JPS60255291A - Electron beam working device - Google Patents

Electron beam working device

Info

Publication number
JPS60255291A
JPS60255291A JP10936384A JP10936384A JPS60255291A JP S60255291 A JPS60255291 A JP S60255291A JP 10936384 A JP10936384 A JP 10936384A JP 10936384 A JP10936384 A JP 10936384A JP S60255291 A JPS60255291 A JP S60255291A
Authority
JP
Japan
Prior art keywords
door
vacuum
working room
electron beam
processing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10936384A
Other languages
Japanese (ja)
Inventor
Michinobu Hattori
服部　通宣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10936384A priority Critical patent/JPS60255291A/en
Publication of JPS60255291A publication Critical patent/JPS60255291A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K15/00—Electron-beam welding or cutting
    • B23K15/06—Electron-beam welding or cutting within a vacuum chamber

Abstract

PURPOSE:To keep sufficiently the vacuum of a vacuum working room by arranging a packing for vacuum sealing between the vacuum working room and cross moving type door provided to the opening part thereof and by cleaning by a wiper the sealed face at the time of opening and closing the door. CONSTITUTION:A door 9 having faces 9b, 9c, 9d on the side of opening part of a vacuum working room 8 is provided in a cross moving type and the vacuum working room 8 is kept in a vacuum. In case of opening the door 8, the door 9 is moved to the direction (h) like pulling out of the vacuum working room 8 by a cylinder device 16. A sliding member 13 is then slid to the direction (g) and the door 9 is moved to the position shown by an alternate long and short dash line. At this moment the sealed face 9a of the door 9 is cleaned by a wiper 10. A spatter and dust existed between the sealed face 9a and sealed face 9b are thus removed and the vacuum working room 8 is kept in a sufficient vacuum.

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は、電子ビーム加工装置における真空加工室の
真空シール扉に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a vacuum seal door of a vacuum processing chamber in an electron beam processing apparatus.

〔従来技術〕[Prior art]

第４図に従来の電子ビーム加工装置における真空加工室
の真空シール扉の構造を示す。図において、（１）は真
空加工室、（２）は電子銃、（３）は真空排気管、（４
）は扉、（５）は真空シール用パツキン、（６）は被加
工物（７）を載せる台である。FIG. 4 shows the structure of a vacuum seal door of a vacuum processing chamber in a conventional electron beam processing apparatus. In the figure, (1) is a vacuum processing chamber, (2) is an electron gun, (3) is a vacuum exhaust pipe, and (4) is a vacuum processing chamber.
) is a door, (5) is a gasket for vacuum sealing, and (6) is a stand on which the workpiece (7) is placed.

このような加工装置において例えば電子銃（２）よりの
電子ビーム（２ａ）を被加工物（７）に照射して溶接を
すると、スパッターが真空加工室（１）の内面（１ｂ）
等に多数飛散して扉（４）と真空加工室（１）との間の
すき間に入り、このスパッターが、扉（４）を開いて被
加工物（７）を出し入れする場合に、扉（４）のシール
面（４ａ）に付着することがある。また扉（４）を開い
て被加工物（７）を取シ出しあるいは設置する場合には
、外部の塵等が扉（４）のシール面（４＆）に付着する
。この状態で扉（４）を閉じると、真空加工室（１）の
シール面（１ａ）と扉（４）のシール面（４＆）との間
にスパッター、塵等が挾まれ、真空シールを保てないこ
とがよくおこる。またスパッタ、塵等をはさんだまま扉
を閉じることによって扉（４）のシール面（４ａ）を傷
っけ、その結果真空シールを保てず、電子ビーム加工に
必要な真空度を保てないこともある。このため、扉（４
）を閉じる前に扉（４）のシール面（４ａ）を清掃しな
ければならなかった。In such a processing device, when welding is performed by irradiating the workpiece (7) with an electron beam (2a) from an electron gun (2), for example, spatter is generated on the inner surface (1b) of the vacuum processing chamber (1).
etc., and enters the gap between the door (4) and the vacuum processing chamber (1), and when the door (4) is opened to take in and take out the workpiece (7), this spatter enters the gap between the door (4) and the vacuum processing chamber (1). 4) may adhere to the sealing surface (4a). Furthermore, when the door (4) is opened to take out or install the workpiece (7), external dust etc. adhere to the sealing surface (4&) of the door (4). If the door (4) is closed in this state, spatter, dust, etc. will be caught between the sealing surface (1a) of the vacuum processing chamber (1) and the sealing surface (4&) of the door (4), and the vacuum seal will be maintained. Things that don't happen often. Also, closing the door with spatter, dust, etc. inside may damage the sealing surface (4a) of the door (4), making it impossible to maintain a vacuum seal and the degree of vacuum required for electron beam processing. Sometimes. For this reason, the door (4
) had to be cleaned before closing the sealing surface (4a) of the door (4).

〔発明の概要〕[Summary of the invention]

この発明は上記のような欠点を除去するために、電子ビ
ーム加工装置の開口部に横移動式扉を設けて、該扉と真
空加工室との間に真空シール用パツキンを配設すると共
に、前記扉の開閉時に、該扉のシール面を清掃するため
のワイパーを設置し、真空加工室のシール面と扉のシー
ル面との間にスパッターや塵等が挾まれて、真空加工室
の真空度が低下するのを自動的に防止することのできる
電子ビーム加工装置を提供するものである。In order to eliminate the above-mentioned drawbacks, the present invention provides a horizontally movable door at the opening of an electron beam processing device, and arranges a vacuum sealing gasket between the door and the vacuum processing chamber. A wiper is installed to clean the sealing surface of the door when the door is opened and closed, and spatter and dust are caught between the sealing surface of the vacuum processing chamber and the sealing surface of the door, causing the vacuum in the vacuum processing chamber to deteriorate. An object of the present invention is to provide an electron beam processing device that can automatically prevent a decrease in the degree of deterioration.

〔発明の実施例〕[Embodiments of the invention]

第１図は本発明の一実施例を示す断面図、第２図はその
平面図で扉を開いた状態を示す。また第３図は扉とワイ
パーの関係位置を示す説明図である。図において、（２
）　、　（３）　、　（５）　、　（６）　、　（７）
は従来のものと全く同一である。（８）は開口側に突出
部（８Ｃ）を持つ真空加工室、（９）は面（９ｂ）　、
　（９ｃ）　、　（９ａ）で囲まれた塵芥保持部を持つ
扉である。（９ｅ）は扉（９）に設けられた係合部材、
０１は扉（９）のシール面（９＆）を清掃するワイパー
で、ゴムで形成され支持部材（＋１）に支持されている
。（ｌのはレールで、矢印ｇ方向に延在している。ａ渇
はレールα２で摺動可能に支持された摺動部材で、駆動
装置（図示せず）によって矢印ｇ方向に駆動される。Ｉ
は摺動部材ａ３に回動可能に支持された吊腕、Ｑ５）は
扉（９）を吊腕（＋４）に回動可能に連結した連結部材
、（１６）は真空加工室（８）に固定されたシリンダ装
置、ａηは係合部材（９ｅ）と嵌合する溝（１７ａ）を
有する操作部材で、シリンダ装置Ｏｅによって矢印り方
向に操作される。FIG. 1 is a sectional view showing an embodiment of the present invention, and FIG. 2 is a plan view of the same with the door open. Further, FIG. 3 is an explanatory diagram showing the relative positions of the door and the wiper. In the figure, (2
), (3), (5), (6), (7)
is exactly the same as the conventional one. (8) is a vacuum processing chamber with a protrusion (8C) on the opening side, (9) is a surface (9b),
This is a door with a garbage holding part surrounded by (9c) and (9a). (9e) is an engagement member provided on the door (9);
01 is a wiper for cleaning the sealing surface (9&) of the door (9), which is made of rubber and supported by a support member (+1). (L is a rail extending in the direction of arrow g. A is a sliding member slidably supported by rail α2, and is driven in the direction of arrow g by a drive device (not shown). .I
Q5) is a hanging arm that is rotatably supported by sliding member a3, Q5 is a connecting member that rotatably connects the door (9) to the hanging arm (+4), and (16) is a connecting member that is rotatably supported in the vacuum processing room (8). The fixed cylinder device aη is an operating member having a groove (17a) that fits into the engagement member (9e), and is operated in the direction indicated by the arrow by the cylinder device Oe.

第２図の矢印り、ｇは扉（９）を開閉する時の動作方向
を示す。扉（９）を開く時は、まずシリンダ装置Ｏｅに
より扉（９）を矢印（ｈ）の方向に移動させて真空加工
室（８）より引き外し、次いで駆動装置によって摺動部
材０３）を矢印（ｇ）の方向に摺動させ、真空加工室（
８）の正面より１点鎖線で示す位置に移動させる。Arrows g in FIG. 2 indicate the direction of movement when opening and closing the door (9). When opening the door (9), first move the door (9) in the direction of the arrow (h) using the cylinder device Oe and pull it out from the vacuum processing chamber (8), then use the drive device to move the sliding member 03) in the direction of the arrow (h). Slide it in the direction of (g) and move it to the vacuum processing chamber (
8) from the front to the position shown by the one-dot chain line.

上記のように構成した電子ビーム加工装置において、例
えば、溶接の場合は従来の装置と全く同じ操作で扉の開
閉、被溶接物（７）の出し入れ、溶接が可能である。In the electron beam processing apparatus configured as described above, for example, in the case of welding, it is possible to open and close the door, take in and take out the workpiece (7), and perform welding with exactly the same operations as in conventional devices.

〔発明の効果〕〔Effect of the invention〕

本発明により、従来と同じ操作でも、スパッターは面（
９ｂ）　、　（９ｃ）　、（９ｄ）で囲まれた塵芥保持
部に溜り、真空加工室（８）のシール面（８ａ）と、扉
（９）のシール面（９ａ）に挾まることはない。またシ
ール面にスパッターが付着したシ、あるいは扉（９）を
開いている時に、シール面（９ａ）に塵芥が付着したシ
することがあっても、第３図に示すように扉（９）の開
閉時にワイパー０１でシール面（９ａ）が清掃されるた
め、塵芥は除去されシール面（９ａ）とシール面（９ｂ
）の間にスパッターや塵芥が挾まれることがなく、従っ
て、真空加工室（８）の真空度を充分に保つことができ
る。With the present invention, even with the same operation as before, spatter can be removed from the surface (
9b), (9c), and (9d), and will not get caught between the sealing surface (8a) of the vacuum processing chamber (8) and the sealing surface (9a) of the door (9). . Also, if spatter has adhered to the sealing surface, or if dust has adhered to the sealing surface (9a) when the door (9) is open, the door (9) should be closed as shown in Figure 3. Since the sealing surface (9a) is cleaned by the wiper 01 when opening and closing, dust is removed and the sealing surface (9a) and sealing surface (9b
), so that no spatter or dust is caught between the two, and therefore the degree of vacuum in the vacuum processing chamber (8) can be maintained sufficiently.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明に係る電子ビーム加工装置の真空加工室
の実施例を示す断面図、第２図はその平面図、第３図は
扉とワイパーの関係位置を示す説明図、第４図は従来の
電子ビーム加工装置の真空加工室の構造を示す断面図で
ある。 図において、（２）は電子銃、（３）は真空排気管、（
５）は真空シール用パツキン、（６）は被溶接物を載せ
る台、（７）は被溶接物、（８）は真空加工室、（９）
は扉、０１はワイパー、Ｑ］）は支持部材、０２１はレ
ール、（ＩＱは摺動部材、（１４）は吊腕、（ＩＱは連
結部材、（１６１はシリンダ装置、（１７）は操作部材
である。 なお各図中同一符号は同−又は相当部分を示すものとす
る。 代理人弁理士　木　村　三　朗 第１図 １３ ４ １１２８°１６ ９Ｊ７　／ １パ　、２ａ １、　＼　゛・・　３ Ｃ ９ｄ−・　＼、＼・ ９ｃ　’″　Ｊ　ゝ７ ９ノ）　。 ＠　、９ｅ５８ｂ６ 「　第２図 ４゛　″ ６　８ 特開昭ＧＯ−２５５２９１（３） 第３図 第４図 □Fig. 1 is a sectional view showing an embodiment of a vacuum processing chamber of an electron beam processing apparatus according to the present invention, Fig. 2 is a plan view thereof, Fig. 3 is an explanatory diagram showing the relative position of the door and wiper, and Fig. 4 1 is a sectional view showing the structure of a vacuum processing chamber of a conventional electron beam processing apparatus. In the figure, (2) is an electron gun, (3) is a vacuum exhaust pipe, (
5) is a gasket for vacuum sealing, (6) is a table on which the work to be welded is placed, (7) is the work to be welded, (8) is a vacuum processing chamber, (9)
is the door, 01 is the wiper, Q]) is the support member, 021 is the rail, (IQ is the sliding member, (14) is the hanging arm, (IQ is the connecting member, (161 is the cylinder device, (17) is the operating member Note that the same reference numerals in each figure indicate the same or corresponding parts.Representative Patent Attorney Sanro KimuraFigure 1 13 4 1128° 16 9J7 / 1 Pa, 2a 1, ＼ ゛... 3 C 9d-.

Claims (2)

【特許請求の範囲】[Claims] （１）電子ビーム加工装置において、開口部に横移動式
扉を設けて該扉と真空加工室との間に真空シール用パツ
キンを配設すると共に、前記扉の開閉時に、該扉のシー
ル面を清掃するためのワイパーを設けたことを特徴とす
る電子ビーム加工装置。(1) In an electron beam processing device, a horizontally movable door is provided at the opening, and a vacuum sealing gasket is provided between the door and the vacuum processing chamber, and when the door is opened or closed, the sealing surface of the door is An electron beam processing device characterized by being equipped with a wiper for cleaning. （２）前記真空加工室側の真空用パツキンを有する面が
、該加工室の開口部より後方に位置し、前記扉のシール
面が扉面より突き出し、塵芥保持部を有することを特徴
とする特許請求の範囲第１項記載の電子ビーム加工装置
。(2) The surface having the vacuum gasket on the side of the vacuum processing chamber is located at the rear of the opening of the processing chamber, the sealing surface of the door protrudes from the door surface, and has a dust holding section. An electron beam processing apparatus according to claim 1.
JP10936384A 1984-05-31 1984-05-31 Electron beam working device Pending JPS60255291A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10936384A JPS60255291A (en) 1984-05-31 1984-05-31 Electron beam working device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10936384A JPS60255291A (en) 1984-05-31 1984-05-31 Electron beam working device

Publications (1)

Publication Number Publication Date
JPS60255291A true JPS60255291A (en) 1985-12-16

Family

ID=14508329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10936384A Pending JPS60255291A (en) 1984-05-31 1984-05-31 Electron beam working device

Country Status (1)

Country Link
JP (1) JPS60255291A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012518897A (en) * 2009-02-22 2012-08-16 マッパー・リソグラフィー・アイピー・ビー．ブイ． Charged particle lithography equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012518897A (en) * 2009-02-22 2012-08-16 マッパー・リソグラフィー・アイピー・ビー．ブイ． Charged particle lithography equipment
TWI510863B (en) * 2009-02-22 2015-12-01 Mapper Lithography Ip Bv Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber

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