JPS63151347A - Chemical liquid supply pipe - Google Patents
Chemical liquid supply pipeInfo
- Publication number
- JPS63151347A JPS63151347A JP30094986A JP30094986A JPS63151347A JP S63151347 A JPS63151347 A JP S63151347A JP 30094986 A JP30094986 A JP 30094986A JP 30094986 A JP30094986 A JP 30094986A JP S63151347 A JPS63151347 A JP S63151347A
- Authority
- JP
- Japan
- Prior art keywords
- pipe
- chemical liquid
- chemical
- liquid
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000126 substance Substances 0.000 title claims abstract description 88
- 239000007788 liquid Substances 0.000 title claims abstract description 65
- 238000012993 chemical processing Methods 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 9
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003595 mist Substances 0.000 abstract description 4
- 239000000243 solution Substances 0.000 description 25
- 239000007789 gas Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 238000012545 processing Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000010129 solution processing Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000008155 medical solution Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は薬液、特に半導体装置を製造するためにエツチ
ングや洗浄等に用いる薬液を薬液処理装置に供給する薬
液供給管に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a chemical liquid supply pipe for supplying a chemical liquid, particularly a chemical liquid used for etching, cleaning, etc. for manufacturing semiconductor devices, to a chemical liquid processing apparatus.
従来の技術
近年、大形の薬液供給タンクから薬液処理装置に管を介
して窒素ガスや空気などによる圧送またはポンプ稼動に
よって薬液を送り込む、いわゆる薬液供給装置が利用さ
れている。BACKGROUND OF THE INVENTION In recent years, so-called chemical liquid supply devices have been used that feed chemical liquids from large chemical liquid supply tanks to chemical liquid processing apparatuses via pipes by pressure-feeding with nitrogen gas, air, or the like, or by operating pumps.
第２図に従来の薬液供給装置を示し、これを参照して薬
液供給管を説明する。薬液供給タンク１と薬液処理装置
２は壁３を隔てて同じ床４に配置されている。薬液供給
タンク１には薬液５が充填されており、薬液５を圧送す
るために薬液供給タンク１内に窒素ガスを送り込む加圧
用窒素供給管６が設けられている。薬液供給タンク１か
ら薬液処理装置２の間には薬液５の通る内側管７と内側
管７を内包している外側管７１の二重管で構成されてい
る薬液供給管がある。FIG. 2 shows a conventional chemical liquid supply device, and the chemical liquid supply pipe will be explained with reference to this. The chemical liquid supply tank 1 and the chemical liquid processing device 2 are placed on the same floor 4 with a wall 3 in between. The chemical solution supply tank 1 is filled with a chemical solution 5, and a pressurizing nitrogen supply pipe 6 is provided for feeding nitrogen gas into the chemical solution supply tank 1 in order to forcefully feed the chemical solution 5. Between the chemical liquid supply tank 1 and the chemical liquid processing device 2, there is a chemical liquid supply pipe which is made up of a double pipe consisting of an inner pipe 7 through which the chemical liquid 5 passes and an outer pipe 71 containing the inner pipe 7.
この薬液供給管が二重管構造になっているのは、供給す
る薬液、例えば弗酸、発煙硝酸などの危険物が、長い薬
液供給管の途中で万−何らかの原因で薬液が内側管より
漏洩したとき、外側管７１に薬液５が漏洩するだけで、
外側管７１の外すなわち床４などに薬液を漏洩拡大させ
ない様にするためである。This chemical supply pipe has a double-tube structure, because if the chemical to be supplied, such as hydrofluoric acid or fuming nitric acid, were to leak halfway through the long chemical supply pipe, the chemical would leak from the inner tube for some reason. When this occurs, the chemical solution 5 simply leaks into the outer tube 71.
This is to prevent the chemical solution from leaking and spreading outside the outer pipe 71, that is, to the floor 4, etc.
薬液供給管の材質は、内側管７は耐薬品性に優れたフッ
素樹脂が用いられ、外側管７１は内側管７の様子及び外
側管への薬液の漏洩が目視できる様に安価な透明塩化ビ
ニール管が用いられている。As for the material of the chemical solution supply tube, the inner tube 7 is made of fluororesin, which has excellent chemical resistance, and the outer tube 71 is made of inexpensive transparent vinyl chloride so that the condition of the inner tube 7 and the leakage of the chemical solution into the outer tube can be visually observed. tube is used.
発明が解決しようとする問題点
上記従来の構成では、内側管から薬液が漏洩しているか
どうかの検査は、配管されている二重管を外部から目視
で点検するしか方法がなかった。Problems to be Solved by the Invention In the above-mentioned conventional configuration, the only way to check whether the chemical solution is leaking from the inner pipe is to visually inspect the double-walled pipe from the outside.
通常、薬品供給タンクは清浄管理のため薬液処理装置と
は別の室に隔離されているため、薬液供給管の配管は距
離が長く、天井裏、床下等に及んでいる場合が多く、目
視で点検する作業に時間と人手がかかるという問題があ
った。Usually, the chemical supply tank is isolated in a separate room from the chemical processing equipment for cleanliness control, so the chemical supply pipes are long and often extend under the ceiling or under the floor, making it difficult to see visually. There was a problem in that the inspection work required time and manpower.
また、外側管と内側管の間隙には空気が滞溜しているだ
けで、その空気は外気と置換されることはない。従って
、弗酸、発煙硝酸などの強酸を供給する場合、長期間使
用するうちに、フッ素系樹脂の内側管の管壁を薬液が透
過して外側管と内側管の間隙に酸ミストが滞溜し、外側
管の透明塩化ビニール管の内壁を曇らせるので、内側管
の様子が全く目視できなくなるという問題も有していた
。In addition, air only remains in the gap between the outer tube and the inner tube, and the air is not replaced with outside air. Therefore, when supplying strong acids such as hydrofluoric acid and fuming nitric acid, after long-term use, the chemical solution permeates the wall of the fluororesin inner tube and acid mist accumulates in the gap between the outer tube and the inner tube. However, since the inner wall of the transparent vinyl chloride tube of the outer tube becomes cloudy, there is also the problem that the state of the inner tube cannot be visually observed at all.
本発明は上記のような従来の問題点を解決するもので、
薬液の漏洩点検作業を容易にし、かつ透明塩化ビニール
管のくもりを解消することのできる薬液供給管を提供す
ることを目的としているものである。The present invention solves the conventional problems as described above.
The object of the present invention is to provide a chemical liquid supply pipe that facilitates the leakage inspection work of chemical liquid and eliminates fogging of a transparent vinyl chloride pipe.
問題点を解決するための手段
この目的を達成するための本発明の薬液供給管は、薬液
を供給する内側管と、内側管を内包する外側管と、外側
管の中に液体または気体を外側管の一方の端部附近から
流入させる流入管と、外側管の他の端部附近から外側管
の中の液体または気体を排出させる排出管とを備えたも
のである。Means for Solving the Problems In order to achieve this object, the chemical liquid supply tube of the present invention comprises an inner tube for supplying a chemical liquid, an outer tube for encapsulating the inner tube, and a liquid or gas supply pipe for supplying liquid or gas into the outer tube. It is equipped with an inflow pipe that allows inflow from near one end of the pipe, and a discharge pipe that causes liquid or gas in the outer pipe to be discharged from near the other end of the outer pipe.
作用
この構成によって、流入管より外側管と内側管の間隙に
水などの液体または空気などの気体を流し込むことによ
って、上記間隙に薬液ミストが滞溜することがなく、こ
の結果外側管の透明塩化ビニール管がくもることを解消
させることができる。また、排出管より排出された液体
または気体を分析することによって内側管より外側管へ
の薬液の漏洩の有無を容易に検知することができる。Effect: With this configuration, by flowing liquid such as water or gas such as air from the inflow pipe into the gap between the outer tube and the inner tube, chemical mist does not accumulate in the gap, and as a result, the outer tube becomes transparent. It can eliminate fogging of vinyl pipes. Furthermore, by analyzing the liquid or gas discharged from the discharge pipe, it is possible to easily detect whether or not a chemical solution has leaked from the inner pipe to the outer pipe.
実施例
本発明の薬液供給管の実施例について、第１図の薬液供
給装置の概略構成図を参照しながら説明する。Embodiment An embodiment of the chemical liquid supply pipe of the present invention will be described with reference to the schematic diagram of the chemical liquid supply apparatus shown in FIG.
この装置は、薬液処理装置２と薬液供給タンク１は清浄
化のため壁３を隔てて同じ床４に配置されている。そし
て薬液供給タンク１には薬液５が充填されており、薬液
５を圧送するため薬液供給タンク１内に窒素ガスを送り
込む加圧用窒素供給管６が設けられている。薬液供給タ
ンク１から薬液処理装置２の間には薬液５の通る内側管
７と内側管７を内包している外側管７１の二重管で構成
されている薬液供給管がある。なお、内側管７の一方の
端部は薬液供給タンク１の中の薬液５の中にまで延長さ
れ、他方の端部は薬液処理装置２内にある薬液処理槽１
１の近くまで延長されている。液体または気体を外側管
７１に流し込む流入管８が薬液処理装置２の附近に設け
られ、液体または気体を外側管７１から排出する排出管
９が薬液供給タンクに附近に設けられている。そして、
排出管の途中に内側管７から外側管７１に薬液５が漏れ
たことを検知する漏洩検知器１０が設置されている。漏
洩検知器１０として、外側管に水を流す場合は、比抵抗
測定器あるいはｐＨ測定器などを用い、空気を流す場合
はガス検知器等を用いる。以上により薬液供給装置が構
成される。In this device, a chemical treatment device 2 and a chemical supply tank 1 are placed on the same floor 4 with a wall 3 in between them for cleaning purposes. The chemical liquid supply tank 1 is filled with a chemical liquid 5, and a pressurizing nitrogen supply pipe 6 is provided for feeding nitrogen gas into the chemical liquid supply tank 1 in order to forcefully feed the chemical liquid 5. Between the chemical liquid supply tank 1 and the chemical liquid processing device 2, there is a chemical liquid supply pipe which is made up of a double pipe consisting of an inner pipe 7 through which the chemical liquid 5 passes and an outer pipe 71 containing the inner pipe 7. Note that one end of the inner pipe 7 extends into the chemical solution 5 in the chemical solution supply tank 1, and the other end extends into the chemical solution processing tank 1 in the chemical solution processing device 2.
It has been extended to near 1. An inflow pipe 8 for flowing liquid or gas into the outer pipe 71 is provided near the chemical solution processing device 2, and a discharge pipe 9 for discharging the liquid or gas from the outer pipe 71 is provided near the chemical solution supply tank. and,
A leak detector 10 is installed in the middle of the discharge pipe to detect leakage of the chemical solution 5 from the inner pipe 7 to the outer pipe 71. As the leakage detector 10, a resistivity meter or a pH meter is used when water is flowing through the outer pipe, and a gas detector or the like is used when air is flowing. The chemical solution supply device is configured as described above.
次に、薬液供給管の使用方法を示す。流入管８より、外
側管７１の中へ水を常時ゆっ（り流すか、通常は滞溜さ
せておいて、漏洩チェック時のみ流す。そして、排出管
９より排出された水を比抵抗測定器で抵抗の変化をみる
か、ＰＨ測定器でｐＨの変化を調べて薬液の漏洩の有無
を調べる。Next, we will show how to use the chemical solution supply pipe. Water is always allowed to slowly flow into the outer pipe 71 from the inlet pipe 8, or is normally allowed to stagnate, and is only allowed to flow when checking for leaks.Then, the water discharged from the discharge pipe 9 is measured with a resistivity measuring device. Check for changes in resistance using a PH meter, or check for changes in pH using a pH meter to check for chemical leakage.
なお、外側管に流す液体としては水でなく他の液体でも
よく、また液体でなく空気等の気体であってもよい。薬
液は無機、有機など、どんな種類でもよいことは勿論で
ある。Note that the liquid to be flowed into the outer tube may be other liquids instead of water, or may be gases such as air instead of liquids. Of course, the chemical solution may be of any type, such as inorganic or organic.
発明の効果
本発明の薬液供給管によれば、薬液供給管の内側管に供
給する薬液を流し、内側管を内包する外側管に液体また
は気体を流すことによって、薬液ミストの滞溜による外
側管のくもりが解消される。また外側管から排出された
液体または気体を漏洩検知器で監視することによって、
薬液供給管の内側管のどこかで薬液が漏洩しているかど
うか、を、配管系全体を点検してまわらなくても容易に
検知することができ、作業能率を高めることができる。Effects of the Invention According to the chemical liquid supply pipe of the present invention, by flowing the chemical liquid to be supplied into the inner pipe of the chemical liquid supply pipe and flowing the liquid or gas into the outer pipe containing the inner pipe, the outer pipe due to the accumulation of chemical liquid mist can be prevented. The cloudiness will be removed. Also, by monitoring the liquid or gas discharged from the outer tube with a leak detector,
It is possible to easily detect whether a chemical solution is leaking somewhere in the inner pipe of the chemical solution supply pipe without inspecting the entire piping system, and work efficiency can be improved.
第１図は本発明の薬液供給管の実施例を示す薬液供給装
置の概略構成図、第２図は従来の薬液供給管を示す薬液
供給装置の概略構成図である。
１・・・・・・薬液供給タンク、２・・・・・・薬液処
理装置、３・・・・・・壁、４・・・・・・床、５・・
・・・・薬液、６・・・・・・加圧用窒素供給管、７・
・・・・・内側管、７１・・・・・・外側管、８・・・
・・・流入管、９・・・・・・排出管、１０・・・・・
・漏洩検知器、１１・・・・・・薬液処理槽。FIG. 1 is a schematic configuration diagram of a chemical solution supply device showing an embodiment of a chemical solution supply pipe of the present invention, and FIG. 2 is a schematic configuration diagram of a chemical solution supply device showing a conventional chemical solution supply pipe. 1... Chemical solution supply tank, 2... Chemical solution processing device, 3... Wall, 4... Floor, 5...
...Medical solution, 6...Nitrogen supply pipe for pressurization, 7.
...Inner pipe, 71...Outer pipe, 8...
...Inflow pipe, 9...Discharge pipe, 10...
・Leak detector, 11...chemical treatment tank.
Claims (2)
る内側管と、同内側管を内包する外側管と、同外側管の
一方の端部附近から前記外側管の内へ液体または気体を
流入させる流入管と、前記外側管の他方の端部附近から
前記液体または気体を排出させる排出管とを備えたこと
を特徴とする薬液供給管。(1) An inner pipe that supplies a chemical solution from a chemical supply tank to a chemical processing device, an outer pipe that encloses the inner pipe, and a liquid or gas flowing into the outer pipe from near one end of the outer pipe. A liquid chemical supply tube comprising: an inlet tube for discharging the liquid or gas from near the other end of the outer tube.
薬液の混在の有無を知る検知器を排出管に備えているこ
とを特徴とする特許請求の範囲第（１）項に記載の薬液
供給管。(2) The chemical liquid according to claim (1), characterized in that the discharge pipe is equipped with a detector that detects whether the liquid or gas discharged from the outer pipe is mixed with the chemical liquid in the inner pipe. supply pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30094986A JPS63151347A (en) | 1986-12-17 | 1986-12-17 | Chemical liquid supply pipe |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30094986A JPS63151347A (en) | 1986-12-17 | 1986-12-17 | Chemical liquid supply pipe |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63151347A true JPS63151347A (en) | 1988-06-23 |
Family
ID=17891027
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30094986A Pending JPS63151347A (en) | 1986-12-17 | 1986-12-17 | Chemical liquid supply pipe |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63151347A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999045578A1 (en) * | 1998-03-03 | 1999-09-10 | Applied Materials, Inc. | Uniform heat trace and secondary containment for delivery lines for processing system |
| JP2005033135A (en) * | 2003-07-11 | 2005-02-03 | Kobe Steel Ltd | Cleaning device for microstructure |
| JP2010034203A (en) * | 2008-07-28 | 2010-02-12 | Tokyo Electron Ltd | Device and method for cleaning semiconductor manufacturing device |
| JP2013219388A (en) * | 1997-07-11 | 2013-10-24 | Advanced Technology Materials Inc | Bulk chemical delivery system |
-
1986
- 1986-12-17 JP JP30094986A patent/JPS63151347A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013219388A (en) * | 1997-07-11 | 2013-10-24 | Advanced Technology Materials Inc | Bulk chemical delivery system |
| WO1999045578A1 (en) * | 1998-03-03 | 1999-09-10 | Applied Materials, Inc. | Uniform heat trace and secondary containment for delivery lines for processing system |
| US6202656B1 (en) | 1998-03-03 | 2001-03-20 | Applied Materials, Inc. | Uniform heat trace and secondary containment for delivery lines for processing system |
| US6498898B2 (en) | 1998-03-03 | 2002-12-24 | Applied Materials, Inc. | Uniform heat trace and secondary containment for delivery lines for processing system |
| JP2005033135A (en) * | 2003-07-11 | 2005-02-03 | Kobe Steel Ltd | Cleaning device for microstructure |
| JP2010034203A (en) * | 2008-07-28 | 2010-02-12 | Tokyo Electron Ltd | Device and method for cleaning semiconductor manufacturing device |
| US8297292B2 (en) | 2008-07-28 | 2012-10-30 | Tokyo Electron Limited | Cleaning device and cleaning method of semiconductor manufacturing apparatus |
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