JPS63163301A - Optical disk substrate - Google Patents
Optical disk substrateInfo
- Publication number
- JPS63163301A JPS63163301A JP61308042A JP30804286A JPS63163301A JP S63163301 A JPS63163301 A JP S63163301A JP 61308042 A JP61308042 A JP 61308042A JP 30804286 A JP30804286 A JP 30804286A JP S63163301 A JPS63163301 A JP S63163301A
- Authority
- JP
- Japan
- Prior art keywords
- unit
- formula
- resin
- weight
- copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 41
- 239000000758 substrate Substances 0.000 title claims abstract description 15
- 239000000178 monomer Substances 0.000 claims abstract description 18
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 7
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims abstract description 6
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 claims abstract description 3
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000005462 imide group Chemical group 0.000 claims abstract 2
- -1 aromatic vinyl compound Chemical group 0.000 claims description 22
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 7
- 235000021122 unsaturated fatty acids Nutrition 0.000 claims description 7
- 150000004670 unsaturated fatty acids Chemical class 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- 229920006026 co-polymeric resin Polymers 0.000 abstract description 15
- 235000014113 dietary fatty acids Nutrition 0.000 abstract 2
- 229930195729 fatty acid Natural products 0.000 abstract 2
- 239000000194 fatty acid Substances 0.000 abstract 2
- 150000004665 fatty acids Chemical class 0.000 abstract 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 2
- 125000004018 acid anhydride group Chemical group 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 37
- 239000011347 resin Substances 0.000 description 37
- 229920001577 copolymer Polymers 0.000 description 22
- 229910052751 metal Inorganic materials 0.000 description 19
- 239000002184 metal Substances 0.000 description 19
- 238000000465 moulding Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 13
- 238000006116 polymerization reaction Methods 0.000 description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 11
- 238000001746 injection moulding Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 230000000704 physical effect Effects 0.000 description 9
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 150000003949 imides Chemical group 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000003381 stabilizer Substances 0.000 description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 description 4
- 150000008064 anhydrides Chemical group 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000000748 compression moulding Methods 0.000 description 4
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- ZQMIGQNCOMNODD-UHFFFAOYSA-N diacetyl peroxide Chemical compound CC(=O)OOC(C)=O ZQMIGQNCOMNODD-UHFFFAOYSA-N 0.000 description 4
- 239000000428 dust Substances 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 125000005395 methacrylic acid group Chemical group 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 238000010557 suspension polymerization reaction Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 2
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000012662 bulk polymerization Methods 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000012933 diacyl peroxide Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- RNVCVTLRINQCPJ-UHFFFAOYSA-N o-toluidine Chemical compound CC1=CC=CC=C1N RNVCVTLRINQCPJ-UHFFFAOYSA-N 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical class C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- QUBBAXISAHIDNM-UHFFFAOYSA-N 1-ethyl-2,3-dimethylbenzene Chemical group CCC1=CC=CC(C)=C1C QUBBAXISAHIDNM-UHFFFAOYSA-N 0.000 description 1
- HYFLWBNQFMXCPA-UHFFFAOYSA-N 1-ethyl-2-methylbenzene Chemical compound CCC1=CC=CC=C1C HYFLWBNQFMXCPA-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- XKBHBVFIWWDGQX-UHFFFAOYSA-N 2-bromo-3,3,4,4,5,5,5-heptafluoropent-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(Br)=C XKBHBVFIWWDGQX-UHFFFAOYSA-N 0.000 description 1
- JBIJLHTVPXGSAM-UHFFFAOYSA-N 2-naphthylamine Chemical compound C1=CC=CC2=CC(N)=CC=C21 JBIJLHTVPXGSAM-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- QSNSCYSYFYORTR-UHFFFAOYSA-N 4-chloroaniline Chemical compound NC1=CC=C(Cl)C=C1 QSNSCYSYFYORTR-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methyl-N-phenylamine Natural products CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004419 Panlite Substances 0.000 description 1
- BHHGXPLMPWCGHP-UHFFFAOYSA-N Phenethylamine Chemical compound NCCC1=CC=CC=C1 BHHGXPLMPWCGHP-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000002019 disulfides Chemical class 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002443 hydroxylamines Chemical class 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000002356 laser light scattering Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- UDGSVBYJWHOHNN-UHFFFAOYSA-N n',n'-diethylethane-1,2-diamine Chemical compound CCN(CC)CCN UDGSVBYJWHOHNN-UHFFFAOYSA-N 0.000 description 1
- SFMJNHNUOVADRW-UHFFFAOYSA-N n-[5-[9-[4-(methanesulfonamido)phenyl]-2-oxobenzo[h][1,6]naphthyridin-1-yl]-2-methylphenyl]prop-2-enamide Chemical group C1=C(NC(=O)C=C)C(C)=CC=C1N1C(=O)C=CC2=C1C1=CC(C=3C=CC(NS(C)(=O)=O)=CC=3)=CC=C1N=C2 SFMJNHNUOVADRW-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229940100684 pentylamine Drugs 0.000 description 1
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、いわゆる光学式デジタル・オーディオ・ディ
スク、ビデオディスク、書き込み即再生が可能なディス
ク等のような光デイスク基板に関し、更に詳しくは、近
年、民生機器としてその便益性より世界的に注目されて
いるレーザー光線を。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an optical disc substrate such as a so-called optical digital audio disc, a video disc, a write-ready disc, etc., and more specifically, In recent years, laser beams have been attracting attention worldwide due to their usefulness as consumer devices.
利用し、情報をデジ乞ル化する高密度情報記録・再生装
置の高密度情報記録媒体に使用するに最適な光デイスク
基板に係るものである。The present invention relates to an optical disk substrate that is most suitable for use in a high-density information recording medium of a high-density information recording/reproducing device that digitalizes information.
[従来の技術及びその問題点]
光ディスクの一例としてのデジタル・オーディオ・ディ
スク (DAD)は、音楽の信号を細かく分割し、単純
に数値化し、「0」とrlJの2進法のパターンに置き
かえ、レーザー光線反射可能な金属面の凹凸として記録
し、次にパターンをレーザー光線で拾いあげて、更にレ
ーザー光線の2進法の信号を電気信号に変換し、更に音
として再生するものである。このような、レーザー光線
反射n(能な金属面の凹凸を有する円盤は、一般的には
片面に凹凸のついた透明な樹脂円盤を成形し、これの凹
凸面に金属蒸着などによって金属膜を形成することによ
り得られるものである。[Prior art and its problems] A digital audio disk (DAD), which is an example of an optical disk, divides the music signal into small pieces, simply converts them into numerical values, and replaces them with a binary pattern of "0" and rlJ. The pattern is recorded as irregularities on a metal surface that can reflect a laser beam, then the pattern is picked up by a laser beam, and the binary signal of the laser beam is converted into an electrical signal, which is then reproduced as sound. Discs with an uneven metal surface that can reflect laser beams are generally made by molding a transparent resin disk with an uneven surface on one side, and then forming a metal film on the uneven surface by metal vapor deposition. It is obtained by doing.
画像に関する信号をデジタルの凹凸パターンとして記録
するようにすれば、ビデオディスク(VD)となる。ま
た、コンピューターのプログラムやデータを凹凸パター
ンに記録するようにすればプログラムやデータの記録板
としても用いるこ、とができ、殊にこの用途に書き込み
即再生が可能なディスク(Direct Read A
fter Write :これを略してDRAWと呼
ばれている)が注目されるようになってきている。更に
消去と書込みが可能な書換型光ディスク(Eragab
le Direct read afterwrite
、 E−DRAW)も各社開発中である。If a signal related to an image is recorded as a digital uneven pattern, it becomes a video disc (VD). Furthermore, by recording computer programs and data in a concave-convex pattern, it can be used as a recording board for programs and data.
After Write (abbreviated as DRAW) has been attracting attention. In addition, rewritable optical discs that can be erased and written to (Eragab
le Direct read afterwrite
, E-DRAW) are also under development by various companies.
上記の光ディスクのうち、DRAWには情報書き込みの
ための記録層として、レーザー光等を照射することによ
り■穴を形成するもの、■層間の気泡形成を利用するも
の、■相変化を利用するもの等の種々のタイプに分類さ
れる種々の物質からなる膜が種々の層構成で使用されて
いる。そして、■のタイプの記録層はE−DRAW用と
して使用し得るものである。Among the above-mentioned optical discs, DRAW has a recording layer for writing information: one that forms holes by irradiating laser light, etc., one that uses bubble formation between layers, and one that uses phase change. Membranes made of various materials classified into various types, such as, are used in various layer configurations. The recording layer of type (2) can be used for E-DRAW.
しかして、上記の如き光ディスクは、レーザー光線を用
い、非常に小さい光の光路差、位相差に基〈干渉光を検
出再生するものであるから、光学的特性としては、
i)樹脂層のレーザー光線透過率が大きいこと
if )樹脂層の高分子の配向が小さく、複屈折が小さ
いこと
iii )屈折率のバラツキが小さいことiv)ゴミ、
混濁等がないこと
等が要求され、物理的特性としては
■)熱変形温度が高いこと
vi )金属蒸着性の良いこと
vi)成形性に優れ、細かい凹凸もシャープに形成しう
ること
た)記録膜(感剤)との密着性
等が要求され、寸法精度、安定性としては、ix )肉
厚分布が小さいこと
X)ソリが小さいこと
等が要求される。However, since the above-mentioned optical disc uses a laser beam to detect and reproduce interference light based on a very small optical path difference and phase difference, its optical characteristics include: i) laser beam transmission through the resin layer; If) the orientation of the polymer in the resin layer is small and the birefringence is small iii) the variation in the refractive index is small iv) dust,
It is required that there is no turbidity, etc., and the physical properties are ■) High heat distortion temperature vi) Good metal deposition properties vi) Excellent formability and the ability to form fine irregularities sharply) Records Adhesion to the film (sensitizer) is required, and dimensional accuracy and stability are required such as ix) small thickness distribution and X) small warpage.
また、これら以外に、重合溶媒等の不純物を含有しない
こと、加水分解しないこと、といった特性が要求される
。In addition to these properties, properties such as not containing impurities such as polymerization solvents and not being hydrolyzed are also required.
ポリメチルメタクリレート樹脂を用いたのでは吸水率が
大きく、そのために吸水等による経時変化により成形し
た板状体はソリを生じ致命的である。これを改善するた
めに、ポリメチルメタクリレート樹脂の表面に塩化ビニ
リデン系樹脂のようにバリアー性に優れた樹脂を積層す
る試みもなされている。しかし、積層するにはそれだけ
煩雑な工程が増える欠点がある。そこで、上記(i)〜
(×)の要求項目を満足し、かつ、一度に成形できる樹
脂が望まれていた。When polymethyl methacrylate resin is used, its water absorption rate is high, and as a result, the molded plate-like body warps due to changes over time due to water absorption, which is fatal. In order to improve this, attempts have been made to laminate a resin with excellent barrier properties, such as a vinylidene chloride resin, on the surface of the polymethyl methacrylate resin. However, lamination has the disadvantage that the process becomes more complicated. Therefore, the above (i)
There was a desire for a resin that satisfies the requirements (x) and can be molded at once.
光ディスクに関する試みとして、メタクリル酸メチル/
スチレン: 60/40 (重量比)の共重合体樹脂(
特願昭57−33446号、特願昭57−162135
号)やメタクリル酸メチル/スチレン= 30/70
(ffiffi比)の共重合体樹脂(特開昭57−16
2135号)を光ディスクに用いる例が知られている。As an attempt to develop optical discs, methyl methacrylate/
Styrene: 60/40 (weight ratio) copolymer resin (
Patent application No. 57-33446, Patent application No. 57-162135
) and methyl methacrylate/styrene = 30/70
(ffiffi ratio) copolymer resin (JP-A-57-16
No. 2135) is used for optical discs.
一方、本発明者らは、上記i)〜ix )の如き要求性
能を基本的に満足する樹脂として、メタクリル酸エステ
ル4i量体とモノアルケニル芳香族単量体とを共重合し
て得られる共重合体を特徴とする特定の樹脂を見い出し
た(特開昭58−88843)が、この共重合体を主体
とする樹脂は、DAD(直径120mm 、厚み1.2
mm )では規格はほぼ満足する結果が得られるものの
、DRAW (直径300mm+ 、厚み1.2mm
)では、規格値を満足するのが困難になってきた。すな
わち、直径が120mmから30hmになり、直径と厚
さの比(L/T)が100から250に変化したため、
射出成形時に樹脂が中央部から周辺部に流れる距離が大
幅に増大し、流動に伴う分子配向がかかり易く、複屈折
の値をDRAW用として要求される規格値、即ち40n
m以下、更にE−DRAWの要求される規格値20nm
以下にするのが困難となり、成形性が難しくなり成形不
良率が上昇してくるという問題が生じるに至った。On the other hand, the present inventors have developed a copolymer obtained by copolymerizing a methacrylic acid ester 4i-mer and a monoalkenyl aromatic monomer as a resin that basically satisfies the required performances as described in i) to ix) above. A specific resin characterized by a polymer was discovered (Japanese Unexamined Patent Publication No. 58-88843), but the resin mainly composed of this copolymer was DAD (diameter 120 mm, thickness 1.2 mm).
mm), the results almost meet the standards, but DRAW (diameter 300mm+, thickness 1.2mm)
), it has become difficult to meet the standard values. In other words, the diameter changed from 120 mm to 30 hm, and the ratio of diameter to thickness (L/T) changed from 100 to 250.
During injection molding, the distance that the resin flows from the center to the periphery increases significantly, and the flow tends to cause molecular orientation, which lowers the birefringence value to the standard value required for DRAW, i.e. 40n.
m or less, and the standard value required for E-DRAW is 20 nm.
It became difficult to achieve the following, resulting in problems such as difficulty in moldability and an increase in molding defect rate.
更に本発明者らはメタクリル酸メチル単量体40〜70
重量部とメタクリル酸の一価の飽和脂肪族アルコール0
3〜C6とのエステル単量体5〜20重量部とモノアル
ケニル芳香族単量体25〜40重量部で共重合した共重
合体を主体として、25°Cに8ける該共重合体のlθ
%メチルエチルケトン溶液粘度3〜10cpsの範囲に
あり、かつ複屈折が1100n以下であることを特徴と
する樹脂を見い出した(特願昭57−217026 >
。しがしながらこの共重合体を主体とする樹脂は、光デ
イスク用の基材として使用する場合に、基材にスパッタ
リング等により記録層や反射層を形成させる場合に要求
される耐熱性に問題があり、また、温暖雰囲気下で立て
かけて長期保存する場合にクリープを発生する等の問題
があった。Furthermore, the present inventors have found that methyl methacrylate monomer 40-70
Part by weight and monohydric saturated aliphatic alcohol of methacrylic acid 0
The copolymer is mainly composed of 5 to 20 parts by weight of ester monomer with 3 to C6 and 25 to 40 parts by weight of monoalkenyl aromatic monomer, and the lθ of the copolymer at 8 at 25°C
% methyl ethyl ketone solution viscosity in the range of 3 to 10 cps and a birefringence of 1100 nm or less (Japanese Patent Application No. 57-217026 >
. However, when resins based on this copolymer are used as base materials for optical disks, there are problems with the heat resistance required when forming recording layers and reflective layers on the base materials by sputtering, etc. In addition, there were problems such as creep occurring when standing up in a warm atmosphere for long-term storage.
一方、上記の系統の他にポリカーボネートも光デイスク
用基板に用いられている。しかしながら、ポリカーボネ
ートは不純物として、C「や残留重合溶剤として二塩化
メチレンを含有し、また、紗面的に加水分解し、その結
果記録層(感剤)との密着性が低下したり、記録層や反
射層に孔蝕を発生させたりするという問題があった。On the other hand, in addition to the above-mentioned types, polycarbonate is also used for optical disk substrates. However, polycarbonate contains impurities such as C and methylene dichloride as a residual polymerization solvent, and it also hydrolyzes on the surface, resulting in decreased adhesion to the recording layer (sensitive material) and There have been problems in that it causes pitting and corrosion in the reflective layer.
そこで、本発明者らはDRAW用基材及びE−DRAW
用基材として満足する樹脂を得るために鋭意検討の結果
本発明に到達した。Therefore, the present inventors developed a DRAW base material and an E-DRAW base material.
In order to obtain a resin that satisfies the needs of the substrate, the present invention was achieved as a result of extensive research.
[間届点を解決するための手段及び作用]本発明によれ
ば、(A)メタクリル醜メチル単位と、(B)芳香族ビ
ニル化合物単位と、(C)不飽和脂肪酸単量体単位と、
(D)式
(式中R1,R2は水素原子又はメチル基である。)で
示される六員環酸無水物単位及び(E)式(式中R+
* R2は水素原子又はメチル基、R3は水素原子、ア
ルキル基、シクロアルキル基又はアリール基である。)
で示される六員環イミド単位の5種の繰り返し単位がラ
ンダムに配列された分子構造を有し、かつ(A)、 (
B)、 CG)、 (D)及び(E)の各単位の含有量
をそれぞれa、b、c、d及び0重量%としたとき。[Means and effects for solving the problem] According to the present invention, (A) a methacrylic ugly methyl unit, (B) an aromatic vinyl compound unit, (C) an unsaturated fatty acid monomer unit,
A six-membered cyclic acid anhydride unit represented by the formula (D) (in which R1 and R2 are a hydrogen atom or a methyl group) and (E) (in the formula R+
*R2 is a hydrogen atom or a methyl group, and R3 is a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group. ) has a molecular structure in which five types of repeating units of six-membered ring imide units are randomly arranged, and (A), (
When the content of each unit of B), CG), (D) and (E) is a, b, c, d and 0% by weight, respectively.
a + b + c + d −1−e = 1009
5≧a≧40゜
56≧b≧1゜
96≧a十b≧50゜
lO≧C≧1゜
50≧d+e≧3
の数値条件を満たす共重合体樹脂を主成分とじてなる光
デイスク基板が提供される。a + b + c + d -1-e = 1009
5≧a≧40゜56≧b≧1゜96≧a10b≧50゜lO≧C≧1゜50≧d+e≧3 The optical disk substrate is mainly composed of a copolymer resin that satisfies the following numerical conditions. provided.
メタクリル酸メチル単量体の含有量aは、95≧a≧4
0とされる。aが40重量%未満のときは、複屈折が大
きくなり好ましくない、上限は他成分の必要性から95
重量%以下に限定される。The content a of methyl methacrylate monomer is 95≧a≧4
It is set to 0. When a is less than 40% by weight, birefringence increases, which is undesirable, and the upper limit is 95% due to the necessity of other components.
Limited to % by weight or less.
本発明において、芳香族ビニル化合物単量体としては、
スチレン、α−メチルスチレン、P−メチルスチレンま
たはそれの混合物が挙げられる。In the present invention, the aromatic vinyl compound monomer is
Mention may be made of styrene, alpha-methylstyrene, p-methylstyrene or mixtures thereof.
芳香族ビニル化合物単位は共重合体樹脂の熱変形温度の
上昇、飽和吸水率の低下に寄与する。。The aromatic vinyl compound unit contributes to increasing the heat distortion temperature and decreasing the saturated water absorption rate of the copolymer resin. .
よってこの単位の含有率すは56≧b≧1とされ、1重
量%未満であるよこの単位の寄与がなくなり、56重量
%を越えると共重合体樹脂の複屈折を増大せしめて好ま
しくない。Therefore, the content of this unit is 56≧b≧1, and the contribution of the lateral units, which are less than 1% by weight, disappears, and if it exceeds 56% by weight, it increases the birefringence of the copolymer resin, which is not preferable.
不飽和脂肪酸単量体としてはアクリル酸、メタクリル酸
またはそれの混合物が挙げられる。Unsaturated fatty acid monomers include acrylic acid, methacrylic acid or mixtures thereof.
一般式:
(R1,R2:水素原子又はメチル基)で示される六員
環酸無水物単位及び一般式(式中のR1及びR2は水素
原子又はメチル基、R3は水素原子、アルキル基、シク
ロアルキル基又はアリール基である。)
で示される六員環イミド単位の成る比率の共重合体樹脂
の熱変形温度上昇に寄与する。六員環酸無水物単位の含
有量dと六員環イミド単位の含有量eの合計量は、50
≧d+e≧3の範囲とされる。General formula: (R1, R2: hydrogen atom or methyl group) six-membered cyclic acid anhydride unit and general formula (in the formula, R1 and R2 are hydrogen atoms or methyl groups, R3 is hydrogen atom, alkyl group, cyclo (alkyl group or aryl group)) contributes to increasing the heat distortion temperature of the copolymer resin. The total amount of the content d of six-membered cyclic acid anhydride units and the content e of six-membered cyclic imide units is 50
The range is ≧d+e≧3.
d+eが3重量%未満では熱変形温度が100°C未満
になり好ましくない。好ましい範囲は10〜22.5重
量部が望ましい。d+eが50重量%を越えると成形加
工が困難になり好ましくない。If d+e is less than 3% by weight, the heat distortion temperature will be less than 100°C, which is not preferable. The preferred range is 10 to 22.5 parts by weight. If d+e exceeds 50% by weight, molding becomes difficult, which is not preferable.
不飽和脂肪酸単量体単位の含有量Cは、IO≧C≧1の
範囲とされる。不飽和脂肪酸単量体単位の仕込量の全量
を六員環無水物単位に変換させることは不可能であり、
必然的に1重量%以上になってしまう。また、Cが10
重量%を越えると、吸水率が大きくなり好ましくない。The content C of unsaturated fatty acid monomer units is in the range of IO≧C≧1. It is impossible to convert the entire amount of unsaturated fatty acid monomer units into six-membered ring anhydride units,
Inevitably, the content will be 1% by weight or more. Also, C is 10
If it exceeds % by weight, the water absorption rate increases, which is not preferable.
メタクリル酸メチル単位の含有量aと芳香族ビニル化合
物単位の含有lbの合計量a+bは。The total amount a+b of the content a of methyl methacrylate units and the content lb of aromatic vinyl compound units is.
96≧a+b≧50の範囲とされる。a+bが50重量
%以上であれば、複屈折がDRAWまたはE−DRAW
規格の40または20nI11以下を達成することがで
きる。The range is 96≧a+b≧50. If a+b is 50% by weight or more, the birefringence is DRAW or E-DRAW.
It is possible to achieve the standard of 40 or 20nI11 or less.
a+bの上限は、他の成分の必要性から96重量%以下
に限定される。The upper limit of a+b is limited to 96% by weight or less due to the necessity of other components.
本発明の共重合体は、温度25°Cのクロロホルムに該
共重合体0.150gを含有させた溶液0.5dI!の
還元粘度ηsp/Cかつ0.1〜2 g/dj)である
のが好ましい。ηsp/Cが0.1g/dI!未満の場
合は機械的にもろくなり、2 g/dlを越えると成形
性、量産性、転写性が悪くなり工業的ではない。The copolymer of the present invention is prepared by preparing a solution containing 0.150 g of the copolymer in chloroform at a temperature of 25°C at 0.5 dI! It is preferable that the reduced viscosity is ηsp/C and 0.1 to 2 g/dj). ηsp/C is 0.1g/dI! If it is less than 2 g/dl, it will become mechanically brittle, and if it exceeds 2 g/dl, moldability, mass productivity, and transferability will deteriorate, making it unsuitable for industrial use.
本発明の共重合体を得るには、懸濁重合、塊状重合、溶
液重合等公知の重合法により上記メタクリル酸エステル
と七ノアルケニル芳香族単量体とを共重合させることに
より得られる。The copolymer of the present invention can be obtained by copolymerizing the above methacrylic acid ester and a heptanoalkenyl aromatic monomer using known polymerization methods such as suspension polymerization, bulk polymerization, and solution polymerization.
塊状重合により重合させる場合には、熱的単量体状′M
離ジラジカル電離性放射線照射により重合を開始させる
ことができるが全ての遊離ラジカル生成性触媒によって
重合を開始することができる。具体的には、アセチルパ
ーオキサイド、ラウロイルパーオキサイド、ベンゾイル
パーオキサイドなどのジアシルパーオキサイド、クメン
ヒドロペルオキシドのようなヒドロペルオキシド類、ジ
ーtert−ブチルペルオキシドのようなアルキルペル
オキシド、t−ブチルパーオキシアセテート、t−ブチ
ルパーオキシラウレート、t−ブチルパーオキシベンゾ
エートのようなパーオキシエステル類、2,2′−7ゾ
ビスイソブチロニトリルのようなアゾ化合物等が例示さ
れる。この場合、高変換度における粘度を制御すること
を目的にトルエン、キシレン、エチルベンゼン、エチル
トルエン、エチルキシレン、ジエチルベンゼン、ベンゼ
ン等のような希釈剤を単量体の2〜20%量加えること
ができる。When polymerizing by bulk polymerization, thermal monomeric 'M
Although the polymerization can be initiated by irradiation with free diradical ionizing radiation, it can be initiated by any free radical-generating catalyst. Specifically, diacyl peroxides such as acetyl peroxide, lauroyl peroxide, and benzoyl peroxide, hydroperoxides such as cumene hydroperoxide, alkyl peroxides such as di-tert-butyl peroxide, t-butyl peroxyacetate, Examples include peroxy esters such as t-butyl peroxylaurate and t-butyl peroxybenzoate, and azo compounds such as 2,2'-7zobisisobutyronitrile. In this case, diluents such as toluene, xylene, ethylbenzene, ethyltoluene, ethylxylene, diethylbenzene, benzene, etc. can be added in an amount of 2 to 20% of the monomer in order to control the viscosity at high conversions. .
また、懸濁重合により重合させる場合には、重合開始剤
としては、媒体(主として水)に難溶で単量体に易溶性
の重合開始剤を用いる。このような重合開始剤としては
、過酸化アセチル、過酸化ラウロイル、過酸化ベンゾイ
ルなどの過酸化ジアシル、2,2′−7ゾビスイソプチ
ロニトリルなどが用いられる。単量体、を水の中へかき
まぜて分散させるのに分散の安定剤、補助安定剤を添加
してもよい。このような安定剤を用いる場合は水溶性高
分子が用いられる。通常の懸濁重合の分散安定剤として
用いられる難溶性の微粉末状の無機化合物は用いること
ができない0本発明の樹脂は高度の透明性が要求される
からである。Further, in the case of polymerization by suspension polymerization, a polymerization initiator that is sparingly soluble in the medium (mainly water) and easily soluble in the monomer is used. Examples of such polymerization initiators include diacyl peroxides such as acetyl peroxide, lauroyl peroxide, and benzoyl peroxide, and 2,2'-7zobisisobutyronitrile. A dispersion stabilizer or co-stabilizer may be added to stir and disperse the monomer in water. When such a stabilizer is used, a water-soluble polymer is used. A poorly soluble fine powder inorganic compound used as a dispersion stabilizer in ordinary suspension polymerization cannot be used because the resin of the present invention is required to have a high degree of transparency.
また、上記各種重合法においては、メルカプタン、ジス
ルフィド、ハロゲン化物、テルペンのような分子:+1
調節剤、又更に安定剤等を混入することが往々にして望
ましい。In addition, in the above various polymerization methods, molecules such as mercaptans, disulfides, halides, and terpenes: +1
It is often desirable to incorporate modifiers or even stabilizers and the like.
また、本発明における中間生成物としての六員環酸無水
物単位を有する共重合体は、例えばモノアルケニル単量
体とメタクリル酸メチルとメタクリル酸又はアクリル酸
とを適当な溶媒例えばエチルベンゼン中に溶解し、重合
開始剤として1,1−ジーtert−ブチルパーオキシ
シクロヘキサンを用い、約130’Oの温度において反
応率50%程度まで重合させ、次いでこの反応混合物を
1〜10Torrの減圧下で260’O程度の高温にお
いて5〜60分間保持して溶媒及び未反応単量体を除去
するとともに、ポリマー鎖中の不飽和脂肪酸の分子内縮
合による環化を起させ、六員環無水物単位を形成させる
ことにより得られる。Further, the copolymer having six-membered cyclic acid anhydride units as an intermediate product in the present invention can be obtained by dissolving, for example, a monoalkenyl monomer, methyl methacrylate, and methacrylic acid or acrylic acid in a suitable solvent such as ethylbenzene. Then, using 1,1-di-tert-butylperoxycyclohexane as a polymerization initiator, polymerization was carried out at a temperature of about 130'O to a reaction rate of about 50%, and then this reaction mixture was heated at 260' under a reduced pressure of 1 to 10 Torr. The solvent and unreacted monomers are removed by holding at a high temperature of about 200 yen for 5 to 60 minutes, and the unsaturated fatty acids in the polymer chain are cyclized by intramolecular condensation to form six-membered ring anhydride units. It can be obtained by
この六員環酸無水物を全量又は一部をイミド化すること
により、一部は
(式中のR1及びR2は水素原子又はメチル基、R3は
水素原子、アルキル基、シクロアルキル基又はアリール
基である。)
のような六員環イミド単位及び未反応の六員環イミド単
位の共重合体樹脂になり、耐熱性が向上する。この六員
環イミド単位と六員環酸無水物単位の混在した共重合体
樹脂にするためには、六員環酸無水物単位を六員環イミ
ド単位に変性するために、アンモニア、脂肪族第一級ア
ミン、芳香族アミンなどが用いられる。アンモニアとし
ては、液状アンモニア、アンモニアガス、アンモニア水
を使用することができ、脂肪族第一級アミンとしては、
例えばメチルアミン、エチルアミン、n−プロピルアミ
ン、1so−プロピルアミン、ブチルアミン、ペンチル
アミン、ヘキシルアミン、シクロヘキシルアミン、アリ
ルアミンなどが挙げられ、これらは水溶液としても用い
ることができる。また芳香族アミンとしては、例えばア
ニリン、o−トルイジン、p−トルイジン、0−クロロ
アニリン、p−クロロアニリン、 2,4.6−)リク
ロロアニリン、α−ナフチルアミン、β−ナフチルアミ
ンなどが挙げられ、またベンジルアミン、OL−、D−
又はL−α−フェネチルアミン、β−フェネチルアミン
なども用いることができる。さらに、2−ジエチルアミ
ノエチルアミンのようなメタアミン類、インプロパツー
ルアミンのようなヒドロキシルアミン類モ使用できる。By imidizing all or part of this six-membered cyclic acid anhydride, some of the six-membered cyclic acid anhydrides are It becomes a copolymer resin of six-membered ring imide units and unreacted six-membered ring imide units, such as ), and has improved heat resistance. In order to make a copolymer resin containing a mixture of six-membered cyclic imide units and six-membered cyclic acid anhydride units, ammonia, aliphatic Primary amines, aromatic amines, etc. are used. As ammonia, liquid ammonia, ammonia gas, aqueous ammonia can be used, and as aliphatic primary amines,
Examples include methylamine, ethylamine, n-propylamine, 1so-propylamine, butylamine, pentylamine, hexylamine, cyclohexylamine, and allylamine, which can also be used as an aqueous solution. Examples of aromatic amines include aniline, o-toluidine, p-toluidine, 0-chloroaniline, p-chloroaniline, 2,4.6-)lichloroaniline, α-naphthylamine, β-naphthylamine, and the like. , also benzylamine, OL-, D-
Alternatively, L-α-phenethylamine, β-phenethylamine, etc. can also be used. Furthermore, metaamines such as 2-diethylaminoethylamine and hydroxylamines such as impropaturamine can also be used.
本発明の共重合体の前駆体である六員環無水物単位を含
有する共重合体の製造については、通常のラジカル共重
合法がすべて使用されうるが、特に連続液状重合法又は
連続溶液重合法が望ましく、ざらに該共重合体の組成を
できるだけ均一にする点で、重合反応器は完全混合型が
好ましい。For the production of copolymers containing six-membered anhydride units, which are the precursors of the copolymers of the present invention, all conventional radical copolymerization methods can be used, but especially continuous liquid polymerization methods or continuous solution polymerization methods can be used. The polymerization reactor is preferably of a complete mixing type in order to make the composition of the copolymer as uniform as possible.
連続溶液重合の場合、溶剤としては、例えばトルエン、
エチルベンゼンなどの芳香族炭化水素、ア七トン、メチ
ルエチルケトン、メチルイソブチルケトン、シクロヘキ
サノンなどのケトン類、炭素数1〜6のアルキル又はシ
クロアルキルアルコール類、テトラヒドロフランやジオ
キサンなどのエーテル類、エチレングリコールモノアル
キルエーテル類などが用いられる。In the case of continuous solution polymerization, examples of solvents include toluene,
Aromatic hydrocarbons such as ethylbenzene, ketones such as acetate, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone, alkyl or cycloalkyl alcohols having 1 to 6 carbon atoms, ethers such as tetrahydrofuran and dioxane, ethylene glycol monoalkyl ether etc. are used.
次に、六員環酸無水物単位を六員環イミド単位に変性す
る方法としては、種々の方法が用いられる。例えばオー
トクレーブ中に反応前駆体として、メタクリル酸メチル
単位29〜95重量%、芳香族ビニル化合′物単位1〜
67重量%、アクリル酸又はメタクリル酩単位1、〜l
O重量%及び六員環無水物単位3〜50重量%から成る
共重合体を仕込み、次いで溶液状態でアンモニア水を注
入して反応させ、さらに250℃の温度で2時間処理し
てイミド化する方法、あるいは押出機を用い、前駆体で
ある共重合体を連続して溶融したのち、アンモニア水、
シクロヘキシルアミン、アニリンなどを連続して注入し
、その後減圧室でイミドに環化させる方法などが用いら
れる。Next, various methods can be used to modify the six-membered cyclic acid anhydride unit into the six-membered cyclic imide unit. For example, in an autoclave, as reaction precursors, 29 to 95% by weight of methyl methacrylate units, 1 to 10% of aromatic vinyl compound units,
67% by weight, 1 to 1 acrylic acid or methacrylic acid unit
A copolymer consisting of 3% to 50% by weight of O and 6-membered ring anhydride units is charged, then aqueous ammonia is injected in a solution state to react, and further treated at a temperature of 250°C for 2 hours to imidize. After melting the precursor copolymer continuously using a method or an extruder, aqueous ammonia,
A method is used in which cyclohexylamine, aniline, etc. are continuously injected and then cyclized to imide in a vacuum chamber.
このようにして得られた本発明の共重合体は、分子“間
で架橋するといった不都合(ゲル化)は全くなく、有機
溶剤、特にジメチルホルムアミドに+i(溶であり、か
つ完全に熱可塑性である。The copolymer of the present invention thus obtained has no disadvantages such as crosslinking between molecules (gelation), is soluble in organic solvents, especially dimethylformamide, and is completely thermoplastic. be.
本発明の変性共重合体は、透明で加熱変形温度が110
’(!を超えるものであり、その上窒素気流中で熱天秤
による加熱減量測定において、to’c/分の)1温時
、1重量%減少が300″C以上といった優れた熱安定
性を示し、さらに機械的強度や耐油性はポリメタクリル
酸メチルに匹敵するなど極めて優れた特徴を有している
。The modified copolymer of the present invention is transparent and has a heat deformation temperature of 110
In addition, it has excellent thermal stability, with a loss of 1% by weight exceeding 300"C at 1 temperature (to'c/min) in heating loss measurements using a thermobalance in a nitrogen stream. Furthermore, it has extremely excellent characteristics such as mechanical strength and oil resistance comparable to polymethyl methacrylate.
複屈折が大であると光学式高密度情報再生装置において
該光ディスクに記録された情報を再生する場合にレーザ
ー光線の反射効率が低下し、再生度が悪くなり好ましく
ない。また該装置の各種制約上該光ディスクの樹脂部分
の複屈折が40mm又は20111以下が望ましい。If the birefringence is large, the reflection efficiency of the laser beam will decrease when information recorded on the optical disk is reproduced in an optical high-density information reproducing device, and the degree of reproduction will deteriorate, which is not preferable. Furthermore, due to various limitations of the apparatus, it is desirable that the birefringence of the resin portion of the optical disk is 40 mm or less than 20111.
調h1折は各種要因により決まるものであるがその要因
およびその要因の複屈折におよぼす影響はいまだ明確に
なっていない。本発明者等は各種検討をかさねた結果、
樹脂の種類および樹脂の組成分子量、等を検討した結果
、複屈折との関係を明確にし、さらに前述の各種要求性
能を満足し、かつ比較的安価な樹脂即ち工業的に最適な
樹脂を見出したものである。Although the h1 refraction is determined by various factors, the factors and their effects on birefringence have not yet been clarified. As a result of various studies, the inventors of the present invention found that
As a result of examining the type of resin and the molecular weight of the resin composition, we clarified the relationship with birefringence, and also found a resin that satisfies the various performance requirements mentioned above and is relatively inexpensive, i.e., an industrially optimal resin. It is something.
上記樹脂の基本構成以外にも実際の光ディスクを作る場
合、該光ディスクの製造法(成形法)が複屈折におよぼ
す影響も無視しえない。成形法としては各種考えられる
がその生産性1寸法精度等より射出成形が一番すぐれて
いると考えられる。In addition to the basic composition of the resin described above, when producing an actual optical disc, the influence of the manufacturing method (molding method) of the optical disc on birefringence cannot be ignored. Although various molding methods are possible, injection molding is considered to be the best in terms of productivity, dimensional accuracy, etc.
射出成形はその成形原理より考えて樹脂の流れ方向と流
れに直角方向により各種物性に差異を生じ光学的性質に
も差異を生じる。即ち樹脂の流れ方向の屈折率(n+)
と流れに直角方向(n2)の屈折率に差がありその差Δ
n =nl−In2が複屈折率である。Considering the molding principle of injection molding, there are differences in various physical properties and optical properties depending on the flow direction of the resin and the direction perpendicular to the flow. That is, the refractive index (n+) of the resin in the flow direction
There is a difference in the refractive index in the direction (n2) perpendicular to the flow, and the difference Δ
n=nl-In2 is the birefringence.
換言すると成形条件により複屈折率Δn、複屈折Rが大
きくなったり小さくなったりする。両者の関係は次式で
表わされる。In other words, the birefringence Δn and the birefringence R increase or decrease depending on the molding conditions. The relationship between the two is expressed by the following equation.
R=ΔnXd
d:試験片厚み
一方、批の中にある各種射出成形機、成形温度、金型温
度、金型デザイン(ゲートデザイン、ランナー径、ラン
ナー長さ)等を全て定量化し複屈折との関係を明確にす
ることは不可能である。R = Δn It is impossible to clarify the relationship.
そこで大体の傾向とその中でも複屈折に一番影響を与え
ると考えられる成形温度につき検討した結果、成形温度
を上昇させると複屈折は減少する!Kがわかった。ただ
、成形温度は無限に上げることは不可能でありシリンダ
一温度は該樹脂の熱分解温度が上限であり金型温度は離
型性より考え加熱変形温度が上限である。Therefore, we investigated the general trends and the molding temperature, which is thought to have the greatest effect on birefringence, and found that as the molding temperature increases, birefringence decreases! I understand K. However, it is impossible to raise the molding temperature infinitely; the upper limit of the cylinder temperature is the thermal decomposition temperature of the resin, and the upper limit of the mold temperature is the heat deformation temperature in consideration of mold release properties.
そこで本発明者等は本樹脂の組成等最適化をはかる条件
に下記条件を設定した。成形温度は該樹脂の上限温度に
近い温度を設定した。Therefore, the present inventors set the following conditions to optimize the composition of the present resin. The molding temperature was set close to the upper limit temperature of the resin.
射出成形a :インライン型射出成形機(多機製作所
:ダイナメルター
M7OA−D)
金 型: DRAW用ディスク金型(127m
m直径円板、1.2mm厚み)シリンダ一温度:300
℃
金 型 温 度ニア0℃
一例を示すと1本発明の共重合体樹脂において、MMA
/スチレン/メタクリル酸/六員環酸無氷物/六員環
イミド=65/20/4/2/9 (重量%)、温度2
5℃のクロロホルムにポリマー0.150gを含有させ
た溶液0.5dI!の還元粘度r) sp/Cが0 、
5 g/ tiRであるポリマーを前記成形条件のうち
シリンダ一温度を300℃、320℃と変化させた場合
のモ均複屈折Rは各々17.12nmであった。Injection molding a: Inline injection molding machine (Taki Seisakusho: Dynamelter M7OA-D) Mold: DRAW disc mold (127 m
m diameter disc, 1.2mm thickness) Cylinder temperature: 300
℃ Mold temperature near 0℃ To give an example, in the copolymer resin of the present invention, MMA
/styrene/methacrylic acid/6-membered cyclic acid ice-free product/6-membered cyclic imide = 65/20/4/2/9 (wt%), temperature 2
A solution containing 0.150 g of polymer in chloroform at 5°C is 0.5 dI! The reduced viscosity r) sp/C is 0,
When the cylinder temperature was changed to 300° C. and 320° C. under the above-mentioned molding conditions, the uniform birefringence R of the polymer having 5 g/tiR was 17.12 nm.
また、上記特定の共重合体に分子量350以上のヒンダ
ードフェノール化合物を1100pp NN10000
pp添加すると成形時における発泡性が抑制され更に好
ましいものとなる。In addition, 1100pp NN10000 of a hindered phenol compound with a molecular weight of 350 or more is added to the above specific copolymer.
When pp is added, the foamability during molding is suppressed, making it even more preferable.
ヒンダードフェノール化合物とは、フェノール性水酸基
の2つのオルト位のうち少なくとも1箇所がバルキーな
置換基で置換された化合物を意味する。A hindered phenol compound means a compound in which at least one of the two ortho positions of a phenolic hydroxyl group is substituted with a bulky substituent.
好ましい例としては一般式:
%式%
(式中R1は水素原子又はアルキル基、R2は水素原子
又はアルキル基、R3は有機置換基、R4は水素原子、
R5はt−ブチル基である)
で示される分子量350以上のフェノール化合物が挙げ
られる。この有機置換基R3としては、その有機置換基
中に更に1個以上のヒーダードフェノールの構造を有す
る構造のものが好ましい。A preferred example is the general formula: % formula % (wherein R1 is a hydrogen atom or an alkyl group, R2 is a hydrogen atom or an alkyl group, R3 is an organic substituent, R4 is a hydrogen atom,
(R5 is a t-butyl group) Phenol compounds having a molecular weight of 350 or more are exemplified. The organic substituent R3 preferably has a structure in which the organic substituent further has one or more heated phenol structures.
また、具体的な化合物基を例示すれば下記の通りである
。Further, specific examples of compound groups are as follows.
ペンタエリスリチル−テトラキス[3−(3,5−ジ−
t−ブチル−4−ヒドロキシフェニル)プロピオネート
1 (分子量1176.6)1.1
.3− )リス(2−メチル−4−ヒドロキシ−3−t
−ブチル−フェニル)ブタン (分子M544.83
)n−オクタデシル−3−(4’−ヒドロキシ−3’
、5’ −ジ−t−ブチル−フェニル)プロピオネート
(分子量520.9)
トリス(3,5−ジ−t−ブチル−4−ヒドロキシ−ベ
ンジル)インシアヌレート (分子1712)トリ
エチレングリコール−ビス−3−(3−t−ブチル−4
−ヒドロキシ−5−メチル−フェニル)プロピオネート
(分子量586.8)4.4′−
ブチリデン−ビス(3−メチル−6−t−ブチル−フェ
ノール) (分子量382.6)トリス[β
−(3,5−ジ−t−ブチル−4−ヒドロキシ−フェニ
ル)プロピオニルオキシエチル]イソシアヌレート
(分子量1045)4.4′−メチレン−
ビス(2,6−ジーt−ブチル)フェノール
(分子量425)1.3.5− )ジ−メチ
ル−2,4,6−トリス(3,5−ジ−t−ブチル−4
−ヒドロキシ−ベンジル)ベンゼン(分子量761.1
)
ヘキサメチレングリコールビス[β−3,5−ジ−t−
ブチルー4−ヒドロキシフェニル)プロピオネート(分
子量524.8)
ビス[3,3−ビス(4′−ヒドロキシ−3′−t−ブ
チル−フェニル)ブチリックアシッドコグリコールエス
テル (分子量795)なお、
透明性その他の物性を損わない限り、離型剤、帯電防止
剤、その他の添加剤を樹脂に添加することは自由である
。Pentaerythrityl-tetrakis [3-(3,5-di-
t-Butyl-4-hydroxyphenyl)propionate 1 (molecular weight 1176.6) 1.1
.. 3-) Lis(2-methyl-4-hydroxy-3-t
-butyl-phenyl)butane (molecule M544.83
) n-octadecyl-3-(4'-hydroxy-3'
, 5'-di-t-butyl-phenyl)propionate (molecular weight 520.9) tris(3,5-di-t-butyl-4-hydroxy-benzyl)in cyanurate (molecule 1712) triethylene glycol-bis- 3-(3-t-butyl-4
-Hydroxy-5-methyl-phenyl)propionate (molecular weight 586.8) 4.4'-
Butylidene-bis(3-methyl-6-t-butyl-phenol) (molecular weight 382.6) Tris[β
-(3,5-di-t-butyl-4-hydroxy-phenyl)propionyloxyethyl]isocyanurate
(Molecular weight 1045) 4.4'-methylene-
Bis(2,6-di-t-butyl)phenol
(Molecular weight 425) 1.3.5-)di-methyl-2,4,6-tris(3,5-di-t-butyl-4
-hydroxy-benzyl)benzene (molecular weight 761.1
) hexamethylene glycol bis[β-3,5-di-t-
Butyl-4-hydroxyphenyl) propionate (molecular weight 524.8) Bis[3,3-bis(4'-hydroxy-3'-t-butyl-phenyl)butyric acid coglycol ester (molecular weight 795)
A mold release agent, an antistatic agent, and other additives may be freely added to the resin as long as they do not impair transparency or other physical properties.
次に図面を挙げて光ディスクの概略を説明する。第1図
は、光ディスクの一例の作動状態を示す説明図、第2図
は第1図の光ディスクの拡大上面図である。第1図にお
いてlは上記特定の樹脂よりなる樹脂層、2は金属蒸着
などによって積層された金属11りである。3は樹脂層
1の凸部である。金属膜2の方に着目して、金属膜2を
1つの層としてとらえると樹脂層lの凸部3の部分は、
金属膜2ではピット4の部分になる。このピット4はl
」約1.0〜1.5 JL、深さ0.1〜0.2経、そ
して長さは最小1〜1.6μに構成してする。このよう
なビット4は盤面全体から見れば渦巻状の線に沿うよう
に密に配列される。この配列状態、を示す拡大上面図を
第2図として示す。次に、第1図においてレーザー光線
5を半透明鏡6に進行させると、光線の半分は直進し、
もう半分は樹脂層1に垂直に入射し、樹脂層1を通過し
、次いで金属膜2により反射され、反射光は半透明鏡6
で更に反射されて、直進した光と同一の光路をたどる。Next, an outline of the optical disc will be explained with reference to the drawings. FIG. 1 is an explanatory diagram showing the operating state of an example of an optical disc, and FIG. 2 is an enlarged top view of the optical disc shown in FIG. In FIG. 1, 1 is a resin layer made of the above-mentioned specific resin, and 2 is a metal layer 11 laminated by metal vapor deposition or the like. 3 is a convex portion of the resin layer 1. Focusing on the metal film 2 and considering the metal film 2 as one layer, the convex portion 3 of the resin layer l is as follows.
In the metal film 2, this becomes the pit 4 portion. This pit 4 is l
” approximately 1.0 to 1.5 JL, depth 0.1 to 0.2 warp, and minimum length 1 to 1.6 μm. Such bits 4 are densely arranged along a spiral line when viewed from the entire board surface. An enlarged top view showing this arrangement is shown in FIG. 2. Next, in Fig. 1, when the laser beam 5 is made to travel to the semi-transparent mirror 6, half of the beam goes straight;
The other half enters the resin layer 1 perpendicularly, passes through the resin layer 1, is then reflected by the metal film 2, and the reflected light is transmitted to the semi-transparent mirror 6.
It is further reflected and follows the same optical path as the light that went straight.
これにより直進する光と金属膜2、半透明鏡6を経てき
た反射光には金属膜2の凹凸により該レーザー光線反射
部位より光路差(従って、位相差)ができる。そこで、
板状体全体を回転させるとピット4と平担部7とが種々
の間隔で表われ、それに応じて光路差が変化し、光路差
の変化に基づいて、直進光と反射光とが干渉し合い、光
ディスクの凹凸の形の情報がレーザー光線の強弱及びそ
の強弱の時間的長さという信号に変換される。この信号
を電気信号に変換し、更に音として再生するものである
。As a result, an optical path difference (therefore, a phase difference) is created between the light traveling straight and the reflected light passing through the metal film 2 and the semi-transparent mirror 6 due to the unevenness of the metal film 2 from the laser beam reflection portion. Therefore,
When the entire plate-shaped body is rotated, the pits 4 and the flat portions 7 appear at various intervals, and the optical path difference changes accordingly, and based on the change in the optical path difference, the straight light and the reflected light interfere. Then, information about the shape of the unevenness on the optical disk is converted into a signal indicating the intensity of the laser beam and the time length of the intensity. This signal is converted into an electrical signal and further reproduced as sound.
この光ディスクを製造するには、まず、前述の特定の樹
脂を例えば射出成形のような成形法により成形して片面
に微小な凹凸を付した板状体を得る。次に、得られた板
状体の凹凸面に金属膜を形成する。樹脂の板状体に金属
膜を形成するには、金属蒸着による方法が好適に適用さ
れる。金属膜の金属としては、アルミニウム、金、白金
、銀、銅等が用いられるが、アルミニウムが安価で実用
的である。To manufacture this optical disc, first, the above-mentioned specific resin is molded by a molding method such as injection molding to obtain a plate-like body having minute irregularities on one side. Next, a metal film is formed on the uneven surface of the obtained plate-shaped body. In order to form a metal film on a resin plate, a method using metal vapor deposition is suitably applied. Aluminum, gold, platinum, silver, copper, etc. are used as the metal for the metal film, and aluminum is inexpensive and practical.
この表裏両面を記録面として用いることのできる光ディ
スクの断面図を第3図に示す。第3図の記録媒体は、前
述のようにして得られる片面を記録面とした板状の積層
物2枚を金属膜2面どうしを、例えば接着剤8等により
貼り合わせるなどして一体化することにより製造するこ
とができる。FIG. 3 shows a cross-sectional view of an optical disc whose front and back surfaces can be used as recording surfaces. The recording medium shown in FIG. 3 is obtained by combining two plate-shaped laminates with one side as a recording surface obtained as described above by bonding the two surfaces of the metal film together using, for example, an adhesive 8. It can be manufactured by
なお、本発明に係る光デイスク基板用共重合体樹脂の物
性は下記の値を満足するものである。The physical properties of the copolymer resin for optical disk substrates according to the present invention satisfy the following values.
表 1
なお、上記表1及び以下の実施例における各物性は下記
のようにして測定したものである。Table 1 In addition, each physical property in the said Table 1 and the following Example was measured as follows.
[1]複屈折
■ E−DRAWディスク用基板の成形品(直径127
mm 、厚み1.2mmの溝無円板)につき、日本光学
工業株式会社XTP−11型偏光顕微鏡を利用して、光
源をHe−Meレーザー光線としてセナルモンコンペン
セーター法にてリターデーション(1,2m+s厚みダ
ブルパスにおける値)を測定。判定ノ、(準は次の通り
。[1] Birefringence ■ Molded product for E-DRAW disk substrate (diameter 127
mm, 1.2 mm thick grooveless circular plate), retardation (1.2 m + s Measure the thickness (value in double pass). Judgment No. (The criteria are as follows.
複屈折(nm)
O:20未満(E−DRAW規格)
Δ:40未満(DRAW規格)
×:40以上
(2) eo℃〜70℃における経時変化O:経時変
化がほとんどない。Birefringence (nm) O: less than 20 (E-DRAW standard) Δ: less than 40 (DRAW standard) ×: 40 or more (2) Change over time at eo°C to 70°C O: Almost no change over time.
X:経時変化する。X: Changes over time.
(3> 複屈折におけるHe−Neレーザー光の入射
依存性
O:入射角依存性なし。(3> Incidence dependence of He-Ne laser light on birefringence O: No dependence on incident angle.
×:入射角依存性あり(入射角の変化により複屈折が大
きくなる。)。×: There is incidence angle dependence (birefringence increases as the incident angle changes).
[21耐熱性
JIS K 7207に従い、18.6kg/cm2の
荷重下で加熱変形温度を測定。判定基準は次の通り。[21 Heat resistance According to JIS K 7207, heat deformation temperature was measured under a load of 18.6 kg/cm2. The judgment criteria are as follows.
加熱変形温度(℃)
0 : 110以上
Δ:100以上
X : 100未満
[3]透明性(レーザー光線透過率)
JIS K6718 (A法)に従い、積分球式光線
透過率測定装置を使用して測定する。Heating deformation temperature (°C) 0: 110 or more Δ: 100 or more .
透過率(%)
O:90以上
×:90未満
[4]転写性(信号評価)
単一信号例えば500キロサイクルをカッティングした
スタンパ−で成形したディスクを再生して、■3〜P、
P信号をとりピークの■高さ、■巾、■ピークゆがみを
みて転写性を判定する。Transmittance (%) O: 90 or more
The transferability is determined by taking the P signal and looking at the peak ■height, ■width, and ■peak distortion.
転写性(信号評価)
0:ピークの高さ、巾、ピークの形にゆがみがなく一定
×:ピークの高さ、巾、ピークの形にゆがみがみられる
。Transferability (signal evaluation) 0: Peak height, width, and peak shape are constant without distortion. ×: Distortion is observed in peak height, width, and peak shape.
【5]酸素透過率 測定装置は製科研式フィルム酸素透過計で測定した。[5] Oxygen transmission rate The measuring device was a Seikaken-type film oxygen permeability meter.
酸素透過率[cc(STP)cm/cm2・sec−c
mHglO: 10−12以上
X : 10−10未満
〔61表面硬度(#キズ性)
ディスク表面硬度を鉛筆硬度により判定。Oxygen permeability [cc (STP) cm/cm2・sec-c
mHglO: 10-12 or more X: Less than 10-10 [61 Surface hardness (# scratch resistance) Disc surface hardness was determined by pencil hardness.
鉛筆硬度
0 : 18以上
X:08未満
[71記録膜(感剤)との密着性と均一性o:65℃×
90%RHX 1000Hr(7)環境試験ニテAf、
Te系、 (Te、 Gd)、 (Fe、 Co)等の
膜の孔蝕無(密着性保持)
×:65°C×90%RHX 1000Hrc7)環境
試験にて八!、Te系、 (Te、 Gd)、 (Fe
、 Go)等の膜の孔蝕有により密着性が悪くな
る。Pencil hardness 0: 18 or more
90%RHX 1000Hr (7) Environmental test Nite Af,
No pitting (maintenance of adhesion) of Te-based, (Te, Gd), (Fe, Co), etc. films ×: 65°C x 90%RHX 1000Hrc7) 8 in environmental test! , Te system, (Te, Gd), (Fe
, Go), etc., the adhesion becomes poor due to pitting of the film.
[81ゴミ・混濁
レーザー光散乱方式センサーのHIAG/ROYCO液
体微粒子カウンターModei’ 4100を使って、
光デイスク基板用共重合体樹脂のIgrを1.2−ジク
ロルエタン250m1)に溶解させてゴミ・混濁の個数
を測定した。[Using 81 dust/turbidity laser light scattering sensor HIAG/ROYCO liquid particulate counter Modei' 4100,
Igr, a copolymer resin for optical disk substrates, was dissolved in 250 ml of 1,2-dichloroethane, and the number of dust and turbidity was measured.
ゴミ・混濁
0 : 10〜25弘未渦の範囲で200個未満×:1
0〜25ル未満の範囲で200個以上[91耐溶剤性
O:基板の樹脂中の不純物が少なくて、かつ感剤を劣化
させない。Dust/turbidity 0: Less than 200 pieces in the range of 10 to 25 Hiromi vortices x: 1
200 or more in the range of 0 to less than 25 ml [91 Solvent resistance O: There are few impurities in the resin of the substrate and does not deteriorate the sensitizer.
×:基板の樹脂中の不純物、例えば重合溶剤の存在、具
体的には)\ロゲン系の溶媒が残っているため、それが
感剤を劣
化させる。×: Presence of impurities in the resin of the substrate, such as a polymerization solvent; specifically, \rogen-based solvent remains, which deteriorates the sensitizer.
[10]量産性(成形性)
O:射出成形、射出・圧縮成形及び圧縮成形数“成形可
能でかつ不良率(成形時の焼は及びスクリュー摩耗など
による異
物混入)が少ない。[10] Mass-producibility (moldability) O: Injection molding, injection/compression molding, and compression molding are possible and have a low defect rate (foreign matter contamination due to burning during molding and screw wear, etc.).
X:射出成形、射出・圧縮成形及び圧縮成形等で成形可
能であるが、不良率(成
形時の焼は及びスクリュー摩耗などに
よる異物混入)が高い。X: Can be molded by injection molding, injection/compression molding, compression molding, etc., but the defect rate is high (foreign matter contamination due to burning during molding and screw wear, etc.).
[実施例] 次に実施例を挙げて本発明を更に詳しく説明する。[Example] Next, the present invention will be explained in more detail with reference to Examples.
実施例1
スチレン14重量部、メタクリルl’i@15重量部、
メタクリル酸メチル71重量部、エチルベンゼン20重
量部及びオクチルメルカプタン0.1重量部から成る混
合液を調製し、この混合液を0.51 /hrの速度で
連続して内容積2文のジャケット付完全混合反応器に供
給して重合を行った。重合開始剤として1,1−ジーt
ert−ブチルパーオキシ−3,3,5−トリメチルシ
クロヘキサンを用い、重合温度は110°Cであった。Example 1 14 parts by weight of styrene, 15 parts by weight of methacrylic l'i,
A mixed solution consisting of 71 parts by weight of methyl methacrylate, 20 parts by weight of ethylbenzene and 0.1 part by weight of octyl mercaptan was prepared, and this mixed solution was continuously fed at a rate of 0.51/hr into a jacketed container with an internal volume of 2 cm. Polymerization was carried out by supplying the mixture to a mixing reactor. 1,1-Gt as a polymerization initiator
The polymerization temperature was 110°C using ert-butylperoxy-3,3,5-trimethylcyclohexane.
固形分42重量%の重合反応液を連続して高温真空室へ
供給して、未反応物の除去及び六員環酸無水物の生成を
行った。この生成共重合体の中和滴定及び赤外分光光度
計による組成分析の結果は、スチレン単位15重量%、
メタクリル酸メチル単位65重量%、メタクリル酸単位
4重量%及び六員環酸無水物単位16重量%であった。A polymerization reaction solution having a solid content of 42% by weight was continuously supplied to a high-temperature vacuum chamber to remove unreacted substances and produce a six-membered cyclic acid anhydride. The results of neutralization titration and compositional analysis using an infrared spectrophotometer of this copolymer were as follows: 15% by weight of styrene units;
The methyl methacrylate units were 65% by weight, the methacrylic acid units were 4% by weight, and the six-membered cyclic acid anhydride units were 16% by weight.
上記のようにして得た共重合体0.5 kgをペレット
状で5文のオートクレーブに仕込み、次いでジメチルホ
ルムアミド3.0kgを投入し、かきまぜて全量溶解後
、六員環酸無水物単位量に対し0.4当量のアンモニア
を含有する28%アンモニア水を仕込み、75°C12
時間処理した0反応液を取り出し、n−ヘキサンでポリ
マーを析出、精製後このポリマーを250°C12時間
、10torrの揮発炉で処理を行った。最終的に得ら
れた生成物はほとんど無色透明で、その赤外分光光度計
による測定より、六員環酸無水物に物理的な1800c
m刊及び1760cm−1の吸収の減少がみられ、同時
に1700cm−1の新しい吸収から六員環イミドの生
成が認められた、元素分析の窒素含有量より、六員環イ
ミド単位は3重量%であった。0.5 kg of the copolymer obtained as above was charged in the form of pellets into a 5-unit autoclave, and then 3.0 kg of dimethylformamide was added, stirred to dissolve the entire amount, and then the unit amount of six-membered cyclic acid anhydride was added. 28% ammonia water containing 0.4 equivalent of ammonia was added, and 75°C12
The time-treated reaction solution was taken out, a polymer was precipitated with n-hexane, and after purification, the polymer was treated at 250° C. for 12 hours in a volatilization furnace at 10 torr. The final product was almost colorless and transparent, and as measured by an infrared spectrophotometer, it was determined that the six-membered cyclic acid anhydride had a physical
A decrease in the absorption at m and 1760 cm-1 was observed, and at the same time, the formation of six-membered ring imide was observed from the new absorption at 1700 cm-1.From the nitrogen content in elemental analysis, the six-membered ring imide unit was 3% by weight. Met.
温度25°Cのクロロホルムに該共重合体0.150g
を含有させた溶液0.5dfLの還元粘度ηsp/Gは
0.4であった。0.150 g of the copolymer in chloroform at a temperature of 25°C
The reduced viscosity ηsp/G of 0.5 dfL of the solution containing the following was 0.4.
上記の共重合体につき、光ディスク盤材としての評価を
行なった。結果を表2に示す。The above copolymer was evaluated as an optical disc material. The results are shown in Table 2.
実施例2〜6
共重合成分の配合量等を変化させ、実施例1と略同様に
操作して、表2に示す共重合体樹脂を得、光ディスク盤
材としての評価を行なった。結果を表2に示す。Examples 2 to 6 The copolymer resins shown in Table 2 were obtained by changing the blending amount of the copolymer components, etc., and operating in substantially the same manner as in Example 1, and evaluated as optical disc materials. The results are shown in Table 2.
比較例1.2
ポリカーボネート[帝人化成■製パンライトAD 55
03 ] (比較例1)、ポリメタクリル酸メチル(
旭化成工業■製デルペツ) 98A 、 25℃、10
重量%メチルエチルケトン溶液粘度10cps )
(比較例2)について、上記と同様の物性を測定した。Comparative Example 1.2 Polycarbonate [Teijin Kasei Panlite AD 55
03] (Comparative Example 1), polymethyl methacrylate (
Asahi Kasei Kogyo ■Delpetu) 98A, 25℃, 10
Weight% methyl ethyl ketone solution viscosity 10 cps)
Regarding (Comparative Example 2), the same physical properties as above were measured.
結果を表2に示す。The results are shown in Table 2.
比較例3〜6
表2に示す共重合体樹脂を得、上記と同様の物性を測定
した。結果を表2に示す。Comparative Examples 3 to 6 Copolymer resins shown in Table 2 were obtained, and the same physical properties as above were measured. The results are shown in Table 2.
比較例7
カラスについて、上記と同様の物性を評価した。結果を
表2に示す。Comparative Example 7 The same physical properties as above were evaluated for crow. The results are shown in Table 2.
比較例8
ポリスチレン(旭化成工業■製スタイロン666)につ
いて同様の物性を測定した。結果を表2に示す。Comparative Example 8 Similar physical properties were measured for polystyrene (Styron 666 manufactured by Asahi Kasei Corporation). The results are shown in Table 2.
第1図は光ディスクの作動状態を示す説明図。
第2図は光ディスクの一実施例の一部分の拡大上面図、
第3図は表裏両面を記録面として用いることができる光
ディスクの断面図である。
1・・・樹脂層、2・・・金属膜、3・・・凸部、4・
・・ビット、5・・・レーザー光線、6・・・半透明鏡
7・・・平担部、8・・・接着剤。FIG. 1 is an explanatory diagram showing the operating state of an optical disc. FIG. 2 is an enlarged top view of a portion of an embodiment of an optical disk;
FIG. 3 is a sectional view of an optical disc whose front and back surfaces can be used as recording surfaces. DESCRIPTION OF SYMBOLS 1... Resin layer, 2... Metal film, 3... Convex part, 4...
... Bit, 5... Laser beam, 6... Semi-transparent mirror 7... Flat part, 8... Adhesive.
Claims (1)
は水素原子、アルキル基、シクロアルキル基又はアリー
ル基である。) で示される六員環イミド単位の5種の繰り返し単位がラ
ンダムに配列された分子構造を有し、かつ(A)、(B
)、(C)、(D)及び(E)の各単位の含有量をそれ
ぞれa、b、c、d及びe重量%としたとき、 a+b+c+d+e=100 95≧a≧40、 56≧b≧1、 96≧a+b≧50、 10≧c≧1、 50≧d+e≧3 の数値条件を満たす共重合体樹脂を主成分としてなる光
ディスク基板。 2)芳香族ビニル化合物がスチレン、α−メチルスチレ
ン、p−メチルスチレンまたはそれの混合物である特許
請求の範囲第1項記載の光ディスク基板。 3)不飽和脂肪酸単量体がアクリル酸、メタクリル酸ま
たはそれの混合物である特許請求の範囲第1項記載の光
ディスク基板。[Claims] 1) (A) methyl methacrylate unit, (B) aromatic vinyl compound unit, (C) unsaturated fatty acid monomer unit, (D) formula ▲ mathematical formula, chemical formula, table, etc. ▼ (In the formula, R_1, R_2 are hydrogen atoms or methyl groups.) Six-membered cyclic acid anhydride unit and formula (E) ▲ Numerical formulas, chemical formulas, tables, etc. ▼ (In the formula, R_1, R_2 is a hydrogen atom or a methyl group, R_3
is a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group. ) has a molecular structure in which five types of repeating units of six-membered ring imide units are randomly arranged, and (A), (B
), (C), (D) and (E), when the content of each unit is a, b, c, d and e weight%, respectively, a+b+c+d+e=100 95≧a≧40, 56≧b≧1 , 96≧a+b≧50, 10≧c≧1, 50≧d+e≧3. 2) The optical disc substrate according to claim 1, wherein the aromatic vinyl compound is styrene, α-methylstyrene, p-methylstyrene, or a mixture thereof. 3) The optical disc substrate according to claim 1, wherein the unsaturated fatty acid monomer is acrylic acid, methacrylic acid, or a mixture thereof.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61308042A JPS63163301A (en) | 1986-12-25 | 1986-12-25 | Optical disk substrate |
CA000530941A CA1274936A (en) | 1986-12-25 | 1987-03-02 | Random copolymer containing hexagonal imide units, a process for producing the same, and an optical disc substrate made of the random copolymer |
EP87102979A EP0273092B1 (en) | 1986-12-25 | 1987-03-03 | A random copolymer containing hexagonal imide units,a process for producing the same,and an optical disc substrate made of the random copolymer |
US07/021,267 US4820778A (en) | 1986-12-25 | 1987-03-03 | Random copolymer containing hexagonal imide units, a process for producing the same, and an optical disc substrate made of the random copolymer |
DE87102979T DE3786769T2 (en) | 1986-12-25 | 1987-03-03 | Random copolymer containing hexagonal imide units, process for producing the same and substrate of an optical disk made from this random copolymer. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61308042A JPS63163301A (en) | 1986-12-25 | 1986-12-25 | Optical disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63163301A true JPS63163301A (en) | 1988-07-06 |
Family
ID=17976181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61308042A Pending JPS63163301A (en) | 1986-12-25 | 1986-12-25 | Optical disk substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63163301A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005108438A1 (en) * | 2004-05-10 | 2005-11-17 | Kaneka Corporation | Imide resin, method for producing same, and molded body using same |
JP2008101216A (en) * | 2002-05-31 | 2008-05-01 | Toray Ind Inc | Optical guide plate |
WO2021193922A1 (en) * | 2020-03-26 | 2021-09-30 | 株式会社クラレ | Acrylic composition and molded article |
-
1986
- 1986-12-25 JP JP61308042A patent/JPS63163301A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008101216A (en) * | 2002-05-31 | 2008-05-01 | Toray Ind Inc | Optical guide plate |
WO2005108438A1 (en) * | 2004-05-10 | 2005-11-17 | Kaneka Corporation | Imide resin, method for producing same, and molded body using same |
WO2021193922A1 (en) * | 2020-03-26 | 2021-09-30 | 株式会社クラレ | Acrylic composition and molded article |
CN115315480A (en) * | 2020-03-26 | 2022-11-08 | 株式会社可乐丽 | Acrylic composition and molded article |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4820778A (en) | Random copolymer containing hexagonal imide units, a process for producing the same, and an optical disc substrate made of the random copolymer | |
US4845142A (en) | Magneto optical disk substrate comprising an aromatic vinyl monomer and a polyphenylene ether | |
US5208307A (en) | Optical material | |
JPS63163301A (en) | Optical disk substrate | |
JPS63163302A (en) | Optical disk substrate | |
US5198305A (en) | Optical element substrate | |
EP0431903A2 (en) | Intrinsically low birefringent molding polymers, process for preparation and molded objects therefrom | |
JPS62112612A (en) | Acrylic resin | |
JPS63264613A (en) | Optical element substrate | |
JPS60133004A (en) | Resin for optically high-density information recording medium and medium therefor | |
JPS6013335A (en) | Information recording medium consisting of methaclyrate resin | |
JPS63309547A (en) | Optical resin molding | |
JPH0615579B2 (en) | Optical equipment made of polymer | |
JPS62158706A (en) | Optical resin composition | |
JPH01102502A (en) | Optical molding | |
EP0273397B1 (en) | A substrate for an optical element | |
JPH056161B2 (en) | ||
JPH02151602A (en) | Lowly moisture-absorptive copolymer | |
JPS59108012A (en) | Resin for optical high-density information recording medium, and medium for optical high-density information recording | |
JPS63301247A (en) | Optical resin molding | |
JPS5888843A (en) | Optical high density information recording medium resin and optical high density information recording medium | |
JPS63213506A (en) | Material for optical use | |
JPS63210111A (en) | Optical resin material | |
JPH02233710A (en) | Methacrylic resin having low moisture absorption | |
JPS63256427A (en) | Manufacture of optical element |