JPS6089828A - Manufacture of vertical magnetic recording medium - Google Patents
Manufacture of vertical magnetic recording mediumInfo
- Publication number
- JPS6089828A JPS6089828A JP19619483A JP19619483A JPS6089828A JP S6089828 A JPS6089828 A JP S6089828A JP 19619483 A JP19619483 A JP 19619483A JP 19619483 A JP19619483 A JP 19619483A JP S6089828 A JPS6089828 A JP S6089828A
- Authority
- JP
- Japan
- Prior art keywords
- film
- cylindrical
- substrate
- base
- conductive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は高密度記録特性の優れた垂直磁気記録媒体の製
造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a perpendicular magnetic recording medium with excellent high-density recording characteristics.
(従来例の構成とその問題点)
短波長記録特性の優れた方式として垂直記録方式が知ら
れている。これは媒体の膜面に垂直方向の残留磁化を利
用するものである。従ってこの方式においては、膜面の
略々垂直方向に残留磁化が残る垂直磁化膜が必要となる
。垂直磁化膜としては、COとCrを主成分とするいわ
ゆるCo −Cr垂直磁化膜が優れた特性を有している
。Co −Cr垂直磁化膜はスパッタリング法や真空蒸
着法(イオンシレーティング法のように蒸発原子の一部
をイオン化して膜を堆積する方法も含む。)により作製
されるが、特に後者の方法によれば非常に高い膜堆積速
度が達成出来、量産に適している。しかし以下に説明す
るように、実際に真空蒸着法によシCo −Cr垂直磁
化膜の作製を行なうと、種々の皺が発生するという問題
が生じた。皺が発生すると、磁気記録媒体として使用す
ることは不可能であり、何らかの解決策が必要である。(Structure of conventional example and its problems) A perpendicular recording method is known as a method with excellent short wavelength recording characteristics. This utilizes residual magnetization in the direction perpendicular to the film surface of the medium. Therefore, this method requires a perpendicularly magnetized film in which residual magnetization remains in a direction substantially perpendicular to the film surface. As a perpendicular magnetization film, a so-called Co--Cr perpendicular magnetization film containing CO and Cr as main components has excellent characteristics. Co-Cr perpendicular magnetization films are produced by sputtering methods and vacuum evaporation methods (including methods such as ion silating methods, in which a part of evaporated atoms is ionized to deposit a film), but the latter method is particularly effective. According to this method, a very high film deposition rate can be achieved and it is suitable for mass production. However, as will be explained below, when a Co--Cr perpendicular magnetization film was actually fabricated by a vacuum evaporation method, various wrinkles occurred. If wrinkles occur, it is impossible to use the material as a magnetic recording medium, and some kind of solution is required.
真空蒸着法によfl Co −Cr垂直磁化膜を作製す
る方法としては、基板を円筒状キャンの周面に沿わせて
走行させつつ蒸着を行なう方法が最も優れている。As a method for producing a fl Co -Cr perpendicularly magnetized film by a vacuum evaporation method, the most excellent method is to carry out the evaporation while moving the substrate along the circumferential surface of a cylindrical can.
第1図はCo −(:r垂直磁化膜を作製するだめの従
来の真空蒸着装置内部の正面図である。FIG. 1 is a front view of the interior of a conventional vacuum evaporation apparatus for producing a Co-(:r perpendicularly magnetized film).
高分子材料よ構成る基板1は円筒状キャン2の周面に沿
って走行する。3及び4はそれぞれ基板入側ローラ及び
基板出側ローラであシ、テープ状の基板1を案内走行さ
せるものである。5は蒸着源、6は遮蔽板である。以上
の様に構成された従来の真空蒸着装置について以下その
動作を説明する。A substrate 1 made of a polymeric material runs along the circumferential surface of a cylindrical can 2. Reference numerals 3 and 4 denote a substrate inlet roller and a substrate outlet roller, respectively, which guide and run the tape-shaped substrate 1. 5 is a vapor deposition source, and 6 is a shielding plate. The operation of the conventional vacuum evaporation apparatus configured as described above will be explained below.
基板入側ローラ3にょシ案内された高分子材料より成る
基板1は、円筒状□キャン2の回転に従いその周面、に
沿って走行し、基板出側ローラ4によ:・・
9巻取シ側へ案内される。なお、円、筒状キャン2は周
面の温度を350C付近まで任意に温度設定が可能であ
る。蒸発源5はCo −Cr合金インゴットを加熱蒸発
させ、遮蔽板6にょp垂直入射に近い成分を有する蒸発
原子のみが高分子材料よ9成る基板1に付着してCo
−Cr垂直磁化膜を形成する。The substrate 1 made of a polymeric material guided by the substrate input roller 3 travels along the circumferential surface of the cylindrical square can 2 as it rotates, and is wound up by the substrate output roller 4: 9. You will be guided to the side. Note that the temperature of the circumferential surface of the circular and cylindrical can 2 can be arbitrarily set to around 350C. The evaporation source 5 heats and evaporates the Co--Cr alloy ingot, and only the evaporated atoms having a component close to normal incidence on the shielding plate 6 adhere to the substrate 1 made of a polymeric material 9, resulting in Co
- Form a Cr perpendicular magnetization film.
しかし、上記の構成によりCo −Cr垂直磁化膜を作
製すると、下記の様な問題が発生する。即ち、Co −
Cr垂直磁化膜に信号を記録再生すると、膜面に垂直方
向の保持力Hc土の大きな膜はど高い再生出力が得られ
る。保持力HO上は蒸着時の基板温度Tsubが上昇す
るに従い高くなる。Co −Cr垂直磁化膜を実用化す
るためには、少なくとも4000eの保持力He土が必
要である艇、そのためには蒸着時の基板温度Tsut)
を門20℃以上にしなければならないことが実験の結果
間らかになった。より好ましくは保持力Hc土として8
000e以上の値を有する膜が必要であるが、この場合
には蒸着時の基板温度T8ubは200℃以上にしなけ
ればならない。However, when a Co--Cr perpendicular magnetization film is manufactured with the above configuration, the following problems occur. That is, Co −
When a signal is recorded and reproduced in a perpendicularly magnetized Cr film, a film having a large coercive force Hc in the direction perpendicular to the film surface can obtain a high reproduction output. The holding force HO increases as the substrate temperature Tsub during vapor deposition increases. In order to put a Co-Cr perpendicularly magnetized film into practical use, a coercive force of at least 4000e is required.
As a result of experiments, it became clear that the temperature must be kept above 20℃. More preferably, the holding power Hc soil is 8
A film having a value of 000e or more is required, but in this case, the substrate temperature T8ub during vapor deposition must be 200° C. or more.
なお、ここで述べた蒸着時の基板温度Tsubとは円筒
状キャンの周囲温度のことである。また、高分子材料よ
構成る基板1としては、表面性、安定性。Note that the substrate temperature Tsub during vapor deposition mentioned here refers to the ambient temperature of the cylindrical can. In addition, the substrate 1 made of a polymeric material has surface properties and stability.
量産性等の点から考えてポリエチレンテレフタレートフ
ィルムあるいはIリアミド系のフィルムが適している。From the viewpoint of mass production, polyethylene terephthalate film or I-lyamide film is suitable.
ところがこれらのフィルムを用い、第1図に示される様
な方法によって円筒状キャン2の周面の温度を120℃
以上として蒸着を行なうと、蒸着部で波状の皺が発生す
る。However, using these films, the temperature of the circumferential surface of the cylindrical can 2 was increased to 120°C by the method shown in Figure 1.
If vapor deposition is performed as described above, wavy wrinkles will occur in the vapor deposited area.
第2゛図はこのときの基板1上に発生する波状の皺の発
生状態を示す立体図であシ、7は波状の皺を示す。この
よう・な波状皺7は、円筒状キャン2と基板1との接触
が不充分の場合に蒸着部で発生することが明らかになっ
た。そこでこれを防止する方法として、高分子材料よ構
成る基板1の上に導体膜を形成してこの導体膜と円筒状
キャン2との間に電位差を設け、静電引力によって密着
させることが考えられる。なお、この導体膜としてパー
マロイやTiを用いると垂直磁気記録媒体としての記録
再生特性や配向性が向上する。FIG. 2 is a three-dimensional diagram showing the state in which wavy wrinkles are generated on the substrate 1 at this time, and 7 shows the wavy wrinkles. It has been revealed that such wavy wrinkles 7 occur in the vapor deposition part when the contact between the cylindrical can 2 and the substrate 1 is insufficient. Therefore, one idea to prevent this is to form a conductive film on the substrate 1 made of a polymeric material, create a potential difference between the conductive film and the cylindrical can 2, and bring them into close contact by electrostatic attraction. It will be done. Note that when permalloy or Ti is used as this conductive film, the recording/reproducing characteristics and orientation of the perpendicular magnetic recording medium are improved.
第3図は上記の様に導体膜と円筒状キャン2との間に電
位差を設けて、co−cr膜を蒸着した場合の状態を示
す立体図である。8は表面(円筒状キャン2に接してい
ない面)に導体膜の形成された高分子材料より成る基板
である。導体膜と円筒状キャン2との間に印加する電圧
としては、直流電圧でも良いし、交流電圧でも良い。上
記の方法によれば、第2図に示される様な波状皺7は消
滅するが、基板8が円筒状キャン2に接する際に、ラン
ダムな皺9が発生する。このランダムな皺9の発生する
原因は次の様に考えられる。基板8が円筒状キャン2に
接する際に、円筒状キャン2が高温のため、基板8が急
激に加熱され変形を生じる。変形が修正されない状態で
静電引力により円筒状キャン2に密着するため、基板8
にはランダムな皺9が発生する。FIG. 3 is a three-dimensional view showing a state in which a co-cr film is deposited by providing a potential difference between the conductor film and the cylindrical can 2 as described above. Reference numeral 8 denotes a substrate made of a polymer material on which a conductive film is formed on the surface (the surface not in contact with the cylindrical can 2). The voltage applied between the conductor film and the cylindrical can 2 may be either a direct current voltage or an alternating current voltage. According to the above method, the wavy wrinkles 7 as shown in FIG. 2 disappear, but random wrinkles 9 are generated when the substrate 8 comes into contact with the cylindrical can 2. The cause of the occurrence of these random wrinkles 9 can be considered as follows. When the substrate 8 comes into contact with the cylindrical can 2, since the cylindrical can 2 is at a high temperature, the substrate 8 is rapidly heated and deformed. The substrate 8 is tightly attached to the cylindrical can 2 due to electrostatic attraction without being deformed.
Random wrinkles 9 occur.
第4図は第3図のランダムな皺9を改良することを試み
た装置の立体図である。この装置の構成は第3図と殆ん
ど同じであるが、第4図では基板入側ローラ3をニップ
ローラ3′に変更した点が異なっている。ニップローラ
3′の表面は一般にコ゛ムで作られている。表面に導体
膜の形成された高分子材料より成る基板8は、円筒状キ
ャン2に接し始める際に、ニラノロ=う3′にょシ円筒
状キャン2に押さえつけられる。しかしながらこの構成
でも、円筒状キャン2の温度を高くし、基板8と円筒状
キャン2との間に電圧を印加して、、 Co −Cr垂
直磁化膜を作製すると、基板8が円筒状キャン2に接触
する際に急激な加熱のため変形が発生し、これが修正さ
れる前にニップローラ3′によって押さえつけられるた
めに折シ皺10が発生する。FIG. 4 is a three-dimensional view of a device that attempts to improve the random wrinkles 9 in FIG. 3. The configuration of this apparatus is almost the same as that shown in FIG. 3, but the difference in FIG. 4 is that the substrate entrance roller 3 is replaced with a nip roller 3'. The surface of the nip roller 3' is generally made of comb. The substrate 8 made of a polymer material and having a conductive film formed on its surface is pressed against the cylindrical can 2 when it starts to come into contact with the cylindrical can 2. However, even with this configuration, when the temperature of the cylindrical can 2 is increased and a voltage is applied between the substrate 8 and the cylindrical can 2 to produce a Co-Cr perpendicularly magnetized film, the substrate 8 is moved to the cylindrical can 2. deformation occurs due to rapid heating when it comes into contact with the material, and before this deformation is corrected, it is pressed down by the nip roller 3', resulting in creases 10.
以上の様に従来の構成では、Co−Cr垂直磁化膜を蒸
着する際に、高分子材料よ構成る基板に皺が発生し、磁
気記録媒体としては使用出来ないという問題点を有して
いた。As described above, the conventional structure had the problem that wrinkles were generated on the substrate made of polymer material when the Co-Cr perpendicular magnetization film was deposited, making it unusable as a magnetic recording medium. .
(発明の目的)
本発明は上記の様な問題点を解決するものであり、皺の
ない良好な垂直磁気記録媒体を製造するだめの方法を提
供することを目的としている。(Objective of the Invention) The present invention solves the above-mentioned problems, and aims to provide a method for manufacturing a good perpendicular magnetic recording medium without wrinkles.
(発明の構成)
本発明は120℃以上に昇温された円筒状キャンの周面
に沿って走行しつつある、表面に導体膜の形成された高
分子材料よ構成る基板上に、coとCrを主成分とする
垂直磁化膜を真空蒸着法によフ形成する際に、上記基板
が上記円筒状キャンに接している部分において、上記基
板の上記円筒状キャンへの接触開始部と蒸着膜形成部と
の間の位置よりも後方部分は上記円筒状キャンと上記導
体膜をほぼ同電位にし、かつ上記位置よシも前方部分は
上記円筒状キャンと上記導体膜を異なる電位にするよう
にした垂直磁気記録媒体の製造方法であり、本発明の方
法を用いることにより皺のない垂直磁気記録媒体が得ら
れるものである。(Structure of the Invention) The present invention is directed to a substrate made of a polymeric material with a conductive film formed on the surface, which is running along the circumferential surface of a cylindrical can heated to 120°C or higher. When forming a perpendicularly magnetized film containing Cr as a main component by a vacuum evaporation method, in a portion where the substrate is in contact with the cylindrical can, a contact start portion of the substrate with the cylindrical can and the vapor deposited film are formed. The cylindrical can and the conductive film are made to have approximately the same potential at a portion rearward of the position between the forming portion, and the cylindrical can and the conductive film are placed at a different potential at a portion forward of the position. A perpendicular magnetic recording medium without wrinkles can be obtained by using the method of the present invention.
(実施例の説明)
第5図は本発明の製造方法の一実施例を説明するだめの
真空蒸着装置内部の正面図である。(Description of Examples) FIG. 5 is a front view of the inside of a vacuum evaporation apparatus for explaining an example of the manufacturing method of the present invention.
図において、円筒状キャン2及び基板入側ローラ3は接
地されている。また、基板出側ローラ4は、表面に導体
膜の形成された高分子材料よ構成る基板8の表面の導体
部と円筒状キャン2との間に電位差を設けるために電源
11に接続されている。なお、基板出側ローラ4の電位
は正でも負でも良いし、交流でもよい。矢印12の場所
で基板8は円筒状キャン2に接し始め、矢印13の場所
で離れる。前者の場所を接触開始部、後者を接触終了部
と称し、両部の間においては基板8け円筒状キャンに接
している・14は蒸着膜形成部であり、ここでCo −
Cr垂直磁化膜が形成される。In the figure, the cylindrical can 2 and the substrate entry roller 3 are grounded. Further, the substrate output roller 4 is connected to a power source 11 in order to create a potential difference between the cylindrical can 2 and the conductor portion on the surface of the substrate 8, which is made of a polymeric material with a conductive film formed on the surface. There is. Note that the potential of the substrate output roller 4 may be positive or negative, or may be alternating current. The substrate 8 begins to contact the cylindrical can 2 at the location indicated by arrow 12 and leaves at the location indicated by arrow 13. The former location is called the contact start part, and the latter is called the contact end part, and between the two parts, it is in contact with the 8-board cylindrical can. 14 is the deposited film forming part, where Co -
A Cr perpendicular magnetization film is formed.
15は接触開始部12と蒸着膜形成部14との間に設け
られた接地電位の金属ローラであり、これを基板80表
面の導体膜に接触させている。Reference numeral 15 denotes a metal roller with a ground potential, which is provided between the contact initiation section 12 and the deposited film forming section 14, and is brought into contact with the conductive film on the surface of the substrate 80.
以上のような配置にすることにより、金属ローラ15の
位置よシも後方部分は円筒状キャン2と導体膜がほぼ同
電位になり、金属ローラ15の位置よシも前方部分は円
筒状キャン2と導体膜は異なった電位になる。なお、こ
こで金属ローラ15の位置よシも後方部分とは矢印j2
側でちゃ、前方部分とは矢印13である。By arranging as described above, the cylindrical can 2 and the conductor film are at almost the same potential at the rear part of the metal roller 15, and the cylindrical can 2 is at the same potential at the front part of the metal roller 15. and the conductor film have different potentials. Note that the position of the metal roller 15 also refers to the rear part as indicated by the arrow j2.
On the side, the front part is indicated by arrow 13.
次に上記のように構成された真空蒸着装置の動作につい
て説明する。基板8は矢印12の部分で円筒状キャン2
に接し始め、この部分から金属ローラ15に接している
部分までの間においては、基板8上の導体膜と円筒状キ
ャン2とはほぼ同電位になっているので両者間に力は働
かない。従って第3図に示したようなランダムな皺は入
らない。Next, the operation of the vacuum evaporation apparatus configured as described above will be explained. The board 8 is connected to the cylindrical can 2 at the part indicated by the arrow 12.
The conductor film on the substrate 8 and the cylindrical can 2 are at almost the same potential between this part and the part in contact with the metal roller 15, so no force acts between them. Therefore, random wrinkles as shown in FIG. 3 do not appear.
金属ローラ15の前方では基板8上の導体膜が電源11
により電圧を印加されているので、円筒状キャン2と基
板8上の導体膜との間に静電引力が働き2、基板8が円
筒状キャン2に張シ付く。In front of the metal roller 15, the conductive film on the substrate 8 is connected to the power source 11.
Since a voltage is applied to the cylindrical can 2, an electrostatic attraction force 2 acts between the cylindrical can 2 and the conductor film on the substrate 8, and the substrate 8 is stretched onto the cylindrical can 2.
第3図及び第4図に示される従来の方法においては、基
板8が円筒状キャン2に接する際に、基板8が急激に加
熱され変形が発生し、この変形が修正される前に円筒状
キャンに密着していたためにランダムな皺あるいは折り
皺が発生していたが、本発明においては基板8が円筒状
キャン2に接してから金属ローラ]5までの間では基板
8と円筒状キャン2との間には基板8のテン7ョンによ
る刀身外の力は働いていないので、基板8は円筒状キャ
ン2上をほぼ自由に動ける。即ち、基板8が円筒状キャ
ン2に接し始めると、基板8は急激に熱変形するが、こ
の変形の際に基板8と円筒状キャン2との間に静電引力
のような強い力が働いていないので、ランダムな皺や折
り皺を発生せずに熱変形を終了する。金属ローラ15の
前方では基板8は熱変形を終了した状態で静電引力によ
り円筒状キャン2に張シ伺く。従って円筒状キャンに張
シ付く際に皺は全く入らない。蒸着膜形成部14におい
ては、基板8上の導体膜と円筒状キャン2との間の静電
引力により基板8は円筒状キャン2に張シ付いているた
めに、第2図に示されるような波状の皺も入らない。こ
のように、本発明の方法によれば皺は全く発生しない。In the conventional method shown in FIGS. 3 and 4, when the substrate 8 comes into contact with the cylindrical can 2, the substrate 8 is rapidly heated and deformed, and before this deformation is corrected, the cylindrical can However, in the present invention, between the time when the substrate 8 comes into contact with the cylindrical can 2 and the metal roller ]5, the substrate 8 and the cylindrical can 2 are in close contact with each other. Since no force outside the blade due to the tension of the base plate 8 is acting between the base plate 8 and the base plate 8, the base plate 8 can move almost freely on the cylindrical can 2. That is, when the substrate 8 begins to come into contact with the cylindrical can 2, the substrate 8 undergoes rapid thermal deformation, but during this deformation, a strong force such as electrostatic attraction acts between the substrate 8 and the cylindrical can 2. The heat deformation ends without generating random wrinkles or creases. In front of the metal roller 15, the substrate 8, which has completed thermal deformation, is stretched against the cylindrical can 2 by electrostatic attraction. Therefore, no wrinkles occur when it is attached to a cylindrical can. In the vapor deposition film forming section 14, the substrate 8 is stretched to the cylindrical can 2 due to the electrostatic attraction between the conductor film on the substrate 8 and the cylindrical can 2, as shown in FIG. There are no wavy wrinkles. Thus, according to the method of the present invention, wrinkles are not generated at all.
なお、電源11の具体的な電圧値や接触開始部12と金
属ローラ15の距離等は、円筒状キャン2の直径及び温
度、基板の幅及び膜厚、基板上の導体膜の膜厚等によシ
異なる。−例として、円筒状キャンの直径を50cr+
+、温度を250℃、基板の幅及び膜厚をそれぞれ15
6n及び12μm1基板上の導体膜を膜厚3 o、o
OXパーマロイとした場合に、電源11の電圧を10〜
150V、接触開始部12と金属ローラ15の距離を8
〜40crnとすると、皺の全くない長尺のCo −C
r垂直磁気記録媒体が安定に得られた。Note that the specific voltage value of the power source 11, the distance between the contact initiation part 12 and the metal roller 15, etc. depend on the diameter and temperature of the cylindrical can 2, the width and thickness of the substrate, the thickness of the conductive film on the substrate, etc. Very different. - As an example, the diameter of the cylindrical can is 50cr+
+, temperature 250℃, substrate width and film thickness 15% each
Conductor film on 6n and 12μm 1 substrate with film thickness 3 o, o
When using OX permalloy, the voltage of power supply 11 is 10~
150V, the distance between the contact start part 12 and the metal roller 15 is 8
~40crn, a long Co-C with no wrinkles
A stable r-perpendicular magnetic recording medium was obtained.
次に本発明の具体的な実施例について説明する。Next, specific examples of the present invention will be described.
第5図に示した真空蒸着装置によって幅15tYn1膜
厚10^mのポリアミド系フィルム上に膜厚2000X
のパーマロイ膜を蒸着し、さらにその上に膜厚1000
XのCo −Cr垂直磁化膜を蒸着した。A film with a thickness of 2000 x
A permalloy film of 1,000 mm thick is deposited on top of that
A Co--Cr perpendicular magnetization film of X was deposited.
但し、幅15cynのフィルムの幅方向の両端1cmは
マージン部として蒸着膜を形成しなかった。即ち、蒸着
膜の形成されている幅は13cfnである。・ぐ−マロ
イ膜蒸着の際には、直径50mの円筒状キャン2の周面
の温度を室温に設定したので、皺は入らなかった。ノぐ
一マロイ膜の上にさらにCo −’Cr垂直磁化膜を蒸
着する際には、円筒状キャン2の周面の温度を260℃
とし、電源11により金属ローラ4に一70Vの電圧を
印加した。また接触開始部12と金属ローラ15との距
離を13c1nとした。蒸着の完了した垂直磁気記録媒
体において、皺は皆無であった。また、Co−Cr垂直
磁化膜のHe土は8500eとなっており、優れた短波
長記録再生特性を示した。However, no vapor deposited film was formed on 1 cm of both ends in the width direction of the film having a width of 15 cyn as margin parts. That is, the width of the deposited film is 13 cfn. - When depositing the gummalloy film, the temperature of the circumferential surface of the cylindrical can 2 with a diameter of 50 m was set at room temperature, so no wrinkles were formed. When further depositing a Co-'Cr perpendicular magnetization film on the Noguchi Malloy film, the temperature of the circumferential surface of the cylindrical can 2 was set to 260°C.
A voltage of -70 V was applied to the metal roller 4 by the power source 11. Further, the distance between the contact start portion 12 and the metal roller 15 was set to 13c1n. There were no wrinkles in the perpendicular magnetic recording medium after the vapor deposition was completed. Further, the He soil of the Co--Cr perpendicular magnetization film was 8500e, and exhibited excellent short wavelength recording and reproducing characteristics.
(発明の効果) ゛
以上説明したように本発明の方法によれば、従来、高分
子材料よシなる基板上にCo −Cr垂直磁化膜を蒸着
する際に生じていた皺を完全に除去することが可能であ
シ、皺のない垂直磁気記録媒体を提供出来る。(Effects of the Invention) As explained above, according to the method of the present invention, wrinkles that conventionally occur when depositing a Co--Cr perpendicularly magnetized film on a substrate made of a polymeric material can be completely removed. It is possible to provide a wrinkle-free perpendicular magnetic recording medium.
第1図はCo −Cr垂直磁化膜を作製するための従来
の真空蒸着装置内部の正面図、第2図〜第4図は従来の
真空蒸着装置において基板に発生する皺を説明するため
の立体図、第5図は本発明の製造方法の一実施例を説明
するための真空蒸着装置内部の正面図である。
1.8・・・基板、2・・・円筒状キャン、3・・・基
板入側ローラ、4・・・基板出側ローラ、5・・・蒸発
源、6・・・遮蔽板、7・・・波状皺、9・・・ランダ
ムな皺、10・・・折シ皺、11・・・電源、12・・
矢印・接触開始部、13・・・矢印・接触終了部、14
・・・蒸着膜形成部、15・・・金属ローラ。
第1図
第2図
1
第3図
第4図
第5図Figure 1 is a front view of the inside of a conventional vacuum evaporation apparatus for producing a Co-Cr perpendicular magnetization film, and Figures 2 to 4 are three-dimensional diagrams for explaining wrinkles that occur on a substrate in a conventional vacuum evaporation apparatus. FIG. 5 is a front view of the inside of a vacuum evaporation apparatus for explaining an embodiment of the manufacturing method of the present invention. 1.8... Substrate, 2... Cylindrical can, 3... Board entry roller, 4... Board exit roller, 5... Evaporation source, 6... Shielding plate, 7... ... Wavy wrinkles, 9... Random wrinkles, 10... Folding wrinkles, 11... Power supply, 12...
Arrow/contact start part, 13...Arrow/contact end part, 14
... Deposited film forming section, 15... Metal roller. Figure 1 Figure 2 Figure 1 Figure 3 Figure 4 Figure 5
Claims (1)
走行しつつある、表面に導体膜の形成された高分子材料
より成る基板上に、COとCrを主成分とする垂直磁化
膜を真空蒸着法によフ形成する際に、上記基板が上記円
筒状キャンに接している部分において、上記基板の上記
円筒状キャンへの接触開始部と蒸着膜形成部との間の位
置よシも後方部分は上記円筒状キャンと上記導体膜をほ
ぼ同電位にし、かつ上記位置よシも前方部分は上記円筒
状キャンと上記導体膜を異なる電位にすることを特徴と
する垂直磁気記録媒体の製造方法。A perpendicularly magnetized film mainly composed of CO and Cr is placed on a substrate made of a polymeric material with a conductive film formed on its surface, which is running along the circumference of a cylindrical can heated to over 120°C. When forming a film by a vacuum evaporation method, in the part where the substrate is in contact with the cylindrical can, the position between the contact start part of the substrate with the cylindrical can and the vapor deposited film forming part is adjusted. A perpendicular magnetic recording medium characterized in that the cylindrical can and the conductor film are set at substantially the same potential at the rear portion, and the cylindrical can and the conductor film are set at different potentials at the front portion. Production method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19619483A JPS6089828A (en) | 1983-10-21 | 1983-10-21 | Manufacture of vertical magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19619483A JPS6089828A (en) | 1983-10-21 | 1983-10-21 | Manufacture of vertical magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6089828A true JPS6089828A (en) | 1985-05-20 |
Family
ID=16353753
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19619483A Pending JPS6089828A (en) | 1983-10-21 | 1983-10-21 | Manufacture of vertical magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6089828A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6220137A (en) * | 1985-07-18 | 1987-01-28 | Matsushita Electric Ind Co Ltd | Production of magnetic recording medium |
JPS63300429A (en) * | 1987-05-29 | 1988-12-07 | Matsushita Electric Ind Co Ltd | Production of magnetic recording medium |
-
1983
- 1983-10-21 JP JP19619483A patent/JPS6089828A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6220137A (en) * | 1985-07-18 | 1987-01-28 | Matsushita Electric Ind Co Ltd | Production of magnetic recording medium |
JPS63300429A (en) * | 1987-05-29 | 1988-12-07 | Matsushita Electric Ind Co Ltd | Production of magnetic recording medium |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4767516A (en) | Method for making magnetic recording media | |
JPH0853763A (en) | Production of thin film | |
JPS6089828A (en) | Manufacture of vertical magnetic recording medium | |
JPH0721560A (en) | Production of magnetic recording medium | |
JPS6116031A (en) | Production of vertical magnetic recording medium | |
JPS61120345A (en) | Production of vertical magnetic recording medium | |
JPS59172163A (en) | Production of vertical magnetic recording medium | |
JPS6059069A (en) | Manufacture of metallic thin film | |
JPS59201230A (en) | Manufacture of vertical magnetic recording medium | |
JPS63277750A (en) | Formation of thin film | |
JPS61120346A (en) | Production of vertical magnetic recording medium | |
JPS61187127A (en) | Manufacture of magnetic recording medium | |
JPS59148139A (en) | Manufacture of vertical magnetic recording medium | |
JPS63308729A (en) | Production of magnetic recording medium | |
JPH0528487A (en) | Production of magnetic recording medium | |
JPS62219234A (en) | Production of magnetic recording medium | |
JPS6061921A (en) | Production of magnetic recording medium | |
JPH0334131B2 (en) | ||
JPS59124024A (en) | Magnetic recording medium | |
JPS63310959A (en) | Production of thin metal film | |
JPH06309646A (en) | Thin-film magnetic recording medium and its production | |
JPS5814326A (en) | Production for magnetic recording medium | |
JPS63292423A (en) | Production of magnetic recording medium | |
JPH06103571A (en) | Production of magnetic recording medium | |
JPS61242332A (en) | Device for producing vertical magnetic recording medium |