JPS60184259U - analytical electron microscope - Google Patents

analytical electron microscope

Info

Publication number
JPS60184259U
JPS60184259U JP7241384U JP7241384U JPS60184259U JP S60184259 U JPS60184259 U JP S60184259U JP 7241384 U JP7241384 U JP 7241384U JP 7241384 U JP7241384 U JP 7241384U JP S60184259 U JPS60184259 U JP S60184259U
Authority
JP
Japan
Prior art keywords
sample
electron microscope
magnetic pole
pole piece
upper magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7241384U
Other languages
Japanese (ja)
Inventor
行人 近藤
Original Assignee
日本電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社 filed Critical 日本電子株式会社
Priority to JP7241384U priority Critical patent/JPS60184259U/en
Publication of JPS60184259U publication Critical patent/JPS60184259U/en
Pending legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

゛　第１図は従来装置を説明するための図、第２図は本
考案の一実施例の構成図、第３図は本考案を説明するた
めの図、第４図は他の実施例の要部を説明するための図
である。 １：電子線、２：試料、３：Ｘ線検出器、４：対物レン
ズ上磁極片、６：コリメータ、７：孔、１０：反射電子
防止板、１１：移動手段、１２−二反射電子検出器。゛ Fig. 1 is a diagram for explaining a conventional device, Fig. 2 is a configuration diagram of one embodiment of the present invention, Fig. 3 is a diagram for explaining the present invention, and Fig. 4 is a diagram of another embodiment. FIG. 3 is a diagram for explaining main parts. 1: Electron beam, 2: Sample, 3: X-ray detector, 4: Objective lens upper magnetic pole piece, 6: Collimator, 7: Hole, 10: Backscattered electron prevention plate, 11: Moving means, 12-Two backscattered electron detection vessel.

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] （１）電子線の試料への照射によって試料より発生する
Ｘ線を検出するため、対物レンズ上磁極片の上に配置さ
れたＸ線検出器と、該上磁極片の開口に挿入されて配置
され試料から該Ｘ線検出器を見込む孔を有するコリメー
タとを備えた装置において、該対物レンズ上磁極片と試
料との′　間に設けられた反射電子防止板と、該反射電
子防止板を移動するための移動手段を設けたことを特徴
とする分析電子顕微鏡。(1) In order to detect the X-rays generated by the sample when the sample is irradiated with an electron beam, an X-ray detector is placed above the upper magnetic pole piece of the objective lens, and an X-ray detector is inserted into the opening of the upper magnetic pole piece. In an apparatus equipped with a collimator having a hole through which the X-ray detector can be viewed from the sample, a backscattered electron prevention plate provided between the upper magnetic pole piece of the objective lens and the sample, and the backscattered electron prevention plate are moved. An analytical electron microscope characterized by being provided with a means of transportation for carrying out the analysis. （２）前記反射電子防止板に反射電子検出器を取り付け
た実用新案登録請求の範囲第１項記載の分析電子顕微鏡
。(2) The analytical electron microscope according to claim 1, wherein a backscattered electron detector is attached to the backscattered electron prevention plate.
JP7241384U 1984-05-17 1984-05-17 analytical electron microscope Pending JPS60184259U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7241384U JPS60184259U (en) 1984-05-17 1984-05-17 analytical electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7241384U JPS60184259U (en) 1984-05-17 1984-05-17 analytical electron microscope

Publications (1)

Publication Number Publication Date
JPS60184259U true JPS60184259U (en) 1985-12-06

Family

ID=30610794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7241384U Pending JPS60184259U (en) 1984-05-17 1984-05-17 analytical electron microscope

Country Status (1)

Country Link
JP (1) JPS60184259U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817856B2 (en) * 1975-05-23 1983-04-09 株式会社クボタ Kensetsukikainoyouratsuho-surenketsukouzo

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817856B2 (en) * 1975-05-23 1983-04-09 株式会社クボタ Kensetsukikainoyouratsuho-surenketsukouzo

Similar Documents

Publication Publication Date Title
JPS60184259U (en) analytical electron microscope
JPH06338281A (en) Scanning electron microscope
JPS58174856U (en) electronic microscope
JPS59134261U (en) X-ray detection equipment for analytical electron microscopes, etc.
JPS59150159U (en) scanning electron microscope
JPS58148654U (en) Sample capsule for electronic analyzer
JP2500423Y2 (en) electronic microscope
Bianchi et al. Chromatographic identification in serum of endogenously radioiodinated thyroid hormones after iodine-131 whole-body scintigraphy in the follow-up of patients with differentiated thyroid carcinoma
JPS6065967U (en) scanning electron microscope
JPH0738843Y2 (en) Energy dispersive X-ray fluorescence analyzer
JPS5823160U (en) electronic probe device
JPS58120555U (en) Charged beam device
JPS58146345U (en) Charged particle beam device
JPS58146348U (en) scanning electron microscope
JPS62169462U (en)
JPS60121250U (en) analytical electron microscope
JPS61194951U (en)
JPS5857065U (en) surface analysis device
JPS5945849U (en) ion implanter
JPS5941967U (en) Sample position display device for scanning electron microscopes, etc.
JPS5988857U (en) Charged beam measuring device
JPH0171857U (en)
JPS619761U (en) electron beam equipment
JPS59103260U (en) Radiation applied measurement device
JPS5846440U (en) Sample stage of electron beam lithography system