JPS5951530A - Xy transfer apparatus - Google Patents
Xy transfer apparatusInfo
- Publication number
- JPS5951530A JPS5951530A JP58150147A JP15014783A JPS5951530A JP S5951530 A JPS5951530 A JP S5951530A JP 58150147 A JP58150147 A JP 58150147A JP 15014783 A JP15014783 A JP 15014783A JP S5951530 A JPS5951530 A JP S5951530A
- Authority
- JP
- Japan
- Prior art keywords
- axis
- sliding
- sample table
- base
- transfer member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012840 feeding operation Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Position Or Direction (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、半導体製造装置などにおいて用いられるXY
移動装置に関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to an XY
Relating to mobile devices.
半導体装置、たとえl、Yステップアンドリピータや縮
小投影露光装置などは、通常、ホ1−レジス1〜を塗布
したマスク基板またはウェハ上に梁積回路パターンを光
学写真的に投影焼イ・1けするものであるが、投影焼伺
はレンズの結像範囲の制約から前記のようなマスク基板
やウェハの全面を一度に焼イ)1けすることは不IIr
能である。そのため、上記のような装置てtJ°精密X
Y移動台を備え、この−1−に前記マスクJ、を板また
はウェハ髪装着してx、■方向の二次元の間欠送り動作
を行ないながら、集積回路パターンを前記マスク基板ま
たはウェハ上の全面に配列焼付けしている。Semiconductor devices, such as L and Y step-and-repeater and reduction projection exposure equipment, are usually manufactured by optically photographically projecting and baking a beam laminated circuit pattern onto a mask substrate or wafer coated with Hole 1-Resist 1. However, in projection burning, it is impossible to burn the entire surface of the mask substrate or wafer at once due to the limitations of the imaging range of the lens.
It is Noh. Therefore, the above-mentioned equipment is tJ° precision
A Y moving table is provided, and the mask J is attached to the plate or wafer on this -1-, and the integrated circuit pattern is transferred over the entire surface of the mask substrate or wafer while performing intermittent two-dimensional feeding operations in the x and ■ directions. The array is burned in.
このようなXY移動台には、スルーグツ1−向上のため
その高速化が強く望まれている。−1−記装置のように
1回の送り距11711が1. OnIn以下と短かい
場合、位置決めの高速化をはかるには可動部質量を小さ
くして加減速特性を良くすると共に、位置決め後の振動
を早く整定することが有効である。There is a strong demand for such an XY moving table to be faster in order to improve its throughput. -1- As in the device described above, one feed distance 11711 is 1. When the distance is shorter than OnIn, in order to increase the speed of positioning, it is effective to reduce the mass of the movable part to improve acceleration/deceleration characteristics and to quickly settle vibrations after positioning.
本発明は、上記の点に着EI してなされたものであり
、」1記の要求を?igt足できる、小型で製作容易か
つ高速位置決めが可能なXV移動装置を提供することを
目的とする。The present invention has been made in consideration of the above points, and meets the requirements set forth in ``1''. The purpose of the present invention is to provide an XV moving device that is compact, easy to manufacture, and capable of high-speed positioning.
上記目的を達成するために、本発明では、基盤1−にX
方向に形成しに溝内を、活動可能に形成された部分を右
するX移動部材と、該X移動部月の」二側にあってこれ
と一体にかつX軸方向と直交する如く敷設されたY軸ガ
イド手段と、該Y軸ガイド手段と組み合ってY軸方向の
案内をする溝をその下面に形成した試料テーブルを具備
する如く構成したものである。In order to achieve the above object, the present invention provides X on the substrate 1-.
an X-moving member with a movably formed part on the right side of the groove formed in the direction; The sample table is provided with a Y-axis guide means and a sample table having a groove formed on its lower surface for guiding in the Y-axis direction in combination with the Y-axis guide means.
以下、本発明を実施例を参照して説明する。 Hereinafter, the present invention will be explained with reference to Examples.
図は、本発明の一実施例を示す図である。The figure is a diagram showing an embodiment of the present invention.
ベース1には溝2が形成されており、図中X軸方向と垂
直な面内の断面形状が′1゛字形をしたX移動部材3が
この溝内を摺動する。X移動部材3のベース1と接触す
る部分4,5.6には高分子摺動材料が接着さ九ており
、円滑な摺動をなさしめる。慴動部4を溝2の側壁に密
着させるため、ローラ7と板バネ8からなる荷重機構が
X移動部材3に設けられており、前記側壁と対向する壁
を押している。このX移動部材3の1−面にはX軸と直
交してY軸ガイド9が敷設さオしている。X、Y軸の両
方向に移動すべき試料テーブル】0の下面中央部にはI
IIIIが形成されており、前記Y軸ガイド9と組み合
一ってこの試料テーブル10をY軸方向に案内する。X
軸回様、お互いが摺動する部分12には摺動材が接、n
されており、荷重機構13によりY 1lilllガイ
ド9との接触を保証する。試料テーブル10の西端には
摺動部14が形成されており、ベース1の、(、平面の
上をX、Y軸内方向に摺動する。A groove 2 is formed in the base 1, and an X-moving member 3 having a '1''-shaped cross section in a plane perpendicular to the X-axis direction in the figure slides within this groove. A polymeric sliding material is bonded to the portions 4, 5.6 of the X-moving member 3 that come into contact with the base 1, allowing smooth sliding. In order to bring the sliding part 4 into close contact with the side wall of the groove 2, a loading mechanism consisting of a roller 7 and a leaf spring 8 is provided on the X-moving member 3, and pushes the wall opposite to the side wall. A Y-axis guide 9 is laid on the first plane of the X-moving member 3 so as to be perpendicular to the X-axis. [Sample table that should be moved in both directions of the X and Y axes] I
III is formed, and in combination with the Y-axis guide 9 guides this sample table 10 in the Y-axis direction. X
Like the shaft, the sliding material is in contact with the parts 12 that slide each other, n
The load mechanism 13 ensures contact with the Y 1lill guide 9. A sliding portion 14 is formed at the west end of the sample table 10, and slides on the plane of the base 1 in the X and Y axes.
以−にのような構造とすることにより、試料テーブル]
0のrR■j:はベース1により支えられ、X移動部材
3に加えられることはない。そのためX移動部材3には
XY両軸を含む面内の強度および剛性が要求されろのみ
であり、1−ラス構造とすることも可能とな−)で非常
に軽量化することができる。By having the structure as shown below, the sample table]
0 rR■j: is supported by the base 1 and is not applied to the X moving member 3. Therefore, the X-moving member 3 is only required to have in-plane strength and rigidity including both the X and Y axes, and can be made into a one-lath structure, making it extremely lightweight.
駆動系(図には示されていない。)はX、Y軸ともベー
ス1ど同じ静11−座標系に固定され、xIIll目よ
駆動ロット15夕介し、Y軸は矩形穴を右する!ψ動栓
枠16ベアリング17を介して駆動する。The drive system (not shown in the figure) has both the X and Y axes fixed to the same static 11-coordinate system on the base 1, and the Y axis has a rectangular hole. The ψ movable stopper frame 16 is driven via a bearing 17.
〔発明のく1ノジ1!、〕
以」―説明したような構造とすることにより、X移動部
材3の質・量は一般的なで一段重ね(1シフ’JSlj
のものに比にl/;)〜115程度にまで小さくするこ
とができ、高速化が果たせる。またこのような構造によ
り4ノ(料テーブル′10の高さが小さくでき、急激な
加減速時にもピッチングをイ1;しることがない。他の
長所は、X移動部材3および試料テーブル10ともベー
スlの」一平面を共通に摺動するため、精度を有する摺
動面の数が1つで済み、この摺動面も単純な形状をして
いるため、容易に高精度で研削加コ、により製作するこ
とができる。[Invention 1 noji 1! , ] - By having the structure as explained, the quality and quantity of the
It can be made as small as 1/;) to about 115, and high speed can be achieved. In addition, this structure allows the height of the sample table 10 to be reduced by 4 mm, and pitching does not occur even during rapid acceleration/deceleration.Another advantage is that the height of the sample table 10 can be reduced by Because both slide on the same flat surface of the base l, only one precision sliding surface is required, and this sliding surface also has a simple shape, making it easy to grind with high precision. It can be manufactured by
図面の1lti電)1か説明 図は、本発明の一実施例を示す図である。1lti electric) 1 explanation of the drawing The figure is a diagram showing an embodiment of the present invention.
Claims (1)
された部分を有するX移動部月と、該X移動部材のL側
にあってこれと一体にかっX軸方向と直交する如く敷設
されたY軸ガイド手段と、該Y軸ガイド手段と絹み合っ
てY軸方向の案内をする溝をその下面に形成した試料テ
ーブルを具備してなることを特徴とするXY移動装置。1. An X-moving part having a part formed to be able to slide in a groove formed in the X-direction in the base 1-, and an X-moving part that is located on the L side of the X-moving member and is integrally connected thereto and perpendicular to the X-axis direction. An XY moving device comprising a Y-axis guide means laid in such a way that the Y-axis guide means and a sample table have a groove formed on the lower surface thereof to guide the Y-axis direction by interlocking with the Y-axis guide means. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58150147A JPS5951530A (en) | 1983-08-19 | 1983-08-19 | Xy transfer apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58150147A JPS5951530A (en) | 1983-08-19 | 1983-08-19 | Xy transfer apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5951530A true JPS5951530A (en) | 1984-03-26 |
Family
ID=15490518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58150147A Pending JPS5951530A (en) | 1983-08-19 | 1983-08-19 | Xy transfer apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5951530A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106238796A (en) * | 2016-08-18 | 2016-12-21 | 陈泳东 | A kind of Novel planer for building labor and materials processing |
-
1983
- 1983-08-19 JP JP58150147A patent/JPS5951530A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106238796A (en) * | 2016-08-18 | 2016-12-21 | 陈泳东 | A kind of Novel planer for building labor and materials processing |
CN106238796B (en) * | 2016-08-18 | 2018-12-11 | 林勇翔 | A kind of Novel planer processed for building labor and materials |
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