JPS6145988A - Vibration-proof structure - Google Patents
Vibration-proof structureInfo
- Publication number
- JPS6145988A JPS6145988A JP16560384A JP16560384A JPS6145988A JP S6145988 A JPS6145988 A JP S6145988A JP 16560384 A JP16560384 A JP 16560384A JP 16560384 A JP16560384 A JP 16560384A JP S6145988 A JPS6145988 A JP S6145988A
- Authority
- JP
- Japan
- Prior art keywords
- main body
- stage
- mechanical device
- vibration
- force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Details Of Measuring And Other Instruments (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[発明の分野]
本発明は、機械装置本体に対して移動可能な部材例えば
位置決めステージを有する機械装置における防振構造に
関し、特に上記部材の移動の際に機械装置本体が受ける
反力を機械装置本体が床に接している機械装置本体下部
に対して自由に動くことによって吸収させ、機械装置本
体の振動を防止するようにした防振構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to a vibration isolation structure in a mechanical device having a member movable relative to the main body of the mechanical device, such as a positioning stage. The present invention relates to a vibration isolation structure that prevents vibration of the mechanical device body by absorbing the reaction force received by the mechanical device body by moving freely relative to the lower part of the mechanical device body that is in contact with the floor.
[従来技術の説明コ
近年、各種の精密な測定装置あるいは半導体関連の各種
製造装置等において、極めて高精度な位置決め装置の要
求が高まっている。通常、この種の位置決め装置はXY
方向に移動するステージを有し、ステージを支持する装
置本体は装置ベース部から弾性体を介して支持されてい
る。これは、ステージが停止後、大地から伝わってくる
振動を防止するためである。[Description of the Prior Art] In recent years, there has been an increasing demand for extremely high-precision positioning devices in various precision measuring devices and various semiconductor-related manufacturing devices. Usually, this type of positioning device is
The device has a stage that moves in the direction, and a main body of the device that supports the stage is supported from the device base via an elastic body. This is to prevent vibrations transmitted from the ground after the stage has stopped.
第1図は、一般的な高精度位置決め装置の構成を示す。FIG. 1 shows the configuration of a general high-precision positioning device.
同図において、1は位置決めステージであり、装置本体
2上で移動をするものである。また、4は装置ベース部
であり、大地5に固定されているものである。In the figure, 1 is a positioning stage that moves on the main body 2 of the apparatus. Further, 4 is a device base portion, which is fixed to the ground 5.
また、装置本体2は、装置ベース部4に対して外来振動
を防止する目的で極めてやわらかい弾性体(例えば空気
バネ等)3で連結されている。なお、ステージ1を動か
すためには装置本体2に対してステージ1を加速または
減速する装置(一般にはモータとか送りスクリュー等)
が必要であるが、ここでは図示していない。Further, the device main body 2 is connected to the device base portion 4 by an extremely soft elastic body 3 (such as an air spring) 3 for the purpose of preventing external vibrations. In addition, in order to move stage 1, a device (generally a motor, a feed screw, etc.) that accelerates or decelerates stage 1 relative to device body 2 is required.
is required, but is not shown here.
ところで、ステージ1を装置本体2上で移動させるため
には当然のことながらステージ1に力を与えて加速し、
停止のためには逆方向に力を与えて減速してステージ1
を動かす。この際、上記の加速、減速の力はその反力を
装置本体2に与える。By the way, in order to move the stage 1 on the device main body 2, it is natural to apply force to the stage 1 and accelerate it.
To stop, apply force in the opposite direction and decelerate to stage 1.
move. At this time, the above-mentioned acceleration and deceleration forces give reaction forces to the device main body 2.
装置本体2は装置ベース部4に対して極めてやわらかい
弾性体3で支えられているため上記の反力によりステー
ジ1とは逆方向に動き始める。Since the apparatus main body 2 is supported by an extremely soft elastic body 3 against the apparatus base part 4, it begins to move in the opposite direction to the stage 1 due to the above-mentioned reaction force.
このようにしてステージ1が移動した後では装置本体2
に振動が発生し、この振動はステージ1が停止後も継続
するため極めて有害である。After the stage 1 has moved in this way, the device main body 2
This vibration is extremely harmful because it continues even after the stage 1 has stopped.
従来、このような振動を防止するため、種々の方法がと
られており、これらを列記すると次のようになる。Conventionally, various methods have been used to prevent such vibrations, and these are listed below.
a)ステージ1に対して装置本体2の重量を極めて大き
く設定し、装置本体2の発生ずる振動の振幅を小さくす
る。a) The weight of the apparatus main body 2 is set to be extremely large relative to the stage 1, and the amplitude of the vibration generated by the apparatus main body 2 is reduced.
b)ステージ1の移動速度を遅くする。b) Slow down the movement speed of stage 1.
C)装置本体2の振動を停止させる力を外部から加える
。C) Applying a force from the outside to stop the vibration of the device body 2.
しかし、これらの対策は何れも何等かの欠陥を持ってお
り、実用上程々の制限が発生ずる。However, all of these countermeasures have some kind of flaw and are subject to certain practical limitations.
すなわち、a)の方式においては、装置本体2の重量を
極めて大きくする必要があり、またb)の方式において
は装置の動作速度を下げることになるので好ましくない
。また、C)の方式においては外部に装置本体2の振動
を静止させるための極めて大きな力を発生する駆動源を
設けなければならないという不都合がある。That is, in the method a), it is necessary to make the weight of the main body 2 of the apparatus extremely large, and in the method b), the operating speed of the apparatus is reduced, which is not preferable. Further, in the method C), there is a disadvantage that a driving source that generates an extremely large force for stopping the vibration of the apparatus main body 2 must be provided externally.
[発明の目的コ
本発明の目的は、上述のような欠陥をすべて解消し、本
質的には装置本体に振動を発生させない防振構造を提供
することにある。[Object of the Invention] An object of the present invention is to eliminate all of the above-mentioned defects and to provide a vibration isolation structure that essentially does not generate vibrations in the apparatus body.
[実施例の説明] 以下、本発明の詳細な説明する。[Explanation of Examples] The present invention will be explained in detail below.
第2図は、本発明の一実施例に係る機械装置のの概略図
であり、1はステージ、2はステージ1を支持している
装置本体、6はこの上で装置本体−2がずべりにより自
由に動作可能な装置本体下部、3は装置本体下部を支持
している弾性体、4は弾性体3を介して装置本体下部6
を支持している装置ベース部であり、5は大地である。FIG. 2 is a schematic diagram of a mechanical device according to an embodiment of the present invention, in which 1 is a stage, 2 is a device main body supporting stage 1, and 6 is a mechanical device on which the device main body 2 slides. 3 is an elastic body supporting the lower part of the apparatus body; 4 is a lower part of the apparatus body 6 via the elastic body 3;
5 is the base of the device that supports the , and 5 is the ground.
この機械装置においても、ステージ1を装置本体2上ぐ
移動させると、前述の従来例と同様に、装置本体2には
ステージ1がらの反力が加えられる。Also in this mechanical device, when the stage 1 is moved above the device main body 2, a reaction force from the stage 1 is applied to the device main body 2, as in the above-mentioned conventional example.
従来例においては、この際にこの反力を何等かの力によ
り押えようとするがためにこの反力が装置本体2の振動
になるのである。In the conventional example, at this time, this reaction force is tried to be suppressed by some force, and this reaction force becomes vibration of the main body 2 of the apparatus.
しかし、本発明の機械装置においては、装置本体2が装
置本体下部6に対して固定されていないため、装置本体
2が反力を受けた際には装置本体下部6に対してすべり
により自由に移動可能となる。つまり、反力を装置本体
2のすべりによる移動で吸収し、装置本体2に振動を発
生さじないようにしている。However, in the mechanical device of the present invention, since the device main body 2 is not fixed to the device main body lower part 6, when the device main body 2 receives a reaction force, it freely slides against the device main body lower part 6. It becomes possible to move. In other words, the reaction force is absorbed by the sliding movement of the device main body 2, and vibrations are not generated in the device main body 2.
このように位置決めステージを有する機械装置において
、機械装置本体を機械装置下部に対して、自由に移動可
能な構成とすることにより機械装置本体の振動を防止す
ることが可能となる。In a mechanical device having a positioning stage as described above, by configuring the mechanical device main body to be freely movable relative to the lower part of the mechanical device, it is possible to prevent vibration of the mechanical device main body.
[発明の応用例]
なお、本発明の構成において下記のような応用も容易に
実現可能なものである。[Application Examples of the Invention] Note that the following applications can also be easily realized with the configuration of the present invention.
a)ステージが一定ストロークの移動後に装置本体の装
置本体下部に対する位置出しを再度行なう。a) After the stage has moved a certain stroke, the apparatus main body is repositioned with respect to the lower part of the apparatus main body.
b)ステージのスピードまたはステージmmの変化によ
り装置本体の装置本体下部に対する摩擦力を変更する。b) Changing the frictional force of the apparatus main body against the lower part of the apparatus main body by changing the speed of the stage or the stage mm.
この摩擦力の変更は、例えば電磁力または真空吸着力に
より摩擦力をコントロールして行なうことができる。This change in frictional force can be carried out by controlling the frictional force using, for example, electromagnetic force or vacuum suction force.
また、本発明は、任意の産業機械に使用されているシリ
ンダまたiピストン例えば油圧サーボ用シリンダ等の防
振構造としても適用することができる。Further, the present invention can be applied as a vibration-proof structure for cylinders used in any industrial machinery, i-pistons, etc., such as hydraulic servo cylinders.
[発明の効果コ
以上説明したように、本発明によると、機械装置本体に
対し−て移動可能な部材を有する機械装置において、機
械装置本体を機械装置下部に対して、自由に移動可能な
構造とすることにより機械装置本体の振動を防止するこ
とが可能となる。[Effects of the Invention] As explained above, according to the present invention, in a mechanical device having a member movable relative to the main body of the mechanical device, a structure is provided in which the main body of the mechanical device can be freely moved relative to the lower part of the mechanical device. By doing so, it is possible to prevent vibration of the main body of the mechanical device.
第1図は位置決めステージを有する従来の機械装置の概
略図であり、第2図は位置決めステージを有する本発明
の機械装置の概略図である。
1・・・ステージ、2・・・装置本体、3・・・弾性体
、4・・・装置ベース部、5・・・大地、6・・・装置
本体下部。FIG. 1 is a schematic diagram of a conventional mechanical device having a positioning stage, and FIG. 2 is a schematic diagram of a mechanical device of the present invention having a positioning stage. DESCRIPTION OF SYMBOLS 1...Stage, 2...Device main body, 3...Elastic body, 4...Device base part, 5...Ground, 6...Device main body lower part.
Claims (1)
装置の防振構造において、機械装置本体を前記移動可能
な部材の移動による影響を緩和する方向に移動可能とす
ることにより前記部材の移動の際に機械装置本体が受け
る反力を吸収せしめることを特徴とする防振構造。 2、前記移動可能な部材が、位置決めステージである特
許請求の範囲第1項記載の防振構造。 3、前記移動可能な部材が、ピストンまたはシリンダで
ある特許請求の範囲第1項記載の防振構造。[Claims] 1. In a vibration isolation structure for a mechanical device having a member that is movable relative to the main body of the mechanical device, the main body of the mechanical device is movable in a direction that alleviates the influence of movement of the movable member. A vibration-proof structure characterized by absorbing a reaction force applied to a main body of a mechanical device when said member moves. 2. The vibration isolation structure according to claim 1, wherein the movable member is a positioning stage. 3. The vibration isolation structure according to claim 1, wherein the movable member is a piston or a cylinder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16560384A JPS6145988A (en) | 1984-08-09 | 1984-08-09 | Vibration-proof structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16560384A JPS6145988A (en) | 1984-08-09 | 1984-08-09 | Vibration-proof structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6145988A true JPS6145988A (en) | 1986-03-06 |
Family
ID=15815488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16560384A Pending JPS6145988A (en) | 1984-08-09 | 1984-08-09 | Vibration-proof structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6145988A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1028456A1 (en) * | 1997-09-19 | 2000-08-16 | Nikon Corporation | Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby |
US6246204B1 (en) | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
EP1341044A2 (en) * | 1995-05-30 | 2003-09-03 | ASML Netherlands B.V. | Positioning device with a reference frame for a measuring system |
JP2019202375A (en) * | 2018-05-22 | 2019-11-28 | 国立大学法人信州大学 | 6-dof joint and device with 6-dof joint |
-
1984
- 1984-08-09 JP JP16560384A patent/JPS6145988A/en active Pending
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6844695B2 (en) | 1994-06-27 | 2005-01-18 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6252370B1 (en) | 1994-06-27 | 2001-06-26 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US7573225B2 (en) | 1994-06-27 | 2009-08-11 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6693402B2 (en) | 1994-06-27 | 2004-02-17 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6255796B1 (en) | 1994-06-27 | 2001-07-03 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6323935B1 (en) | 1994-06-27 | 2001-11-27 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6329780B1 (en) | 1994-06-27 | 2001-12-11 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US7012398B2 (en) | 1994-06-27 | 2006-03-14 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6969966B2 (en) | 1994-06-27 | 2005-11-29 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6246204B1 (en) | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6255795B1 (en) | 1994-06-27 | 2001-07-03 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US6844696B2 (en) | 1994-06-27 | 2005-01-18 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
EP1341044A3 (en) * | 1995-05-30 | 2003-10-29 | ASML Netherlands B.V. | Positioning device with a reference frame for a measuring system |
EP1341044A2 (en) * | 1995-05-30 | 2003-09-03 | ASML Netherlands B.V. | Positioning device with a reference frame for a measuring system |
EP1028456A1 (en) * | 1997-09-19 | 2000-08-16 | Nikon Corporation | Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby |
US6906782B2 (en) | 1997-09-19 | 2005-06-14 | Nikon Corporation | Stage apparatus, scanning type exposure apparatus, and device produced with the same |
EP1028456A4 (en) * | 1997-09-19 | 2003-03-05 | Nikon Corp | Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby |
JP2019202375A (en) * | 2018-05-22 | 2019-11-28 | 国立大学法人信州大学 | 6-dof joint and device with 6-dof joint |
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