JPS60187680A - Formation of mirror-finished surface on metallic surface - Google Patents
Formation of mirror-finished surface on metallic surfaceInfo
- Publication number
- JPS60187680A JPS60187680A JP4226484A JP4226484A JPS60187680A JP S60187680 A JPS60187680 A JP S60187680A JP 4226484 A JP4226484 A JP 4226484A JP 4226484 A JP4226484 A JP 4226484A JP S60187680 A JPS60187680 A JP S60187680A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- blank
- roughness
- plated
- jig
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Elements Other Than Lenses (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は金属面に鏡面を形成する方法に関するものであ
シ、特に軟質金属製の累月に、簡単な手法で高度の鏡面
全形成する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming a mirror surface on a metal surface, and more particularly to a method for forming a highly mirrored surface on a soft metal moon using a simple method.
アルミニウム、銅ないしはこれらの合金等の軟質金属に
鏡面を形成したものが、レーザープリンターのポリゴン
ミラーに用いられている。Soft metals such as aluminum, copper, or their alloys with mirror surfaces are used in polygon mirrors for laser printers.
ポリゴンミラーの反射面の製法としては、例えば、アル
ミニウムないしはアルミニウム合金の厚板の側面を正八
角形に切削加工し、次いで、この面に電電解メッキ全施
し、さらにメッキ層全研削して面精度と角度精度を出し
たのち０［摩して鏡面とする方法がある（特開昭３２−
／Ｊ’♂≦２Δ参照）。このような方法の難点の−っは
、メッキ層全厚くせざるを得ないことであり、その結果
としてメッキ後の研削や研摩に、多大の手間と時間を要
することである。厚いメッキ層全形成することは費用が
かさむばかりでなく、メッキ層と下地との付着力が弱く
なり、かつメッキ層そのものにも種々の欠陥が現われる
ようになるとされている。従って、メッキ層は薄い方が
好ましいが、一般に鏡面全形成するためのラッピングの
取代としては、常識的に５０〜７０μｍ以上が必要とさ
れているので、メッキ層會必然的に厚くせざるを得ない
。The method for manufacturing the reflective surface of a polygon mirror is, for example, by cutting the side surface of a thick plate of aluminum or aluminum alloy into a regular octagon, then applying electrolytic plating to this surface, and then grinding the entire plating layer to improve surface accuracy. There is a method of achieving angular accuracy and then polishing it to create a mirror surface.
/J'♂≦2Δ). The disadvantage of such a method is that the entire plating layer must be made thick, and as a result, a great deal of effort and time is required for grinding and polishing after plating. Forming a thick plating layer in its entirety not only increases costs, but also weakens the adhesion between the plating layer and the underlying layer, and is said to cause various defects to appear in the plating layer itself. Therefore, it is preferable for the plating layer to be thin, but common sense requires a lapping allowance of 50 to 70 μm or more to completely form a mirror surface, so the plating layer must necessarily be thick. do not have.
本発明者はメッキ層の下地加工の程度が成る範囲にあれ
ば、薄いメッキ層でもランピングにより十分な鏡面を形
成し得ることケ見出し、本発明を完成した。The present inventors have discovered that even a thin plated layer can form a sufficient mirror surface by ramping, as long as the level of surface treatment for the plated layer is within the appropriate range, and has completed the present invention.
すなわち、本発明は、軟質金属製累月の鏡面形成面に機
械加工を施して粗面度（Ｒｍａｘ）がλ〜ｉμの平担面
を形成すること、この平担面に厚さ／−５′〜￥ｊμの
ニッケルー燐の無電解メッキを施すこと、及びこのメッ
キ層を粗面度（Ｒｍａｘ）が００Ｏ５μ以下となるまで
光学研摩することの各工程を経ることを特徴とする鏡面
の形成方法をその要旨とするものである。That is, the present invention involves machining the mirror-formed surface of a soft metal moon to form a flat surface with a roughness (Rmax) of λ to iμ, and a thickness of /-5 on this flat surface. A method for forming a mirror surface, which is characterized by passing through the steps of applying nickel-phosphorus electroless plating with a thickness of 0 to ¥jμ, and optically polishing this plating layer until the roughness (Rmax) becomes 00O5μ or less. Its gist is as follows.
本発明についてさらに詳細に説明すると、本発明はアル
ミニウム、銅およびこれらの合金等の軟質金属に鏡面を
形成する方法である。本発明は各種の鏡面の形成に適用
できるが、特にポリゴンミラーの鏡面形成に有効なので
、以下にこれケ例にとって説明する。本発明では先ず軟
質金属、好ましくはアルミニウムないしはアルで切断し
て、側面に所定の面数を有する多角形に形成する。この
際、面間隔、面角度等は製品のポリゴンミラーに要求さ
れる精度を保つようにする。この際、鏡面とする面の粗
面度（Ｒｍａｘ）は２〜とμの範囲に入るようにするこ
とが必要である。この範囲の粗面度であれば通常の機械
加工で容易に達成することができるが、λμ以下の粗面
度にすることは特別の機械設備を用いない限り困難であ
る。また、どμよりも粗い粗面度では、引続く無電解メ
ッキを厚くシ、従ってラッピングの加工量も大きくせざ
る全得す、不利である。切削加工により達成すべき好適
な粗面度（Ｒｍａｘ）は３〜６μである。所定の粗面度
に切削加工した累月には、次いでニッケルー燐の無電解
メッキを施す。この無電解メッキは良く知られており、
ニッケル塩と次亜燐酸塩を主成分とするメッキ浴中に被
処理物を浸漬して、次亜燐酸塩の還元作用によってニッ
ケルと燐を析出させる方法である。これによシ形成され
るメッキ層は緻密な非晶質でかつ適度の硬度を有してい
るので、累月のアルミニウム合金等よシも研摩による鏡
面の形成が容易である。メッキ層−ノ厚さは／ｊ−１ｊ
ｔμであることが必要であシ、この範囲内において下地
の粗面度に応じてその厚さ全適宜選択すればよい。メッ
キ層の厚さがｌ−５′μよりも薄ければ、次の研摩工程
で所蛍の鏡面となる前に往々にして下地が露出してしま
い、研摩が困難となる。また、′；ｌ！μよりも厚くメ
ッキ層全形成することは、不必要であるばかシでなく、
メッキ費用がかさみ、しかも形成されたメッキ層の性質
が悪化する。また研摩工程のカロエ量も多くなり、いず
れの点からも不利である。メッキ層の好適な厚さハ／！
〜グＯμ、特に、２０〜３５μである。To explain the present invention in more detail, the present invention is a method for forming a mirror surface on soft metals such as aluminum, copper, and alloys thereof. Although the present invention can be applied to forming various types of mirror surfaces, it is particularly effective for forming mirror surfaces of polygon mirrors, so this example will be explained below. In the present invention, first, a soft metal, preferably aluminum or aluminum, is cut to form a polygon having a predetermined number of side faces. At this time, the surface spacing, surface angle, etc. should maintain the accuracy required for the polygon mirror product. At this time, it is necessary that the roughness (Rmax) of the mirror surface falls within the range of 2 to .mu.. A surface roughness within this range can be easily achieved by normal machining, but it is difficult to achieve a surface roughness of λμ or less unless special mechanical equipment is used. Moreover, if the surface roughness is rougher than 0 μ, the subsequent electroless plating must be thick, and therefore the amount of lapping must be increased, which is disadvantageous. The preferred surface roughness (Rmax) to be achieved by cutting is 3 to 6μ. After cutting to a predetermined roughness, the surface is then electrolessly plated with nickel-phosphorus. This electroless plating is well known,
This is a method in which the object to be treated is immersed in a plating bath whose main components are nickel salt and hypophosphite, and nickel and phosphorus are precipitated by the reducing action of the hypophosphite. The plated layer thus formed is dense and amorphous and has appropriate hardness, so it is easy to form a mirror surface by polishing even aluminum alloys and the like. The thickness of the plating layer is /j-1j
It is necessary that the thickness be tμ, and the total thickness may be appropriately selected within this range depending on the roughness of the base. If the thickness of the plating layer is thinner than 1-5'μ, the underlying layer will often be exposed before it becomes a mirror surface in the next polishing step, making polishing difficult. Also, ′;l! It is not unnecessary to form the entire plating layer thicker than μ;
The plating cost increases and the properties of the formed plating layer deteriorate. Further, the amount of caroe in the polishing process increases, which is disadvantageous from all points of view. Suitable thickness of plating layer ha/!
~ 0μ, especially 20 to 35μ.
メッキを施した素材は、次いでメッキ面に光学研摩全施
して所望の鏡面を形成する。この研摩は、素材奢治其の
平滑面と累月のメッキ面とがほぼ同一平面上に来るよう
に治具に固定し、メッキ面全治具と一緒にランピングす
ることによシ容易に行なうことができる。す外わちこの
方法によれば少ない加工量で鏡面を形成することができ
、かつ正確に角度を出した治具を用いることにより得ら
れる鏡面の角度も保証される。The plated material is then completely optically polished on the plated surface to form a desired mirror surface. This polishing can be easily done by fixing the material to a jig so that the smooth surface of the material and the plated surface of the plated surface are almost on the same plane, and then ramping the entire plated surface together with the jig. I can do it. In addition, according to this method, a mirror surface can be formed with a small amount of processing, and the angle of the mirror surface obtained by using a jig with an accurately angled surface is also guaranteed.
ラッピングは公知の方法で行なうことができ、ラップ用
油およびランプ剤ｃ；＆を粒）も市販品から適宜選択し
て用いればよい。なお石氏粒は３μ以下のものを用い、
かつ少くとも３段階にその大きさヶ順次変更してラッピ
ングする。ラッピングの程度は形成される鏡面に要求さ
れる粗面度（Ｒｍａｘ）により決定されるが、少くとも
Ｏ，ＯＳμ以下の粗面度となるまでラッピングすること
が必要である。Wrapping can be carried out by a known method, and the wrapping oil and lamp agent (c) may be appropriately selected from commercially available products. The Ishiji grains used are 3μ or less.
In addition, wrapping is performed by sequentially changing the size in at least three stages. The degree of lapping is determined by the roughness (Rmax) required for the mirror surface to be formed, but it is necessary to perform lapping until the roughness is at least O, OSμ or less.
以下に実施例により本発明をさらに具体的に説明するが
、本発明はその要旨を超えない限シ、以下の実施例に限
定されるものではない。The present invention will be explained in more detail with reference to Examples below, but the present invention is not limited to the following Examples unless it exceeds the gist thereof.
実施例
アルミニウム拐（、ｆＯオ乙Ｓ）を旋盤およびフライス
盤で切削加工して、厚さ乙８５馴で内接円の直径乙９咽
の正７２角形の累月全製作した。各面の表面粗さくＲｍ
ａｘ）は約ｇμであった。これにニッケルー燐の無電解
メッキを施した。メッキ層の厚さは２６．−．２ｆμで
あった。正確に９０度に角度をだした鋼製の治具（ブロ
ック）に、治具の研摩面とメッキ面とがほぼ同じ平面上
に来るようにして素材ヲを付け、ラップ盤を用いてメッ
キ面金研摩した。研摩はダイヤモンドスラリー（３μ）
および（／μ）（いずれもエン、ギス社製品）で順次行
なったのち、Ｏ０／μのアルミナ−水スラリーで仕上げ
した。得られた研摩面は表面粗さくＲｍａｘ）が０θ夕
μ以下で、その鏡面度および加工精度は良好であった。Example Aluminum foil was cut using a lathe and a milling machine to produce a regular heptagonal moon with a thickness of 85 mm and an inscribed circle diameter of 9 mm. Surface roughness of each side Rm
ax) was approximately gμ. Electroless nickel-phosphorus plating was applied to this. The thickness of the plating layer is 26. −． It was 2fμ. The material is applied to a steel jig (block) that is angled accurately at 90 degrees so that the polished surface of the jig and the plated surface are on the same plane, and then the plated surface is removed using a lapping machine. Gold polished. Polishing with diamond slurry (3μ)
and (/μ) (all products of En and Gis Co., Ltd.), and then finished with O0/μ alumina-water slurry. The surface roughness (Rmax) of the obtained polished surface was less than 0θμ, and its specularity and processing accuracy were good.
Claims (4)
て粗面度（Ｒｍａｘ）がス〜ざμの平担面を形成するこ
と、この平担面に厚さ／！〜グ！μのニッケルー燐の無
電解メッキを施すこと、及びこのメッキ層全粗而度（Ｒ
ｍａｘ）が０６０ｊμ以下となるまで光学研摩すること
の各工程を経ることを特徴とする鏡面の形成方法。(1) Machining the mirror-formed surface of a soft metal material to form a flat surface with a roughness (Rmax) of ~. ~G! Electroless plating of nickel-phosphorus of μ is applied, and the total roughness of this plating layer (R
max) is 060jμ or less.
金であることを特徴とする特許請求の範囲第１項記載の
鏡面の形成方法(2) A method for forming a mirror surface according to claim 1, wherein the soft metal is aluminum or an aluminum alloy.
ッキ面とが、はぼ同一平面上に来るように治具に固定し
てラッピングすることによシ行なうことを特徴とする特
許請求の範囲第１項または第２項記載の鏡面の形成方法
。(3) Optical polishing is characterized in that the material is fixed to a jig and wrapped so that the smooth surface of the jig and the plated surface of the material are on approximately the same plane. A method for forming a mirror surface according to claim 1 or 2.
とする特許請求の範囲第１項ないし第３項のいずれかに
記載の鏡面の形成方法。(4) The method for forming a mirror surface according to any one of claims 1 to 3, wherein the mirror surface is a reflective surface of a polygon mirror.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4226484A JPS60187680A (en) | 1984-03-06 | 1984-03-06 | Formation of mirror-finished surface on metallic surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4226484A JPS60187680A (en) | 1984-03-06 | 1984-03-06 | Formation of mirror-finished surface on metallic surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60187680A true JPS60187680A (en) | 1985-09-25 |
Family
ID=12631172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4226484A Pending JPS60187680A (en) | 1984-03-06 | 1984-03-06 | Formation of mirror-finished surface on metallic surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60187680A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6248654A (en) * | 1985-08-27 | 1987-03-03 | Sumitomo Chem Co Ltd | Production of n-alkylaminophenol compound |
-
1984
- 1984-03-06 JP JP4226484A patent/JPS60187680A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6248654A (en) * | 1985-08-27 | 1987-03-03 | Sumitomo Chem Co Ltd | Production of n-alkylaminophenol compound |
| JPH0134981B2 (en) * | 1985-08-27 | 1989-07-21 | Sumitomo Chemical Co |
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