JPS6042244A - Quartz glass having resistance to melting loss - Google Patents
Quartz glass having resistance to melting lossInfo
- Publication number
- JPS6042244A JPS6042244A JP14668483A JP14668483A JPS6042244A JP S6042244 A JPS6042244 A JP S6042244A JP 14668483 A JP14668483 A JP 14668483A JP 14668483 A JP14668483 A JP 14668483A JP S6042244 A JPS6042244 A JP S6042244A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- nitrogen
- resistance
- glass
- melting loss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/045—Silicon oxycarbide, oxynitride or oxycarbonitride glasses
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は、耐溶損性石英ガラスに関Jるものひある。[Detailed description of the invention] The present invention relates to erosion-resistant quartz glass.
従来から石英ガラスは、半々体工業や化学工業等で溶融
ルツボとして幅広く使用されている。その中で光学ガラ
ス溶融ルツボなとは使用温度が低いにもかかわらず、失
透が生じたりあるいは割れたりづることが多かった。BACKGROUND ART Conventionally, quartz glass has been widely used as a melting crucible in half-and-half industries, chemical industries, and the like. Among them, optical glass melting crucibles often suffer from devitrification or cracking despite the low operating temperature.
これは、光学ガラス中に多量のアルカリや全屈イオンが
含まれていて、石英ガラスをアタックし溶損してしまう
からである。また、通常では生成しにくいトリジマイト
等も使用後のルツボに多量にみられた。This is because the optical glass contains a large amount of alkali and total ion, which attack the silica glass and cause it to melt. Additionally, a large amount of tridymite, which is difficult to produce normally, was found in the crucible after use.
以、にのことからアルカリや金属との反応に対し、強い
抵抗をもつ石英ガラスが望まれていた。For this reason, quartz glass with strong resistance to reactions with alkalis and metals has been desired.
また、従来の石英ガラスは、石英ガラス中に微細なりラ
ックが発生して割れ易かった。Furthermore, conventional quartz glass is prone to breakage due to the formation of fine racks in the quartz glass.
従来の石英ガラスの強度は、理論強度の約1/200〜
1/40OL、かなかった。このため、石英ガラスに強
度をもたせるため、従来からアニール等の物理的強化法
を施したり、あるいは原わ1及び製品を高It度にして
、不純物が原因で発生する微細なりラックを防止()て
いた。The strength of conventional quartz glass is approximately 1/200 of the theoretical strength.
1/40OL, it didn't work. For this reason, in order to give strength to quartz glass, physical strengthening methods such as annealing have been conventionally applied, or the raw material 1 and the product are made to have a high It degree to prevent fine cracks caused by impurities. was.
しかし、アニール等による物理的強化法は、時間や熱量
などが多くかかるわりには強度がイれぽど向上せず、あ
まり効果的なものではなかった。また、原料及び製品を
高純度にする強化法にも限界があり、強度向」二のため
の根本的対策ではなかった。このため従来の石英ガラス
にあっては、割れによる故障が大きな障害となっていた
。However, physical strengthening methods such as annealing were not very effective, as they required a large amount of time and heat, but did not improve the strength very much. In addition, there are limits to the strengthening method that improves the purity of raw materials and products, and it is not a fundamental measure to improve strength. For this reason, failures due to cracks have been a major problem with conventional quartz glass.
本発明は、上記の実情に鑑みてなされたもので、耐溶損
性に優れて割れにくい耐溶損性石英ガラスを提供するこ
とを目的とするものである。The present invention has been made in view of the above-mentioned circumstances, and an object of the present invention is to provide a melt-resistant quartz glass that has excellent melt-proof properties and is difficult to break.
本発明の耐溶損性石英ガラスは、石英ガラス中の窒素含
有量が0.5〜20重間%であることを特徴とするもの
である。The erosion-resistant quartz glass of the present invention is characterized in that the nitrogen content in the quartz glass is 0.5 to 20% by weight.
本発明の耐溶損性石英ガラスは上記のように溝底されて
いるので、石英ガラス中に窒素−ケイ素結合が導入され
、この窒素−ケイ素結合にJ:つて高密度で耐溶損性に
優れた石英ガラスが得られるのである。この窒素−ケイ
素結合を有する本発明の耐溶損性石英ガラスは耐酸及び
耐アルカリ特性にすぐれているだけでなく、強度的にも
すぐれているため化学工業に広く使用できる。Since the erosion-resistant quartz glass of the present invention has a groove bottom as described above, nitrogen-silicon bonds are introduced into the quartz glass, and this nitrogen-silicon bond has a high density and excellent erosion resistance. Quartz glass is obtained. The erosion-resistant quartz glass of the present invention having nitrogen-silicon bonds not only has excellent acid and alkali resistance properties, but also has excellent strength, so it can be widely used in the chemical industry.
また、本発明の耐溶損性石英ガラスをシリコン単結晶引
上用ルツボとして用いた場合には、石英ガラスルツボ中
の窒素含有量を変化させることにより、単結晶引上工程
においてシリコン単結晶に溶(プ込む酸素の吊を制御゛
りることができる。In addition, when the melt-resistant quartz glass of the present invention is used as a crucible for pulling silicon single crystals, by changing the nitrogen content in the quartz glass crucible, it is possible to dissolve the silicon single crystal in the single crystal pulling process. (You can control the amount of oxygen pumped in.
本発明者は石英ガラスの密麿向上のため鋭意研究した結
果、石英ガラス中の酸素原子を窒素原子と置き換えるこ
とにJ:って(−8i−O−St−を−St−N−St
−にする)瑠
i
MFfJ損性に優れたものにすることができることを見
い出したものである。As a result of intensive research to improve the density of silica glass, the present inventor decided to replace the oxygen atoms in silica glass with nitrogen atoms (-8i-O-St- to -St-N-St).
It has been discovered that it is possible to make Rui MFfJ excellent in loss resistance.
石英ガラス中の窒素含有量を0.5〜20重量%に限定
した理由は次のとおりである。The reason why the nitrogen content in the quartz glass is limited to 0.5 to 20% by weight is as follows.
窒素含有間が0.5重量%よりも低いと、耐溶損性に伺
ら変化が現われず耐溶損性の石英ガラスを(aることが
できない。まIζ、窒素含有間が20重量%よりも大き
いと、石英ガラス中に泡やクラックが発生し、耐溶損性
が劣ってしまう。If the nitrogen content is lower than 0.5% by weight, there will be no change in the erosion resistance and it will not be possible to create quartz glass that is resistant to erosion.If the nitrogen content is lower than 20% by weight, If it is large, bubbles and cracks will occur in the quartz glass, resulting in poor erosion resistance.
石英ガラス中に窒素を含有さヒるには、例えば3i 3
N4やBN等の窒素化合物を窒素雰囲気中で石英と同
時に溶融づる。窒素化合物どしては、前記の化合物ばか
りでなく、石矢万ラス中に0.5〜20重邑%の窒素を
含有させるものであれば何でもよい。In order to contain nitrogen in quartz glass, for example, 3i 3
Nitrogen compounds such as N4 and BN are melted together with quartz in a nitrogen atmosphere. The nitrogen compound is not limited to the above-mentioned compounds, but any compound that can contain 0.5 to 20% nitrogen in the Ishiyama lath may be used.
以下、実施例を掲げて本発明の耐溶損性石英ガラスをJ
:り具体的に説明する。Examples are given below, and the melt-resistant quartz glass of the present invention is shown in J.
:Explain in detail.
史羞Mal l−
タングステンヒーターをもつモリブデン製炉に、水晶粉
と窒素ケイ素を入れ、−M化炭素、窒素雰囲気に置換後
密閉して炉内を5〜10気圧にづる。徐々に炉内の湿度
を上置させ、2200℃に保持する。数時間後、炉内部
のガスを1友き、2気圧まで下げたのち炉下部J、り溶
融した石英ガラスを取り出し、自然に放冷し本発明の耐
溶損性石英ガラスを製造した。この石英ガラスのブロッ
クを酸水素炎で加工して種々のルツボや板を作るのであ
るが、rrn I 7する際に放出される窒素の間は極
く少量であった(0.5%以下)。Shiki Mal l- Quartz crystal powder and silicon nitrogen are put into a molybdenum furnace equipped with a tungsten heater, and after replacing the atmosphere with -M carbon and nitrogen, the furnace is sealed and the inside of the furnace is brought to 5 to 10 atmospheres. The humidity in the furnace was gradually increased and maintained at 2200°C. After several hours, the gas inside the furnace was cooled down to 2 atmospheres, and then the molten quartz glass was taken out from the lower part of the furnace and allowed to cool naturally to produce the melt-resistant quartz glass of the present invention. This quartz glass block is processed with an oxyhydrogen flame to make various crucibles and plates, but the amount of nitrogen released during rrn I 7 was extremely small (less than 0.5%). .
このJ:うにしζ製ン告した本発明の耐溶損性6灸ガラ
スについて、窒素含有量、耐溶損性及び硬度を測定した
。その結果を第1表(後掲)に示す。耐溶損性の試験は
、石英ガラスの表面層の溶損量を測定することにより行
った。石英ガラス表面層は、溶融した光学ガラスBaF
10で溶損させた。試験温度は950℃、試験時間は1
0時間であった。尚、光学ガラスBaF10の組成を第
2表(後掲)に示した。また、硬度はビッカース硬度計
により測定した。The nitrogen content, erosion resistance, and hardness of this J: sea urchin ζ-manufactured glass with melting resistance 6 of the present invention were measured. The results are shown in Table 1 (see below). The erosion resistance test was conducted by measuring the amount of erosion on the surface layer of quartz glass. The quartz glass surface layer is made of fused optical glass BaF
It was melted at 10. Test temperature is 950℃, test time is 1
It was 0 hours. The composition of the optical glass BaF10 is shown in Table 2 (described later). Further, the hardness was measured using a Vickers hardness meter.
実施例2
実施例1と同様の炉に、ケイ砂と窒化ボロンを入れ実施
例1と同様の方法により本発明の耐溶1fi性石英ガラ
スを製造した。Example 2 A melt-resistant 1fi quartz glass of the present invention was produced in the same manner as in Example 1 by placing silica sand and boron nitride in the same furnace as in Example 1.
こうして得られた本発明の耐溶損性石英ガラスについて
も、窒素含有間、耐溶損性及び硬度を測定した。その結
果を第1表に示す。Regarding the erosion-resistant quartz glass of the present invention thus obtained, nitrogen content, erosion resistance, and hardness were also measured. The results are shown in Table 1.
硬度はビッカース硬度計により測定した。Hardness was measured using a Vickers hardness meter.
ULL
比較のために、窒素を含有していない従来の石英ガラス
(比較例1)と、窒素含有量が30重M%の石英ガラス
(比較例2)についても耐溶損性及びビッカース硬度計
による硬度を測定した。その結果を第1表に示す。ULL For comparison, conventional quartz glass that does not contain nitrogen (Comparative Example 1) and quartz glass with a nitrogen content of 30% by weight (Comparative Example 2) also have melting resistance and hardness measured by Vickers hardness tester. was measured. The results are shown in Table 1.
窒素含有量が30重間%のものは、石英ガラス中に泡が
多く、クラックが発生した。When the nitrogen content was 30% by weight, there were many bubbles in the quartz glass and cracks occurred.
特許出願人 東芝セラミックス株式会社匿IL 匿2MPatent applicant: Toshiba Ceramics Co., Ltd. Hidden 2M
Claims (1)
ことを特徴とする耐溶損性石英ガラス。A melt-resistant quartz glass characterized in that the nitrogen content m in the quartz glass is 0.5 to 20 w%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14668483A JPS6042244A (en) | 1983-08-12 | 1983-08-12 | Quartz glass having resistance to melting loss |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14668483A JPS6042244A (en) | 1983-08-12 | 1983-08-12 | Quartz glass having resistance to melting loss |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6042244A true JPS6042244A (en) | 1985-03-06 |
JPH0135780B2 JPH0135780B2 (en) | 1989-07-27 |
Family
ID=15413244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14668483A Granted JPS6042244A (en) | 1983-08-12 | 1983-08-12 | Quartz glass having resistance to melting loss |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6042244A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63206329A (en) * | 1987-02-20 | 1988-08-25 | Sunao Tsunetomi | Production of glass causing crystallite |
JPH01172239A (en) * | 1987-04-24 | 1989-07-07 | Tosoh Corp | High-hardness quartz glass and its production |
JPH03223136A (en) * | 1990-01-26 | 1991-10-02 | Shimadzu Corp | Production of oxynitride glass and glass fiber therefrom |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5087339A (en) * | 1973-11-27 | 1975-07-14 | ||
JPS53113817A (en) * | 1977-03-17 | 1978-10-04 | Toshiba Ceramics Co | Quartz glass crucible for pulling up single crysal of silicon |
JPS54157779A (en) * | 1978-06-02 | 1979-12-12 | Toshiba Corp | Production of silicon single crystal |
JPS5832037A (en) * | 1981-08-13 | 1983-02-24 | Nippon Telegr & Teleph Corp <Ntt> | Preparation of glass containing additive |
-
1983
- 1983-08-12 JP JP14668483A patent/JPS6042244A/en active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5087339A (en) * | 1973-11-27 | 1975-07-14 | ||
JPS53113817A (en) * | 1977-03-17 | 1978-10-04 | Toshiba Ceramics Co | Quartz glass crucible for pulling up single crysal of silicon |
JPS54157779A (en) * | 1978-06-02 | 1979-12-12 | Toshiba Corp | Production of silicon single crystal |
JPS5832037A (en) * | 1981-08-13 | 1983-02-24 | Nippon Telegr & Teleph Corp <Ntt> | Preparation of glass containing additive |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63206329A (en) * | 1987-02-20 | 1988-08-25 | Sunao Tsunetomi | Production of glass causing crystallite |
JPH01172239A (en) * | 1987-04-24 | 1989-07-07 | Tosoh Corp | High-hardness quartz glass and its production |
JPH03223136A (en) * | 1990-01-26 | 1991-10-02 | Shimadzu Corp | Production of oxynitride glass and glass fiber therefrom |
Also Published As
Publication number | Publication date |
---|---|
JPH0135780B2 (en) | 1989-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |