JPS6132219A - Manufacture of vertical magnetic recording medium - Google Patents

Abstract

PURPOSE:To manufacture an excellent vertical magnetic recording medium which is not wrinkled by heating rapidly a substrate, which consists of a high molecular material and travels on a cylindrical can heated at high temps., with a halogen lamp. CONSTITUTION:A substrate 1 consisting of a high molecular material is guided by a roller 3 on the inlet side of the substrate, and traveled along the surface of a cylindrical can 2 which is heated at >=120 deg.C. The substrate 1 is rapidly heated on the cylindrical can 2 by a heater 8 which is provided between the part where the substrate 1 begins to contact with the cylindrical can 2 and the part where a vapor-deposited film is formed. When the substrate 1 is rapidly heated by the heater 8, the thermal deformation of the substrate 1 is completed at a position beyond the heater 8. The substrate 1 after finishing the thermal deformation is closely and stably adhered onto the cylindrical can 2 without being wrinkled between the heater 8 and the vapor-deposited film-forming part 7. Consequently, the substrate 1 at the vapor-deposited film-forming part 7 is not wrinkled, and hence the vapor-deposited film formed at this place is not wrinkled. Accordingly, an excellent metallic film can be formed.

Description

【発明の詳細な説明】 （産業上の利用分野） 本発明は高密度記録特性をもつ垂直磁気記録媒−１＝ 体の製造方法に関するものである。[Detailed description of the invention] (Industrial application field) The present invention provides a perpendicular magnetic recording medium with high density recording characteristics-1= The present invention relates to a method of manufacturing a body.

（従来例の構成とその問題点） 従来、垂直磁気記録方式は、短波長記録特性の優れた磁
気記録方式である。この方式は磁気記録媒体の膜面に垂
直方向に媒体を磁化させるもので、媒体膜面の垂直方向
に残留磁化が残る垂直磁化膜を用いる必要がある。垂直
磁化膜としてはｃｏとＣｒを主成分とするＣｏ−Ｃｒ垂
直磁化膜が使用される。(Structure of conventional example and its problems) Conventionally, the perpendicular magnetic recording system is a magnetic recording system with excellent short wavelength recording characteristics. This method magnetizes the medium in a direction perpendicular to the film surface of the magnetic recording medium, and requires the use of a perpendicular magnetization film in which residual magnetization remains in the direction perpendicular to the medium film surface. As the perpendicular magnetization film, a Co--Cr perpendicular magnetization film containing co and Cr as main components is used.

Ｃｏ−Ｃｒ垂直磁化膜は真空蒸着法で形成された場合、
膜堆積速度が非常に早く、量産に適しているが、早い膜
堆積速度で膜を形成する際に、磁気特性の良い、カール
の無いＣｏ−Ｃｒ膜をうるには、基板を高温に加熱して
蒸着を行なう必要があるため、しわが多数発生する欠点
があった。When the Co-Cr perpendicular magnetization film is formed by vacuum evaporation method,
The film deposition rate is very fast, making it suitable for mass production. However, in order to obtain a curl-free Co-Cr film with good magnetic properties when forming a film at a fast film deposition rate, the substrate must be heated to a high temperature. Since it is necessary to carry out the vapor deposition at multiple times, there is a drawback that many wrinkles occur.

垂直磁気記録媒体の製作方法を第１図に基づいて説明す
る。基板としては、高分子材料よりなる耐熱フィルムと
して一般にポリイミドやポリアミド系のフィルムが用い
られる。膜面に垂直方向の保磁力Ｈｅ１ｌは蒸着時の基
板温度が高い程大きいことがわかっており、垂直磁化膜
として充分な記録再生特性を得るためには基板温度を１
２０℃以」二に保ち、Ｈｃｍを３００工ルステツド以上
にする必要がある。一方ポリイミドやポリアミド系の耐
熱フィルムは、その耐熱性の問題から３００℃以上で使
用することは基板の熱変形や劣化等の問題から、避ける
必要がある。一方パーマロイの蒸着においても、蒸着終
了時の基板のカールを最少限におさえる必要性から基板
温度を１２０℃以上３００℃以下にする必要がある。蒸
着終了時の基板のカールは蒸着膜の熱膨張係数と基板自
体の熱膨張係数の差によって発生する。蒸着膜の熱膨張
係数は金属材料に固有のもので、これを変えることはで
きない。従って、蒸着後の基板のカールを小さくするた
めには、基板の熱膨張係数を変化させる必要がある。し
かし、基板の熱膨張係数の変化にもある範囲があり、そ
れ以上変化させることはできない。この範囲内でカール
を小さくするためには、蒸着時の基板温度を、１２０℃
から３００℃以下にする必要がある。A method for manufacturing a perpendicular magnetic recording medium will be explained based on FIG. As the substrate, a polyimide or polyamide film is generally used as a heat-resistant film made of a polymeric material. It is known that the coercive force He1l in the direction perpendicular to the film surface increases as the substrate temperature during deposition increases, and in order to obtain sufficient recording and reproducing characteristics as a perpendicularly magnetized film, the substrate temperature should be
It is necessary to maintain the temperature at 20°C or higher and to make the Hcm 300 or higher. On the other hand, polyimide or polyamide-based heat-resistant films must be avoided from being used at temperatures above 300° C. due to heat resistance problems, such as thermal deformation and deterioration of the substrate. On the other hand, in the vapor deposition of permalloy, it is necessary to keep the substrate temperature at 120° C. or more and 300° C. or less because it is necessary to minimize curling of the substrate at the end of vapor deposition. The curl of the substrate upon completion of vapor deposition is caused by the difference between the thermal expansion coefficient of the vapor-deposited film and the thermal expansion coefficient of the substrate itself. The thermal expansion coefficient of the deposited film is unique to the metal material and cannot be changed. Therefore, in order to reduce the curl of the substrate after vapor deposition, it is necessary to change the thermal expansion coefficient of the substrate. However, there is a certain range in which the coefficient of thermal expansion of the substrate can be changed, and it cannot be changed beyond this range. In order to reduce curl within this range, the substrate temperature during vapor deposition must be 120°C.
The temperature must be lower than 300℃.

高分子材料よりなる基板１は、１２０℃から３００℃に
加熱された円筒状キャン２に沿って走行する。A substrate 1 made of a polymeric material runs along a cylindrical can 2 heated from 120°C to 300°C.

３と４は各々基板入側ローラおよび基板出側ローラで、
基板を安定に案内走行させるものである。3 and 4 are a board entry roller and a board exit roller, respectively.
It is used to guide and run the board stably.

５は蒸着源、６は遮蔽板である。基板入側ローラ３によ
り案内された高分子材料よりなる基板１は円筒状キャン
２の周面に沿って走行し、７の蒸着膜形成部で蒸着源５
から蒸着され、基板出側ローラ４に案内されて巻き取ら
れる。円筒状キャン２は、３００℃付近まで任意の温度
に設定することができ、基板出側ローラ４によって金属
膜の形成された基板１にバイアスを印加することができ
る。5 is a vapor deposition source, and 6 is a shielding plate. A substrate 1 made of a polymeric material guided by a substrate entry roller 3 runs along the circumferential surface of a cylindrical can 2, and passes through a deposition source 5 at a deposition film forming section 7.
The substrate is then evaporated and guided to the substrate exit roller 4 and wound up. The cylindrical can 2 can be set at any temperature up to around 300° C., and a bias can be applied to the substrate 1 on which a metal film is formed by the substrate exit roller 4.

バイアスの絶対値は、基板１とローラ４との間の接触が
何かの原因で悪くなったとき発生する放電による基板１
への損傷を少なくするため、２５０ｖ以下が適している
。このように金属膜のついた基板１と円筒状キャン２と
の間に電位差を設け、金属膜の蒸着された基板１が円筒
状キャン２に貼りつき、蒸着熱による熱負けを防止して
いる。しかし円筒状キャン２は高温に加熱されているた
め、ベースフィルムが円筒状キャン２に接すると、ベー
スフィルムと円筒状キャン２の温度差によって、ベース
フィルムに熱変形を生じる。そして高分子材料よりなる
基板１は、基板入側ローラ３と蒸着部７との間で熱変形
が完了しないため、熱変形によるしわが蒸着部７まで残
り、蒸着された基板１にもしわが残る欠点があった。The absolute value of the bias is determined by the electric discharge that occurs when the contact between the substrate 1 and the roller 4 deteriorates for some reason.
250v or less is suitable to reduce damage to the battery. In this way, a potential difference is created between the substrate 1 on which the metal film is attached and the cylindrical can 2, and the substrate 1 on which the metal film is deposited sticks to the cylindrical can 2, thereby preventing heat loss due to vapor deposition heat. . However, since the cylindrical can 2 is heated to a high temperature, when the base film comes into contact with the cylindrical can 2, the base film is thermally deformed due to the temperature difference between the base film and the cylindrical can 2. Since the thermal deformation of the substrate 1 made of a polymeric material is not completed between the substrate entrance roller 3 and the vapor deposition section 7, wrinkles due to the thermal deformation remain up to the vapor deposition section 7, and wrinkles also remain on the substrate 1 after vapor deposition. There were drawbacks.

（発明の目的） 本発明の目的は、従来例の欠点を解消し、しわのない良
好な垂直磁気記録媒体を製造するための方法を提供する
ことであ□る。(Objective of the Invention) An object of the present invention is to provide a method for manufacturing a good perpendicular magnetic recording medium without wrinkles by eliminating the drawbacks of the conventional example.

（発明の構成） 本発明の垂直磁気記録媒体の製造方法は、１２０℃以上
に昇温された円筒状キャンの周面に沿って走行しつつあ
る高分子材料よりなる基板上に垂直磁気記録媒体用の一
層目金属膜として、たとえば、パーマロイやＣｏ−Ｃｒ
膜を真空蒸着法により形成する際に、未蒸着の前記基板
が、前記円筒状キャンに接している部分において、基板
の円筒状キャンへの接触開始部と蒸着膜形成部との間の
位置で、加熱装置によって基板を加熱するものである。(Structure of the Invention) A method for manufacturing a perpendicular magnetic recording medium according to the present invention includes a method for producing a perpendicular magnetic recording medium on a substrate made of a polymeric material that is running along the circumferential surface of a cylindrical can heated to 120° C. or higher. For example, permalloy or Co-Cr
When forming a film by a vacuum evaporation method, in a portion of the undeposited substrate that is in contact with the cylindrical can, at a position between the starting point of contact of the substrate with the cylindrical can and the evaporated film forming part. , the substrate is heated by a heating device.

（実施例の説明） ４一 本発明の一実施例を第２図に基づいて説明する同図にお
いて、第１図と同じ部品については同一符号とし、説明
を省略する。(Description of Embodiment) 41 In this figure, an embodiment of the present invention will be explained based on FIG. 2, where the same parts as in FIG.

高分子材料よりなる基板１は、基板入側ローラ３によっ
て案内され、１２０℃以上、３００℃以下に加熱された
円筒状キャン２の表面にはいる。このとき基板１の円筒
状キャン２への接触開始部と、蒸着膜形成部との間に設
置された加熱装置８によって基板１は円筒状キャン２上
で急速に加熱をうける。通常、加熱装置８がない場合、
基板１の円筒状キャン２への接触開始部から、熱を受け
た基板ｌはこれによる熱変形を起こし、円筒状キャン２
上で亀の千秋のしわを発生する。そして、この熱変形が
終了して円筒状キャン２に一様にはりついた状態で蒸着
されれば、しわの無い蒸着膜が形成される。しかし通常
は蒸着膜形成部７へ行くまでに変形が終了していないの
で、基板１が円筒状キャン２に一様に張りついていない
状態で蒸着され、基板出側ローラ４によるバイアスによ
って円筒状キャン２に強制的に張りつけられ、基板１上
にし６一 わとして残る。A substrate 1 made of a polymeric material is guided by a substrate entry roller 3 and enters the surface of a cylindrical can 2 heated to a temperature of 120° C. or more and 300° C. or less. At this time, the substrate 1 is rapidly heated on the cylindrical can 2 by the heating device 8 installed between the contact start part of the substrate 1 with the cylindrical can 2 and the vapor deposited film forming part. Normally, if there is no heating device 8,
From the point where the substrate 1 starts contacting the cylindrical can 2, the substrate 1 that receives heat undergoes thermal deformation, and the cylindrical can 2
Kame no Chiaki's wrinkles occur on the top. When this thermal deformation is completed and the vapor is deposited uniformly on the cylindrical can 2, a wrinkle-free vapor deposited film is formed. However, normally, the deformation is not completed before reaching the deposition film forming section 7, so that the substrate 1 is deposited without being evenly stuck to the cylindrical can 2, and the cylindrical can is biased by the substrate exit roller 4. 2 and remains as a wrinkle on the substrate 1.

しかし、加熱装置８によって基板を急速に加熱した場合
、基板１の熱変形が加熱装置８の位置を越えたところで
終了しており、加熱装置８と蒸着膜形成部７との間では
、熱変形を終えた基板１が円筒状キャン２上に安定した
しわのない状態で密着するため、蒸着膜形成部７では基
板１にはしわがなく、ここで形成された蒸着膜はしわの
ない状態となり、良好な金属膜を形成することができる
。However, when the substrate is rapidly heated by the heating device 8, the thermal deformation of the substrate 1 ends when the substrate 1 exceeds the position of the heating device 8, and the thermal deformation occurs between the heating device 8 and the vapor deposited film forming section 7. Since the substrate 1 that has been subjected to the process is tightly adhered to the cylindrical can 2 in a stable and wrinkle-free state, there are no wrinkles on the substrate 1 in the vapor-deposited film forming section 7, and the vapor-deposited film formed here is wrinkle-free. , a good metal film can be formed.

なお加熱装置８としては抵抗体や光を利用したものもあ
るが、安定性、制御のしやすさや応答性のよいことから
、ハロゲンランプによる光放射を利用したものが最も適
している。The heating device 8 may be one that uses a resistor or light, but one that uses light radiation from a halogen lamp is most suitable because of its stability, ease of control, and good responsiveness.

つぎに、具体的な実施例を説明する。Next, specific examples will be described.

（１）第１実施例 Ｇｏ−Ｃｒ／ハーマロイ基板構成のものである。高分子
材料よりなる基板１として膜厚１２μｌのポリアミド系
のフィルムを用い、このフィルム上に膜厚０．２５μｍ
のパーマロイ膜を形成し、円筒状キャン２の温度は２４
０℃とし、基板出側ローラ４によって基板に印加するバ
イアスを一４０Ｖとする。加熱装置８としてｉｏｏｏｗ
のハロゲンランプ２本を電圧４０Ｖで点灯して良好な結
果を得た。なお加熱装置８の電圧は５０ｖを越すと温度
が高くなりすぎ、基板の熱劣化を発生し３０Ｖ以下では
温度が低すぎた。(1) First Example This is a Go-Cr/Hermalloy substrate structure. A polyamide film with a thickness of 12 μl is used as the substrate 1 made of a polymeric material, and a film with a thickness of 0.25 μl is placed on this film.
A permalloy film is formed, and the temperature of the cylindrical can 2 is 24
The temperature is 0° C., and the bias applied to the substrate by the substrate exit roller 4 is -40V. iooow as heating device 8
Good results were obtained by lighting two halogen lamps at a voltage of 40V. Note that when the voltage of the heating device 8 exceeded 50V, the temperature became too high, causing thermal deterioration of the substrate, and when the voltage was below 30V, the temperature was too low.

（２）第２実施例 Ｃｏ−Ｃｒ／パーマロイ／チタニウム／パーマロイ基板
構成のものである。高分子材料よりなる基板１として、
膜厚４５μｍのポリイミド系のフィルムを用い、パーマ
ロイ／チタニウム／パーマロイの総膜厚は、およそ０．
３μｍとしこの上に膜厚０．１５μｍのＣｏ−Ｃｒ膜面
を蒸着する。円筒状キャン２の温度は２５０℃とし、基
板出側ローラ４によって基板１に印加するバイアスを−
２５０Ｖとする。加熱装置８を第１実施例と同じランプ
を用い電圧５０Ｖで点灯して良好な結果となった。なお
電圧４０Ｖ以下では温度が低すぎしわを生じた。(2) Second Example This is a Co--Cr/Permalloy/Titanium/Permalloy substrate structure. As a substrate 1 made of a polymer material,
Using a polyimide film with a film thickness of 45 μm, the total film thickness of permalloy/titanium/permalloy is approximately 0.5 μm.
A Co--Cr film having a thickness of 0.15 μm is deposited on this layer with a thickness of 3 μm. The temperature of the cylindrical can 2 is 250°C, and the bias applied to the substrate 1 by the substrate exit roller 4 is -
The voltage shall be 250V. Good results were obtained when the heating device 8 was turned on at a voltage of 50 V using the same lamp as in the first embodiment. Note that when the voltage was 40 V or less, the temperature was too low and wrinkles were generated.

（発明の効果） 本発明によれば、高温に加熱された円筒状キャンの上で
、この円筒状キャンの上を走行する商会子材料よりなる
基板を、ハロゲンランプにより急速に加熱することによ
り、しわのよらいない、良好な垂直磁気記録媒体を製作
することができる効果がある。(Effects of the Invention) According to the present invention, on a cylindrical can heated to a high temperature, by rapidly heating a substrate made of Shokaishi material running on the cylindrical can with a halogen lamp, This has the effect that a good perpendicular magnetic recording medium without wrinkles can be manufactured.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は従来例の垂直磁気記録媒体製造方法を説明する
ための装置の断面図、第２図は本発明の一実施例におけ
る垂直磁気記録媒体製造方法を説明するための装置の断
面図である。 １　・・・基板、　２　・・・円筒状キャン、　３　・
・・基板入側ローラ、　４・・・基板出側ローラ、５　
・・・蒸着源、　６・・・遮蔽板、　７・・・蒸着部、
　８・・・加熱装置。 特許出願人　松下電器産業株式会社 第１図FIG. 1 is a cross-sectional view of an apparatus for explaining a conventional method for manufacturing a perpendicular magnetic recording medium, and FIG. 2 is a cross-sectional view of an apparatus for explaining a method for manufacturing a perpendicular magnetic recording medium according to an embodiment of the present invention. be. 1...Substrate, 2...Cylindrical can, 3.
... Board entry roller, 4... Board exit roller, 5
... Vapor deposition source, 6... Shielding plate, 7... Vapor deposition section,
8...Heating device. Patent applicant Matsushita Electric Industrial Co., Ltd. Figure 1

Claims (2)

【特許請求の範囲】[Claims] （１）１２０℃以上に昇温された円筒状キャンの周面に
沿って走行する高分子材料よりなる基板上に垂直磁気記
録媒体用の金属膜としてのパーマロイ、またはＣｏ−Ｃ
ｒを真空蒸着法により形成する際に、パーマロイまたは
Ｃｏ−Ｃｒと円筒状キャンとの間に電位差を設け、かつ
前記円筒状キャンに接している部分において、前記基板
の円筒状キャンへの接触開始部と蒸着膜形成部との間の
位置において、加熱装置により、前記基板を金属膜側か
ら加熱することを特徴とする垂直磁気記録媒体の製造方
法。(1) Permalloy or Co-C as a metal film for perpendicular magnetic recording media is placed on a substrate made of a polymeric material that runs along the circumferential surface of a cylindrical can heated to 120°C or higher.
When forming r by a vacuum evaporation method, a potential difference is provided between Permalloy or Co-Cr and the cylindrical can, and the substrate starts contacting the cylindrical can at a portion in contact with the cylindrical can. A method of manufacturing a perpendicular magnetic recording medium, characterized in that the substrate is heated from the metal film side using a heating device at a position between the metal film forming part and the vapor deposition film forming part. （２）前記加熱装置としてハロゲンランプを用いること
を特徴とする特許請求の範囲第（１）項記載の垂直磁気
記録媒体の製造方法。(2) The method for manufacturing a perpendicular magnetic recording medium according to claim (1), characterized in that a halogen lamp is used as the heating device.