JPS62245688A - Superconducting contact - Google Patents
Superconducting contactInfo
- Publication number
- JPS62245688A JPS62245688A JP61089566A JP8956686A JPS62245688A JP S62245688 A JPS62245688 A JP S62245688A JP 61089566 A JP61089566 A JP 61089566A JP 8956686 A JP8956686 A JP 8956686A JP S62245688 A JPS62245688 A JP S62245688A
- Authority
- JP
- Japan
- Prior art keywords
- superconducting
- film
- contact
- metal film
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010408 film Substances 0.000 claims abstract description 41
- 239000010409 thin film Substances 0.000 claims abstract description 13
- 229910052737 gold Inorganic materials 0.000 claims abstract description 3
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 3
- 239000002184 metal Substances 0.000 claims description 38
- 229910052751 metal Inorganic materials 0.000 claims description 38
- 239000010931 gold Substances 0.000 claims description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 8
- 238000004140 cleaning Methods 0.000 abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010955 niobium Substances 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000009751 slip forming Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- -1 platinum (Pt) Chemical class 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/80—Constructional details
Landscapes
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野］
この発明は超伝導素子における超伝導コンタクトに関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] This invention relates to a superconducting contact in a superconducting element.
第２図は従来のたとえば、ニオブ（Ｎｂ）系超伝導素子
の配線層間の超伝導コンタクトを示す断面図（Ｐｂ）系
の超伝導金属膜、（４）は超伝導コンタクトを示してい
る。FIG. 2 is a cross-sectional view showing a conventional superconducting contact between wiring layers of a niobium (Nb)-based superconducting element, for example, a Pb-based superconducting metal film, and (4) shows the superconducting contact.
第２図に示すよう擾こ、従来は２つの超伝導金属膜＋１
） 、 ＋３）間の超伝導コンタクトをとる場合、超伝
導金属膜（１）の表面は層間絶縁層（２）を形成するプ
ロセス中をこレジスト、現像液にさらされ、また、大気
にもさらされているので表面に酸化膜が成長している。As shown in Figure 2, conventionally two superconducting metal films + 1
), +3), the surface of the superconducting metal film (1) is exposed to the resist and developer during the process of forming the interlayer insulating layer (2), and is also exposed to the atmosphere. Because of this, an oxide film grows on the surface.
この時、直接超伝導金属膜（３）を超伝導金属膜（１）
上に形成した場合には、超伝導金属膜ｍ表面の酸化膜に
より、トンネル接合ができ、超伝導コンタクト（４）の
臨界電流密度が減少する。従来こグし、超伝導金属膜（
１）表面の酸化膜を除去し、表面を清浄ｌこした後超伝
導金属膜（３）を形成していた。At this time, directly transfer the superconducting metal film (3) to the superconducting metal film (1).
When formed on the surface of the superconducting metal film m, a tunnel junction is formed due to the oxide film on the surface of the superconducting metal film m, and the critical current density of the superconducting contact (4) is reduced. Traditionally, the superconducting metal film (
1) After removing the oxide film on the surface and cleaning and rubbing the surface, a superconducting metal film (3) was formed.
従来の超伝導コンタクトでは下地の超伝導金属膜（１）
表面上に成長した酸化膜等を取りのぞく必要があり、ま
た酸化膜の除去が不十分な場合には良好な超伝導コンタ
クトが得られないといった問題点があった。In conventional superconducting contacts, the underlying superconducting metal film (1)
There is a problem in that it is necessary to remove the oxide film etc. that has grown on the surface, and if the oxide film is insufficiently removed, a good superconducting contact cannot be obtained.
この発明は上記のような問題点を解消するためになされ
たもので、下地の超伝導金属膜表面のクリーニングプロ
セスなしに安定で良好な超伝導コンタクトを得ることを
目的とする。This invention was made to solve the above-mentioned problems, and its purpose is to obtain a stable and good superconducting contact without a cleaning process for the surface of the underlying superconducting metal film.
この発明に係る超伝導コンタクトは、下地の超伝導金属
膜表面に反応性のない金属薄膜を連続に形成したもので
ある。The superconducting contact according to the present invention has a non-reactive metal thin film continuously formed on the surface of an underlying superconducting metal film.
この発明において、下地の超伝導金属膜上に連続ｌこ形
成された反応性のない金属薄膜は当該超伝導金属膜表面
を酸化から守り自分自身も酸化しないのでクリーニング
プロセスなしで良好な超伝導コンタクトが得られる。In this invention, the non-reactive metal thin film continuously formed on the underlying superconducting metal film protects the surface of the superconducting metal film from oxidation and does not oxidize itself, so a good superconducting contact can be made without a cleaning process. is obtained.
以下、この発明の一実施例を図について説明する。この
例ではＮｂ−Ｎｂの超伝導コンタクトを考える。第１図
に８いて、（１）はＮｂからなる第１の超脱で、ここで
は金（Ａｕ）を用いる。An embodiment of the present invention will be described below with reference to the drawings. In this example, consider a Nb-Nb superconducting contact. 8 in FIG. 1, (1) is the first super-depletion layer made of Nb, and gold (Au) is used here.
本実施例での超伝導コンタクトは、まずＮｂからなる第
１の超伝導金属膜（１）を形成するときに、真空を破る
ことなく連続に反応性のない金属薄膜（ここではＡｕ）
（５）を形成する。真空を破らないので、歯からなる第
１の超伝導金属膜＋１１の表面は酸化されない。ここで
、反応性のない金属薄膜（５） （Ａｕ）の膜厚は数十
Ａ程度で、この程度の膜厚では反応性のない金属薄膜（
５） （Ａｕ）は近接効果により超伝導性を示すので、
超伝導コンタクトの臨界電流を減少させない。さらｌこ
ＳｉＯからなる層間絶縁膜（２）を形成し、クリーニン
グプロセスなしでＮｂからなる第２の超伝導金属膜（３
）を形成して超伝導コンタクトを得る。In the superconducting contact in this example, first, when forming the first superconducting metal film (1) made of Nb, a non-reactive metal thin film (here Au) is continuously formed without breaking the vacuum.
(5) is formed. Since the vacuum is not broken, the surface of the first superconducting metal film +11 consisting of teeth is not oxidized. Here, the film thickness of the non-reactive metal thin film (5) (Au) is about several tens of amperes, and at this thickness, the non-reactive metal thin film (5) (Au) is about several tens of amperes.
5) (Au) exhibits superconductivity due to the proximity effect, so
Does not reduce the critical current of superconducting contacts. An interlayer insulating film (2) made of SiO is formed, and a second superconducting metal film (3) made of Nb is formed without a cleaning process.
) to obtain a superconducting contact.
なお、上記実施例ではＮｂ−Ｎｂの超伝導コンタクトを
考えたが、他のＮｂ −Ｐｂ 、 ＮｂＮ −ＮｂＮ等
の超伝導コンタクトでも同様の効果が得られる。In the above embodiment, a Nb-Nb superconducting contact was considered, but similar effects can be obtained with other superconducting contacts such as Nb-Pb and NbN-NbN.
また、上記実施例では反応性のない金属薄膜としてＡｕ
を考えたが、条件さえ満たせば他の金属、たとえば白金
（Ｐｔ ）でも良い。In addition, in the above embodiment, Au was used as the non-reactive metal thin film.
However, other metals, such as platinum (Pt), may be used as long as the conditions are met.
〔発明の効果］
以上のように、この発明によれば下地の超伝導金属膜上
に連続し゛Ｃ反応性のない金属薄膜を形成したので、下
地の超伝導金属膜を酸化から守ることができ、従って、
クリー二ングプロセスヲナくすことができ、さらにその
結果安定で良好な超伝導コンタクトが得られる効果があ
る。[Effects of the Invention] As described above, according to the present invention, since a continuous metal thin film with no C reactivity is formed on the underlying superconducting metal film, the underlying superconducting metal film can be protected from oxidation. , therefore,
The cleaning process can be eliminated, and as a result, a stable and good superconducting contact can be obtained.
第１図はこの発明の一実施例による超伝導コンタクトの
断面図、第２図は従来の超伝導コンタクトの断面図であ
る。
図において、（１）は第１の超伝導金属膜、（２）は層
間絶縁膜、（３）は第２の超伝導金属膜、（５）は反応
性のない金属薄膜である。
なお、図中、同一符号は同一、又は相当部分を示す。FIG. 1 is a sectional view of a superconducting contact according to an embodiment of the present invention, and FIG. 2 is a sectional view of a conventional superconducting contact. In the figure, (1) is a first superconducting metal film, (2) is an interlayer insulating film, (3) is a second superconducting metal film, and (5) is a non-reactive metal thin film. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.
Claims (3)
された反応性のない金属薄膜と、所要部分で上記反応性
のない金属薄膜を介して上記第１の超伝導金属膜に接す
る第２の超伝導金属膜とを備えたことを特徴とする超伝
導コンタクト。(1) A non-reactive metal thin film formed continuously on the first superconducting metal film, and a non-reactive metal thin film formed on the first superconducting metal film in required parts. A superconducting contact comprising: a second superconducting metal film in contact with the superconducting metal film.
を特徴とする特許請求の範囲第１項記載の超伝導コンタ
クト。(2) The superconducting contact according to claim 1, wherein the non-reactive metal thin film is made of gold (Au).
とを特徴とする特許請求の範囲第１項記載の超伝導コン
タクト。(3) The superconducting contact according to claim 1, wherein the non-reactive metal thin film is made of platinum (pt).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61089566A JPS62245688A (en) | 1986-04-17 | 1986-04-17 | Superconducting contact |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61089566A JPS62245688A (en) | 1986-04-17 | 1986-04-17 | Superconducting contact |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62245688A true JPS62245688A (en) | 1987-10-26 |
Family
ID=13974360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61089566A Pending JPS62245688A (en) | 1986-04-17 | 1986-04-17 | Superconducting contact |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62245688A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02139978A (en) * | 1988-11-21 | 1990-05-29 | Matsushita Electric Ind Co Ltd | Josephson element and its manufacture |
-
1986
- 1986-04-17 JP JP61089566A patent/JPS62245688A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02139978A (en) * | 1988-11-21 | 1990-05-29 | Matsushita Electric Ind Co Ltd | Josephson element and its manufacture |
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