JPS61259516A - Manufacture of thin iron nitride magnetic film - Google Patents

Abstract

PURPOSE:To enable readily the formation of a thin uniform film of iron nitride having excellent anticorrosion and hardness by forming the film by reactive ion implanting for depositing an iron with nitrogen as reaction gas. CONSTITUTION:A thin amorphous iron nitride film is formed by a manufacturing method of a magnetic recording medium by reactive ion implanting for depositing an iron with nitrogen as reaction gas. At this time the nitrogen gas pressure is preferably 8X10<-3>-1.5X10<-1>pa. Thus, a magnetic recording medium in which the coercive force is suitably alterable can be obtained.

Description

【発明の詳細な説明】 〔概　要〕 窒素を反応ガスとして鉄を蒸着する反応性イオンブレー
ティングによって保磁力の高い窒化鉄の薄膜を形成する
。[Detailed Description of the Invention] [Summary] A thin film of iron nitride with a high coercive force is formed by reactive ion blasting, which deposits iron using nitrogen as a reactive gas.

〔産業上の利用分野〕[Industrial application field]

本発明は高保磁力の磁気記録媒体として使用できる窒化
鉄薄膜の製法に関する。The present invention relates to a method for producing an iron nitride thin film that can be used as a high coercivity magnetic recording medium.

〔従来技術〕[Prior art]

窒化鉄は、耐食性および硬度に優れているので、磁気記
録材料として注目されてきた。窒化鉄は通常は酸化鉄を
□アンモニアと反応させて微粒子として得られる。この
窒化鉄微粒子を樹脂塗膜にまぜる方法が行われているが
、均質な塗膜を得ることが困難である。また特開昭５５
−３３０９３号の開示する窒化鉄のスパッタリングによ
る成膜方法はターゲットとする塊状の窒化鉄を容易に得
られないことが問題である。Iron nitride has been attracting attention as a magnetic recording material because of its excellent corrosion resistance and hardness. Iron nitride is usually obtained as fine particles by reacting iron oxide with ammonia. A method has been used in which iron nitride fine particles are mixed into a resin coating film, but it is difficult to obtain a homogeneous coating film. Also, JP-A-55
The problem with the film forming method using sputtering of iron nitride disclosed in Japanese Patent No. 33093 is that it is not easy to obtain bulk iron nitride as a target.

〔解決しようとする問題点〕[Problem to be solved]

均質な窒化鉄薄膜の簡単な製法を提供することである。 The object of the present invention is to provide a simple method for producing a homogeneous iron nitride thin film.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は、窒素を反応ガスとして鉄を蒸着する反応
性イオンブレーティングによってアモルファス窒化鉄薄
膜を形成することを特徴とする磁気記録媒体の製法によ
って解決することができる。The above problems can be solved by a method for manufacturing a magnetic recording medium characterized in that an amorphous iron nitride thin film is formed by reactive ion blating in which iron is deposited using nitrogen as a reactive gas.

〔実施例〕〔Example〕

実差側」 窒素中で純鉄を溶融させ、約２０人／Ｓの蒸着速度でマ
イクロシー１□　（Ｃｏｒｎｉｎｇ　０２１１）を基板
として蒸着させた。このとき窒素ガス圧を８×１０〜］
、５ＸＩＯＰａの範囲で変えて、得られた薄膜の窒素−
にα線対鉄−にα線の強度比を測定した。Actual difference side'' Pure iron was melted in nitrogen, and Microsea 1□ (Corning 0211) was deposited as a substrate at a deposition rate of about 20 people/S. At this time, increase the nitrogen gas pressure to 8×10 ~]
, 5XIOPa, the resulting thin film nitrogen-
The intensity ratio of alpha rays to iron was measured.

第１図に示すように、蒸着薄膜には窒素が含有されてい
て、窒化鉄が形成されていることがわかる。As shown in FIG. 1, it can be seen that the deposited thin film contains nitrogen and iron nitride is formed.

実−施刺−２一 実施例１と同様な条件で薄膜を形成した。この薄膜のＸ
線回折パターンは、第２図に示すように、真空蒸着の場
合は曲線１にα−Ｐｅ　（１１０）およびα−Ｆｅ　（
２１１）のピークが顕著に表れるが、窒素ガス圧の上昇
につれてピークが次第に低くなり、３．５Ｘ］ＯＰａで
はほとんど消失して窒化鉄がアモルファスであることが
わかる。Implementation-Application-2 A thin film was formed under the same conditions as in Example 1. This thin film
As shown in Figure 2, the line diffraction pattern shows curve 1 in the case of vacuum evaporation with α-Pe (110) and α-Fe (
211) is prominent, but as the nitrogen gas pressure increases, the peak gradually becomes lower, and at 3.5X]OPa, it almost disappears, indicating that the iron nitride is amorphous.

ＸＪ令玉１タリー−；ター 実施例１で得たＭＨ！ｉ！の保磁力は、第３図に示すよ
うに、１７０〜３１００ｅの範囲であり、この値は磁気
記録媒体として使用するのに適当であり、窒素ガス圧を
８×１０〜１．５ＸＩＯＰａの範囲で変化さゼるごとに
よって」−記範囲内で任意の値を得られた。XJ Reitama 1 tally - MH obtained in Example 1! i! As shown in Figure 3, the coercive force of is in the range of 170 to 3100e, which is suitable for use as a magnetic recording medium. By changing the value, any value within the specified range could be obtained.

〔発明の効果〕〔Effect of the invention〕

本発明によれば耐食性および硬度にずくれた窒化鉄の均
質な薄膜を容易に製造することができ、保磁力を適宜に
変えた磁気記録媒体を安価に提供することができる。According to the present invention, it is possible to easily produce a homogeneous thin film of iron nitride having poor corrosion resistance and hardness, and it is possible to provide a magnetic recording medium having an appropriate coercive force at a low cost.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明の製法による窒化鉄薄膜の鉄−にα線対
窒素−にα線の強度比と窒素ガス圧との関係を示すグラ
フであり、 第２図は本発明の製法による窒化鉄薄膜のＸ線回折パタ
ーンを示すグラフであり、 第３図は本発明の製法による窒化鉄薄膜の保磁力と窒素
ガス圧との関係を示すグラフである。 １・・・通當の真空蒸着で得られる薄膜のＸ線回折パタ
ーンFIG. 1 is a graph showing the relationship between the intensity ratio of iron α rays to nitrogen α rays and nitrogen gas pressure for an iron nitride thin film manufactured by the manufacturing method of the present invention. FIG. 3 is a graph showing the X-ray diffraction pattern of an iron thin film. FIG. 3 is a graph showing the relationship between the coercive force and nitrogen gas pressure of the iron nitride thin film produced by the manufacturing method of the present invention. 1...X-ray diffraction pattern of thin film obtained by regular vacuum deposition

Claims (1)

【特許請求の範囲】 １、窒素を反応ガスとして鉄を蒸着する反応性イオンブ
レーティングによってアモルファス窒化鉄薄膜を形成す
ることを特徴とする磁気記録媒体の製法。 ２、窒素ガス圧を８×１０＾−＾３〜１．５×１０＾−
＾１Ｐａとする、特許請求の範囲第１項記載の製法。[Claims] 1. A method for producing a magnetic recording medium, characterized in that an amorphous iron nitride thin film is formed by reactive ion blating, in which iron is deposited using nitrogen as a reactive gas. 2. Increase the nitrogen gas pressure to 8 x 10^-^3 to 1.5 x 10^-
The manufacturing method according to claim 1, wherein the pressure is 1 Pa.