JPS61241331A - Surface protecting material - Google Patents

Surface protecting material

Info

Publication number
JPS61241331A
JPS61241331A JP60083435A JP8343585A JPS61241331A JP S61241331 A JPS61241331 A JP S61241331A JP 60083435 A JP60083435 A JP 60083435A JP 8343585 A JP8343585 A JP 8343585A JP S61241331 A JPS61241331 A JP S61241331A
Authority
JP
Japan
Prior art keywords
hot melt
melt adhesive
film
antioxidant
adhesive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60083435A
Other languages
Japanese (ja)
Inventor
Mitsuo Iimura
飯村 満男
Yoshifumi Okamoto
岡本 宜文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP60083435A priority Critical patent/JPS61241331A/en
Publication of JPS61241331A publication Critical patent/JPS61241331A/en
Pending legal-status Critical Current

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  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)

Abstract

PURPOSE:A protecting material suitable as a solar cell having improved water- vapor resistance, obtained by forming a hot melt adhesive layer containing an ultraviolet light absorber and an antioxidant on the treated surface, obtained by subjecting the surface of FEP film to high-frequency sputtering etching treatment. CONSTITUTION:The surface of a tetrafluoroethylene-hexafluoropropylene copolymer film is subjected to high-frequency sputtering etching and a hot melt adhesive layer containing an ultraviolet light absorber and an antioxidant is formed on the treated surface. The sputtering etching on the film is carried out at 0.005-0.5Torr atmospheric pressure and the product of discharge powder and time is >=1W.sec/cm<2>. The hot melt adhesive comprises an ethylene-ethyl acrylate copolmer or an ethylene-vinyl acetaet copolymer as a main component and has 50-500mum layer thickness.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は表面保護材に関し、特に防湿性を要求される太
陽電池等に好適な保護材に関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a surface protective material, and particularly to a protective material suitable for solar cells and the like that require moisture resistance.

〈従来の技術とその問題点〉 太陽電池としては、例えばアルミ電極上にアモルファス
・シリコン、透明電極および表面保護材としてのガラス
板を順次積層せしめたものが知られている。
<Prior art and its problems> As a solar cell, for example, one in which amorphous silicon, a transparent electrode, and a glass plate as a surface protection material are sequentially laminated on an aluminum electrode is known.

しかしながら、この太陽電池においてはガラス板が破損
され易いばかりでなく、ガラス板と透明電極との密閉性
が必らずしも充分ではなく、防湿性に問題がめった。
However, in this solar cell, not only the glass plate is easily damaged, but also the sealing between the glass plate and the transparent electrode is not necessarily sufficient, leading to problems in moisture resistance.

本出願人はかような問題を解決するため、先に、表面に
高周波スパッタエツチング処理を施したフッ素樹脂フィ
ルムの該処理面上に、ホットメルト接着剤層を形成せし
めた表面保護材を提案した(特開昭59−73942号
公報)。
In order to solve such problems, the present applicant has previously proposed a surface protection material in which a hot melt adhesive layer is formed on the treated surface of a fluororesin film whose surface has been subjected to high frequency sputter etching treatment. (Japanese Unexamined Patent Publication No. 59-73942).

この表面保護材を用いれば、ガラス板を用いた場合に比
べ、太陽電池等における透湿による機能低下を抑制でき
、長寿命化が達成されるので、好ましいものである。
The use of this surface protective material is preferable because it can suppress functional deterioration due to moisture permeation in solar cells and the like and achieve a longer service life than when a glass plate is used.

ところで、最近、かような表面保護材における防湿性の
一層の向上が要求されるようKなった。
Incidentally, recently there has been a demand for further improvement in the moisture resistance of such surface protection materials.

〈問題点を解決するための手段〉 本発明者達は上記要求に応えるため鋭意検討の結果、表
面に高周波スパッタエツチング処理を施したテトラフル
オロエチレン−へキサフルオロプロピレン共重合体(以
下、F’EPと称す)フィルムを用いると共に、このフ
ィルムのスパツタエツチング処理面上に紫外線吸収剤お
よび酸化防止剤を含有するホットメルト接着剤層を形成
せしめることにより、防湿性がより一層向上することを
見出し、本発明を完成するに至ったものである。
<Means for Solving the Problems> In order to meet the above requirements, the inventors of the present invention made extensive studies and developed a tetrafluoroethylene-hexafluoropropylene copolymer (hereinafter referred to as F') whose surface was subjected to high-frequency sputter etching treatment. We have discovered that moisture resistance can be further improved by using a film (referred to as EP) and forming a hot melt adhesive layer containing an ultraviolet absorber and an antioxidant on the sputter etching surface of this film. , which led to the completion of the present invention.

即ち、本発明に係る表面保護材はFEPフィルムの表面
が高周波スパッタエツチング処理されており、該処理面
上に紫外線吸収剤および酸化防止剤を含有するホットメ
ルト接着剤層が形成されていることを特徴とするもので
ある。
That is, in the surface protection material according to the present invention, the surface of the FEP film is subjected to high frequency sputter etching treatment, and a hot melt adhesive layer containing an ultraviolet absorber and an antioxidant is formed on the treated surface. This is a characteristic feature.

本発明において用いるFEPフィルムの厚さは表面保護
材の用途に応じて適宜設定することができるが、通常は
約25〜300μmであり、その表面にはスパッタエツ
チング処理が施される。
The thickness of the FEP film used in the present invention can be appropriately set depending on the use of the surface protection material, but is usually about 25 to 300 μm, and the surface thereof is subjected to sputter etching treatment.

このスパッタエツチング処理とは、耐圧容器内で減圧雰
囲気下において陰陽両電極間に高周波電加速して、陰極
上のFBPフィルム表面に衝突させる処理である。この
ための装置としては、例えば特公昭56−1337号公
報、特公昭56−1338号等に記載された処理装置を
用いることができ、これら装置においては、耐圧容器内
に陰極と陽極が対向して配設され、陰極はインビーダン
ス整合器を介して高周波電源に接続され、陽極は高周波
電源のアース側に接続されて構成されている。陰極の外
側にはシールド用電極が配設され、アース電位に保たれ
ている。
This sputter etching process is a process in which a high frequency electric wave is accelerated between the negative and positive electrodes in a pressure-resistant container under a reduced pressure atmosphere, and is caused to collide with the surface of the FBP film on the cathode. As a device for this purpose, for example, the processing devices described in Japanese Patent Publication No. 56-1337, Japanese Patent Publication No. 56-1338, etc. can be used. In these devices, a cathode and an anode face each other in a pressure-resistant container. The cathode is connected to a high frequency power source via an impedance matching box, and the anode is connected to the ground side of the high frequency power source. A shielding electrode is provided on the outside of the cathode and is maintained at ground potential.

本発明においては、FEPフィルムに対するスパッタエ
ツチング処理を安定して行なうため、雰囲気圧を通常0
.005〜0.5 Torr好ましくは0.05〜0.
2 Torrに設定するのがよい。
In the present invention, in order to stably perform the sputter etching process on the FEP film, the atmospheric pressure is usually set to 0.
.. 005-0.5 Torr preferably 0.05-0.
It is best to set it to 2 Torr.

また、放電処理量、即ち、放電電力(W/cd )と処
理時間(sec )の積はIW、Sec〜以上好適には
10〜45 W −sec/−になるように行なう。
Further, the discharge processing amount, that is, the product of the discharge power (W/cd) and the processing time (sec) is set to IW, Sec or more, preferably 10 to 45 W-sec/-.

放電電力および処理時間は、放電処理量が上記所定値以
上になるようならば、いかようにも設定し得るが、実用
上から放電電力は通常0.1〜5W/cIa好ましくは
0.2〜2 W/−の範囲内で、処理時間は通常1〜3
00秒の範囲内で各々設定される。
The discharge power and treatment time can be set in any way as long as the amount of discharge treatment exceeds the above predetermined value, but from a practical standpoint, the discharge power is usually 0.1 to 5 W/cIa, preferably 0.2 to 5 W/cIa. Within the range of 2 W/-, the processing time is usually 1 to 3
Each time is set within the range of 00 seconds.

また、スパッタエツチング処理に用いる高周波電源とし
ては、通常数百−〜数千mの周波数のものを用い得るが
、実用上は工業割当周波数の13.56%IHzの電源
を用いるのが好ましい。
Further, as a high frequency power source used in the sputter etching process, a power source having a frequency of several hundred to several thousand meters can be used, but it is practically preferable to use a power source having a frequency of 13.56% IHz of the industrially allocated frequency.

雰囲気ガスとしては種々の気体を用いることができるが
、アルゴン、ヘリウム等の不活性ガス、チッ素ガス、炭
酸ガス、水蒸気等が好ましい。
Various gases can be used as the atmospheric gas, but inert gases such as argon and helium, nitrogen gas, carbon dioxide gas, water vapor, and the like are preferred.

このようにしてFBPフィルムの表面をスパッタエツチ
ング処理すると、該処理面に無数の微細針状突起が形成
される、 本発明においては、FEPフィルムのスパッタエツチン
グ処理面にエチレン−エチルアクリレート共重合体(以
下、EEAと称す)、エチレン−・酢酸ビニル共重合体
等を主成分とする厚さが通常的50〜500 )Lmの
ホットメルト接着剤層が形成されるが、防湿性、光によ
る黄変を招来し難いこと等からEEA(エチルアクリレ
ート含有量10〜25重量%が好適)を主成分として用
いるのが好適である。
When the surface of the FEP film is sputter-etched in this way, countless fine needle-like protrusions are formed on the treated surface. In the present invention, the sputter-etched surface of the FEP film is coated with ethylene-ethyl acrylate copolymer ( A hot melt adhesive layer with a thickness of typically 50 to 500 Lm is formed, which is mainly composed of ethylene-vinyl acetate copolymer (hereinafter referred to as EEA), but has good moisture resistance and yellowing due to light. It is preferable to use EEA (ethyl acrylate content preferably 10 to 25% by weight) as the main component because it is difficult to cause.

このホットメルト接着剤は紫外線吸収剤および酸化防止
剤を含有するものであり、紫外線吸収剤および酸化防止
剤の接着剤構成成分中に占る割合は、各々0.02〜4
重量%好ましくは0.05〜1重量%とされる。
This hot melt adhesive contains an ultraviolet absorber and an antioxidant, and the proportions of the ultraviolet absorber and the antioxidant in the adhesive components are each 0.02 to 4.
The weight percent is preferably 0.05 to 1 weight percent.

紫外線吸収剤の好適な例としては、2−ヒドロキシ−4
−メトキシベンゾフェノン、2−ヒドロキシ−4−オク
トキシベンゾフェノン、2−ヒトo4シー4− n−ド
デシロキシペンゾフェノン、2.4−ジヒドロキシ−ベ
ンゾフェノン等のベンゾフェノン系吸収剤、或いは2 
(2’−ヒドロキシ−5′−メチルフェニル)ベンゾト
リアゾール、2(2′−ヒドロキシ−3’−tert−
ブチル−5′−メチルフェニル)−5−クロルベンゾト
リアゾール、2−(2’−ヒドロキシ−3’ 、 5’
−ジーtert−ブチルフェニル)−5−クロロ−ペン
ツトリアゾール、2−(2’−ヒドロキシ−3’ 、 
5’−ジーtert−アミルフェニル)−ベンゾトリア
ゾール、2−(2’−ヒ)”o * V−5’ −te
rt−オクチルフェニル)−ベンゾトリアゾール等のベ
ンゾトリアゾール系吸収剤を挙げることができる。
A suitable example of the ultraviolet absorber is 2-hydroxy-4
- benzophenone absorbents such as methoxybenzophenone, 2-hydroxy-4-octoxybenzophenone, 2-human o4-4-n-dodecyloxypenzophenone, 2,4-dihydroxy-benzophenone, or 2-hydroxybenzophenone;
(2'-hydroxy-5'-methylphenyl)benzotriazole, 2(2'-hydroxy-3'-tert-
Butyl-5'-methylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3', 5'
-di-tert-butylphenyl)-5-chloro-penztriazole, 2-(2'-hydroxy-3',
5'-di-tert-amylphenyl)-benzotriazole, 2-(2'-hy)"o*V-5'-te
Examples include benzotriazole-based absorbents such as rt-octylphenyl)-benzotriazole.

また、酸化防止剤の好適な例としては、テトラキス〔メ
チレン−3(3,5−ジーtert−ブチルー4−ヒド
ロキシフェニル〕グロビオネート〕メタン、2,6−シ
ーtert−ブチル−4−メチルフェノール、2.i−
メチレンビス(4−メチル−5−tert−−−ブチル
フェノール)、ステアリル−β−(3、5−ジーter
t−ブチルー4−ヒドロキシフェノール)プロピオネ−
)、4.4’−チオビス(3−メチル−5−tert−
ブチルフェノール)等のフェノール系酸化防止剤を挙げ
ることができる。
Further, preferable examples of the antioxidant include tetrakis[methylene-3(3,5-di-tert-butyl-4-hydroxyphenyl]globionate]methane, 2,6-di-tert-butyl-4-methylphenol, .i-
methylenebis(4-methyl-5-tert---butylphenol), stearyl-β-(3,5-tert
t-Butyl-4-hydroxyphenol)propione
), 4,4'-thiobis(3-methyl-5-tert-
Examples include phenolic antioxidants such as butylphenol).

かような本発明の表面保護材を太陽電池用保護材のよう
な透明性が要求される用途に適用する場合には、その全
光線透過率(JIS −K −6714により測定)を
90%以上にするのが好ましい。
When the surface protection material of the present invention is applied to applications requiring transparency such as a protection material for solar cells, the total light transmittance (measured according to JIS-K-6714) should be 90% or more. It is preferable to

本発明の表面保護材におけるFEPフィルムとホットメ
ルト接着剤との接着力は、スパッタエツチング処理によ
りフィルム表面に形成された微細針状突起が接着剤に対
して投錨効果を発揮するため、大きなものとなる。
The adhesive force between the FEP film and the hot melt adhesive in the surface protection material of the present invention is large because the fine needle-like protrusions formed on the film surface by the sputter etching process exert an anchoring effect on the adhesive. Become.

本発明の表面保護材を用いて太陽電池を密封すると、電
池の延命効果が得られることが判明した。
It has been found that when solar cells are sealed using the surface protection material of the present invention, the life span of the cells can be extended.

この理由は必らずしも明らかではないが、ホットメルト
接着剤層が透明電極に強固に接合するので、この界面に
おける密閉性が優れたものとなり、またFBPフィルム
とホットメルト接着剤層との接着力は前記した如く大き
なものでibb、この界面の密閉性も優れているので、
電池表面付近の防湿性は万全で、水分は電池表面で遮断
され内部への到達が防止され、透明電極やアモルファス
・シリコンが水分から保護されると共に、ホットメルト
接着剤における太陽光にさらされることによる紫外線劣
化および太陽光集光による温度上昇に起因する熱劣化を
、紫外線および酸化防止剤の配合により抑制β全防止し
、その機能が長期維持されるためと推論される。
The reason for this is not necessarily clear, but since the hot melt adhesive layer is firmly bonded to the transparent electrode, the sealing performance at this interface is excellent, and the bond between the FBP film and the hot melt adhesive layer is excellent. As mentioned above, the adhesive strength is large, ibb, and the sealing properties of this interface are also excellent, so
The area near the battery surface is completely moisture-proof, and moisture is blocked by the battery surface and prevented from reaching the inside, protecting the transparent electrodes and amorphous silicon from moisture, and preventing exposure to sunlight in hot melt adhesives. It is inferred that this is because the combination of ultraviolet rays and antioxidants completely prevents UV deterioration due to ultraviolet rays and thermal deterioration due to temperature rise due to concentrated sunlight, thereby maintaining its function for a long period of time.

本発明の表面保護材は太陽電池以外1例えば太陽光集熱
器、太陽光選択吸収膜等の保護材としても有用である。
The surface protective material of the present invention is also useful as a protective material for things other than solar cells, such as solar heat collectors and solar selective absorption films.

〈実施例〉 以下、実施例により本発明を更に詳細に説明する。<Example> Hereinafter, the present invention will be explained in more detail with reference to Examples.

実施例1 厚さ100 )1mのFEPフィルムの片面を周波数1
3.56MHzの高周波電圧を印加し、放電電力3W/
−1雰凹気圧0.1 Torr (雰囲気ガスとしてア
ルゴンガス使用)の条件で10秒間スパッタエツチング
処理する。
Example 1 One side of a 1m FEP film (thickness 100) was heated to a frequency of 1
A high frequency voltage of 3.56 MHz was applied, and the discharge power was 3 W/
A sputter etching process is performed for 10 seconds under the condition of -1 atmosphere pressure of 0.1 Torr (argon gas is used as the atmosphere gas).

次K、FEPフィルムのスパッタエツチング処理面上に
厚さ350μmのホットメルト接着剤層を形成し、全光
線透過率85%の表面保護材(試料番号1)を得た。
Next, a 350 μm thick hot melt adhesive layer was formed on the sputter-etched surface of the FEP film to obtain a surface protection material (sample number 1) with a total light transmittance of 85%.

なお、ホットメルト接着剤はEEA 100重量部、紫
外線吸収剤2−(2’−ヒドロキシ−5−tert −
オクチルフェニル)ベンゾトリアゾール0.5重量部お
よび酸化防止剤テトラキス〔メチレン−3(3,5−ジ
ーtert−ブチルー4−ヒドロキシフェニル)グロビ
オネート〕メタン()、3重量部から成るものを用いた
The hot melt adhesive contains 100 parts by weight of EEA and an ultraviolet absorber 2-(2'-hydroxy-5-tert-
A compound consisting of 0.5 parts by weight of octylphenyl)benzotriazole and 3 parts by weight of the antioxidant tetrakis[methylene-3(3,5-di-tert-butyl-4-hydroxyphenyl)globionate]methane () was used.

この表面保護材2枚の間にアルミニウム電極、アモルフ
ァス・シリコンおよび酸化スズ薄膜から成る透明電極が
順次積層せしめられた太陽電池を挾み込み、温度125
℃、圧カフ Kg/−の条件で5分間加熱加圧して、保
護材相互および保護材と太陽電池とを接着せしめ、これ
をサンシャインウェザ−メタ−中で1000時間放置し
た後、電池の変換効率を測定して得た結果を第1表に示
す。なお、第1表の変換文率の欄における「前」および
「後」はウェザ−メーター「投入前」および「投入後」
を各々示す。
A solar cell, in which transparent electrodes made of aluminum electrodes, amorphous silicon, and tin oxide thin films were successively laminated, was sandwiched between the two sheets of surface protection material, and the temperature was increased to 125°C.
℃, pressure cuff Kg/- for 5 minutes to bond the protective materials to each other and the protective materials to the solar cell, and after leaving it in the Sunshine Weather Meta for 1000 hours, the conversion efficiency of the battery was determined. The results obtained are shown in Table 1. In addition, "before" and "after" in the conversion rate column of Table 1 refer to "before" and "after" weather meter.
are shown respectively.

実施例2 FEPフィルムに対するスパッタエツチング処理条件を
第1表に示すように設定する以外は全て実施例1と同様
に作業して、3種の表面保護材(試料番号2〜4)を得
た。これら表面保護材の性能を第1表に示す。
Example 2 Three types of surface protection materials (sample numbers 2 to 4) were obtained in the same manner as in Example 1, except that the sputter etching conditions for the FEP film were set as shown in Table 1. Table 1 shows the performance of these surface protection materials.

実施例3 紫外線吸収剤として2−ヒドロキシ−4−オクトキシベ
ンゾフェノンを、酸化防止剤として2゜6−シーter
t−ブチル−4−メチルフェノールを各々用いる以外は
全て実施例1と同様に作業して、表面保護材(試料番号
5)を得た。
Example 3 2-hydroxy-4-octoxybenzophenone as an ultraviolet absorber and 2°6-sheeter as an antioxidant
A surface protection material (Sample No. 5) was obtained in the same manner as in Example 1 except that t-butyl-4-methylphenol was used in each case.

実施例4 紫外線吸収剤および酸化防止剤の配合量を第1表に示す
ように設定する以外は全て実施例3の場合と同様に作業
し、6種の表面保護材(試料番号6〜11)を得た。
Example 4 Six types of surface protection materials (sample numbers 6 to 11) were prepared in the same manner as in Example 3, except that the amounts of ultraviolet absorbers and antioxidants were set as shown in Table 1. I got it.

参考例1 紫外線吸収剤および酸化防止剤の配合量を第1表に示す
ように設定する以外は全て実施例3の場合と同様にして
作業して3種の表面保護材(試料番号12〜14)を得
た。これら表面保護材の性能を第1表に示す。
Reference Example 1 Three types of surface protection materials (sample numbers 12 to 14) were prepared in the same manner as in Example 3, except that the amounts of ultraviolet absorbers and antioxidants were set as shown in Table 1. ) was obtained. Table 1 shows the performance of these surface protection materials.

〈発明の効果〉 上記実施例および参考例からも判るように、本発明の表
面保護材は防湿性が一段と改善されており、太陽電池等
の長寿命化を達成できる。
<Effects of the Invention> As can be seen from the above Examples and Reference Examples, the surface protection material of the present invention has further improved moisture resistance, and can achieve longer lifespans of solar cells and the like.

Claims (1)

【特許請求の範囲】[Claims] テトラフルオロエチレン−ヘキサフルオロプロピレン共
重合体フィルムの表面が高周波スパッタエッチング処理
されており、該処理面に紫外線吸収剤および酸化防止剤
を含有するホットメルト接着剤層が形成されて成る表面
保護材。
A surface protection material comprising a tetrafluoroethylene-hexafluoropropylene copolymer film whose surface is subjected to high frequency sputter etching treatment, and a hot melt adhesive layer containing an ultraviolet absorber and an antioxidant is formed on the treated surface.
JP60083435A 1985-04-17 1985-04-17 Surface protecting material Pending JPS61241331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60083435A JPS61241331A (en) 1985-04-17 1985-04-17 Surface protecting material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60083435A JPS61241331A (en) 1985-04-17 1985-04-17 Surface protecting material

Publications (1)

Publication Number Publication Date
JPS61241331A true JPS61241331A (en) 1986-10-27

Family

ID=13802351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60083435A Pending JPS61241331A (en) 1985-04-17 1985-04-17 Surface protecting material

Country Status (1)

Country Link
JP (1) JPS61241331A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1364762A1 (en) * 2002-05-23 2003-11-26 Asahi Glass Company Ltd. Release film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1364762A1 (en) * 2002-05-23 2003-11-26 Asahi Glass Company Ltd. Release film

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