapor deposition zone 6, SiC4 gas is sprayed from a nozzle together with a carrier gas such as argon gas toward the surface of the base material plate 2, and silicon is deposited on the surface of the base material plate 2 in a non-oxidizing atmosphere according to the reaction formula described above. Deposit.
均熱帯７は、蒸着帯６によって表面に珪素が蒸着された
母材板２’ｉ１２００〜１４００’（：、に加熱して、
母材板２０表面に蒸着された珪素を無酸化雰囲気下で母
材板２中に拡散させ、例えば、６，５ｗｔ％ の珪素
を母材板２中に浸透させる。冷却帯８ば、均熱帯７によ
って得られた高珪素鋼板４を冷却する。コイラー９は、
冷却帯８によって冷却された高珪素鋼板４をコイル状に
巻き取る。The soaking zone 7 heats the base material plate 2'i1200 to 1400' (:,
The silicon deposited on the surface of the base plate 20 is diffused into the base plate 2 in a non-oxidizing atmosphere, so that, for example, 6.5 wt % of silicon is infiltrated into the base plate 2. The high silicon steel plate 4 obtained in the soaking zone 7 is cooled in the cooling zone 8 . Coiler 9 is
The high-silicon steel plate 4 cooled by the cooling zone 8 is wound into a coil.
上述した、この発明の、鋼板の製造装置の一実施態様に
よれば、第２図に示すように、母材板２として、その板
厚ｔ１が、最終製品としての高珪素鋼板４の板厚ｔ２と
蒸着処理により減少する板厚減少分Δｔ（Δｔは前述し
たように母材板２中の珪素濃度から予め求めることがで
きる）との和（ｔ２＋Δｔ）より厚いものを用意し、そ
して、圧延機３による母材板２の圧下量を、前記板厚ｔ
１が前記板厚（ｔ２＋Δｔ）になる量に設定すれば、１
種類の板厚を有する母材板を用意すれば、板厚の異なる
多種類の高珪素鋼板の各々を連続的に製造することがで
きる。According to one embodiment of the steel plate manufacturing apparatus of the present invention described above, as shown in FIG. 2, the thickness t1 of the base material plate 2 is equal to the thickness of the high silicon steel plate 4 as the final product. A plate thicker than the sum (t2+Δt) of t2 and the thickness reduction Δt (Δt can be determined in advance from the silicon concentration in the base material plate 2 as described above) due to the vapor deposition process is prepared, and then rolled. The amount of reduction of the base material plate 2 by the machine 3 is determined by the plate thickness t.
If 1 is set to the amount that makes the plate thickness (t2+Δt), then 1
By preparing base material plates having different thicknesses, it is possible to continuously manufacture various types of high-silicon steel plates having different thicknesses.
板を連続的に製造することもできる。It is also possible to produce the plates continuously.
以上説明したように、この発明によれば、１種類の板厚
を有する母材板から、板厚の異なる多種類の高珪素鋼板
を参珪処理法によって各々連続的に製造することができ
るといったきわめて有用な効果がもたらされる。As explained above, according to the present invention, it is possible to continuously manufacture many types of high-silicon steel plates having different thicknesses from a base material plate having one type of thickness by using the silica treatment method. A very useful effect is produced.
第１図は、この発明の、鋼板の製造装置の一実施態様を
示すブロック図、第２図は、同実施態様による母材板の
板厚の変化を示す図、第３図は、板厚減少率と珪素濃度
との関係を示すグラフである。図面において、
１・・・アンコイラ−１２・・・母材板、３・・・圧延
機、 ４・・・高珪素鋼板、５・・・加熱帯
、 ６・・・蒸着帯、７・・均熱帯、
８・・・冷却帯、９・・・コイラー。FIG. 1 is a block diagram showing an embodiment of the steel plate manufacturing apparatus of the present invention, FIG. 2 is a diagram showing changes in the thickness of the base plate according to the same embodiment, and FIG. 3 is a block diagram showing the plate thickness. It is a graph showing the relationship between reduction rate and silicon concentration. In the drawings, 1... Uncoiler 12... Base material plate, 3... Rolling machine, 4... High silicon steel plate, 5... Heating zone, 6... Vapor deposition zone, 7... Leveling tropical,
8... Cooling zone, 9... Coiler.
Claims (1)
すためのアンコイラーと、前記アンコイラーに続いて設
けられた、前記母材板の板厚を、最終製品としての高珪
素鋼板の目標板厚に応じて調整するための圧延機と、前
記圧延機に続いて設けられた、前記母材板を加熱するた
めの加熱帯と、前記加熱帯に続いて設けられた、前記加
熱帯内で加熱された前記母材板にＣＶＤ法により蒸着処
理を施すための蒸着帯と、前記蒸着帯に続いて設けられ
た、前記蒸着帯内で前記母材板の表面に蒸着された珪素
を前記母材板中に拡散させて、高珪素鋼板を得るための
均熱帯と、前記均熱帯に続いて設けられた、前記高珪素
鋼板を冷却するための冷却帯と、前記冷却帯に続いて設
けられた、前記冷却帯内で冷却された前記高珪素鋼板を
巻き取るためのコイラーとからなり、前記圧延機は、前
記高珪素鋼板の目標板厚に、前記蒸着帯内で施される蒸
着処理によつて減少する前記母材板の板厚減少分をプラ
スした板厚と等しくなるように、前記アンコイラーから
繰り出される前記母材板を圧延することを特徴とする、
鋼板の製造装置。An uncoiler for unwinding a base material plate made of a low-silicon steel plate wound into a coil, and an uncoiler installed following the uncoiler to determine the thickness of the base material plate as the target thickness of the high-silicon steel plate as the final product. a rolling mill for adjusting according to the rolling mill, a heating zone provided following the rolling mill for heating the base material plate, and a heating zone provided following the heating zone in the heating zone. a vapor deposition zone for performing a vapor deposition treatment on the base material plate by a CVD method; a soaking zone for diffusing into the plate to obtain a high-silicon steel plate; a cooling zone provided following the soaking zone to cool the high-silicon steel plate; and a cooling zone provided following the cooling zone. and a coiler for winding up the high-silicon steel sheet cooled in the cooling zone, and the rolling mill is configured to roll up the high-silicon steel sheet to a target thickness by a vapor deposition process performed in the vapor deposition zone. The base material plate fed out from the uncoiler is rolled so that the thickness is equal to the thickness of the base material plate plus the decrease in the thickness of the base material plate, which decreases as the thickness increases.
Steel sheet manufacturing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16564686A JPS6324015A (en) | 1986-07-16 | 1986-07-16 | Apparatus for producing steel sheet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16564686A JPS6324015A (en) | 1986-07-16 | 1986-07-16 | Apparatus for producing steel sheet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6324015A true JPS6324015A (en) | 1988-02-01 |
| JPH0465900B2 JPH0465900B2 (en) | 1992-10-21 |
Family
ID=15816317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16564686A Granted JPS6324015A (en) | 1986-07-16 | 1986-07-16 | Apparatus for producing steel sheet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6324015A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5342019A (en) * | 1976-09-29 | 1978-04-17 | Hitachi Ltd | Floating type magnetic head |
| JPS61129803A (en) * | 1984-11-29 | 1986-06-17 | Nippon Kokan Kk <Nkk> | Production of high permiability magnetic steel sheet without internal defect |
-
1986
- 1986-07-16 JP JP16564686A patent/JPS6324015A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5342019A (en) * | 1976-09-29 | 1978-04-17 | Hitachi Ltd | Floating type magnetic head |
| JPS61129803A (en) * | 1984-11-29 | 1986-06-17 | Nippon Kokan Kk <Nkk> | Production of high permiability magnetic steel sheet without internal defect |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0465900B2 (en) | 1992-10-21 |
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