JPS60257833A - Light irradiation processing apparatus - Google Patents
Light irradiation processing apparatusInfo
- Publication number
- JPS60257833A JPS60257833A JP11424184A JP11424184A JPS60257833A JP S60257833 A JPS60257833 A JP S60257833A JP 11424184 A JP11424184 A JP 11424184A JP 11424184 A JP11424184 A JP 11424184A JP S60257833 A JPS60257833 A JP S60257833A
- Authority
- JP
- Japan
- Prior art keywords
- discharge chamber
- gas discharge
- gas
- antenna
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/126—Microwaves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/12—Processes employing electromagnetic waves
- B01J2219/1203—Incoherent waves
- B01J2219/1206—Microwaves
- B01J2219/1209—Features relating to the reactor or vessel
- B01J2219/1212—Arrangements of the reactor or the reactors
- B01J2219/1215—Single reactor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は紫外線や赤外線を用いて各種材料の表面処理や
化学反応等を行なう光照射処理装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a light irradiation treatment apparatus that uses ultraviolet rays and infrared rays to perform surface treatments and chemical reactions on various materials.
近年、光CVD(Chemical Vap。 In recent years, optical CVD (Chemical Vap.
r [)eposition)技術の進歩に伴い、真空
中もしくは特殊なガス雰囲気中に被処理物を収容し、こ
の被処理物に紫外線や赤外線の如きある特定の波長領域
の光を照射することにより、上記被処理物を化学反応さ
せたり、表面を浄化する等の作業が行なわれている。With advances in technology, the workpiece is housed in a vacuum or a special gas atmosphere, and the workpiece is irradiated with light in a specific wavelength range, such as ultraviolet rays or infrared rays. Work such as chemically reacting the object to be treated and cleaning the surface is performed.
ところで、この種の作業には、被処理物に対し特定の光
を照射する光照射処理装置を必要どし、既存の装置は上
記特定の波長領域の光を発生する光発生源と、この光発
生課内の光が導かれるとともに、被処理物が収容される
処理至を主体どして構成されている。By the way, this type of work requires a light irradiation treatment device that irradiates the object with a specific light, and existing devices require a light source that generates light in the specific wavelength range and a light source that emits light in the specific wavelength range. The generator section is mainly composed of a processing section through which light is guided and objects to be processed are accommodated.
(背景技術の問題点〕
このような光照射処理装置の光発生源は、現在のところ
実験的レベルでしかないため、内部が所定のガス雰囲気
に保たれた中空容器の外周囲に、高周波コイルを巻回し
、この高周波コイルに高周波電圧を印加させることによ
り、中空容器内のガスに放電を生じせしめ、例えば20
0 nm以下の紫外線を発生させる方式となっている。(Problems with the background technology) The light generation source of such a light irradiation treatment device is currently only at an experimental level, so a high-frequency coil is installed around the outside of a hollow container whose interior is maintained in a predetermined gas atmosphere. By winding the high-frequency coil and applying a high-frequency voltage to this high-frequency coil, a discharge is generated in the gas in the hollow container, for example, 20
It is a method that generates ultraviolet light of 0 nm or less.
ところが、このものによると、高周波コイルに発生した
電磁界が外方に漏洩し易く、電磁界を有効に利用できな
いとともに、中空容器内に均一に放電を生じさせること
が難しく、このため、光の波長がばらついたり照射面に
輝度むらが生じる問題があり、特定の波長領域の光を安
定して供給する上で改善の余地が残されていた。However, with this method, the electromagnetic field generated in the high-frequency coil tends to leak outward, making it impossible to use the electromagnetic field effectively, and making it difficult to generate a discharge uniformly within the hollow container. There are problems with variations in wavelength and uneven brightness on the irradiated surface, and there is still room for improvement in stably supplying light in a specific wavelength range.
(発明の目的)
本発明はこのような事情にもとずいてなされたもので、
特定の波長領域の光を安定して供給できるどともに、照
射面の輝度むらも少なくなり、大面積の光照射処理が可
能どなる光照射処理装置の提供を目的とする。(Object of the invention) The present invention was made based on the above circumstances, and
An object of the present invention is to provide a light irradiation processing device that can stably supply light in a specific wavelength range, reduce uneven brightness on an irradiated surface, and enable light irradiation processing over a large area.
すなわち、本発明は上記目的を達成するため、特定の波
長領域の光を発生する光発生源を、マイクロ波発生源と
、気密構造をなすとともに光を取出す透過窓を備えた気
体放電室と、この気体放電室内の雰囲気を置換する排気
源および気体供給源と、上記気体放電室内に導入され、
上記マイクロ波発生源で発生されたマイクロ波を気体放
電室内に発射せしめてこの気体放電室内に放電を生起さ
せるアンテナとで構成したことを特徴とする。That is, in order to achieve the above object, the present invention includes a light generation source that generates light in a specific wavelength range, a microwave generation source, a gas discharge chamber having an airtight structure and a transmission window for extracting light; an exhaust source and a gas supply source that replace the atmosphere in the gas discharge chamber, and an exhaust source and a gas supply source introduced into the gas discharge chamber,
The present invention is characterized by comprising an antenna for emitting microwaves generated by the microwave generation source into a gas discharge chamber to cause discharge within the gas discharge chamber.
以下本発明を、図面に示す一実施例にもとずいて説明す
る。The present invention will be explained below based on an embodiment shown in the drawings.
この実施例は液晶表示パネルの表面に付着した有機物等
を除去して洗浄する装置について示し、符号1は光発生
源である。この光発生源1は中空状の容器2を備え、こ
の容器2はその両端開口部が夫々蓋部材3,4によって
気密に閉鎖されて内部に気体放電室5を形成している。This embodiment shows an apparatus for cleaning and removing organic matter adhering to the surface of a liquid crystal display panel, and reference numeral 1 represents a light source. The light source 1 includes a hollow container 2, which has openings at both ends hermetically closed by lid members 3 and 4, respectively, to form a gas discharge chamber 5 therein.
そして、気体放電室5は開閉弁6を介して例えば水素ガ
スを供給する気体供給源7に接続されているとともに、
伯の開閉弁8を介して真空ポンプの如き排気源9に接続
されており、この気体放電室5内は上記排気源9により
例えば10°’Torr程度まで真空引きされた後、気
体供給源7を通じて水素ガスが導入され、数Torrの
水素ガス雰囲気に保たれるようになっている。なお、符
号10は気体放電室5内のガス圧を検知する圧力計、1
1は気体放電室5内のガス圧を調整するマスフローコン
トローラである。The gas discharge chamber 5 is connected to a gas supply source 7 that supplies, for example, hydrogen gas via an on-off valve 6, and
It is connected to an exhaust source 9 such as a vacuum pump through an on-off valve 8, and after the inside of the gas discharge chamber 5 is evacuated to about 10° Torr by the exhaust source 9, the gas supply source 7 Hydrogen gas is introduced through the tube, and a hydrogen gas atmosphere of several Torr is maintained. Incidentally, reference numeral 10 denotes a pressure gauge 1 for detecting the gas pressure within the gas discharge chamber 5.
1 is a mass flow controller that adjusts the gas pressure within the gas discharge chamber 5;
ところで、上記一方の蓋部材3の中央には、コネクタ1
2を介して棒状のアンテナ13が支持されており、この
アンテナ13は蓋部材3に開設した通孔14内を挿通し
て上記気体放電室5内に導入されている。また、通孔1
4の開口部には中空円筒状をなした石英ガラス製の隔壁
チューブ15が気密に取付【プられており、この隔壁チ
ューブ15は通孔14を閉鎖して気体放電室5内の気密
を確保するとともに、上記アンテナ13の外周囲を同軸
的に覆い、アンテナ13の周囲と気体放電室5内とを区
画している。By the way, in the center of one of the lid members 3, there is a connector 1.
A rod-shaped antenna 13 is supported through the cover member 2, and the antenna 13 is introduced into the gas discharge chamber 5 by passing through a through hole 14 formed in the lid member 3. Also, through hole 1
A hollow cylindrical bulkhead tube 15 made of quartz glass is airtightly attached to the opening of the gas discharge chamber 4, and this bulkhead tube 15 closes the through hole 14 to ensure airtightness within the gas discharge chamber 5. At the same time, the outer periphery of the antenna 13 is coaxially covered, and the periphery of the antenna 13 and the inside of the gas discharge chamber 5 are partitioned.
なお、隔壁チューブ15内には好ましい例として、アン
テナ13を冷却するためのガスが流通されるようになっ
ている。Note that, as a preferable example, gas for cooling the antenna 13 is made to flow through the partition tube 15.
アンテナ13にはマイクロ波発生器16内のマグネ]−
ロンからマイクロ波が供給されるが、このマイクロ波は
導波管17、同軸ケーブル変換器18から同軸ケーブル
19を介してアンテナ13に伝送される。The antenna 13 has a magnet in the microwave generator 16]-
Microwaves are supplied from Ron, and are transmitted to the antenna 13 via a waveguide 17, a coaxial cable converter 18, and a coaxial cable 19.
そ己て、導波管17内を伝送されるマイクロ波の出力は
、常時パワーメータ20でモニターされるとともに、同
軸ケーブル変換器18の終端部には、マイクロ波の反射
波を最少に抑えてマイクロ波を効率良くアンテナ13に
伝送するためのプランジャ21およびスリースタブチュ
ーナ22が設置されている。Therefore, the output of the microwave transmitted within the waveguide 17 is constantly monitored by a power meter 20, and a cable is installed at the end of the coaxial cable converter 18 to minimize the reflected waves of the microwave. A plunger 21 and a three-stub tuner 22 are installed to efficiently transmit microwaves to the antenna 13.
したがって、上記気体放電室5内が数TOrrの水素ガ
ス雰囲気に保たれた状態で、マイクロ波発生器16を動
作させ、アンテナ13を通じて気体放電室5内にマイク
ロ波を発射すると、この気体放電室5内の水素ガスに放
電が生U1例えば200 nm以下の波長の紫外線が放
射されるようになっている。Therefore, when the microwave generator 16 is operated and microwaves are emitted into the gas discharge chamber 5 through the antenna 13 while the gas discharge chamber 5 is maintained in a hydrogen gas atmosphere of several Torr, the gas discharge chamber A discharge is generated in the hydrogen gas within U1, and ultraviolet rays having a wavelength of, for example, 200 nm or less are emitted.
気体放電v5の一側壁には光取出し口23が設けられて
おり、この光取出し口23は上記アンテナ13および隔
壁チューブ15の先端部に対向されている。A light extraction port 23 is provided on one side wall of the gas discharge v5, and this light extraction port 23 faces the antenna 13 and the tip of the partition tube 15.
そして、光取出し口23の開口部には紫外線を取出すた
めの透過窓24が気密に取付()られており、本実施例
の場合は、透過窓24の材質として紫外線の透過性に優
れたMQ F2やしIF等のアルカリハライドを使用し
ている。なお、気体放電室5内には隔壁チューブ15の
周囲で発光した光を透過窓24側に反射させる反射板2
5が設けられており、光を効率良く取出すための対策が
なされている。A transmission window 24 for extracting ultraviolet rays is airtightly attached to the opening of the light extraction port 23. In the case of this embodiment, the material of the transmission window 24 is MQ, which has excellent ultraviolet transmittance. Alkali halide such as F2 palm IF is used. Note that a reflection plate 2 is provided in the gas discharge chamber 5 to reflect light emitted around the partition tube 15 toward the transmission window 24 side.
5 is provided, and measures are taken to efficiently extract light.
また、上記透過窓24には液晶表示パネル等の被処理物
26を収容した処理ケース27が接離自在に衝合されて
おり、この処理ケース27内は酸素ガス雰囲気に保たれ
るようになっている。Further, a processing case 27 containing a processing object 26 such as a liquid crystal display panel is attached to the transmission window 24 so as to be able to come into contact with and separate from the processing case 27, and the inside of this processing case 27 is maintained in an oxygen gas atmosphere. ing.
次に、上記構成の作用について説明する。Next, the operation of the above configuration will be explained.
まず、排気源9を作動させ、圧力側10の管理のもとて
気体放電室5内の圧力が10” ’ Torrになるま
で排気する。次に、気体供給源7を通じて気体放電室5
内に水素ガスを供給するとともに、マスフローコントロ
ーラ11により気体放電室5内のガス圧を0.1〜数T
orrに調整する。First, the exhaust source 9 is activated and the gas discharge chamber 5 is evacuated under the control of the pressure side 10 until the pressure within the gas discharge chamber 5 reaches 10'' Torr.
At the same time, the mass flow controller 11 controls the gas pressure in the gas discharge chamber 5 from 0.1 to several T.
Adjust to orr.
このような状態でマイクロ波発生器16を動作させ、ア
ンテナ13から気体放電室5内にマイクロ波を発射させ
て隔壁デユープ15の周囲に放電を生じさせると、この
放電により生起された紫、外線が透過窓24を通じて処
理ケース27内に導入され、この処理ケース27内の酸
素が紫外線を受けてオゾンになる。そして、オゾンの酸
化反応により、被処理物2Gの表面に(=1着している
有機物が除去され、所定の光照射処理がなされる。When the microwave generator 16 is operated in this state and microwaves are emitted from the antenna 13 into the gas discharge chamber 5 to generate a discharge around the partition duplex 15, the ultraviolet and external rays generated by this discharge are is introduced into the processing case 27 through the transmission window 24, and the oxygen within the processing case 27 is exposed to ultraviolet rays and becomes ozone. Then, due to the oxidation reaction of ozone, the organic matter adhering to the surface of the object to be treated 2G (=1) is removed, and a predetermined light irradiation treatment is performed.
このような一実施例によれば、気体放電室5内に放電の
エネルギー源となる棒状のアンテナ13を挿入したので
、このアンテナ13からは第2図に示したようにマイク
ロ波が放射状に均等に発射され、隔壁チューブ15の周
囲には周方向に沿って均一な放電(プラズマ)が生じる
ことになる。しかも、マイクロ波は全てが気体放電室5
内に発射されるので、マイクロ波の漏洩による損失がな
く、このため所望の波長領域の光(本実施例の場合は紫
外線)を安定して供給することができる。また、気 l
“体放電室5内での放電は、アンチカフ3の軸方向仝長
にわたって生じるので、放電長さを長くとることができ
、発光効率が向上する。According to such an embodiment, a rod-shaped antenna 13 serving as an energy source for electric discharge is inserted into the gas discharge chamber 5, so that microwaves are uniformly radiated from this antenna 13 as shown in FIG. A uniform discharge (plasma) is generated around the partition tube 15 along the circumferential direction. Moreover, microwaves are all gas discharge chamber 5.
Since the microwave is emitted inward, there is no loss due to microwave leakage, and therefore light in a desired wavelength range (ultraviolet rays in this example) can be stably supplied. Also, mind
“Since the discharge within the body discharge chamber 5 occurs over the axial length of the anti-cuff 3, the length of the discharge can be increased, and the luminous efficiency is improved.
加えて、気体放電室5内での放電が、アンテナ13の軸
方向にわたり、かつ周方向に)aつで同心円的に均等化
されるので、被処理物26の照射面上の輝度むらが少な
くなり、大面積の光照射処理が可能となる利点がある。In addition, since the discharge within the gas discharge chamber 5 is concentrically equalized in the axial direction of the antenna 13 and in the circumferential direction a), unevenness in brightness on the irradiated surface of the object to be processed 26 is reduced. This has the advantage of enabling light irradiation treatment over a large area.
また、本実施例ではアンテナ13の周囲と気体放電室5
内とを、隔壁デユープ15によって区画しであるので、
アンテナ13が放電空間に直接露出されずに済み、した
がって、アンテナ13がスパッタリングされることもな
く、長寿命となる。In addition, in this embodiment, the surroundings of the antenna 13 and the gas discharge chamber 5 are
Since the inside is divided by the partition wall duplex 15,
The antenna 13 does not need to be directly exposed to the discharge space, so the antenna 13 is not sputtered and has a long life.
なお、本発明において、被処理物は液晶表示パネルに限
定されるものではなく、したがって処理に用いる光も紫
外線に限らず、赤外線であっても良い。In the present invention, the object to be treated is not limited to a liquid crystal display panel, and therefore the light used for treatment is not limited to ultraviolet rays, but may also be infrared rays.
また、気体放電室内に導入するガスも水素に限らず、処
理の種類や被処理物に応じてクリプトン(Kr )やキ
セノン(Xe >ガス又はこれらの混合ガスに変えても
良いことは言うまでもない。It goes without saying that the gas introduced into the gas discharge chamber is not limited to hydrogen, but may be changed to krypton (Kr), xenon (Xe), or a mixture thereof depending on the type of treatment and the object to be treated.
以上詳述した本発明によれば、気体放電室内に挿入され
たアンテナからマイクロ波が放射状に均等に発射される
ので、アンテナの周囲には軸方向にわたるとともに、周
方向に沿って同心円的に均一な放電(プラズマ)が生じ
ることになり、しかもマイクロ波は全てが気体放電室内
に発射されるので、マイクロ波の漏洩による損失がなく
、このため所望の波長領域の光を安定して供給すること
ができる。それとともに、気体放電室内での放電が、ア
ンテナの軸方向にわたり、かつ周方向に同心円的に均等
化されるので、被処理物の照射面上の輝度むらが少なく
なり、大面積の光照射処理が可能となる利点がある。According to the present invention described in detail above, microwaves are uniformly emitted radially from the antenna inserted into the gas discharge chamber, so that the microwaves are uniformly distributed around the antenna in the axial direction and concentrically along the circumferential direction. Moreover, since all the microwaves are emitted into the gas discharge chamber, there is no loss due to microwave leakage, and therefore light in the desired wavelength range can be stably supplied. I can do it. At the same time, the discharge in the gas discharge chamber is equalized in the axial direction of the antenna and concentrically in the circumferential direction, reducing uneven brightness on the irradiated surface of the object to be treated, allowing light irradiation of large areas. It has the advantage of being possible.
図面は本発明の一実施例を示し、第1図は光照射処理装
置の概略構成図、第2図は第1図中■−■線に沿う断面
図である。
1・・・光発生源、5・・・気体放電室、7・・・気体
供給源、9・・・排気源、13・・・アンテナ、1G・
・・マイクロ波発生源(マイクロ波発生器)、24・・
・透過窓、26・・・被処理物。
出願人代理人 弁理士 鈴江武彦The drawings show an embodiment of the present invention, and FIG. 1 is a schematic diagram of a light irradiation processing apparatus, and FIG. 2 is a sectional view taken along line 1--2 in FIG. DESCRIPTION OF SYMBOLS 1... Light generation source, 5... Gas discharge chamber, 7... Gas supply source, 9... Exhaust source, 13... Antenna, 1G.
...Microwave source (microwave generator), 24...
- Transmission window, 26... object to be treated. Applicant's agent Patent attorney Takehiko Suzue
Claims (2)
長領域の光を彼処JIJI物に向って導く透過窓とを具
備し、 上記光発生源は、マイクロ波発生源と、気密構造をなす
とともに上記透過窓を商えた気体放電室と、この気体放
電室内の雰囲気を買換する排気源および気体供給源と、
上記気体放電室内に導入され、上記マイクロ波発生源で
発生されたマイクロ波を気体放電室内に発射せしめてこ
の気体放電!内に放電を生起さゼるアンテナとで構成し
てなることを特徴とプる光照射処理HM。(1) A light generation source and a transmission window that guides light in a specific wavelength range generated by the light generation source toward the JIJI object, the light generation source includes a microwave generation source and an airtight a gas discharge chamber having a structure and having the above-mentioned transmission window; an exhaust source and a gas supply source for replacing the atmosphere in the gas discharge chamber;
This gas discharge is introduced into the gas discharge chamber and the microwaves generated by the microwave generation source are emitted into the gas discharge chamber! A light irradiation treatment HM characterized by being composed of an antenna that generates a discharge inside.
ラス製の隔壁によって区画したことを特徴とする特許請
求の範囲第(1)項記載の光照射処1!!!装置。(2) The light irradiation station 1 according to claim (1), characterized in that the gas discharge chamber and the surrounding area of the antenna are partitioned by a partition wall made of quartz glass! ! ! Device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11424184A JPS60257833A (en) | 1984-06-04 | 1984-06-04 | Light irradiation processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11424184A JPS60257833A (en) | 1984-06-04 | 1984-06-04 | Light irradiation processing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60257833A true JPS60257833A (en) | 1985-12-19 |
Family
ID=14632804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11424184A Pending JPS60257833A (en) | 1984-06-04 | 1984-06-04 | Light irradiation processing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60257833A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01174281U (en) * | 1988-05-31 | 1989-12-11 |
-
1984
- 1984-06-04 JP JP11424184A patent/JPS60257833A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01174281U (en) * | 1988-05-31 | 1989-12-11 |
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