JPS63159234A - Production of optical fiber preform - Google Patents
Production of optical fiber preformInfo
- Publication number
- JPS63159234A JPS63159234A JP30632486A JP30632486A JPS63159234A JP S63159234 A JPS63159234 A JP S63159234A JP 30632486 A JP30632486 A JP 30632486A JP 30632486 A JP30632486 A JP 30632486A JP S63159234 A JPS63159234 A JP S63159234A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- linear velocity
- raw material
- layer
- hydrogen gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000013307 optical fiber Substances 0.000 title claims description 8
- 239000007789 gas Substances 0.000 claims abstract description 67
- 239000002994 raw material Substances 0.000 claims abstract description 47
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 44
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 5
- 239000011261 inert gas Substances 0.000 claims description 6
- 238000002485 combustion reaction Methods 0.000 claims description 5
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 239000011344 liquid material Substances 0.000 claims description 3
- 239000002737 fuel gas Substances 0.000 claims 1
- 239000004071 soot Substances 0.000 claims 1
- 230000032258 transport Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 23
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 239000005373 porous glass Substances 0.000 abstract description 15
- 230000002093 peripheral effect Effects 0.000 abstract description 6
- 239000002019 doping agent Substances 0.000 abstract description 5
- 239000002245 particle Substances 0.000 abstract description 4
- 238000007599 discharging Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 description 22
- 239000001257 hydrogen Substances 0.000 description 11
- 229910052739 hydrogen Inorganic materials 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910006113 GeCl4 Inorganic materials 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 239000000567 combustion gas Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/04—Multi-nested ports
- C03B2207/06—Concentric circular ports
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
- C03B2207/22—Inert gas details
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
- C03B2207/24—Multiple flame type, e.g. double-concentric flame
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/70—Control measures
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野〕
本発明は、気相軸付法（ＶＡＤ法）により光ファイバ母
材を製造する方法に関し、バーナに送り込まれるガラス
原料の反応収率を向上させ、多孔質は材の合成速度を向
上させる光ファイバ母材の製造方法に関するものである
。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing an optical fiber preform by a vapor deposition method (VAD method), and improves the reaction yield of glass raw materials fed into a burner. The porosity is related to a method of manufacturing an optical fiber preform that improves the synthesis rate of the material.
［従来の技術］
一般にＶＡＤ法により光ファイバ母材を製造する場合、
燃焼バーナとしては、複数のノズルを右する同心円状多
回管バーナが用いられ、ガラス原料として５ｉＣ１４、
ドーパント原料としてＧｅα４、燃焼ガスとしてＨ２，
０２が用いられる。[Prior art] Generally, when manufacturing an optical fiber base material by the VAD method,
As the combustion burner, a concentric multi-tube burner with a plurality of nozzles is used, and the glass raw materials are 5iC14,
Geα4 as a dopant raw material, H2 as a combustion gas,
02 is used.
ガラス原料およびドーパント原料である５ｉＣ２４゜Ｇ
ｅＣｆＬ＜は火炎中で加水分解反応をおこし、ガラス微
粒子を生成する。このガラス微粒子が多孔質ガラス母材
の堆積面上に付着し、堆積していく。このとき、多孔質
ガラス母材のかさ密度及びドーパントの濃度分布は多孔
質母材の堆積面の温度分布及び火炎温度分布に依存する
。この多孔質母材の堆積面の温度分布及び火炎温度分布
は、合成用バーナにより形成される火炎の状態が重要な
役割をはたす。とくにガラス合成速度を向上させ大形の
多孔質母材を形成する場合には、火炎温度分布を制御す
る一つの手段として多重管バーナを用い、水素ガスと酸
素ガスにより形成される火炎面を２個以上形成する方法
が提案されている。5iC24゜G, which is a glass raw material and a dopant raw material
eCfL< causes a hydrolysis reaction in a flame to produce glass particles. These glass particles adhere to and accumulate on the deposition surface of the porous glass base material. At this time, the bulk density and dopant concentration distribution of the porous glass base material depend on the temperature distribution of the deposition surface of the porous glass base material and the flame temperature distribution. The condition of the flame formed by the synthesis burner plays an important role in the temperature distribution on the deposition surface of the porous base material and the flame temperature distribution. In particular, when increasing the glass synthesis rate and forming a large porous base material, a multi-tube burner is used as a means of controlling the flame temperature distribution, and the flame front formed by hydrogen gas and oxygen gas is divided into two. A method of forming more than one is proposed.
ここで、合成用バーナにより形成される火炎面を２個つ
くるときには、例えば多重管バーナ部すに原料ガス、燃
焼ガスを第２図に示すように供給する。即ちバーナ部す
の中心の第１層からガラス原料を流出させ、内側の第２
層から水素ガス、第３層にシールドガスとしてＡｒガス
をはさんで第４層に酸素ガスを流出させる。さらに第５
層、第６層を静で区画して同様な順序で外側の第７層、
第９ＦｐＸに水素ガス、Ｍ索ガスを流出させる。When two flame surfaces are formed by the synthesis burner, for example, raw material gas and combustion gas are supplied to the multi-tube burner section as shown in FIG. In other words, the glass raw material flows out from the first layer in the center of the burner part, and
Hydrogen gas flows from the layer, Ar gas is sandwiched between the third layer as a shielding gas, and oxygen gas flows into the fourth layer. Furthermore, the fifth
layer, the 6th layer is divided into layers and the outer 7th layer is placed in the same order,
Hydrogen gas and M-cord gas are discharged to the 9th FpX.
［発明が解決しようとする問題点］
このような方法により多孔質ガラス母材を製造したとこ
ろ、次のような問題があった。[Problems to be Solved by the Invention] When a porous glass base material was manufactured by such a method, the following problems occurred.
大型母材を形成するために原料ガスの投入量を増大させ
ると、反応収率の著しい劣化をまねく。Increasing the input amount of raw material gas to form a large base material leads to a significant deterioration of the reaction yield.
殊に、第６図に示すように、５ｉ（１４，ＧｅＣｌ４の
液体材料に対してＡｒガス等の不活性ガスでバブリング
を行い気体原料としてガラス原料をバーナ部すに供給し
ているため、原料投入量を増大させるには、Ａｒガスの
ｍも増やさねばならず原料ガスの全体量が多くなってし
まう。一方、原料投入量が少な過ぎる場合にも反応収率
が劣化する。In particular, as shown in Fig. 6, since the liquid material of 5i (14, GeCl4) is bubbled with an inert gas such as Ar gas and the glass raw material is supplied to the burner section as a gaseous raw material, the raw material In order to increase the input amount, m of the Ar gas must also be increased, resulting in an increase in the total amount of raw material gas.On the other hand, if the raw material input amount is too small, the reaction yield also deteriorates.
また、内側の第２層から流出する水素ガスの線速度に比
べ外側の第７１１から流出する水素ガスの線速度を小さ
くした場合、収率の茗しい劣化をまねき、一方、外側の
第７層から流出する水素ガスの線速度が大き過ぎる場合
、多孔質母材の堆積部の温度上昇が見られ、多孔質母材
の製造には不適となる。Furthermore, if the linear velocity of the hydrogen gas flowing out from the outer layer 711 is made smaller than the linear velocity of the hydrogen gas flowing out from the inner layer 7, this will lead to a gradual deterioration of the yield; If the linear velocity of the hydrogen gas flowing out is too high, the temperature of the deposited portion of the porous base material will increase, making it unsuitable for manufacturing the porous base material.
本発明は、上記問題点を解消するもので、多孔質ガラス
母材の合成を行う場合に、ガラス原料の反応収率を向上
させ、ガラス合成速度の向上をはかり多孔質ガラス母材
の製造を安定に行なうことができる光ファイバ母材の製
造方法を提供することにある。The present invention solves the above-mentioned problems, and when synthesizing a porous glass base material, it improves the reaction yield of glass raw materials and the speed of glass synthesis. It is an object of the present invention to provide a method for manufacturing an optical fiber preform that can be performed stably.
［問題点を解決するための手段］
本発明は、同心円状で複数の噴出ノズルを有する多重管
バーナ部の中心の第１１１からガラス原料ガスを流出さ
せると共に、内周側部と外周側部に水素ガスおよび酸素
ガスをそれぞれ流出させて火炎面を２組形成させた二重
火炎バーナにおいて、第１層のガラス原料ガスの線速度
ｖ１、バーナ内周側部から流出する水素ガスの線速度■
２、バーナ外周側部から流出する水素ガスの線速度ｖ３
がバーナ燃焼状態にとって重要なパラメータであること
を見出し、これらをｏ、ｓｍ／ｓ＜Ｖｉ ＜ １．０
ｍ／ｓでかつ １＜Ｖ３ ／Ｖ２ ＜２となるようにし
だものである。[Means for Solving the Problems] The present invention allows frit gas to flow out from the center No. 111 of a multi-tube burner section having a plurality of concentric jet nozzles, and also to In a double flame burner in which two sets of flame surfaces are formed by respectively flowing out hydrogen gas and oxygen gas, the linear velocity v1 of the frit gas in the first layer, and the linear velocity ■ of the hydrogen gas flowing out from the inner peripheral side of the burner.
2. Linear velocity v3 of hydrogen gas flowing out from the outer peripheral side of the burner
is an important parameter for the burner combustion state, and these are expressed as o, sm/s<Vi<1.0
m/s and 1<V3/V2<2.
［作 用］
第３図、第４図は今回のバーナ燃焼実験により得られた
実験結果であり、第３図は第１層から流出するガラス原
料ガスの線速度ｖ１と反応収率との関係を示し、第４図
は多重管バーナ部の内周側部から流出する水素ガスの線
速度■２と外周側部から流出する水素ガスの線速度ｖ３
との比Ｖ３／ｖ２と反応収率との関係を示すものである
。[Function] Figures 3 and 4 are the experimental results obtained from this burner combustion experiment, and Figure 3 shows the relationship between the linear velocity v1 of the frit gas flowing out from the first layer and the reaction yield. Fig. 4 shows the linear velocity of hydrogen gas flowing out from the inner circumferential side of the multi-tube burner section ■2 and the linear velocity v3 of hydrogen gas flowing out from the outer circumferential side.
It shows the relationship between the ratio V3/v2 and the reaction yield.
第３図から明らかなように、大形の光ファイバ母材を形
成すべくガラス原料ガスの投入量を増大させ、ガラス原
料ガスの線速度ｖ１を１ｍ／ｓ以上とすると、反応収率
が著しく低下する。これは、ガラス原料ガスの線速度ｖ
１が大きくなり過ぎると、火炎内において十分な加水分
解反応ができずに未反応のままガラス原料ガスが流出す
ることとなるからである。一方、ガラス原料ガスの投入
りを減少しその線速度■１を０．５ｍ ／ｓ以下とした
場合にも反応収率が低下する。これは、ガラス原料ガス
が拡散しやすくなるため、多孔質母材に対する付着効率
が下がるためと考えられる。そこで、ガラス原料ガスの
線速度■１の範囲を０．５７ＦＬ／ｓから１ｍ／ｓまで
とする。As is clear from Fig. 3, when the amount of frit gas input is increased to form a large optical fiber preform and the linear velocity v1 of the frit gas is set to 1 m/s or more, the reaction yield significantly increases. descend. This is the linear velocity v of the frit gas
This is because if 1 becomes too large, a sufficient hydrolysis reaction cannot take place within the flame, and the glass raw material gas will flow out unreacted. On the other hand, the reaction yield also decreases when the input of frit gas is reduced and its linear velocity (1) is set to 0.5 m 2 /s or less. This is thought to be because the frit gas becomes more easily diffused, which lowers the adhesion efficiency to the porous base material. Therefore, the range of the linear velocity (1) of the frit gas is set from 0.57 FL/s to 1 m/s.
なお、５ｉＣＪ！４． Ｇｆ３ＣｊＬａ等の液体材料を
高温加熱し気体原料とし直接流量υＪｔ［ｌを行ない且
つ多重管バーナ部までの原料ガス輸送ラインの途中にＡ
ｒ等の不活性ガスを付加できる機構とすることにより、
ガラス原料を増減しても、Ａｒ等の不活性ガスを含むガ
ラス原料ガスの線速度■１を上記範囲内にすることがで
きる。In addition, 5iCJ! 4. A liquid material such as Gf3CjLa is heated to a high temperature and used as a gaseous raw material, and a flow rate of υJt[l is carried out directly.
By using a mechanism that can add inert gas such as r,
Even if the glass raw material is increased or decreased, the linear velocity (1) of the glass raw material gas containing an inert gas such as Ar can be kept within the above range.
また、第４図に示すように、多重管バーナ部の内周側部
から流出する水素ガスの線速度■２に比べ外周側部から
流出する水素ガスの線速度■３を小さくした場合、火炎
中心部で生成したガラス微粒子（Ｓｉ０２． Ｇｅ０２
）が外周部へ拡散しやすく反応収率が著しく下がる。ま
た、外周側部の水素ガスの線速度ｖ３が内周側部の水素
ガスの線速度ｖ２より大きくなり両者の比Ｖ３／Ｖ２が
２以上となると、堆積部が温度上昇し多孔質母材の製造
には不適となる。そこで、内・外周側部の水素ガスの線
速度ｖ２ 、ｖ３の比Ｖ３ ／Ｖ２を１から２までの範
囲とする。In addition, as shown in Fig. 4, when the linear velocity (3) of the hydrogen gas flowing out from the outer circumferential side is made smaller than the linear velocity (2) of the hydrogen gas flowing out from the inner circumferential side of the multi-tube burner section, the flame Glass fine particles (Si02. Ge02
) easily diffuses to the outer periphery, significantly reducing the reaction yield. Furthermore, when the linear velocity v3 of the hydrogen gas on the outer circumferential side becomes larger than the linear velocity v2 of the hydrogen gas on the inner circumferential side and the ratio V3/V2 of the two becomes 2 or more, the temperature of the deposition part increases and the porous base material Unsuitable for manufacturing. Therefore, the ratio V3/V2 of the linear velocities v2 and v3 of the hydrogen gas at the inner and outer peripheral sides is set in the range of 1 to 2.
［実施例］
以下に、木Ｒ明の具体的な実施例を比較例とともに述べ
る。[Example] Hereinafter, specific examples of Ki Rime will be described together with comparative examples.
原料ガス供給系を第１図に示す。同図に示すように、５
ｉＣ１４，ＧｅＣｌ４等の液体のガラス原料は図示省略
のヒーター等により高温加熱される容器１０内にて気化
され、原料ガス輸送ライン１１を通って多重管バーナ部
すに運ばれる。原料ガス輸送ライン１１の途中には流量
制御のために不活性ガスのＡｒが付加されるようになっ
ている。Figure 1 shows the raw material gas supply system. As shown in the figure, 5
Liquid glass raw materials such as iC14 and GeCl4 are vaporized in a container 10 which is heated to a high temperature by a heater (not shown), and then transported to a multi-tube burner section through a raw material gas transport line 11. An inert gas, Ar, is added in the middle of the raw material gas transport line 11 to control the flow rate.
第２図は多重管バーナ部すの端面を示すもので、多重管
バーナ部すは９重管構造となっており、第１層にはガラ
ス原料５ｉＣ１４とドーパントとしてＧｅＣ２４等が供
給され、線速度ｖ１にて流出する。Figure 2 shows the end face of the multi-tube burner part. The multi-tube burner part has a nine-pipe structure, and the first layer is supplied with glass raw material 5iC14 and GeC24 etc. as a dopant, and the linear velocity is It leaks in v1.
第２層、第７層には水素ガスが供給され、それぞれ線速
度ｖ２ 、ｖ３で流出する。第３層〜第６層。Hydrogen gas is supplied to the second and seventh layers and flows out at linear velocities v2 and v3, respectively. 3rd layer to 6th layer.
第８層、第９層には図示の通りアルゴンと酸素が供給さ
れる。Argon and oxygen are supplied to the eighth and ninth layers as shown in the figure.
実施例では、第１図の原料ガス供給系および第２図の多
重管バーナ部すを使用して多孔質ガラス母材の製造を行
った。各ガス流の配置も第２図と同様である。ガスの流
量条件は、第２層から流れる水素流量を８ＪＶａ＋ｉｎ
１第７層から流れる水素流量を３０Ｊ／ｍｉｎとし、原
料ガスとして５ｉＣ１ｔを１５ｇ／ｍｉｎ、 ＧｅＣｌ
４を１．５ｇ／ｓｉｎ、付加Ａｒガスを１０００ｃｃ／
１ｎとした。このときの原料ガスの線速度■１は０、７
ｍ ／ｓ１水素ガスの線速度■２は２．０７ＦＬ ／ｓ
。In the example, a porous glass preform was manufactured using the raw material gas supply system shown in FIG. 1 and the multi-tube burner section shown in FIG. The arrangement of each gas flow is also the same as in FIG. The gas flow conditions are such that the hydrogen flow rate from the second layer is 8JVa+in.
1 The flow rate of hydrogen flowing from the seventh layer was 30 J/min, 15 g/min of 5iC1t as raw material gas, GeCl
4 at 1.5 g/sin, additional Ar gas at 1000 cc/
It was set to 1n. At this time, the linear velocity ■1 of the raw material gas is 0.7
m/s1 The linear velocity of hydrogen gas ■2 is 2.07 FL/s
.
ｖ３は２．８ｍ ／ｓであった。この結果、反応収率７
０％と非常に良好に多孔質ガラス母材を得ることができ
た。また第２図に示す原料ガス供給系により５ｉＣｉ４
の増減にかかわらず任意にｖｌを変えることができた。v3 was 2.8 m/s. As a result, the reaction yield was 7
It was possible to obtain a porous glass base material with a very good porous glass content of 0%. In addition, 5iCi4
It was possible to arbitrarily change vl regardless of the increase or decrease in .
次に比較例を述べる。Next, a comparative example will be described.
比較例１
第２図に示す多重管バーナ部すを用い、各ガス流の配置
も第２図と同様とした。原料ガスの供給系としては第６
図の従来のバブリング方式のものを使用した。ガスの流
量条件は、第２層から流れる水素流量を８Ｊ／ｗｉｎ、
第７層から流れる水素流量を３０Ｃ／１ｎとし、原料ガ
スとして５ｉＣｕ４を３０００ｃｃ／ｓｉｎ、 ＧｅＣ
ｆ１ａを５００ＣＣ／ｌ ｉ ｎとした。このときの原
料ガスの線速度ｖ１は１．５ｍ／ｓ、水素ガスの線速度
ｖ２は２、Ｏｎ／５１Ｖ３は２． ａｍ ／ｓであった
。Comparative Example 1 The multi-tube burner section shown in FIG. 2 was used, and the arrangement of each gas flow was also the same as in FIG. 2. The sixth source gas supply system is
The conventional bubbling method shown in the figure was used. The gas flow conditions are as follows: hydrogen flow rate flowing from the second layer is 8J/win;
The flow rate of hydrogen flowing from the seventh layer was 30C/1n, 5iCu4 was used as the raw material gas at 3000cc/sin, and GeC
f1a was set to 500CC/lin. At this time, the linear velocity v1 of the raw material gas is 1.5 m/s, the linear velocity v2 of the hydrogen gas is 2, and the On/51V3 is 2. am/s.
この結果多孔質ガラス母材の製造はできたが反応収率は
２５％と非常に低い値であった。As a result, a porous glass base material could be produced, but the reaction yield was a very low value of 25%.
比較例２
第１図の原料ガス供給系を用い、第２図の多重管バーナ
部すの各ガス流の配置も第２図と同様とした。ガスの流
量条件は、第２層の水素流量を２０Ｊ？／ｍｉｎ、第７
層の水素流Ｍを１８Ｊ／１ｎとした。原料ガスとして５
ｉＣＪ２４を１５９／ｗｉｎ、 ＧｅＣｆ１ａを１．５
ｇ／ｌｎ１付加Ａｒガスを１０００ｃｃ／ｍ ｉ ｎと
した。このときの原料ガスの線速度ｖ１は０．７ｍ ／
ｓ、水素ガスの線速度ｖ２は５．０ｍ１５１Ｖ３は１．
７ｍ／ｓであった。Comparative Example 2 The raw material gas supply system shown in FIG. 1 was used, and the arrangement of each gas flow in the multi-tube burner section shown in FIG. 2 was also the same as that shown in FIG. 2. The gas flow conditions are: hydrogen flow rate in the second layer is 20J? /min, 7th
The hydrogen flow M in the bed was 18 J/1n. 5 as raw material gas
iCJ24 159/win, GeCf1a 1.5
g/ln1 additional Ar gas was set to 1000 cc/min. The linear velocity v1 of the raw material gas at this time is 0.7 m/
s, the linear velocity of hydrogen gas v2 is 5.0 m151V3 is 1.
It was 7m/s.
この結果、反応収率は２０％と非常に低い値であった。As a result, the reaction yield was a very low value of 20%.
比較例３
第１図の原料ガス供給系を用い、多重管パーナ部すをク
ラッド合成用に用い、第５図のようにバーナ設置して多
孔質ガラス母材の製造を行った。Comparative Example 3 A porous glass base material was manufactured using the raw material gas supply system shown in FIG. 1, using a multi-pipe perner section for cladding synthesis, and installing a burner as shown in FIG. 5.
ガスの流量条件は、第２層の水素流量を２０１ ／ｗｉ
ｎ。The gas flow conditions are such that the hydrogen flow rate in the second layer is 201 /wi
n.
第７層の水素流量を１８Ｊ２／ｗｉｎとした。原料ガス
として５ｉＣ１４を１０ｇ／ｇａｉｎ、付加ガスとして
Ａ「を１３００ｃｃ／ａ ｉ ｎとした。このときの原
料ガスの線速度■１は０．７ｍ ／ｓ、水素ガスの線速
度ｖ２は５．０ｍ／ｓ。The hydrogen flow rate in the seventh layer was set to 18 J2/win. The raw material gas was 5iC14 at 10 g/gain, and the additional gas was A' at 1300 cc/a in. At this time, the raw material gas linear velocity ■1 was 0.7 m /s, and the hydrogen gas linear velocity v2 was 5.0 m /s.
ｖ３は１．７ＴｒＬ／ｓであった。この結果、バーナ延
長上の堆積面よりも下方にはみ出して５１０２のガラス
微粒子Ｑが堆積するのが確認され、さらにこの付近から
多孔質母材に割れが生じ製造不能となった。v3 was 1.7TrL/s. As a result, it was confirmed that the glass particles Q of 5102 were deposited protruding below the deposition surface on the burner extension, and cracks occurred in the porous base material from around this area, making production impossible.
比較例４
第１図の原料ガス供給系と第２図の多重管バーナ部すを
用い、各ガス流の配置も第２図と同様とし、多孔質ガラ
ス母材の製造を行った。ガスの流量条件は、第２１１Ｊ
の水素流量を８Ｊ／ｇｉｎ、第７１１の水素流量を５０
１／ｓｉｎとした。原料ガスとして５ｉＣＱ４を１５９
／ｓｉｎ、 ＧｅＣＪＬａを１．５９／ｓｉｎ、付加Ａ
ｒガスを１０００ｃｃ／ｓｉｎとした。このときの原料
ガスの線速度ｖ１は０．７ｍ ／ｓ、水素ガスの線速度
■２は２．０ｍ／ｓ、ｖ３は４．６ｍ／ｓであった。こ
の結果、バーナ外側から流出する水素流量が多いため、
堆積面の温度が高くなり過ぎ多孔質母材の製造不可とな
った。Comparative Example 4 A porous glass preform was manufactured using the raw material gas supply system shown in FIG. 1 and the multi-tube burner section shown in FIG. 2, with the arrangement of each gas flow being the same as shown in FIG. 2. The gas flow conditions are 211J
The hydrogen flow rate of No. 711 was 8 J/gin, and the hydrogen flow rate of No. 711 was 50 J/gin.
It was set to 1/sin. 159 5iCQ4 as raw material gas
/sin, GeCJLa 1.59/sin, addition A
The r gas was set to 1000 cc/sin. At this time, the linear velocity v1 of the raw material gas was 0.7 m/s, the linear velocity 2 of the hydrogen gas was 2.0 m/s, and the linear velocity v3 was 4.6 m/s. As a result, there is a large flow of hydrogen flowing out from the outside of the burner, so
The temperature of the deposition surface became too high, making it impossible to produce a porous base material.
［発明の効５Ｑ］
以上型するに本発明によれば、二重火炎バーナを使用し
；バーナ中心の第１層からのガラス原料ガスの線速度を
ｖｌ、バーナ内・外周側部から流出する水素ガスの線速
度をＶ２ 、Ｖ３とするとき、０．５ｍ／ｓ＜Ｖ＋ ＜
１．０ｍ／ｓでかつ １＜Ｖ３／Ｖ２く２とするこ
とにより、多孔質ガラス母材の合成速度を上げる際、ガ
ラス微粒子を効率よく反応させ且つ付着できると共に安
定な多孔質ガラス母材の合成を行うことができる。[Effect of the invention 5Q] To summarize, according to the present invention, a double flame burner is used; When the linear velocity of hydrogen gas is V2 and V3, 0.5 m/s<V+<
By setting the velocity to 1.0 m/s and 1<V3/V2, when increasing the synthesis speed of the porous glass base material, glass fine particles can be efficiently reacted and attached, and a stable porous glass base material can be formed. Synthesis can be performed.
また、特にガラス原料投入ωを増大させた場合でも、ｔ
１温加熱して気体とした原料ガスにキャリア不活性ガス
を付加して流出を制御することにより、任意にバーナか
らのガラス原料ガスの線速度を変えられるため、上記関
係式を十分に満足することができる。In addition, even when the glass raw material input ω is increased, t
By controlling the outflow by adding a carrier inert gas to the raw material gas that has been heated to one temperature and turned into gas, the linear velocity of the glass raw material gas from the burner can be arbitrarily changed, so the above relational expression is fully satisfied. be able to.
第１図は本発明に好適なガラス原料ガスの供給系を示す
構成図、第２図は本発明で使用する火炎面を２個形成す
る多重管バーナ部の一例を示す端面図、第３図、第４図
は多孔質母材の製造実験の結果を示すもので、第３図は
ガラス原料ガスの線速度ｖ１と反応収率の関係を示すグ
ラフ、第４図はバーナ内・外周側部の水素ガスの線速度
Ｖ２ 、Ｖ３の比Ｖ３ ／Ｖ２と反応収率の関係を示す
グラフ、第５図はクラッド合成時のバーナ設置を示す正
面図、第６図は従来用いていた原料ガス供給系を示す構
成図である。
なお、図中１０は容器、１１は原料ガス輸送ライン、ｖ
ｌはガラス原料ガスの線速度、■２は内周側部の水素ガ
スの線速度、■３は外周側部の水素ガスの線速度、ｂは
多重管バーナ部である。FIG. 1 is a configuration diagram showing a frit gas supply system suitable for the present invention, FIG. 2 is an end view showing an example of a multi-tube burner section forming two flame surfaces used in the present invention, and FIG. 3 , Fig. 4 shows the results of a manufacturing experiment for a porous base material, Fig. 3 is a graph showing the relationship between the linear velocity v1 of frit gas and the reaction yield, and Fig. 4 shows the inside and outer peripheral side of the burner. A graph showing the relationship between the linear velocity V2 of hydrogen gas, the ratio V3 /V2 of V3, and the reaction yield. Figure 5 is a front view showing the burner installation during cladding synthesis. Figure 6 is the conventional raw material gas supply. FIG. 2 is a configuration diagram showing the system. In addition, in the figure, 10 is a container, 11 is a raw material gas transportation line, and v
1 is the linear velocity of the frit gas, 2 is the linear velocity of the hydrogen gas on the inner circumferential side, 3 is the linear velocity of the hydrogen gas on the outer circumferential side, and b is the multi-tube burner section.
Claims (2)
炎加水分解反応により発生したスートを堆積させて多孔
質母材を形成する光ファイバ母材の製造方法において、
上記燃焼バーナが同心円状の多重管バーナ部を有し、そ
の中心の第１層からガラス原料ガスを流出させると共に
水素ガスと酸素ガスとからなる燃料ガスをノズルの内周
側部と外周側部の二箇所から流出させる二重火炎バーナ
であり、多重管バーナ部の第１層のガラス原料ガスの線
速度をｖ＿１、内周側部から流出させる水素ガスの線速
度をｖ＿２、外周側部から流出させる水素ガスの線速度
をｖ＿３としたとき、その関係を０．５ｍ／ｓ＜ｖ＿１
＜１．０ｍ／ｓでかつ１＜ｖ＿３／ｖ＿２＜２としたこ
とを特徴とする光ファイバ母材の製造方法。(1) A method for producing an optical fiber preform in which a gaseous frit gas is supplied to a combustion burner and soot generated by a flame hydrolysis reaction is deposited to form a porous preform.
The above-mentioned combustion burner has a concentric multi-tube burner section, in which the frit gas flows out from the first layer at the center, and the fuel gas consisting of hydrogen gas and oxygen gas is transferred to the inner circumferential side and the outer circumferential side of the nozzle. It is a double flame burner in which the linear velocity of the frit gas in the first layer of the multi-tube burner section is v_1, the linear velocity of the hydrogen gas flowing out from the inner circumferential side is v_2, and the linear velocity of the hydrogen gas flowing out from the outer circumferential side is v_1. When the linear velocity of hydrogen gas to flow out is v_3, the relationship is 0.5 m/s<v_1
<1.0 m/s and 1<v_3/v_2<2.
原料ガスが、ＳｉＣｌ＿４、ＧｅＣｌ＿４等の液体材料
を高温加熱した気体原料にこれを多重管バーナ部まで輸
送する原料ガス輸送ラインの途中にてＡｒガス等の不活
性ガスを付加させたものであることを特徴とする特許請
求の範囲第１項記載の光ファイバ母材の製造方法。(2) The frit gas flowing out from the first layer of the multi-tube burner section is placed in the middle of the raw material gas transportation line that transports liquid materials such as SiCl_4 and GeCl_4 to the multi-tube burner section as gaseous raw materials heated to high temperatures. 2. The method of manufacturing an optical fiber preform according to claim 1, wherein an inert gas such as Ar gas is added thereto.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30632486A JPS63159234A (en) | 1986-12-24 | 1986-12-24 | Production of optical fiber preform |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30632486A JPS63159234A (en) | 1986-12-24 | 1986-12-24 | Production of optical fiber preform |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63159234A true JPS63159234A (en) | 1988-07-02 |
Family
ID=17955739
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30632486A Pending JPS63159234A (en) | 1986-12-24 | 1986-12-24 | Production of optical fiber preform |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63159234A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005005331A1 (en) * | 2003-07-10 | 2005-01-20 | Shin-Etsu Chemical Co., Ltd. | Method of manufacturing optical fiber base material |
| CN107857470A (en) * | 2017-12-07 | 2018-03-30 | 长飞光纤光缆股份有限公司 | A kind of VAD prepares the blowtorch of large core fiber mother metal |
-
1986
- 1986-12-24 JP JP30632486A patent/JPS63159234A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005005331A1 (en) * | 2003-07-10 | 2005-01-20 | Shin-Etsu Chemical Co., Ltd. | Method of manufacturing optical fiber base material |
| EP1650172A4 (en) * | 2003-07-10 | 2006-08-23 | Shinetsu Chemical Co | Method of manufacturing optical fiber base material |
| CN100412015C (en) * | 2003-07-10 | 2008-08-20 | 信越化学工业株式会社 | Method of manufacturing optical fiber base material |
| CN107857470A (en) * | 2017-12-07 | 2018-03-30 | 长飞光纤光缆股份有限公司 | A kind of VAD prepares the blowtorch of large core fiber mother metal |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3705169B2 (en) | Method for producing porous glass body | |
| RU2243944C2 (en) | Method of production of optical fiber billet and design of torch to realize the method | |
| JPS63159234A (en) | Production of optical fiber preform | |
| US4312654A (en) | Method and apparatus for making large diameter optical waveguide preforms | |
| JPH0324417B2 (en) | ||
| US4781740A (en) | Method for producing glass preform for optical fiber | |
| JP3953820B2 (en) | Method for manufacturing optical fiber porous preform | |
| JP3118822B2 (en) | Method for manufacturing glass articles | |
| JP3517848B2 (en) | Manufacturing method of optical fiber preform | |
| JP2938688B2 (en) | Manufacturing method of preform for optical fiber | |
| JPH06227825A (en) | Production of porous glass preform | |
| JP3078590B2 (en) | Manufacturing method of synthetic quartz glass | |
| JP3176949B2 (en) | Method for producing porous silica preform | |
| JPS6172645A (en) | Manufacture of optical fiber preform | |
| JPH05147965A (en) | Production of glass base material | |
| JPH04228443A (en) | Burner for producing optical fiber preform | |
| JP3188515B2 (en) | Burner for synthesis of silica fine particles | |
| JPS61183140A (en) | Production of base material for optical fiber | |
| JP3169561B2 (en) | Method for producing glass particle deposit | |
| JPH04243929A (en) | Production of matrix for optical fiber | |
| JPH02133331A (en) | Production of fine glass particle-deposited body | |
| JPS6228100B2 (en) | ||
| JPS6287429A (en) | Method for producing optical fiber preform and apparatus therefor | |
| JPH04228442A (en) | Production of optical preform | |
| JPS61186239A (en) | Production of parent material for optical fiber and burner therefor |