JPS61222934A - Production of optical fiber preform - Google Patents

Production of optical fiber preform

Info

Publication number
JPS61222934A
JPS61222934A JP5539985A JP5539985A JPS61222934A JP S61222934 A JPS61222934 A JP S61222934A JP 5539985 A JP5539985 A JP 5539985A JP 5539985 A JP5539985 A JP 5539985A JP S61222934 A JPS61222934 A JP S61222934A
Authority
JP
Japan
Prior art keywords
optical fiber
layer
core
gas
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5539985A
Other languages
Japanese (ja)
Other versions
JPH02304B2 (en
Inventor
Makoto Tsukamoto
誠 塚本
Koji Okamura
浩司 岡村
Masaji Miki
三木　正司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5539985A priority Critical patent/JPS61222934A/en
Publication of JPS61222934A publication Critical patent/JPS61222934A/en
Publication of JPH02304B2 publication Critical patent/JPH02304B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2203/00—Fibre product details, e.g. structure, shape
    • C03B2203/10—Internal structure or shape details
    • C03B2203/22—Radial profile of refractive index, composition or softening point

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

PURPOSE:To reduce the transmission loss of an optical fiber also at the lower wavelength side, by increasing the feed of GeCl4 gas during the formation of the intermediate deposition layer in the production of an optical fiber preform by inside chemical vapor deposition process, and decreasing the feeding rate of SiCl4 gas according to the increase of the number of deposition layers. CONSTITUTION:The feeding rate (M2) of GeCl4 gas to a quartz tube is increased in the formation of the intermediate deposition layer of core deposition layers compared with the feeding rate in the formation of the initial deposition layer and the final deposition layer. The feeding rate (N2) of SiCl4 gas is adjusted to decrease according to the increase of the number of the deposition layers from the stage of the formation of the initial layer of the core deposition layers. The optical fiber produced by the spinning of the optical fiber preform produced by the above process has low transmission loss at a short wavelength band 0f 0.85mum wavelength not to mention the long wavelength range, i.e. 1.3mum wavelength.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、内付化学気相堆積法による光ファイバ母材の
製造方法の改良に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in a method for manufacturing an optical fiber preform by an internal chemical vapor deposition method.

石英系光ファイバ母材の１つの製造方法である内付化学
気相堆積法は、ガラスの原料である５ｉＣ１４、ＧｅＣ
ｌ４．　　ＰＯＣｌ３．　ＢＢｒ３等の原料ガスを酸素
とともに、加熱した石英管内に送込み、石英管の内壁面
にクラッド堆積層と、クラッド堆積層よりも屈折率の大
きいコア堆積層を堆積合成する方法である。The internal chemical vapor deposition method, which is one of the manufacturing methods for silica-based optical fiber preforms, uses glass raw materials such as 5iC14 and GeC.
l4. POCl3. This is a method in which a raw material gas such as BBr3 is fed into a heated quartz tube together with oxygen, and a cladding layer and a core layer having a higher refractive index than the cladding layer are deposited and synthesized on the inner wall surface of the quartz tube.

この際、光ファイバ母材を紡糸して得られた光ファイバ
の伝送損失の低いことは勿論のこと、堆積層の形成時間
が速いことの要望が強い。At this time, there is a strong demand that the optical fiber obtained by spinning the optical fiber preform not only has a low transmission loss but also has a fast deposition layer formation time.

第３図は内付化学気相堆積法による光ファイバ母材の製
造方法を示す断面図であって、１は光フプイバのクラッ
ドを形成する、例えば外径２５龍。FIG. 3 is a cross-sectional view showing a method of manufacturing an optical fiber preform by internal chemical vapor deposition, in which 1 is a fiber with an outer diameter of 25 mm, for example, which forms the cladding of an optical fiber.

内径２２Ｂ、長さ８００鶴の石英管である。It is a quartz tube with an inner diameter of 22B and a length of 800 mm.

石英管１の両端には石英管１をガラス旋盤７に装着して
回転させるサポート管が融着され、この２つのサポート
管のうち、ガラス旋盤７のベッド上に装着された駆動側
チャック５に支持されるのが排気側サポート管３であり
、従動側チャック６に支持されるのが投入側サポート管
２である。Support tubes for mounting and rotating the quartz tube 1 on a glass lathe 7 are fused to both ends of the quartz tube 1, and one of these two support tubes is attached to a drive-side chuck 5 mounted on the bed of the glass lathe 7. What is supported is the exhaust side support pipe 3, and what is supported by the driven side chuck 6 is the input side support pipe 2.

投入側サポート管２の端末は絞られて、回転ジツイント
９を介して原料ガス供給装置１０に連結されている。The end of the input side support pipe 2 is constricted and connected to a raw material gas supply device 10 via a rotating shaft 9.

原料ガス供給装置ｉ１０は、ガラスの原料であるＳ　１
Ｃｆ４．　ＧｅＣ１ｇ、　　Ｐ　ＱＣ１３，ＢＢｒ３等
の原料ガス及び０□を蓄え、所望の温度（例えば４０℃
）で、原料ガスごとに所定の供給量に調整して石英管１
に供給する装置である。The raw material gas supply device i10 supplies S1, which is a raw material for glass.
Cf4. 1g of GeC, PQC13, BBr3, etc. and 0□ are stored and heated to a desired temperature (e.g. 40℃
), adjust the supply amount to the specified amount for each raw material gas, and then
This is a device that supplies

ガラス旋盤７のベッド上を、石英管１の軸心に平行して
往復運動する酸水素バーナ−８は、石英管１の外周面を
１３００℃乃至１６００℃に加熱し、原料ガスに石英管
１内で熱酸化反応を起こさせるものである。The oxyhydrogen burner 8, which reciprocates on the bed of the glass lathe 7 in parallel with the axis of the quartz tube 1, heats the outer peripheral surface of the quartz tube 1 to 1300°C to 1600°C, and injects the quartz tube 1 into the raw material gas. This causes a thermal oxidation reaction to occur within the reactor.

この酸水素バーナ−８の前進（投入側サポート管２側よ
り排気側サポート管３側への移動を云う、符号Ｘ、で示
す）は通常２０ｃｍ１分であり、後退（符号Ｘ２で示す
）速度は、例えば１５００ｃｍ／分と早い速度である。The forward movement of this oxyhydrogen burner 8 (movement from the input side support pipe 2 side to the exhaust side support pipe 3 side, indicated by the symbol X) is normally 20 cm 1 minute, and the backward speed (indicated by the symbol X2) is , for example, at a high speed of 1500 cm/min.

したがって、長さ８０ｃｍの石英管１に、１層のガラス
層を堆積する時間は４分以上を要していた。Therefore, it took more than 4 minutes to deposit one glass layer on the 80 cm long quartz tube 1.

また、コア堆積層数は、屈折率分布形状を滑らかにする
ため、通常５０ＩｉＩは必要であるので、コア堆積層の
形成には、２００分以上の長時間を要していた。Further, since the number of core deposited layers is usually 50IiI in order to smooth the refractive index distribution shape, it takes a long time of 200 minutes or more to form the core deposited layer.

〔従来の技術〕[Conventional technology]

この酸水素バーナ−８の移動速度を早くして、光ファイ
バ母材の製造時間を短縮するため、従来は下記の手段が
行われている。In order to increase the moving speed of the oxyhydrogen burner 8 and shorten the manufacturing time of the optical fiber preform, the following measures have been conventionally used.

酸水素バーナ−８の前進速度を２５印／分にして繰り返
し移動し、石英管１に５ｉＣ１４ガスを１０００ｃｃ／
分、ＰＯＣｈガスを１００ｃｃ／分の供給量で供給して
、ＳｉＯ□−Ｐ２Ｏ，のクラッド堆積層２１を５層、石
英管ｌの内壁面に形成している。The oxyhydrogen burner 8 was moved repeatedly at a forward speed of 25 marks/min, and 1000 cc/min of 5iC14 gas was supplied to the quartz tube 1.
POCh gas was supplied at a rate of 100 cc/min to form five cladding deposited layers 21 of SiO□-P2O on the inner wall surface of the quartz tube l.

その後、クラッド堆積１ｉ２１の内面に、Ｓ　ｉ０２　
　Ｇｅ０ｚ　　ＰｚＯｓ の組成のコア堆積層２２を５０層形成するようにしてい
る。After that, Si02 is applied to the inner surface of the cladding deposited 1i21.
Fifty core deposit layers 22 having a composition of Ge0zPzOs are formed.

第２図は縦軸に原料ガスの供給流量（ｃｃ／分）を、横
軸にコア堆積層数を示し、曲線Ｍ、はＧｅＣｌ４の供給
流量であり、直線Ｎ、は５ｉＣ１４の供給流量である。In Figure 2, the vertical axis shows the supply flow rate (cc/min) of the raw material gas, and the horizontal axis shows the number of core deposited layers, where the curve M is the supply flow rate of GeCl4, and the straight line N is the supply flow rate of 5iC14. .

Ｓ　１ｃ１４ガス、及び０２はコア堆積層２２の形成全
過程を通じて一定で、供給流量は１０００ｃｃ／分であ
り、ＰＯＣ１！ガスは３５０ｃｃ／分で一定である。S 1c14 gas and 02 are constant throughout the formation process of the core deposit layer 22, the supply flow rate is 1000 cc/min, and POC1! Gas is constant at 350 cc/min.

そして、ＧｅＣｌ４の量は、光ファイバの屈折率分布曲
線がほぼ梯形である屈折率分布指数が４になるようにす
るために、コア堆積層数の初期には、はぼ１５０ｃｃ／
分で少なく、コア堆積層２２の層数の増加とともに、漸
増して曲ｍＭ＋のようにしている。そして、コア堆積層
２２の最内側層である５０層目においては、１８００ｃ
ｃ／分である。The amount of GeCl4 is approximately 150 cc/GeCl4 at the initial stage of the number of core deposited layers in order to make the refractive index distribution index of the optical fiber almost trapezoidal.
As the number of layers of the core deposited layer 22 increases, it gradually increases to a curve mM+. In the 50th layer, which is the innermost layer of the core deposit layer 22, the 1800c
c/min.

従来は上述のように屈折率分布指数を調整形成するのに
、５ｉＣ１４ガスは一定にしＧｅＣ１＊ガスの供給量を
調整供給して、酸水素バーナ−８の移動速度を早くして
、光ファイバ母材の製造時間を短縮している。Conventionally, in order to adjust and form the refractive index distribution index as described above, the 5iC14 gas was kept constant, the GeC1* gas was adjusted and supplied, the moving speed of the oxyhydrogen burner 8 was increased, and the optical fiber motherboard was formed. It shortens the manufacturing time of materials.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら上記従来の製造方法による光ファイバ母材
を紡糸して、得られた光ファイバは、波長１．３μｍの
光波の伝送損失が０．６８　ｄＢ／　ｋａ＋と低損失で
あるが、波長０．８５μｍの光波の伝送損失が２．８５
　ｄＢ／ｋｍと高いという問題点がある。However, the optical fiber obtained by spinning the optical fiber preform by the above-mentioned conventional manufacturing method has a low transmission loss of 0.68 dB/ka+ for light waves with a wavelength of 1.3 μm; The transmission loss of the light wave is 2.85
There is a problem in that it is as high as dB/km.

〔問題点を解決するための手段〕[Means for solving problems]

上記従来の問題点を解決するため本発明にいては、Ｇｅ
Ｃｌ４ガスの供給量を、コア堆積層の中間堆積層形成時
に、初期堆積層及び後期堆積層形成時よりも多くし、且
つＳｉＣ１ｇガスの供給量を、該コア堆積層の初期層形
成時より層数の増加とともに滅じて供給するようにして
、光ファイバのコアの屈折率分布曲線が所望になるよう
に調整形成するものである。In order to solve the above conventional problems, in the present invention, Ge
The amount of Cl4 gas supplied is made larger when forming the intermediate deposited layer of the core deposited layer than when the initial deposited layer and the later deposited layer are formed, and the supplied amount of SiC1g gas is made larger when forming the intermediate deposited layer of the core deposited layer than when forming the initial deposited layer of the core deposited layer. The refractive index distribution curve of the core of the optical fiber is adjusted and formed as desired by supplying the refractive index as the number increases.

〔作用〕[Effect]

従来方法で得られた光ファイバが、波長１．３μｍで伝
送損失が小さく、波長０．８５μｍで伝送損失が大きい
のは、コア堆積層中に生成されるＧｅＯの紫外吸収する
に起因する。The reason why the optical fiber obtained by the conventional method has a small transmission loss at a wavelength of 1.3 μm and a large transmission loss at a wavelength of 0.85 μm is due to the ultraviolet absorption of GeO generated in the core deposited layer.

このＧｅＯは、酸水素バーナーの移動速度が早く、且つ
、ＧｅＣｌ４ガスの供給量が多いので、所定に期待する
、 ＧｅＣｌ４＋Ｏｚ−ＧｅＯｇ　＋　２層１ｇの酸化反応
時間が不足で、 ２　ＧｅＣ１ａ、＋Ｏｔ”ＧｅＯ＋　４Ｃｂの反応によ
り生成されるものである。Since the movement speed of the oxyhydrogen burner is fast and the amount of GeCl4 gas supplied is large, the GeCl4+Oz-GeOg+2 layer 1g oxidation reaction time is insufficient, and 2GeC1a,+Ot"GeO+ It is produced by the reaction of 4Cb.

上記本発明の手段によれば、酸水素バーナーの移動時間
が早いにもかかわらず、Ｇ１３Ｃ１４ガスが所定に少な
く調整供給されるので、ＧｅＣｌ４ガスが過供給となら
ない。よって、ＧｅＯ□の生成時間が確保され、ＧｅＯ
が生成されない。According to the above-mentioned means of the present invention, even though the moving time of the oxyhydrogen burner is fast, the G13C14 gas is adjusted to be supplied in a predetermined small amount, so that the GeCl4 gas is not oversupplied. Therefore, the generation time of GeO□ is secured, and the GeO
is not generated.

また、Ｓ　ｉｃｌ＊ガスの供給量が、コア堆積層の初期
層形成時より層数の増加とともに減じて、最終堆積層形
成時には、ＧｅＣｌ４ガスの供給量より少なく供給する
ので、コアの所望の屈折率分布曲線が得られる。In addition, the supply amount of SiCl* gas decreases as the number of layers increases from the time of initial layer formation of the core deposited layer, and when the final deposited layer is formed, it is supplied less than the supply amount of GeCl4 gas, so that the desired refraction of the core can be achieved. A rate distribution curve is obtained.

〔実施例〕〔Example〕

第１図は本発明の１実施例の、原料ガス供給組成図であ
る。FIG. 1 is a raw material gas supply composition diagram in one embodiment of the present invention.

。　　　　　　　　本発明は、第３図に示す装置を使用
し、酸水素バーナ−８の前進速度を２５ｃｍ／分にして
繰り返し移動し、石英管１に５ｉＣ１，ガスを１０００
ｃｃ／分、ＰＯＣｈガスを１００ｃｃ／分、０！を１０
００ｃｃ／分の供給量で供給して、５ｉＯｚ　−Ｐ２Ｏ
３のクラッド堆積層２１を５層、石英管ｌの内壁面に従
来と同様に形成している。. The present invention uses the apparatus shown in FIG. 3, moves the oxyhydrogen burner 8 repeatedly at a forward speed of 25 cm/min, and injects 5 iC1 gas into the quartz tube 1 at a rate of 1000.
cc/min, POCh gas 100cc/min, 0! 10
00cc/min supply rate, 5iOz -P2O
Five layers of the cladding deposited layers 21 of No. 3 are formed on the inner wall surface of the quartz tube l in the same manner as before.

その後、クラッド堆積層２１の内面に、Ｓ　ｉｏｚ　　
　Ｇｅｍ５　　　ＰｚＯｓの組成のコア堆積層２２を５
０層形成するようにしている。After that, Sioz is applied to the inner surface of the cladding layer 21.
Gem5 The core deposited layer 22 with the composition of PzOs is
0 layers are formed.

この場合、それぞれの原料ガスの供給量は、第３図の原
料ガス供給組成図に示すような供給量である。In this case, the supply amount of each raw material gas is as shown in the raw material gas supply composition diagram of FIG. 3.

第３図は縦軸に原料ガス供給流量（ｃｃ／分）を、横軸
にコア堆積層数を示し、曲線Ｍ！はＧｅＣ１１ガスの供
給流量であり、直線Ｎ２は５ｉＣ１４の供給流量である
。In FIG. 3, the vertical axis shows the raw material gas supply flow rate (cc/min), the horizontal axis shows the number of core deposited layers, and the curve M! is the supply flow rate of GeC11 gas, and the straight line N2 is the supply flow rate of 5iC14.

０□はコア堆積層２２の形成全過程を通じて一定で、１
０００ｃｃ／分であり、ＰＯＣｌ３ガスはコア堆積層２
２の最初の１層目の形成時には１５００ｃｃ／分で供給
し、その後は層数の増加とともに、定量ずつ直線的に減
じて、最終の堆積層形成時である５０層目には、５００
ｃｃ／分になるようにしている。0□ is constant throughout the formation process of the core deposited layer 22, and 1
000cc/min, and the POCl3 gas is
When forming the first layer of 2, it was supplied at a rate of 1,500 cc/min, and thereafter, as the number of layers increased, it was linearly reduced by a constant amount, and when the final deposited layer was formed, at the 50th layer, 500 cc/min was supplied.
cc/min.

一方、ＧｅＣｌ４の供給量はコア堆積層２２の最初の１
層目は１５０ｃｃ／分で、以後層数の増加とともに漸増
し、中間層の２５層目でほぼ１４００ｃｃ／分の最高値
となり、その後、層数の増加とともに漸減して、最終の
堆積層形成時である５０層目には、８００ｃｃ／分にな
るようにしている。On the other hand, the supply amount of GeCl4 is
The speed of each layer is 150 cc/min, which gradually increases as the number of layers increases, reaching a maximum value of approximately 1400 cc/min at the 25th intermediate layer, and then gradually decreases as the number of layers increases, until the final deposited layer is formed. In the 50th layer, the flow rate is set to 800 cc/min.

このように、光ファイバの屈折率を高くする添加物原料
であるＧｅＣｌ４ガスを、中高の曲ＮａＭ　ｚにしたが
って供給し、光ファイバの屈折重分−布曲線がほぼ梯形
である屈折率分布指数が４になるようにしている。In this way, GeCl4 gas, which is an additive raw material that increases the refractive index of an optical fiber, is supplied according to the mid-high curve NaMz, and the refractive index distribution index of the optical fiber is made such that the refraction weight distribution curve is almost trapezoidal. I'm trying to get it to 4.

このようにして得られた光ファイバ母材は、後期のコア
堆積層形成時に、従来方法°に比較して著しくＧｅＣ１
ａガスの供給量が少ないので、ＧｅＯが生成量が極めて
少ない。The optical fiber preform obtained in this way has a significantly higher GeCl content during the formation of the core deposited layer in the latter stage compared to the conventional method.
Since the amount of a gas supplied is small, the amount of GeO produced is extremely small.

よって、このような光ファイバ母材を紡糸して得られた
光ファイバは、波長１．３μｍの光波の伝送損失がほぼ
０．６８ｄＢ／に１１で低損失であることは勿論のこと
、波長０．８５μｍの光波の伝送損失も２、３０　ｄＢ
／ｋｍとなり、従来に比較して０．５ｄＢ／ｋｍ低くす
ることができた。Therefore, the optical fiber obtained by spinning such an optical fiber base material not only has a low transmission loss of approximately 0.68 dB/11 for light waves with a wavelength of 1.3 μm, but also has a low transmission loss of approximately 0.68 dB/11. .85μm light wave transmission loss is also 2.30 dB
/km, which is 0.5 dB/km lower than the conventional method.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明は、波長０．８５μｍの短波
長帯においても、伝送損失が少なく、且つ、光ファイバ
母材の製造時間が短い等、実用上で優れた効果がある。As explained above, the present invention has excellent practical effects such as low transmission loss and short manufacturing time of the optical fiber preform even in the short wavelength band of 0.85 μm.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明の１実施例の原料ガス供給組成図、 第２図は従来の原料ガス供給組成図、 第３図は内付化学気相堆積法による光ファイバ母材の製
造方法を示す断面図である。 図において、 １は石英管、 ２は投入側サポート管、 ３は排気側サポート管、 ５は駆動側チャック、 ６は従動側チャック、 ７はガラス旋盤、 ８は酸水素バーナ−， ９は回転ジヨイント、 ＩＯは原料ガス供給装置、 ２１はクラッド堆積層、 ２２はコア堆積層、 Ｍ　Ｉ、　Ｍ　ｚはＧｅＣｌ４供給曲線、Ｎ　＋、　Ｎ
　ｚはＳ　ｉＣＬ供給曲線を示す。 第　１　り 警　２　固Fig. 1 shows a raw material gas supply composition diagram of one embodiment of the present invention, Fig. 2 shows a conventional raw material gas supply composition diagram, and Fig. 3 shows a method for manufacturing an optical fiber preform by internal chemical vapor deposition method. FIG. In the figure, 1 is a quartz tube, 2 is an input side support tube, 3 is an exhaust side support tube, 5 is a driving side chuck, 6 is a driven side chuck, 7 is a glass lathe, 8 is an oxyhydrogen burner, and 9 is a rotating joint. , IO is a raw material gas supply device, 21 is a cladding deposited layer, 22 is a core deposited layer, M I, Mz are GeCl4 supply curves, N +, N
z indicates the SiCL supply curve. 1st police 2nd police

Claims (1)

【特許請求の範囲】[Claims] 内付化学気相堆積法による光ファイバ母材の製造におい
て、ＧｅＣｌ＿４ガスの石英管への供給量は、コア堆積
層の中間堆積層形成時に、初期堆積層及び後期堆積層形
成時よりも多くし、且つＳｉＣｌ＿４ガスの供給量は、
該コア堆積層の初期層形成時より層数の増加とともに減
じるように供給して、コア堆積層を形成するようにした
ことを特徴とする光ファイバ母材の製造方法。In manufacturing the optical fiber base material by internal chemical vapor deposition, the amount of GeCl_4 gas supplied to the quartz tube is larger when forming the intermediate deposit layer of the core deposit layer than when forming the initial deposit layer and the late deposit layer. , and the supply amount of SiCl_4 gas is
A method for manufacturing an optical fiber preform, characterized in that the core deposited layer is formed by supplying the core deposited layer in such a manner that the number of core deposited layers decreases as the number of layers increases from when the core deposited layer is initially formed.
JP5539985A 1985-03-19 1985-03-19 Production of optical fiber preform Granted JPS61222934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5539985A JPS61222934A (en) 1985-03-19 1985-03-19 Production of optical fiber preform

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5539985A JPS61222934A (en) 1985-03-19 1985-03-19 Production of optical fiber preform

Publications (2)

Publication Number Publication Date
JPS61222934A true JPS61222934A (en) 1986-10-03
JPH02304B2 JPH02304B2 (en) 1990-01-05

Family

ID=12997452

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5539985A Granted JPS61222934A (en) 1985-03-19 1985-03-19 Production of optical fiber preform

Country Status (1)

Country Link
JP (1) JPS61222934A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005154162A (en) * 2003-11-20 2005-06-16 Sumitomo Electric Ind Ltd Method and apparatus for processing glass pipe, and glass pipe

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005154162A (en) * 2003-11-20 2005-06-16 Sumitomo Electric Ind Ltd Method and apparatus for processing glass pipe, and glass pipe
US7637125B2 (en) 2003-11-20 2009-12-29 Sumitomo Electric Industries, Ltd. Glass tube processing method, apparatus and glass tube
US8015845B2 (en) 2003-11-20 2011-09-13 Sumitomo Electric Industries, Ltd. Glass tube processing method
US8024945B2 (en) 2003-11-20 2011-09-27 Sumitomo Electric Industries, Ltd. Glass tube processing apparatus

Also Published As

Publication number Publication date
JPH02304B2 (en) 1990-01-05

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