JPS6289140U - - Google Patents

Info

Publication number
JPS6289140U
JPS6289140U JP1985181815U JP18181585U JPS6289140U JP S6289140 U JPS6289140 U JP S6289140U JP 1985181815 U JP1985181815 U JP 1985181815U JP 18181585 U JP18181585 U JP 18181585U JP S6289140 U JPS6289140 U JP S6289140U
Authority
JP
Japan
Prior art keywords
substrate
cleaning device
water
gas
substrate cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1985181815U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985181815U priority Critical patent/JPS6289140U/ja
Publication of JPS6289140U publication Critical patent/JPS6289140U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Elimination Of Static Electricity (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、本考案の一実施例を示す断面図であ
り、第２図は、従来の一例を示す断面図である。 １１……洗浄室、１２……回転台、１３……ノ
ズル、１４……排水口、１５……ガス管、１６…
…排気口、２１……基板。 FIG. 1 is a sectional view showing an embodiment of the present invention, and FIG. 2 is a sectional view showing a conventional example. 11...Cleaning chamber, 12...Rotating table, 13...Nozzle, 14...Drain port, 15...Gas pipe, 16...
...exhaust port, 21...board.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 基板を載置しかつ回転する回転台と、洗浄水を
噴霧するノズルよりなる基板洗浄装置に於いて、
水に溶けてイオン化する気体を流入させるガス管
を備えた事を特徴とする基板洗浄装置。 In a substrate cleaning device consisting of a rotating table on which a substrate is placed and rotated, and a nozzle that sprays cleaning water,
A substrate cleaning device characterized by being equipped with a gas pipe that flows in a gas that dissolves in water and becomes ionized.
JP1985181815U 1985-11-26 1985-11-26 Pending JPS6289140U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985181815U JPS6289140U (en) 1985-11-26 1985-11-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985181815U JPS6289140U (en) 1985-11-26 1985-11-26

Publications (1)

Publication Number Publication Date
JPS6289140U true JPS6289140U (en) 1987-06-08

Family

ID=31127031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985181815U Pending JPS6289140U (en) 1985-11-26 1985-11-26

Country Status (1)

Country Link
JP (1) JPS6289140U (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55162379A (en) * 1979-06-04 1980-12-17 Fujitsu Ltd Pure water washing method
JPS603121A (en) * 1983-06-21 1985-01-09 Oki Electric Ind Co Ltd Treating process of semiconductor wafer
JPS6240459A (en) * 1985-08-16 1987-02-21 Toshiba Corp Plate cleaner

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55162379A (en) * 1979-06-04 1980-12-17 Fujitsu Ltd Pure water washing method
JPS603121A (en) * 1983-06-21 1985-01-09 Oki Electric Ind Co Ltd Treating process of semiconductor wafer
JPS6240459A (en) * 1985-08-16 1987-02-21 Toshiba Corp Plate cleaner

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