JPS6258785B2 - - Google Patents
Info
- Publication number
- JPS6258785B2 JPS6258785B2 JP16463082A JP16463082A JPS6258785B2 JP S6258785 B2 JPS6258785 B2 JP S6258785B2 JP 16463082 A JP16463082 A JP 16463082A JP 16463082 A JP16463082 A JP 16463082A JP S6258785 B2 JPS6258785 B2 JP S6258785B2
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- nozzle hole
- nozzle plate
- atomizer
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010409 thin film Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 description 13
- 239000010408 film Substances 0.000 description 9
- 238000000889 atomisation Methods 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000003350 kerosene Substances 0.000 description 2
- 229910000833 kovar Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 description 1
- 239000010956 nickel silver Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Special Spraying Apparatus (AREA)
- Apparatuses For Generation Of Mechanical Vibrations (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、灯油などの液体燃料、水、薬液など
の液体の霧化器に関するものであり、さらに詳し
くは、圧電振動子などの電気振動子を利用した霧
化器に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an atomizer for liquid fuels such as kerosene, water, and liquids such as chemical solutions. This is related to the atomizer used.
従来例の構造とその問題点
従来この種の霧化器は、第１図に示すように構
成されている。すなわち電気振動子１の相対向す
る平滑面には、電極膜２ａ，２ｂが形成され、電
極膜２ｂとノズル板３とは、樹脂接着剤や金属鑞
材などによる接着層４ａを介して接合がされてい
た。さらにノズル板３の他方の面と、支持容器５
は上記と同様の接着層４ｂを介して接合されてい
た。Structure of conventional example and its problems A conventional atomizer of this type has a structure as shown in FIG. That is, electrode films 2a and 2b are formed on opposing smooth surfaces of the electric vibrator 1, and the electrode film 2b and the nozzle plate 3 are bonded via an adhesive layer 4a made of resin adhesive, metal brazing material, or the like. It had been. Furthermore, the other surface of the nozzle plate 3 and the support container 5
were bonded via the same adhesive layer 4b as above.
電気振動子１は、主成分がPbO、TiO2、
ZrO2、NbO、MgOからなるセラミツク体で、円
形中央部に開口部を設けたリング形状を有し、電
極膜２ａ，２ｂは、銀系の厚膜用導電性ペースト
の焼結体などが用いられ、ノズル板３はデイスク
状に加工された金属板で、振動子からの振動が加
振され易いように薄板（厚さ約50μｍ程度）が用
いられ、その中央部には液体（図面省略）が微細
に噴霧化され易いようにノズル孔６（孔径約70〜
100μｍ）が、１あるいは１以上設けられてい
た。なお、電極膜２ａは外部リード線接続用電極
であり、支持容器５には液体通路７および液体室
８が設けられ、このように霧化ポンプユニツトは
構成されていた。 The main components of the electric vibrator 1 are PbO, TiO 2 ,
It is a ceramic body made of ZrO 2 , NbO, and MgO, and has a ring shape with an opening in the center of the circle.The electrode films 2a and 2b are made of a sintered body of silver-based thick film conductive paste, etc. The nozzle plate 3 is a metal plate processed into a disk shape, and a thin plate (approximately 50 μm thick) is used so that vibrations from the vibrator can be easily excited, and a liquid (not shown) is placed in the center of the nozzle plate 3. Nozzle hole 6 (hole diameter approx. 70~
100 μm) was provided one or more times. Note that the electrode film 2a is an electrode for connecting an external lead wire, and the support container 5 is provided with a liquid passage 7 and a liquid chamber 8, and thus the atomizing pump unit is configured.
この構成では、ノズル板３が超音波振動により
加振され、ノズル孔６から液体を噴霧化させるた
め、その際の液体通過でノズル孔６の表面が次第
にエツチングされノズル孔が大きくなり、従つて
霧化粒径ならびに霧化量が変化しやすいという欠
点を有していた。 In this configuration, the nozzle plate 3 is vibrated by ultrasonic vibration to atomize the liquid from the nozzle hole 6, so that the surface of the nozzle hole 6 is gradually etched as the liquid passes through the nozzle hole 6, and the nozzle hole becomes larger. It has the disadvantage that the atomized particle size and the amount of atomized tend to change.
発明の目的
本発明は、かかる従来の欠点を除去するもの
で、霧化器の動作時、ノズル孔表面におよぼすエ
ツチング現象を抑制することを目的とする。OBJECTS OF THE INVENTION The present invention eliminates such conventional drawbacks and aims to suppress the etching phenomenon that occurs on the nozzle hole surface during operation of the atomizer.
発明の構成
この目的を達成するために本発明は、リング形
状を有し一対の電極を設けた電気振動子と、この
電気振動子で加振される一ないし一以上のノズル
孔を設けたノズル板と、前記ノズル板を支持する
支持容器とから構成され、前記のノズル板に設け
られたノズル孔及びノズル孔周囲部の表面に耐摩
耗性の高い薄膜を形成したものである。Structure of the Invention In order to achieve this object, the present invention provides a ring-shaped electric vibrator provided with a pair of electrodes, and a nozzle provided with one or more nozzle holes that is excited by the electric vibrator. It is composed of a plate and a support container that supports the nozzle plate, and has a highly wear-resistant thin film formed on the surface of the nozzle hole provided in the nozzle plate and the area around the nozzle hole.
この構成によつて、ノズル表面は耐摩耗性の薄
膜で保護される。従つて、ノズル表面におよぼす
エツチング現象は抑制され、霧化粒径ならびに霧
化量の安定した霧化ポンプユニツトが得られる。 This configuration protects the nozzle surface with a wear-resistant thin film. Therefore, the etching phenomenon on the nozzle surface is suppressed, and an atomizing pump unit with stable atomized particle size and atomized amount can be obtained.
実施例の説明
以下、本発明の一実施例を、第２図、第３図を
用いて説明する。尚、これらの図において第１図
と同じものについては、同一番号を付している。DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. 2 and 3. Components in these figures that are the same as those in FIG. 1 are designated by the same numbers.
第２図において、電気振動子１は外径10mm、開
口径3.5mm、厚さ1.0mmのリング状の従来と同じも
のを選び、その対向する平滑面上には、電極膜２
ａ，２ｂが形成されている。ノズル板３はコバー
ルのデイスク状薄板（厚さ約50μｍ）で、中央付
近に複数個のノズル孔６（孔径70〜100μｍ）を
設けたものを選んだ。また、ノズル板３の一部を
含めたノズル孔周囲部６′ならびにノズル孔６の
表面は、第３図に示す如くクロムの薄膜９が真空
蒸着により形成されている。尚、ノズル板３はコ
バール以外に、ステンレス、ニツケル、チタン、
洋白、鉄、鉄−ニツケルなど通常の金属薄板でも
良い。薄膜９は、クロム以外に、炭化ケイ素、二
酸化ケイ素、炭化硼素など耐摩耗性に優れたもの
であれば良く、形成方法も真空蒸着の他、スパツ
タリングなどでも可能である。 In Fig. 2, the electric vibrator 1 is the same as the conventional ring-shaped one with an outer diameter of 10 mm, an opening diameter of 3.5 mm, and a thickness of 1.0 mm.
a and 2b are formed. The nozzle plate 3 was a disk-shaped thin plate (about 50 μm thick) of Kovar, with a plurality of nozzle holes 6 (hole diameter 70 to 100 μm) provided near the center. Further, a thin chromium film 9 is formed on the nozzle hole surrounding area 6' including a part of the nozzle plate 3 and the surface of the nozzle hole 6 by vacuum deposition as shown in FIG. In addition to Kovar, the nozzle plate 3 is made of stainless steel, nickel, titanium,
Ordinary metal thin plates such as nickel silver, iron, and iron-nickel may also be used. The thin film 9 may be made of any material other than chromium, such as silicon carbide, silicon dioxide, or boron carbide, which has excellent wear resistance, and may be formed by sputtering or the like in addition to vacuum deposition.
ついで、電気振動子１（電極膜２ｂ）とノズル
板３ならびにノズル板３と支持容器５は、樹脂接
着剤や金属鑞材などの接着層４ａ，４ｂを介して
接合される。尚、液体通路７および液体室８は従
来と同じである。 Next, the electric vibrator 1 (electrode film 2b) and the nozzle plate 3, as well as the nozzle plate 3 and the support container 5, are bonded via adhesive layers 4a and 4b such as resin adhesive or metal brazing material. Incidentally, the liquid passage 7 and the liquid chamber 8 are the same as in the conventional case.
上記構成の霧化器と従来の霧化器を比較するた
め、連続霧化動作試験をおこなつた。連続霧化動
作試験は、液体に灯油を用い、一定電圧を印加し
10000Hrsの霧化動作をし、ノズル孔６の孔径比
較ならびに霧化量について調べた。その結果、本
実施例の霧化器では、試験後の孔径変化が±３％
以内で霧化量も安定であつたのに対し、従来構成
ではエツチングにより、孔径が約10〜20％増大
し、霧化量も変化していることが確認された。ま
た本実施例の場合では、孔径ならびに霧化量に変
化が見られず、従つて霧化粒径も殆んど変つてい
ないものと考えられる。 In order to compare the atomizer with the above configuration and a conventional atomizer, a continuous atomization operation test was conducted. The continuous atomization test uses kerosene as the liquid and applies a constant voltage.
The atomization operation was carried out for 10,000 hours, and the hole diameter comparison of the nozzle hole 6 and the amount of atomization were investigated. As a result, in the atomizer of this example, the pore diameter change after the test was ±3%.
In contrast, in the conventional configuration, the pore diameter increased by about 10 to 20% due to etching, and it was confirmed that the atomization amount also changed. Further, in the case of this example, no change was observed in the pore size or the amount of atomization, and therefore it is considered that the atomized particle size also hardly changed.
尚、実施例では、ノズル孔６ならびにノズル孔
６周囲部の表面に、薄膜を形成した構成を述べた
が、他にノズル孔の表面に薄膜を形成した場合に
ついても同様の効果が得られる。 In the embodiment, a configuration in which a thin film is formed on the surface of the nozzle hole 6 and the area around the nozzle hole 6 has been described, but the same effect can be obtained in other cases where a thin film is formed on the surface of the nozzle hole.
発明の効果
本発明の霧化器によれば、次の効果が得られ
る。Effects of the Invention According to the atomizer of the present invention, the following effects can be obtained.
すなわちノズル孔、ノズル周囲部の表面に耐摩
耗性の優れた薄膜を形成するため、液体通過によ
るエツチング現象が抑制され、従つて霧化粒径な
らびに霧化量の安定化が得られる。 That is, since a thin film with excellent abrasion resistance is formed on the surface of the nozzle hole and the surrounding area of the nozzle, the etching phenomenon caused by liquid passage is suppressed, and the atomized particle size and amount of atomized are stabilized.
第１図は従来の霧化器の構成を示す断面図、第
２図は本発明の霧化器の一実施例を示す断面図、
第３図は同要部の拡大断面図である。
１……電気振動子、２ａ……電極膜、２ｂ……
電極膜、３……ノズル板、４ａ……接着層、４ｂ
……接着層、５……支持容器、６……ノズル孔、
６′……ノズル周囲部、７……液体通路、８……
液体室、９……薄膜。
FIG. 1 is a sectional view showing the configuration of a conventional atomizer, and FIG. 2 is a sectional view showing an embodiment of the atomizer of the present invention.
FIG. 3 is an enlarged sectional view of the main part. 1... Electric vibrator, 2a... Electrode film, 2b...
Electrode film, 3... Nozzle plate, 4a... Adhesive layer, 4b
... adhesive layer, 5 ... support container, 6 ... nozzle hole,
6'...Nozzle surrounding area, 7...Liquid passage, 8...
Liquid chamber, 9...Thin film.
Claims (1)
と、この電気振動子で加振される一ないし一以上
のノズル孔を設けたノズル板と、前記ノズル板を
支持する支持容器とから構成され、前記のノズル
板に設けられたノズル孔及びノズル孔周囲部の表
面に耐摩耗性の高い薄膜を形成した霧化器。1 Consisting of a ring-shaped electric vibrator provided with a pair of electrodes, a nozzle plate provided with one or more nozzle holes that is excited by the electric vibrator, and a support container that supports the nozzle plate. , an atomizer in which a highly wear-resistant thin film is formed on the surface of the nozzle hole provided in the nozzle plate and the area around the nozzle hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16463082A JPS5952562A (en) | 1982-09-20 | 1982-09-20 | Atomizer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16463082A JPS5952562A (en) | 1982-09-20 | 1982-09-20 | Atomizer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5952562A JPS5952562A (en) | 1984-03-27 |
| JPS6258785B2 true JPS6258785B2 (en) | 1987-12-08 |
Family
ID=15796847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16463082A Granted JPS5952562A (en) | 1982-09-20 | 1982-09-20 | Atomizer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5952562A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62271505A (en) * | 1986-05-20 | 1987-11-25 | Mitsubishi Electric Corp | Multi-frequency shared horn antenna |
| US5061513A (en) * | 1990-03-30 | 1991-10-29 | Flynn Paul L | Process for depositing hard coating in a nozzle orifice |
| US11357931B2 (en) * | 2013-07-22 | 2022-06-14 | Koninklijke Philips N.V. | Mesh for use in a nebuliser, and a method of manufacturing the same |
| CN103752452A (en) * | 2013-12-20 | 2014-04-30 | 李玉彬 | Composite atomizing sheet |
-
1982
- 1982-09-20 JP JP16463082A patent/JPS5952562A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5952562A (en) | 1984-03-27 |
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