JPS6081003A - Manufacture of aqueous solution of sodium hypochlorite - Google Patents
Manufacture of aqueous solution of sodium hypochloriteInfo
- Publication number
- JPS6081003A JPS6081003A JP18989483A JP18989483A JPS6081003A JP S6081003 A JPS6081003 A JP S6081003A JP 18989483 A JP18989483 A JP 18989483A JP 18989483 A JP18989483 A JP 18989483A JP S6081003 A JPS6081003 A JP S6081003A
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- chlorine
- reaction
- nozzle
- reaction liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/14—Production of inert gas mixtures; Use of inert gases in general
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、次亜塩素酸ソーダ水溶液の製造法に関するも
のである。特に高濃度次亜塩素酸ソーダ水溶液の製造に
おいて、塩化ナトリウムによる反応器等の閉塞の心配の
ない方法に関するものであるＯ
高濃度次亜塩素酸ソーダ水溶液を得るには、高濃度の苛
性ソーダを使用せねばならず、この場合反応の進行に伴
い、次亜塩素酸ソーダー苛性ソーダー塩化ナトリウムの
３成分が液相で共存できなくなり、塩化ナトリウムが結
晶として析出する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing an aqueous solution of sodium hypochlorite. In particular, this relates to a method for producing a high-concentration sodium hypochlorite aqueous solution without worrying about clogging of reactors, etc. due to sodium chloride. To obtain a high-concentration sodium hypochlorite aqueous solution, high-concentration caustic soda is used. In this case, as the reaction progresses, the three components, sodium hypochlorite, caustic soda, and sodium chloride, cannot coexist in the liquid phase, and sodium chloride precipitates as crystals.
この析出した塩化ナトリウムが、反応器等に付着し、閉
塞を起こすことが製造プロセス上重大な障害となる為、
従来閉塞防止の手法が種々検討されている。例えば、特
開昭５６−１１４８０７号に見られる様に、反応液の流
動方向に沿って開口する塩素導入管を設ける方法や、特
開昭５８−２０７０３号に見られる様に、２重管式のサ
イクロン型反応器を用い、塩素含有ガスを内管より供給
し、反応液を外管に接続方向から供給し、サイクロン下
部で両者を接触させる方法が提案されている。しかし前
者、後者いずれの方法でも、塩素供給ノズルが反応液と
接触しており、その近傍で乱流状態で気液混合が行なわ
れる為、液の飛沫が塩素供給ノズル内面に刺着し、やが
て閉塞を起こし、現状では満足できる状態ではない。This precipitated sodium chloride adheres to the reactor etc. and causes blockage, which is a serious problem in the manufacturing process.
Conventionally, various methods for preventing blockage have been studied. For example, as seen in JP-A No. 56-114807, a method of providing a chlorine introduction tube that opens along the flow direction of the reaction solution, and a method of installing a chlorine introduction tube that opens along the flow direction of the reaction solution, and a method of using a double-tube method as seen in JP-A No. 58-20703, A method has been proposed in which a cyclone-type reactor is used, in which a chlorine-containing gas is supplied from an inner tube, a reaction liquid is supplied from the connection direction to an outer tube, and the two are brought into contact at the bottom of the cyclone. However, in both the former and latter methods, the chlorine supply nozzle is in contact with the reaction liquid, and gas-liquid mixing occurs in the vicinity of the reaction liquid in a turbulent state. This has caused a blockage and the current state is not satisfactory.
本発明者らは、この点を改善すべく、鋭意研究の結果、
本発明に至った。In order to improve this point, the present inventors have conducted extensive research and found that
This led to the present invention.
即ち、本発明は、苛性ソーダと塩素の反応によシ次亜塩
素酸ソーダ水溶液を製造するに際し、苛性ソーダを含む
反応液を反応器の壁面の任意の位置から、壁面全面にわ
たって、流下する濡れ壁を形成する如く供給し、塩素含
有ガスを反応液供給位置より下部で開口し、且つ壁面の
濡れ壁とは独立したノズルから供給する方法であり、必
要ならば、苛性ソーダと塩素ガスとの反応が、反応液供
給面より上部から導入され、流下する空気、窒素、及び
／又はその他年活性ガス雰囲気下で行なわれる方法であ
る。That is, when producing a sodium hypochlorite aqueous solution by the reaction of caustic soda and chlorine, the present invention allows a reaction solution containing caustic soda to flow down from any position on the wall surface of a reactor over the entire wall surface, causing a wet wall to flow down. This is a method in which the chlorine-containing gas is supplied from a nozzle that opens below the reaction liquid supply position and is independent of the wetted wall of the wall, and if necessary, the reaction between caustic soda and chlorine gas can be This method is carried out under an atmosphere of air, nitrogen, and/or other active gas introduced from above the reaction liquid supply surface and flowing down.
本発明の方法を図面に基づいて説明する。The method of the present invention will be explained based on the drawings.
図面は、本発明方法に用いる装置の１例を示し、囚図は
正面図、（Ｂ）図は平面図である。The drawings show an example of the apparatus used in the method of the present invention, with the top view being a front view and the figure (B) being a top view.
図面において、反応液貯槽７の上部に、垂直に円筒状反
応器３が取り伺けられている。In the drawing, a cylindrical reactor 3 is vertically extended above the reaction liquid storage tank 7.
この円筒状反応器３に反応液供給ノズル２を通じて、苛
性ソーダを含む反応液６が接線方向８から導入される。A reaction liquid 6 containing caustic soda is introduced into this cylindrical reactor 3 from a tangential direction 8 through a reaction liquid supply nozzle 2 .
反応器３の反応液供給面から、下部排出口に至るまで壁
全面にわたり、濡れ壁が形成されれば、別に他の手法で
導入してもよい。もし一部でも濡れていない所が生じる
とその固液界面に塩化ナトリウムが析出し、その後増々
成長し反応器を閉塞さす。円筒状反応器３内面は塩化ナ
トリウムの壁付着防止の為、出来るだけ滑らかな方が好
ましい。濡れ壁を全面に形成さすに必要な液流量及び流
速は、反応器の直径により異なるので特定できないが、
この円筒状瀝れ壁が形成されている所へ、塩素ガス供給
ノズル１を通じて、反応器３の上から下に向りて、塩素
含有ガスが導入される。ここで重要な事は塩素ガス供給
ノズル１が反応液と完全に独立しており、かつ該ノズル
１の開口部の位置が、反応液供給ノズル２の位置よりも
下にあることである。塩素ガス供給ノズルｌが反応液と
接触すると、接触部に塩化ナトリウムが析出し、王台が
悪く、又塩素ガスが濡れ壁の上端に浸入してくると、こ
こでも塩化ナトリウムが析出する。As long as a wet wall is formed over the entire wall from the reaction liquid supply surface of the reactor 3 to the lower discharge port, it may be introduced by another method. If even a part of the reactor is not wet, sodium chloride will precipitate at the solid-liquid interface, and will continue to grow and block the reactor. The inner surface of the cylindrical reactor 3 is preferably as smooth as possible to prevent sodium chloride from adhering to the wall. The liquid flow rate and flow rate required to form a wetted wall over the entire surface cannot be determined because they vary depending on the diameter of the reactor, but
A chlorine-containing gas is introduced from the top of the reactor 3 downward through the chlorine gas supply nozzle 1 into the area where the cylindrical dead wall is formed. What is important here is that the chlorine gas supply nozzle 1 is completely independent of the reaction liquid, and that the opening of the nozzle 1 is located below the position of the reaction liquid supply nozzle 2. When the chlorine gas supply nozzle 1 comes into contact with the reaction liquid, sodium chloride is precipitated at the contact area, resulting in poor soil formation, and when chlorine gas enters the upper end of the wet wall, sodium chloride is precipitated there as well.
尚、円筒状反応器３の上面に空気、窒素及び／又は不活
性ガス導入口５を複数個設け、この穴より空気、霊素及
び／又は不活性ガスを少量反応器内に導入することによ
り、塩素ガスが濡れ壁上端の固液界面に拡散してくるの
を有効に防げる。この場合尋人する空気、窒素及び／又
は不活性ガスは圧入でも反応器系内減圧による吸い込み
でもかまわない。In addition, by providing a plurality of air, nitrogen and/or inert gas inlet ports 5 on the top surface of the cylindrical reactor 3, and introducing a small amount of air, spiritual elements and/or inert gas into the reactor through these holes. This effectively prevents chlorine gas from diffusing into the solid-liquid interface at the top of the wet wall. In this case, the air, nitrogen and/or inert gas may be introduced under pressure or sucked in by reducing the pressure within the reactor system.
又、塩素含有ガスは文字通シ、１００％塩素でなければ
ならない必要はなく、２〜ａｏｖｏｔ％の塩素を含む粗
塩素ガスでもかまわない。この塩素含有ガスの液膜への
拡散を助長する為、塩素ガス供給ノズル１の先端に、気
流分散器４を設け、気流が真直に下方に移動するのでな
く、横方向にも移動する様に工夫してもかまわない。塩
素ガス供給ノズルｌは図面では円筒状反応器３の中央に
挿入されているが、これに限定されるものではなく、複
数個中央以外の所に配置されてもかまわない。もちろん
この場合も上述の如く塩素ガス供給ノズルｌの管径及び
、取り付は位置を適切に選ひ、液膜と塩素ガス供給ノズ
ルｌとが接触しないようにしなければならない。これは
、塩素ガス供給ノズル１ＴＩＩ−反応液が接触し、塩化
ナトリウムが接触部で析出するのを防ぐ為である。塩素
ガスを吸収反応した反応液は反応器３下部に直結した貯
槽７に入る。貯槽７は攪拌されているのが好寸しく、こ
の中の反応液は循環ポンプで一部抜き出され、反応液供
給ノズル２に至る。塩素と苛性ソーダの反応は発熱反応
であり、貯（・ａ７もしくは反応液循環ラインにおいて
冷却機（図示せず）による除熱を必要とする。反応液の
温度を２００〜３０℃に保持するのが副反応防止の為好
ましい。Further, the chlorine-containing gas does not necessarily have to be 100% chlorine, and may be a crude chlorine gas containing 2 to 100% chlorine. In order to promote the diffusion of this chlorine-containing gas into the liquid film, an air flow disperser 4 is provided at the tip of the chlorine gas supply nozzle 1 so that the air flow does not move straight down but also in the horizontal direction. It doesn't matter if you devise something. Although the chlorine gas supply nozzle 1 is inserted in the center of the cylindrical reactor 3 in the drawing, it is not limited thereto, and a plurality of chlorine gas supply nozzles 1 may be arranged at a location other than the center. Of course, in this case as well, as mentioned above, the tube diameter and mounting position of the chlorine gas supply nozzle l must be appropriately selected to prevent the liquid film from coming into contact with the chlorine gas supply nozzle l. This is to prevent the chlorine gas supply nozzle 1TII from coming into contact with the reaction liquid and precipitating sodium chloride at the contact area. The reaction liquid that has absorbed and reacted with chlorine gas enters a storage tank 7 directly connected to the lower part of the reactor 3. Preferably, the storage tank 7 is stirred, and a portion of the reaction liquid therein is extracted by a circulation pump and reaches the reaction liquid supply nozzle 2. The reaction between chlorine and caustic soda is an exothermic reaction and requires heat removal using a cooler (not shown) in the storage (a7) or reaction liquid circulation line.It is best to maintain the temperature of the reaction liquid at 200 to 30°C. This is preferable to prevent side reactions.
以上述べた如く、本発明によれば塩素ガス供給ノズル１
、円筒状反応器３−において、塩化ナトリウムの析出に
よる閉塞が起こらず、長ｌｑ間安冗して、反応が継続で
きる。尚本発明はバッチ運転に於ても連続運転に於ても
適用できる。As described above, according to the present invention, the chlorine gas supply nozzle 1
In the cylindrical reactor 3-, blockage due to precipitation of sodium chloride does not occur, and the reaction can be safely continued for a long time. It should be noted that the present invention can be applied to both batch operation and continuous operation.
以下、実施例によシ本発明を説明する。The present invention will be explained below with reference to Examples.
実施例１
攪拌機及び反応液循環ポンプ、構内冷却コイルを備えた
容積５００ｔの貯槽７に、直径１５０Ｍｑ長さ２ｒｒＬ
の図面に示すような反応器３を取り付けた。Example 1 A storage tank 7 with a capacity of 500 t equipped with an agitator, a reaction liquid circulation pump, and an in-house cooling coil, with a diameter of 150 Mq and a length of 2 rrL
A reactor 3 as shown in the drawing was installed.
この貯槽７に次亜塩素酸ソーダ濃度２４重量％、結晶を
含む全塩化ナトリウム濃度２１重ｉ％苛性ソーダ濃度３
重量％のスラリー状反応液を３５０を仕込み、循環速度
２ｒｒｌ／ｈｒで反応液供給ノズル６を通じ、接線方向
から円筒状反応器３に循環させた。この循環ラインに３
５重量−の苛性ソーダを約８０ Ｋｇ／ ｈｒの速度で
供給し、塩素ガス２０ ｖｏＡ％含有の粗塩素ガスを純
分換算で２６ Ｋｇ／ ｈｒで直径３０ｍａの塩素ガス
供給ノズル五を通して供給した。In this storage tank 7, the concentration of sodium hypochlorite is 24% by weight, and the concentration of total sodium chloride including crystals is 21% by weight, and the concentration of caustic soda is 3%.
350% by weight of the slurry reaction liquid was charged and circulated tangentially into the cylindrical reactor 3 through the reaction liquid supply nozzle 6 at a circulation rate of 2 rrl/hr. 3 in this circulation line
5 weight of caustic soda was supplied at a rate of about 80 Kg/hr, and crude chlorine gas containing 20 voA% of chlorine gas was supplied at a rate of 26 Kg/hr in pure terms through a chlorine gas supply nozzle 5 with a diameter of 30 ma.
また、貯槽７及び円筒状反応器３の系を約５０関ａ＋０
減圧とし、反応器上部に、径３闘の穴を４個あけて、そ
の穴より空気の導入を計った。この間貯槽の苛性ソーダ
の濃度を４〜１重ｉ％に保つよう、苛性ソーダ供給量を
調節し、貯槽７は攪拌し、冷却コイルにより温度を２０
°〜２５℃に保った。反応液は貯槽液量が３５０ｔにな
るように一部連続で抜き出した。抜き出した液の組成は
最初仕込んだ液組成とほぼ同じであった。反応は開始後
７日間を経過しても反応器の閉塞は起こらなかった。In addition, the system of the storage tank 7 and the cylindrical reactor 3 is approximately 50mm a+0
The pressure was reduced, and four holes with a diameter of 3 mm were made in the upper part of the reactor, and air was introduced through the holes. During this time, the amount of caustic soda supplied was adjusted to maintain the concentration of caustic soda in the storage tank at 4 to 1% by weight, and the storage tank 7 was stirred and the temperature was maintained at 20% by weight using a cooling coil.
The temperature was kept at ~25°C. A portion of the reaction solution was continuously withdrawn so that the amount of liquid in the storage tank was 350 tons. The composition of the extracted liquid was almost the same as the initially charged liquid composition. No blockage of the reactor occurred even after 7 days had passed since the start of the reaction.
図面は本発明方法に用いる装置の１例であり、（５）図
は正面図、（Ｂ）図は平面図である。図中１は塩素ガス
供給ノズル、２は反応液供給ノズル、３は円筒状反応器
、４は気流分散器、５は望気、窒素及ｑ又は不活性ガス
尋人口、６は苛性ソーダを含む反応液、７は貯槽、８は
接線方向を示す。
荷量出願人 旭化戚工業株式会社
図 面
（Ａ）
図 面
（Ｂ）
手続補正書（自発） ５
昭牙口５９年２月；２Ｙ日
特許庁長官 若 杉 和 夫 殿
１、事件の表示 昭和５８年特許願第 １８９８９４
号２ 発明の名称
次亜塩素酸ソーダ水溶液の製造法
ａ 補正をする者
事件との関係 特許出願人
大阪府大阪市北区堂島浜１丁目２番６号４ 補正の対象
明細書の「発明の詳細な説明」の欄
補正の内容
（１）明細書第３頁第１８〜１９行の「図面は、・・・
・・・・・・・・・・・・・・・、但）図は平面図であ
る。」を、「第１図は。
本発明方法に用いる装置の１例の正面図を示し、第２図
は、第１図に示す装置の平面図である。」に訂正する。
（２）同第３貞第２０行の「図面において、」を、「第
１及び２図において、」に訂正する。
以上
手続補正＠（方式） ａ
昭和５９年２月−１日
特許庁長官 若 杉 和 夫 殿
１、事件の表示 昭和５８年特許願第 １８９８９４
号２ 発明の名称
次亜塩素酸ソーダ水溶液の製造法
ａ 補正をする者
事件との関係 特許出願人
大阪府大阪市北区堂島浜１丁目２番６号４、補正の対象
明細書の「図面の簡単な説７、明」
及び「図面」
補正の内容
（１）明細書第８頁第６〜７行の「図面は・・・・・・
・・・・・・・・・・・・・・・・・・・・・、（ハ）
図は平面図である。」を、「第１図は本発明方法に用い
る装置の１例の正面図、第２図は第１図に示す装置の平
面図である。」に訂正する。
（２）「図面（４）」を、「第１図」に訂正する。
（３）「図面［Ｆ］）」を、「第２図」に訂正する。
以上The drawings show an example of the apparatus used in the method of the present invention, in which figure (5) is a front view and figure (B) is a plan view. In the figure, 1 is a chlorine gas supply nozzle, 2 is a reaction liquid supply nozzle, 3 is a cylindrical reactor, 4 is an air flow disperser, 5 is a gas atmosphere, nitrogen and q or inert gas concentration, and 6 is a reaction containing caustic soda. 7 indicates a storage tank, and 8 indicates a tangential direction. Quantity Applicant: Asahi Kaiki Kogyo Co., Ltd. Drawing (A) Drawing (B) Procedural amendment (voluntary) 5 February 1986; 2Y Day Commissioner of the Patent Office Kazuo Wakasugi 1, Indication of the case Showa 1958 Patent Application No. 189894
No. 2 Name of the invention Method for producing aqueous sodium hypochlorite solution a Relationship with the case of the person making the amendment Patent applicant 1-2-6-6 Dojimahama, Kita-ku, Osaka-shi, Osaka Prefecture 4 Details of the invention in the specification to be amended Contents of amendments to the column "Explanation" (1) "Drawings..." on page 3, lines 18-19 of the specification
・・・・・・・・・・・・・・・However, the figure is a plan view. " is corrected to "FIG. 1 shows a front view of an example of the apparatus used in the method of the present invention, and FIG. 2 is a plan view of the apparatus shown in FIG. 1." (2) "In the drawings," in line 20 of No. 3, is corrected to "In Figures 1 and 2." Amendment of the above procedure @ (method) a February-1, 1980 Commissioner of the Japan Patent Office Kazuo Wakasugi 1, Indication of the case Patent application No. 189894 of 1989
No. 2 Name of the invention Method for producing aqueous sodium hypochlorite solution a Relationship with the case of the person making the amendment Patent applicant 1-2-6-4 Dojimahama, Kita-ku, Osaka-shi, Osaka Prefecture, Brief explanation 7, "Clearance" and "Drawings" Contents of amendment (1) "Drawings..." on page 8, lines 6-7 of the specification
・・・・・・・・・・・・・・・・・・・・・ (ha)
The figure is a plan view. " is corrected to "FIG. 1 is a front view of an example of the apparatus used in the method of the present invention, and FIG. 2 is a plan view of the apparatus shown in FIG. 1." (2) "Drawing (4)" is corrected to "Figure 1". (3) "Drawing [F])" is corrected to "Figure 2."that's all
Claims (1)
溶液を製造するに際し、苛性ソーダを含む反応液を反応
器の壁面の任意の位置から、壁面全面にわたって流下す
る濡れ壁を形成する如く供給し、塩素含有ガスを反応液
供給位置より下部で開口し、かつ壁面の濡れ壁とは独立
したノズルから供給することを特徴とする次亜塩素酸ソ
ーダ水溶液の製造法 ２ 苛性ソーダと塩素ガスとの反応が、反応液供給面よ
シ上部から導入されて流下する空気、窒素及び／又はそ
の他年活性ガス雰囲気下で行なわれることを特徴とする
特許請求の範囲第１項記載の次亜塩素酸ソーダ水溶液の
製造法[Claims] L: When producing a sodium hypochlorite aqueous solution by the reaction of caustic soda and chlorine, a wet wall is formed in which the reaction solution containing caustic soda flows down from any position on the wall surface of the reactor over the entire wall surface. Method 2 for producing an aqueous solution of sodium hypochlorite, characterized in that the chlorine-containing gas is supplied from a nozzle that opens below the reaction liquid supply position and is independent of the wetted wall of the wall. Caustic soda and chlorine gas The reaction with hypochlorite according to claim 1 is carried out in an atmosphere of air, nitrogen and/or other active gas introduced from the upper part of the reaction solution supply surface and flowing down. Method for producing acid soda aqueous solution
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18989483A JPS6081003A (en) | 1983-10-13 | 1983-10-13 | Manufacture of aqueous solution of sodium hypochlorite |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18989483A JPS6081003A (en) | 1983-10-13 | 1983-10-13 | Manufacture of aqueous solution of sodium hypochlorite |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6081003A true JPS6081003A (en) | 1985-05-09 |
| JPH05324B2 JPH05324B2 (en) | 1993-01-05 |
Family
ID=16248962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18989483A Granted JPS6081003A (en) | 1983-10-13 | 1983-10-13 | Manufacture of aqueous solution of sodium hypochlorite |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6081003A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005075347A3 (en) * | 2004-02-02 | 2005-10-06 | Powell Technologies Llc | Concurrent packed tower manufacture of hypochlorite |
| WO2018159233A1 (en) * | 2017-03-02 | 2018-09-07 | 日本軽金属株式会社 | Crystalline form of sodium hypochlorite pentahydrate and method for producing same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5818919U (en) * | 1981-07-28 | 1983-02-05 | 株式会社トクヤマ | Reactor for producing sodium hypochlorite |
| JPS5820703A (en) * | 1981-07-24 | 1983-02-07 | Tokuyama Soda Co Ltd | Production of aqueous sodium hypochlorite solution |
| JPS59102806A (en) * | 1982-11-27 | 1984-06-14 | Mitsubishi Gas Chem Co Inc | Production of aqueous solution of sodium hypochlorite having high concentration |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5818919B2 (en) * | 1979-08-02 | 1983-04-15 | 石津 皓史 | How to make colored paper |
-
1983
- 1983-10-13 JP JP18989483A patent/JPS6081003A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5820703A (en) * | 1981-07-24 | 1983-02-07 | Tokuyama Soda Co Ltd | Production of aqueous sodium hypochlorite solution |
| JPS5818919U (en) * | 1981-07-28 | 1983-02-05 | 株式会社トクヤマ | Reactor for producing sodium hypochlorite |
| JPS59102806A (en) * | 1982-11-27 | 1984-06-14 | Mitsubishi Gas Chem Co Inc | Production of aqueous solution of sodium hypochlorite having high concentration |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005075347A3 (en) * | 2004-02-02 | 2005-10-06 | Powell Technologies Llc | Concurrent packed tower manufacture of hypochlorite |
| WO2018159233A1 (en) * | 2017-03-02 | 2018-09-07 | 日本軽金属株式会社 | Crystalline form of sodium hypochlorite pentahydrate and method for producing same |
| JP2018145031A (en) * | 2017-03-02 | 2018-09-20 | 日本軽金属株式会社 | Sodium hypochlorite pentahydrate crystal and method for manufacturing the same |
| US11377349B2 (en) | 2017-03-02 | 2022-07-05 | Nippon Light Metal Company, Ltd. | Sodium hypochlorite pentahydrate crystals and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05324B2 (en) | 1993-01-05 |
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