JPH0334061U - - Google Patents

Info

Publication number
JPH0334061U
JPH0334061U JP9363289U JP9363289U JPH0334061U JP H0334061 U JPH0334061 U JP H0334061U JP 9363289 U JP9363289 U JP 9363289U JP 9363289 U JP9363289 U JP 9363289U JP H0334061 U JPH0334061 U JP H0334061U
Authority
JP
Japan
Prior art keywords
exhaust
plasma processing
processing chamber
hole
exhaust hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9363289U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9363289U priority Critical patent/JPH0334061U/ja
Publication of JPH0334061U publication Critical patent/JPH0334061U/ja
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図は、本考案の一実施例を示す透視斜視図
、第２図ａ，ｂは、夫々排気コンダクタンス制御
板の平面図、第３図は、本考案の他の実施例を示
す透視斜視図、第４図は、従来のものの縦断面図
である。 尚、図中１……プラズマ処理室、２……排気孔
、３……排気配管、４……コンダクタンスバルブ
、５……排気ポンプ、６……ガス導入口、７……
基板、８，８ａ……排気コンダクタンス制御板、
９，９ａ……小孔、１０，１０ａ……排気溝であ
る。 FIG. 1 is a perspective view showing one embodiment of the present invention, FIGS. 2a and b are plan views of the exhaust conductance control board, and FIG. 3 is a perspective view showing another embodiment of the invention. FIG. 4 is a vertical sectional view of a conventional device. In the figure, 1... plasma processing chamber, 2... exhaust hole, 3... exhaust piping, 4... conductance valve, 5... exhaust pump, 6... gas inlet, 7...
Board, 8, 8a...exhaust conductance control board,
9, 9a...small hole, 10, 10a...exhaust groove.

Claims (1)

【実用新案登録請求の範囲】 プラズマ処理室に排気孔を設け、同排気孔に排
気配管、コンダクタンスバルブ、排気ポンプから
なる排気系を接続してプラズマ処理室内の排気を
行うプラズマ処理装置において、 前記プラズマ処理室と排気孔との間に径及び又
は間隙の異なる多数の小孔を有する排気コンダク
タンス制御板を装備してなることを特徴とするプ
ラズマ処理室の排気構造。[Scope of Claim for Utility Model Registration] A plasma processing apparatus in which an exhaust hole is provided in the plasma processing chamber, and an exhaust system consisting of an exhaust pipe, a conductance valve, and an exhaust pump is connected to the exhaust hole to exhaust the inside of the plasma processing chamber. An exhaust structure for a plasma processing chamber, comprising an exhaust conductance control plate having a large number of small holes with different diameters and/or gaps between the plasma processing chamber and the exhaust hole.
JP9363289U 1989-08-09 1989-08-09 Pending JPH0334061U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9363289U JPH0334061U (en) 1989-08-09 1989-08-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9363289U JPH0334061U (en) 1989-08-09 1989-08-09

Publications (1)

Publication Number Publication Date
JPH0334061U true JPH0334061U (en) 1991-04-03

Family

ID=31643000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9363289U Pending JPH0334061U (en) 1989-08-09 1989-08-09

Country Status (1)

Country Link
JP (1) JPH0334061U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005332985A (en) * 2004-05-20 2005-12-02 Sanyo Electric Co Ltd Semiconductor manufacturing apparatus, and photovoltaic device manufactured by using same
JP2010186949A (en) * 2009-02-13 2010-08-26 Nuflare Technology Inc Semiconductor manufacturing apparatus and semiconductor manufacturing method
JP2016149526A (en) * 2015-02-12 2016-08-18 エーエスエム アイピー ホールディング ビー．ブイ． Semiconductor manufacturing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005332985A (en) * 2004-05-20 2005-12-02 Sanyo Electric Co Ltd Semiconductor manufacturing apparatus, and photovoltaic device manufactured by using same
JP2010186949A (en) * 2009-02-13 2010-08-26 Nuflare Technology Inc Semiconductor manufacturing apparatus and semiconductor manufacturing method
JP2016149526A (en) * 2015-02-12 2016-08-18 エーエスエム アイピー ホールディング ビー．ブイ． Semiconductor manufacturing apparatus

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