JPS6137492Y2 - - Google Patents

Description

【考案の詳細な説明】 本考案は、水平なバフ面上に載置された物品の
底面を前記バフの振動および回転によりバフ研摩
する振動式のバフ研摩装置の改良に係わり、特に
載置物品を強制移動させ得るようにした振動バフ
研摩装置に関するものである。[Detailed Description of the Invention] The present invention relates to an improvement of a vibratory buffing device that buffs the bottom surface of an article placed on a horizontal buffing surface by vibration and rotation of the buff, and particularly relates to an improvement of a vibrating buffing device that buffs the bottom surface of an article placed on a horizontal buffing surface. The present invention relates to a vibrating buffing device that can forcibly move the oscillator.

一般に振動式のバフ研摩装置は水平バフ面を振
動させて、これに載置される物品（金属・非金属
等）底面をバフ研摩し、下地仕上げやつや出した
行なうために用いられている。 Generally, a vibrating buffing device is used to vibrate a horizontal buffing surface to buff the bottom surface of an article (metal, non-metal, etc.) placed on it to give a base finish or shine.

しかし、従来の振動式バフ研摩装置にあつては
このバフ研摩に供する物品がバフ面の振動で円滑
に移動する小さなものであれば、問題はないので
あるが、その物品の研摩面積（物品とハブ面との
接触面積）が大きく且つ有角の場合には、物品と
バフ面間の摩擦力が大きいために振動による移動
は困難であり、バフ研摩完了に長時間を要して、
研摩能率を低下させるという欠点を有するもので
あつた。 However, with conventional vibrating buffing equipment, there is no problem as long as the object to be buffed is small and can be moved smoothly by the vibration of the buffing surface. If the contact area with the hub surface is large and angular, the frictional force between the object and the buffing surface is large, making it difficult to move due to vibration, and it takes a long time to complete buffing.
This had the disadvantage of reducing polishing efficiency.

本考案は、上記欠点を解消し、バフ研摩すべき
被研摩材の形状および大小に関係なく効率よくバ
フ研摩でき得る振動バフ研摩装置を提供すること
を目的としてなされたものである。 The present invention has been made for the purpose of solving the above-mentioned drawbacks and providing a vibratory buffing device that can efficiently buff the material to be buffed, regardless of its shape and size.

すなわち、本案振動バフ研摩装置は水平なバフ
面上に載置された物品を研摩時の振動力を利用し
て遊回動させる自由回転促進環により強制移動せ
しめるよう構成したものであり、これを以下図面
に示す一実施例により詳細に説明する。 In other words, the vibratory buff polishing device of the present invention is configured to forcibly move an article placed on a horizontal buffing surface using a free rotation promotion ring that rotates the article using the vibration force during polishing. A detailed explanation will be given below using an embodiment shown in the drawings.

第１図は、本案振動バフ研摩装置を示す一部欠
截正面図であり、該振動バフ研摩装置は、固定台
１と、該固定台１に内装された振動力発生機構２
により、その上部で所定の振動をなし得るよう支
承された可動台５と、該可動台５上面に水平且つ
遊動状に截置せしめたバフ６と、該バフ６の周囲
を包囲し且つこれに載置される被研摩材の落下を
防止するリング状の包囲環７と、該包囲環７に嵌
脱可能でしかも前記バフ６と同調して遊回動し得
る自由回転促進環８とで構成され、前記自由回転
促進環８によりバフ面上の物品を強制移動せしめ
研摩効率を向上させるようにしたものである。 FIG. 1 is a partially cutaway front view of the vibration buff polishing apparatus of the present invention. The vibration buff polishing apparatus comprises a fixed table 1 and a vibration force generating mechanism 2 mounted on the fixed table 1.
The polishing device is composed of a movable table 5 supported at its upper part so as to be able to produce a predetermined vibration, a buff 6 placed horizontally and freely on the upper surface of the movable table 5, a ring-shaped surrounding ring 7 which surrounds the periphery of the buff 6 and prevents the material to be polished placed on it from falling off, and a free rotation promoting ring 8 which can be fitted into and detached from the surrounding ring 7 and which can rotate freely in synchronization with the buff 6, and the free rotation promoting ring 8 forcibly moves the object on the buff surface, thereby improving the polishing efficiency.

前記振動発生機構２は、電磁コイル３と、これ
に所定角度で対向するよう下端を固定して、上端
を前記可動台５に連結せしめた適数の板ばね４と
で構成したものであり、前記電磁コイル３への通
電により前記板ばね４上部が所定範囲を反復移動
し、前記可動台５を振動させ得るようになつてい
る。 The vibration generating mechanism 2 is composed of an electromagnetic coil 3 and an appropriate number of leaf springs 4 whose lower ends are fixed so as to face the electromagnetic coil 3 at a predetermined angle, and whose upper ends are connected to the movable base 5. By energizing the electromagnetic coil 3, the upper part of the leaf spring 4 moves repeatedly within a predetermined range, thereby making it possible to vibrate the movable base 5.

また前記自由回転促進環８は、第２図および第
３図に示すように、それぞれ所定高さの大小２つ
の板状環９，１０を同心的に配しこれら両環間に
直径方向に介設した仕切壁１１により一体的に連
結構成したものであり、その板状外環９は前記包
囲環７内において可及的に大径寸法とされ、板状
内環１０は板状外環９内の空間を略半分に区画す
る径寸法とされており、更にこの板状内環１０と
仕切壁１１とは板状外環９内においてバフ６面に
接しないようその下端を板状外環９底より稍高く
配置構成されている。 As shown in FIGS. 2 and 3, the free rotation promoting ring 8 includes two large and small plate-shaped rings 9 and 10 each having a predetermined height arranged concentrically and interposed in the diametrical direction between the two rings. The plate-shaped outer ring 9 is made as large in diameter as possible within the surrounding ring 7, and the plate-shaped inner ring 10 is connected integrally with the plate-shaped outer ring 9 by a partition wall 11 provided therein. The plate-shaped inner ring 10 and the partition wall 11 have a diameter dimension that divides the inner space into approximately half, and the lower ends of the plate-shaped inner ring 10 and the partition wall 11 are connected to the plate-shaped outer ring 9 so as not to touch the buff 6 surface. It is arranged and configured slightly higher than the 9 sole.

従つて、この自由回転促進環８はバフ６上では
バフ６の規則的な振動を受けた際、その振動と前
記外環９の摩擦抵抗との関係で回転動作を起こす
ものである。 Therefore, when the free rotation promoting ring 8 receives regular vibrations from the buff 6, it rotates due to the relationship between the vibrations and the frictional resistance of the outer ring 9.

尚、上記実施例では、自由回転促進環８を外・
肉環９，１０と、これらを接続する仕切壁１１に
より構成して被研摩材の大小に応じ、前記外・内
環９，１０に適宜装入し得るように区画したもの
を示したが、本案の主たる目的は、被研摩材の強
制移動にあり、よつて外環内を適数の空間に分割
する仕切壁を有するものであればその効果は同様
である。 In the above embodiment, the free rotation promoting ring 8 is removed from the outside.
Although the structure is shown as being composed of meat rings 9, 10 and a partition wall 11 connecting these, and partitioned so that the material to be polished can be loaded into the outer and inner rings 9, 10 as appropriate depending on the size of the material to be polished, The main purpose of the present invention is to forcibly move the material to be polished, and the effect will be the same if it has a partition wall that divides the inside of the outer ring into an appropriate number of spaces.

（実施例） 重量940ｇ、縦120mm、横50mm、高さ20mmの鋼製
被研摩材Ａ及び重量400ｇ、縦50mm、横50mm、高
さ20mmの鋼製被研摩材Ｂの２種につき、本考案の
振動バフ研摩装置と従来の振動バフ研摩装置とで
バフ研摩した結果、従来装置では所定の研摩に被
研摩材Ａが270分、被研摩材Ｂが160分を要した
が、本案では被研摩材Ａは220分被研摩材Ｂは120
分で所定の研摩を行なうことができた。(Example) The present invention was applied to two types of polished steel material A, which weighs 940 g and has a length of 120 mm, width of 50 mm, and height of 20 mm, and steel polished material B that weighs 400 g and has a length of 50 mm, width of 50 mm, and height of 20 mm. As a result of buffing using a vibrating buff polishing device of Material A is polished for 220 minutes, material B is polished for 120 minutes.
I was able to perform the required polishing in minutes.

以上のように本考案は水平なバフ面上に載置さ
れた被研摩材を研摩時の振動力を利用して遊回動
させる自由回転促進環により強制移動せしめるよ
うにしたことで、研摩能率を従来の約1.3倍に向
上させることができると共に被研摩材の大小に関
係なく良効率でバフ研摩できる利点を有するもの
である。 As described above, the present invention improves polishing efficiency by forcibly moving the material to be polished placed on a horizontal buffing surface using a free rotation promotion ring that uses the vibration force during polishing to rotate freely. This method has the advantage of being able to improve buffing by about 1.3 times compared to conventional methods, and also allowing efficient buffing regardless of the size of the material to be polished.

よつて本案振動ハブ研摩装置の利用価値は大で
ある。 Therefore, the proposed vibratory hub polishing device has great utility value.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の一部欠截正面図、第２図は本
考案の自由回転促進環を示す斜視図、第３図は本
考案の自由回転促進環を示す一部欠截正面図。 １は固定台、２は振動発生機構、５は可動台、
６はバフ、７は包囲環、８は自由回転促進環、９
は外環、１１は仕切壁。 FIG. 1 is a partially cutaway front view of the present invention, FIG. 2 is a perspective view of the free rotation promoting ring of the present invention, and FIG. 3 is a partially cutaway front view of the free rotation promoting ring of the present invention. 1 is a fixed base, 2 is a vibration generating mechanism, 5 is a movable base,
6 is a buff, 7 is a surrounding ring, 8 is a free rotation promotion ring, 9
is the outer ring, and 11 is the partition wall.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 固定台に内装された振動力発生機構により所定
の振動をなし得るようこの固定台上部に載設した
可動台と、該可動台上面に水平且つ遊動状に載置
せしめたバフと、該バフの周囲を包囲し且つこれ
に載置される被研摩材の落下防止用のリング形成
した包囲環と、該包囲環内において前記バフと同
調して遊回動可能且つ前記包囲環に対し可及的大
径寸法に形成した外環内を仕切壁で適数の空間に
分割してなる自由回転促進環とからなり、バフ上
の被研摩材を、前記自由回転促進環に随伴せしめ
て強制移動させながら研摩することを特微とする
振動バフ研摩装置。 A movable table is placed on the top of the fixed table so as to generate a predetermined vibration by a vibration force generating mechanism built into the fixed table, a buff is placed horizontally and freely on the top of the movable table, and the buff is an enclosing ring that surrounds the surrounding area and forms a ring for preventing the material to be polished placed thereon from falling; and an enclosing ring that is movable in synchronization with the buff within the enclosing ring and that is as close to the enclosing ring as possible. It consists of a free rotation promoting ring formed by dividing the inside of the outer ring formed into a large diameter dimension into an appropriate number of spaces by partition walls, and the material to be polished on the buff is forcibly moved along with the free rotation promoting ring. A vibrating buff polishing device that is characterized by the ability to perform polishing while polishing.