JPS599500U - Charged particle accelerator ion source gas supply device - Google Patents

Charged particle accelerator ion source gas supply device

Info

Publication number
JPS599500U
JPS599500U JP10456782U JP10456782U JPS599500U JP S599500 U JPS599500 U JP S599500U JP 10456782 U JP10456782 U JP 10456782U JP 10456782 U JP10456782 U JP 10456782U JP S599500 U JPS599500 U JP S599500U
Authority
JP
Japan
Prior art keywords
ion source
source gas
gas supply
charged particle
supply device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10456782U
Other languages
Japanese (ja)
Inventor
山田 輝雄
公彦 秋山
Original Assignee
株式会社日本製鋼所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日本製鋼所 filed Critical 株式会社日本製鋼所
Priority to JP10456782U priority Critical patent/JPS599500U/en
Publication of JPS599500U publication Critical patent/JPS599500U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

図面は本考案装置の一実施例の構成を示す説明図である
。 1a、  1b・・・・・・調圧器付きイオン源ガス供
給源、2a、2b・・・・・・調圧器、−,3a、  
3b・・・・・・電磁弁、4゜4a・・・・・・パイプ
、5・・・・・・マス・フロー・コントロ−ラ、5a曲
”マス゛・フローメータ、5b川・・・コントローラ、
6・・・・・・イオン源、7a、  7b−−−−−−
開閉器、8・・・・・・流量設定器、9・・・・・・流
量表示器、10・・・・・・操作盤。
The drawing is an explanatory view showing the configuration of an embodiment of the device of the present invention. 1a, 1b...Ion source gas supply source with pressure regulator, 2a, 2b...Pressure regulator, -, 3a,
3b...Solenoid valve, 4゜4a...Pipe, 5...Mass flow controller, 5a Mass flow meter, 5b River...Controller ,
6...Ion source, 7a, 7b------
Switch, 8...Flow rate setting device, 9...Flow rate display, 10...Operation panel.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 異なった種類のイオン源ガスを封入した複数個の調圧付
きイオン源ガス供給源に、それぞれ電磁弁を介してイオ
ン源ガスの流量設定、流路調整及び流量表示を行う共通
のマス・フロー・コントローラをパイプで連結し、この
マス・フロー〇コントローラをパイプでイオン源に連結
すると共に、前記各電磁弁の開閉器とマス・フロー・コ
ントローラの流量設定器及び流量表示器を操作盤に設け
てなる荷電粒子加速器のイオン源ガス供給装置。
A common mass flow controller that sets the flow rate of the ion source gas, adjusts the flow path, and displays the flow rate through a solenoid valve for multiple pressure-regulated ion source gas supply sources filled with different types of ion source gases. The controller is connected with a pipe, and this mass flow controller is connected with an ion source through a pipe, and a switch for each of the solenoid valves, a flow rate setting device of the mass flow controller, and a flow rate indicator are provided on the operation panel. An ion source gas supply device for a charged particle accelerator.
JP10456782U 1982-07-09 1982-07-09 Charged particle accelerator ion source gas supply device Pending JPS599500U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10456782U JPS599500U (en) 1982-07-09 1982-07-09 Charged particle accelerator ion source gas supply device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10456782U JPS599500U (en) 1982-07-09 1982-07-09 Charged particle accelerator ion source gas supply device

Publications (1)

Publication Number Publication Date
JPS599500U true JPS599500U (en) 1984-01-21

Family

ID=30245475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10456782U Pending JPS599500U (en) 1982-07-09 1982-07-09 Charged particle accelerator ion source gas supply device

Country Status (1)

Country Link
JP (1) JPS599500U (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284291U (en) * 1985-11-18 1987-05-29
JPS63114586U (en) * 1987-01-20 1988-07-23
JP2008270039A (en) * 2007-04-23 2008-11-06 Hitachi High-Technologies Corp Ion source, ion beam processing-observing device, and test piece cross-section observation method
JP2012164674A (en) * 2012-04-16 2012-08-30 Hitachi High-Technologies Corp Ion beam machining and observation apparatus
US8481980B2 (en) 2007-04-23 2013-07-09 Hitachi High-Technologies Corporation Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample
EP2242339A3 (en) * 2009-04-16 2014-04-09 Siemens Aktiengesellschaft Gas injection system and method for operating the same, in particular for a particle therapy assembly
JP2015167141A (en) * 2015-05-07 2015-09-24 株式会社日立ハイテクノロジーズ Ion beam processing observation device and ion beam processing observation method using the same
US9376187B2 (en) 2010-10-26 2016-06-28 Eco Marine Power Co. Ltd. Power module for use in marine vessel, and wind-propelled vessel provided with said power module

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5585915A (en) * 1978-12-22 1980-06-28 Toshiba Corp Distribution control method for flow amount of sewage
JPS5746904B2 (en) * 1975-12-16 1982-10-06

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5746904B2 (en) * 1975-12-16 1982-10-06
JPS5585915A (en) * 1978-12-22 1980-06-28 Toshiba Corp Distribution control method for flow amount of sewage

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6284291U (en) * 1985-11-18 1987-05-29
JPS63114586U (en) * 1987-01-20 1988-07-23
JP2008270039A (en) * 2007-04-23 2008-11-06 Hitachi High-Technologies Corp Ion source, ion beam processing-observing device, and test piece cross-section observation method
US8481980B2 (en) 2007-04-23 2013-07-09 Hitachi High-Technologies Corporation Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample
US8779400B2 (en) 2007-04-23 2014-07-15 Hitachi High-Technologies Corporation Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample
EP2242339A3 (en) * 2009-04-16 2014-04-09 Siemens Aktiengesellschaft Gas injection system and method for operating the same, in particular for a particle therapy assembly
US9376187B2 (en) 2010-10-26 2016-06-28 Eco Marine Power Co. Ltd. Power module for use in marine vessel, and wind-propelled vessel provided with said power module
JP2012164674A (en) * 2012-04-16 2012-08-30 Hitachi High-Technologies Corp Ion beam machining and observation apparatus
JP2015167141A (en) * 2015-05-07 2015-09-24 株式会社日立ハイテクノロジーズ Ion beam processing observation device and ion beam processing observation method using the same

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