JPS5950190A - Nickel-phosphorus alloy electroplating bath - Google Patents
Nickel-phosphorus alloy electroplating bathInfo
- Publication number
- JPS5950190A JPS5950190A JP16275782A JP16275782A JPS5950190A JP S5950190 A JPS5950190 A JP S5950190A JP 16275782 A JP16275782 A JP 16275782A JP 16275782 A JP16275782 A JP 16275782A JP S5950190 A JPS5950190 A JP S5950190A
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- acid
- phosphorus
- phosphorus alloy
- electroplating bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は高４食性で高速電着性を有し、しかも鏡面被膜
を産み出＋電解ニッケルリン合金メソギ浴に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electrolytic nickel-phosphorus alloy mesolithic bath which has high tetrahydric properties, high-speed electrodeposition properties, and produces a mirror-like coating.
従来の′＋ｌＩ解ニッケルリン合金メ・ツキはリン含有
率が低く、特に耐食性が要望ばれる分野での使用には限
度があった。リン含有率を上げれば析出速度が非常に遅
くｆｒるためと、゛リン含有率限界が、１４〜１５ｑＡ
であるため一般に析出物のリン含有率は１２％以下でカ
１すな。ヌ、外観に訃いＴり壬９等が冬〈発１生し、高
崎装飾品には不向きで１ｒ４７に水素発生等によるビッ
トだ多９１−た、木発す１けかかる欠声をμ′ｉ′すし
たもので、その目的は高耐食性、高電着性、倚面を有す
るＩｖ膜を得るためのニッケルリン合金メッキを力える
ものである。Conventional '+lI nickel phosphorus alloy metals have a low phosphorus content, which limits their use in fields where corrosion resistance is particularly required. This is because the precipitation rate becomes very slow if the phosphorus content is increased, and the phosphorus content limit is 14 to 15 qA.
Therefore, the phosphorus content of the precipitate is generally 12% or less. NU, 91-year-old trees with poor appearance appear in winter, are unsuitable for Takasaki ornaments, and are caused by hydrogen generation in 1r47. Its purpose is to improve nickel-phosphorus alloy plating to obtain an IV film with high corrosion resistance, high electrodepositivity, and a flat surface.
なお、水浴においてニッケルのＩｔ給Ｆｌ トｉするニ
ラ’ｒ ルイオンは、高い溶解度ヲ持っスルフアミン酸
二・Ｉケルを用いた。濃度は１００〜７００ ｇ／ｌで
、ｐ＋しく ｔｒｉ 、５００〜５００ ａ／ｌである
。 １００ ｇ／ｌ ＤＪ ’Ｔ−の鳩舎は雪着速度の
低下と、高電流密度付加がｂしい、ニッケル陽極の溶角
了を行うためにθ〜４５σ／ｌの塩化ニッケルを用いた
。ニッケル体板を用イｆ：ｃ イｆＡ合は必１゛シモ必
ｉｐ′としｌｆイ。ｐ ｎ １１ ｑｌｉ剤としてはホ
ウ酸を１５〜５ｏσ／ｌ用いた。Ｈ４ヤしくけ４０〜５
０ ｇ／ｌでニッヶルリン皮膜の黒色化を白色化に向か
わせた。ホウ酸５０ ａ／ｌ 辺土でｄ沈殿がおこる。Note that sulfamic acid di-I, which has a high solubility, was used as the nickel ion used to supply nickel in the water bath. The concentration is 100-700 g/l, p+tri, 500-500 a/l. The 100 g/l DJ 'T- pigeon house used nickel chloride of θ~45σ/l to reduce the snow accretion rate and to improve the melting angle of the nickel anode, which requires high current density addition. If a nickel body plate is used, if A is used, it must be 1 ゛ must be ip'. As the p n 11 qli agent, boric acid was used at 15 to 5 oσ/l. H4 Yashikake 40~5
At 0 g/l, the blackening of the nickel phosphorus film turned toward whitening. Boric acid 50 a/l d precipitation occurs in the marginal soil.
リンイＩト給源としては亜すン酸３０〜１０ｎｇ／ｌ用
い、望ましくけ４０−７０ ！７／ｌ テ安定して皮膜
中のリン含有率が１６チ以上得ることが可ｆｉＰ Ｉｃ
ｆｔ ッｐ、ｑｌＫＥＤＴＡをｊ Ｏ〜１００ ｇ／
ｌ望しく１４０〜６０σ／ｌ添加したこと忙よってビッ
トだいちじるしく減少し、クモリのない斜面光沢が得ら
れたＥ Ｄ Ｔ Ａ １００ ｑ７’ｔ ｂｌ上添加し
た場合、浴不安定となり沈殿をおこすことがある。ヌ、
ζらにピット防止剤としてラウリル硫酸ナトリウム０、
０１〜０．５ （ｔ／ｌ添加した。望ましくけ、０１〜
ｏ２σ／ｌであり０５０７１以上の添加は泡立ちが多す
ぎるため目的にそぐわないリン酸５〜１ｏｏｑ／ｌ添加
により、リン含有率を増加＃せることができた。As a source of phosphorous acid, use 30-10 ng/l of phosphorous acid, preferably 40-70 ng/l. 7/l It is possible to stably obtain a phosphorus content of 16 or more in the film.
ftp, qlKEDTA j O ~ 100 g/
l Desirably, 140 to 60σ/l was added.Due to busyness, the bit size decreased significantly and a cloud-free sloped gloss was obtained.If added above 100 q7't bl, the bath becomes unstable and precipitation occurs. There is. Nu,
Sodium lauryl sulfate 0 as a pitting preventive agent,
01~0.5 (t/l added. Desirably, 01~0.5
The phosphorus content can be increased by adding 5 to 1 ooq/l of phosphoric acid, which is not suitable for the purpose because the addition of 05071 or more causes too much foaming.
望ましく ｕ ３０〜６０ ｇ／ｌ ｆある。１００６
７１以上の胡′１合、酸性度が強すぎ、メッキする品物
を荒らすことになり、＋ｆｔビットも増加する。Desirably it is 30-60 g/l f. 1006
If the value is 71 or more, the acidity is too strong and will damage the plated item, and the +ft bit will also increase.
以下実Ｍ１１例によって説明する、
実施例１
シングユウで作られた時開ケース（Ｉｌｌ Ｋ、脱脂等
の前処理ヲ行い、スルファミン酸ニッケル４５０ ｇ／
ｌ塩化二っケル３０σ／ｌ、ポリ酸４５σ／ｌ、亜リン
ｌｐ ４ 慣 ｑ／ｌ 、 リ ン Ｒ４０ａ
／ｌ 、 Ｆ！Ｉ） ＴＡ ＲＯｒｙ／／ 。Example 1 A time-opening case made of Singyu (Ill K, subjected to pretreatment such as degreasing, and containing nickel sulfamate 450 g/
l Nickel chloride 30σ/l, polyacid 45σ/l, phosphorous lp 4 q/l, phosphorus R40a
/l, F! I) TAROry//.
ううリル硅酔ナトリウム０．１ ｆ７／ｌがらかるニッ
ケルリン合金メッキ浴に赴いてＰ Ｊ（０，８、浴湯６
ｏ℃、？Ｔ！汁、密度６ Ａ／ｄｒｎ２．回転持拌を用
いて１０分間で４μ所のメッキを施した。づらに水洗を
行ったのも所定の方法で約０．１５μ？ｎのロジウムメ
ッギをｊな。通常ニツケルメッギ十ロジウムメッキの場
合電気化学腐食が起こり、耐食性Ｋ ＩＩ！ＩＧがある
ｆｒめ、ニッケルとロジウムのメ・ツギ神膜間にパラジ
ウムのようなｈ今加メッキを施す。１３チ以下のリン含
有率をもっニッケルリン合仝メッキにおいても直接ロジ
ウムメッキにょ秒、人工汗による耐食性試験で満足なデ
ータは得られない。I went to a nickel phosphorus alloy plating bath containing 0.1 f7/l of sodium chloride and PJ (0.8, bath 6
o℃? T! Soup, density 6 A/drn2. Plating was performed at 4 μm in 10 minutes using a rotary stirrer. I washed it with water using the specified method and it was about 0.15μ? N's rhodium meggi. Normally, electrochemical corrosion occurs in the case of Nickel Meggi 10 rhodium plating, resulting in corrosion resistance K II! When there is an IG, a palladium-like plating is applied between the nickel and rhodium membranes. Even with nickel-phosphorus joint plating with a phosphorus content of 13 or less, satisfactory data cannot be obtained in corrosion resistance tests using direct rhodium plating and artificial sweat.
本方法によるメッキ法の場合、リン含有率が１５ｅＩ）
以上であり、人工汗による耐食性試ｒ冒でおいてパラジ
ウムをイＩ用したものより、秀れてぃた。まタヒット、
クモリ等のメッキ異常も寸っｆ（（ｉｔい鏡面状態が得
られ、これだけの高含治リンにおいて４１°′ｍ／１０
分という値が得らｉまた。折り曲げ試μ、（Ｔにより密
〃ｔゼ１゛を軒側した／Ｉ：これも十った〈間ＰＦＩけ
なか一１ｆ ｏ７．２目の光り寸き′をお濾憂、白メッ
キλしての高級感がでた。In the case of plating according to this method, the phosphorus content is 15eI)
As described above, it was superior to the one using palladium in the corrosion resistance test using artificial sweat. Matahit,
Plating abnormalities such as spiders are also minimized ((It is possible to obtain a very mirror-like surface, and with such a high phosphorus content, 41°'m/10
I also get the value of minutes. Bending test μ, (I made the eave side of the tze 1 by T: This was also 100%, and I was sorry for the light size of the 7.2 eyes, white plating λ. It had a very luxurious feel.
実施例２
晴ｆｆ１Ｈ１給列部品のカナ（素材：炭素階）を脱脂等
ノＭ ｔｐ、 ＪＩＴＩを符かったのち、スルファミン
酸ニッケル４００ ｒｔ／ｌ、ホウ酸４５σ／１．’＃
ｒリン酸５０ ｇ／ｌリン酸５０ ｇ／１． 、 Ｆ、
ＤＴＡ４０ ｇ／ｌ、ラウリル硝酸ナトリウＡ ０．２
ｑ／ｌからなるニッケルリン合金メッキ浴にオイテ、
ＰＨ０，７８１ＦＡＩ′ｆ６５℃ＴＦｔ流密度ｏ２Ａ／
ｄｍ２．１分間回転攪拌を用いてフラッンユメッキを行
ｔ「っだ。炭素鋼に通常ニツケルメツキを行ＩＩっだ場
合、耐食性に問題があったが今回のニッケルリン皮膜（
リン含有率１７チ）を人工汗で試験したところ従来の約
５倍以上の耐食性を示した。Example 2 A clear ff1H1 supply row part (material: carbon layer) was degreased and subjected to Mtp and JITI, and then treated with nickel sulfamate 400 rt/l and boric acid 45σ/1. '#
r phosphoric acid 50 g/l phosphoric acid 50 g/1. , F,
DTA40 g/l, sodium lauryl nitrate A 0.2
Oite in a nickel phosphorus alloy plating bath consisting of q/l.
PH0,781FAI'f65℃TFt flow density o2A/
dm 2.Franille plating is performed using rotary stirring for 1 minute.When conventional nickel plating is applied to carbon steel, there was a problem with corrosion resistance, but the present nickel phosphorus coating (
When tested using artificial sweat with a phosphorus content of 17%, the corrosion resistance was approximately 5 times higher than that of conventional products.
り、カナのｍりもニッケル皮膜の場合と比べて同士して
いること−・わかった。It was also found that the width of the kana is also the same as in the case of nickel film.
実施例
メッキ浴訂１成として、スルファミン酸ニッケル３５０
（１／ｌ、１λ４化二・ソウ′ル３０σ／ｌボウ酸４
５σ／ｌ、亜リン酸５０ ｑ／）、リンｐ ４’ Ｏｔ
ｙ／ｌ、ラウリル宿酔プート リ ラムＯ，ｎ ５ （
１／１． 、 ＥＴ’ｌＴ Ａ ２０４７／）を用
い、浴？Ｘｎ Ａ５℃、電流密ｒｉｆ２八／ｄ？？＋２
、メッキ時間１０分および陰極として黄鉗板の条ヂ１下
としてメツ咋を行い、厚み１０μＶの←面光沢の被覆物
を得た。As an example plating bath version 1, nickel sulfamate 350
(1/l, 1λ4 di-soul 30σ/l boric acid 4
5σ/l, phosphorous acid 50 q/), phosphorus p 4' Ot
y/l, lauryl hangover putri ram O,n 5 (
1/1. , ET'lT A 2047/). Xn A5℃, current density rif28/d? ? +2
Plating was carried out for 10 minutes and with one strip of a yellow plate serving as a cathode, to obtain a coating having a thickness of 10 μV and a glossy surface.
皮膜中のリン含有率Ｖｉ＋６．！ｌで人工汗による耐食
性、硝酸等による耐薬品性、折り曲げ試験による密着性
は浪好でネ・うた。Phosphorus content in the film Vi+6. ! Corrosion resistance due to artificial sweat, chemical resistance due to nitric acid, and adhesion during bending tests were confirmed.
実施例４
スルファミン酸ニッケル４５０ ｎ／ｌ 、ｔＤ 什ニ
ック”ｋ ３０ ｑ／ｌ、 ホウｆｉｅ ４５ ｇ／ｌ
、 ！Ｉｌｉリン酸４０ ｑ／ｌ。Example 4 Nickel sulfamate 450 n/l, tD nickel 30 q/l, nickel sulfamate 45 g/l
, ! Ili phosphate 40 q/l.
ｌｊ ：／ｎｔ ４ ｏ ｇ／ｌ、 ｂｒ＋ＴＡ３０
ｇ／ｌ 、 ラウリル舊Ｆ Ｆナトリウム０．１
０／ｌからなるニッケルリン合金浴（ｐｎｏ、８）Ｋニ
ッケル板と固棒とし、Ｆｉ銅製の時計ケースを除権とし
て配宿し、浴温６ｏ’ｃ雷流密度４Ａ／ｄ？？＋２の売
件下に１０分間時ｎ１ケースに箱クメッキを行った。シ
らに通常の方法により金メッキを３μｌｎ施した。得ら
ノ］た析着物けｃｊイ而面沢を有し、スジ目の光１°あ
いを落とし高級感かでｆ、。lj:/nt 4 o g/l, br+TA30
g/l, sodium lauryl FF 0.1
A nickel phosphorus alloy bath consisting of 0/l (pno, 8) K nickel plate and solid rod, a Fi copper watch case placed as a relief, bath temperature 6 o'c lightning current density 4 A/d? ? Box coating was performed on the n1 case for 10 minutes under +2 sales. The plate was plated with 3 μl of gold using a conventional method. It has a beautiful shine on the surface, reduces the brightness of the streaks by 1°, and has a luxurious feel.
耐食性もニッケル使用の場合の４〜５ （７：旬十向十
Ｌ ｆ。、二の時のニッケ）１． ＩＪン合金皮膜の厚
みＵ２μ？ｎで（Ｉ↑り曲げ耐験による密着性もｐ好で
１．、−Ｉた、辺土）ｔｌ、べてきたように本イと明に
よるメＩキ浴により、ｌｒ′、Ｉに面１介ゼ１１、血１
薬品性を卯望する分野、責合ｉｆｆ ／ ツキの下付は
用としての皮膜を要望する分！ｌ！Ｆ （例ンげ装飾（
１１（品）竹幅広い用袢が考えられ実用上、イ１用ｌｒ
発明である。Corrosion resistance is also 4 to 5 when using nickel (7: ShunjukojuL f., 2nd time nickel) 1. Thickness of IJ alloy film U2μ? At n (I ↑ the adhesion was 1., -I ta, hedo) tl. Kaise 11, blood 1
Fields that desire chemical properties, liability if / Tsuki's subscripts request a film for use! l! F (example decoration)
11 (item) Bamboo can be used for a wide range of purposes, and in practical terms, it is suitable for I1.
It is an invention.
Ｊｙ１士 出願人 株式金側 詐訪精工舎 伏理人 弁理士 最上 務 ４４５−Jy1shi Applicant Stock money side Shobo Seikosha Fushirito Patent Attorney Mogami 445-
Claims (1)
酸ニッケル１００〜７（ＩＱ ｇ／）、塩化ニッケル０
〜４５ ｇ／ｌ、ホウ酸１５〜５０ｇ／ｌ、亜リン酸５
〜ｉｏｎ ｇ／ｌ 、 リン酸５〜１００ ｇ／１．
、ＥＤＴＡ１０〜１００ａ／ｌ 、ラウリル硫酸ナトリ
ウム ０．０１〜０．５ （ｔ／ｌからなることを特徴
とする電解ニッケルリン合金メッキ浴。In an electrolytic nickel phosphorus alloy plating bath, nickel sulfamate 100-7 (IQ g/), nickel chloride 0
~45 g/l, boric acid 15-50 g/l, phosphorous acid 5
~ion g/l, phosphoric acid 5-100 g/1.
, EDTA 10 to 100 a/l, and sodium lauryl sulfate 0.01 to 0.5 (t/l).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16275782A JPS5950190A (en) | 1982-09-17 | 1982-09-17 | Nickel-phosphorus alloy electroplating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16275782A JPS5950190A (en) | 1982-09-17 | 1982-09-17 | Nickel-phosphorus alloy electroplating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5950190A true JPS5950190A (en) | 1984-03-23 |
| JPS6353278B2 JPS6353278B2 (en) | 1988-10-21 |
Family
ID=15760659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16275782A Granted JPS5950190A (en) | 1982-09-17 | 1982-09-17 | Nickel-phosphorus alloy electroplating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5950190A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4767509A (en) * | 1983-02-04 | 1988-08-30 | Burlington Industries, Inc. | Nickel-phosphorus electroplating and bath therefor |
| US4801947A (en) * | 1987-06-25 | 1989-01-31 | Burlington Industries, Inc. | Electrodeposition-produced orifice plate of amorphous metal |
| US5032464A (en) * | 1986-10-27 | 1991-07-16 | Burlington Industries, Inc. | Electrodeposited amorphous ductile alloys of nickel and phosphorus |
| US7794578B2 (en) * | 2002-11-26 | 2010-09-14 | The Furukawa Electric Co., Ltd. | Method for preparing a circuit board material having a conductive base and a resistance layer |
| JP2013249526A (en) * | 2012-06-04 | 2013-12-12 | Nomura Plating Co Ltd | Metal material |
| TWI628314B (en) * | 2012-09-18 | 2018-07-01 | 野村鍍金股份有限公司 | Mold, forming roll and peeled electroformed product |
-
1982
- 1982-09-17 JP JP16275782A patent/JPS5950190A/en active Granted
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4767509A (en) * | 1983-02-04 | 1988-08-30 | Burlington Industries, Inc. | Nickel-phosphorus electroplating and bath therefor |
| US5032464A (en) * | 1986-10-27 | 1991-07-16 | Burlington Industries, Inc. | Electrodeposited amorphous ductile alloys of nickel and phosphorus |
| US4801947A (en) * | 1987-06-25 | 1989-01-31 | Burlington Industries, Inc. | Electrodeposition-produced orifice plate of amorphous metal |
| US7794578B2 (en) * | 2002-11-26 | 2010-09-14 | The Furukawa Electric Co., Ltd. | Method for preparing a circuit board material having a conductive base and a resistance layer |
| JP2013249526A (en) * | 2012-06-04 | 2013-12-12 | Nomura Plating Co Ltd | Metal material |
| WO2013183348A1 (en) * | 2012-06-04 | 2013-12-12 | 株式会社野村鍍金 | Metallic material |
| TWI628314B (en) * | 2012-09-18 | 2018-07-01 | 野村鍍金股份有限公司 | Mold, forming roll and peeled electroformed product |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6353278B2 (en) | 1988-10-21 |
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