JPS5941358A - Composition for heat-resistant adhesive - Google Patents

Composition for heat-resistant adhesive

Info

Publication number
JPS5941358A
JPS5941358A JP15002082A JP15002082A JPS5941358A JP S5941358 A JPS5941358 A JP S5941358A JP 15002082 A JP15002082 A JP 15002082A JP 15002082 A JP15002082 A JP 15002082A JP S5941358 A JPS5941358 A JP S5941358A
Authority
JP
Japan
Prior art keywords
compound
resin
weight
composition
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15002082A
Other languages
Japanese (ja)
Inventor
Tsutomu Okawa
勉 大川
Itsuo Matsuda
松田 五男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Chemical Products Co Ltd
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Products Co Ltd
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Products Co Ltd, Toshiba Chemical Corp filed Critical Toshiba Chemical Products Co Ltd
Priority to JP15002082A priority Critical patent/JPS5941358A/en
Publication of JPS5941358A publication Critical patent/JPS5941358A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Landscapes

  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

PURPOSE:To provide the titled composition composed of a thermoplastic resin containing a dimaleimide compound, aminophenol, an epoxy compound and an imidazole compound as essential components and a polyvinyl formal resin, and having excellent heat-resistance, soldering resistance, and adhesivity to aluminum, etc. CONSTITUTION:The objective composition is prepared by compounding (A) 95- 30wt% of a thermosetting resin prepared by using a dimaleimide compound of formula I (R<1> is H or alkyl; R<2> is -O-, -CH2-, -SO2- or -S-S-; R<3> is H or halogen), an aminophenol of formula II (R<4> is H, halogen or alkyl), an epoxy compound and an imidazole compound of formula III (R<5>-R<8> are H or alkyl) as essential starting components with (B) 5-70wt% of a polyvinyl formal resin. Preferably, 100pts.wt. of the dimaleimide compound is compounded with 10-30pts.wt. of the aminophenol, 20-100pts.wt. of the epoxy compound and 0.1-2pts.wt. of the imidazole compound.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、耐熱性、平田耐熱性および接着性に優れた接
着剤用組成物に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an adhesive composition having excellent heat resistance, Hirata heat resistance, and adhesiveness.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

従来から熱硬化形の接着剤としては、フェノール樹脂や
エボキン樹脂あるいはポリアミド系樹脂を主体とするも
のが多く用いられているが、これらの樹脂は熱変形温度
が低いため、接着剤としての使用条目−が限定されると
いう欠点があった。す々わちフェノール樹脂系の接着剤
においては、140℃以上の温度域f・でおいては耐熱
性VC乏しく、°また縮合反応により硬化するため、硬
化時に発泡がおこり面間の接着には適さないという難点
があった。
Conventionally, thermosetting adhesives mainly made of phenolic resin, Evoquin resin, or polyamide resin have been widely used, but these resins have low heat distortion temperatures, so their use as adhesives has been limited. - had the disadvantage of being limited. In the case of phenolic resin adhesives, heat-resistant VC is poor in the temperature range of 140°C or higher, and since they harden through a condensation reaction, foaming occurs during curing, resulting in poor adhesion between surfaces. The problem was that it was not suitable.

更にエポキシ樹脂系の接着剤においては、樹脂のガラス
転移点が低いため、耐熱性に乏しく、接着剤としての操
作性および保存安定性に劣るという難点があった。
Furthermore, epoxy resin adhesives have disadvantages in that they have poor heat resistance and poor operability and storage stability as adhesives because the resin has a low glass transition point.

〔発明の目的〕[Purpose of the invention]

本発明はこれら従来から難点を解消し、アルミニウムの
ような軽量複合構造体用の接着剤とじて特に好適な耐熱
接着剤用組成物を提供することを目的としている。
It is an object of the present invention to overcome these conventional difficulties and to provide a composition for a heat-resistant adhesive that is particularly suitable as an adhesive for lightweight composite structures such as aluminum.

〔発明の概要〕[Summary of the invention]

本発明の耐熱接着剤用組JJM’、物は、(ト)(イ)
シマレイミド化合物と(ロ)アミンフェノールとC→エ
ポキシ化合物とに)イミダゾール化合物とを必須成分と
する熱硬化性樹脂95〜30重i%と、(B)ポリビニ
ルホルマール樹脂5〜70重量係とから成る組成物であ
る。
The heat-resistant adhesive set JJM' of the present invention is (G) (B)
Consisting of 95 to 30% by weight of a thermosetting resin whose essential components are a simaleimide compound, (B) an amine phenol, a C→epoxy compound, and an imidazole compound, and (B) a polyvinyl formal resin of 5 to 70% by weight. It is a composition.

本発明における(A)の熱硬化性樹脂の配合成分の一つ
である(イ)のシマレイミド化合物としては、次の一般
式で表されるものが適している。
As the simaleimide compound (A), which is one of the components of the thermosetting resin (A) in the present invention, those represented by the following general formula are suitable.

(式中、Rは水素原子又はアルキル基’fc、R2は一
〇−、−CH−、−8o2−又け−5−S−から選択さ
れた2価の有機基ヲ、R3は水素原子又は・・ロゲン原
子を表す。) このようなシマレイミド化合物の具体例とじてtま、4
.4’−ジフェニルメタンシマレイミド、4.4’−ジ
フェニルニーデルシマレイミド、4.4’−ジフェニル
スルノ」ンジマレイミド、N、N′−シナオビス(N−
7エニルマレイミド〕、ポリ(フェニルメチレン)シマ
レイミド等を挙げることができる。
(In the formula, R is a hydrogen atom or an alkyl group 'fc, R2 is a divalent organic group selected from 10-, -CH-, -8o2- or -5-S-, R3 is a hydrogen atom or (Represents a rogene atom.) Specific examples of such simalimide compounds include t, 4.
.. 4'-diphenylmethanesimaleimide, 4,4'-diphenylneedlesimaleimide, 4,4'-diphenylsulno'ndimaleimide, N,N'-cyanobis(N-
7enylmaleimide], poly(phenylmethylene)simalimide, and the like.

また、他の配合成分の一つである(口)アミンフェノー
ルと(7ては、υ4 t/’r 、−駁゛式で表さ7′
するものが適している。
In addition, one of the other compounded ingredients, (1) amine phenol (7 is υ4 t/'r, -7'
What is appropriate is what you do.

!’ (r(、中14&i、水系原子、ハロゲンu子又はアル
キルh(から力畦択塾fする1薗の原子まrけ基を表す
。) このようなアミツノエノールの具体例としてr/1、例
えしl’ o −、m−又汀p−異性f本のアミンフェ
ノールお↓ひアミノクレゾール、2−アミノ−4−クロ
ロフェノール、しζ”””  ’    =’r^−↓
! ' (r (, middle 14&i, represents a water-based atom, a halogen atom, or an atom merging group from an alkyl h). A specific example of such an aminoenol is r/1 , for example l' o -, m- and p-isomer f amine phenol ↓ aminocresol, 2-amino-4-chlorophenol, ζ"""'='r^-↓
.

2−アミノ−4−り一ロクレゾールのような谷独直侯基
異伯一体を含有するアミノフェノール、アミンクレゾー
ル、アミノクロロフェノール、アミノブロムフェノール
等を挙げることができる。
Examples thereof include aminophenols containing 2-amino-4-ri-rocresol, aminecresols, aminochlorophenols, aminobromophenols, and the like.

さらに配合成分の一つである(ハ)エポキシ化合物とし
ては、ビスフェノール形の芳香族系のもの、シクロヘキ
セン誘導体形の脂肪族系のもの、ノボラ、り形分子構造
内にトリアジン核ヲ冶する多官能性エポキシ樹脂などヲ
準げることができる。なかでザ後者の多官能性エポキシ
樹脂を使用すると、前二者によるときに比べ、耐熱性を
一層向上させることができる。
Furthermore, (c) epoxy compounds, which are one of the compounded components, include aromatic ones in the form of bisphenols, aliphatic ones in the form of cyclohexene derivatives, and polyfunctional epoxy compounds that have a triazine nucleus in the novola-shaped molecular structure. It can also be used as a synthetic epoxy resin. When the latter polyfunctional epoxy resin is used, the heat resistance can be further improved compared to when the former two are used.

さらにもう一つの配合成分であるに)イミダゾール化合
物としては、次の一般式で表されるものが適している。
As the imidazole compound (another ingredient), those represented by the following general formula are suitable.

7 (式中R5−R8ハ、水素原子又はアルキル基から選択
される同−又は異なる1価の原子又は基を表す。9 このようなイミダゾール化合物の具体例としては、例え
ば2−エチル−4−メチルイミダゾール。
7 (In the formula, R5-R8 represent the same or different monovalent atoms or groups selected from hydrogen atoms or alkyl groups.9 Specific examples of such imidazole compounds include, for example, 2-ethyl-4- Methylimidazole.

2−メチルイミダゾール、1−ベンジル−2−メチルイ
ミダゾールなどがある。
Examples include 2-methylimidazole and 1-benzyl-2-methylimidazole.

」二記各成分の配合比は、(イ)のシマレイミド化合物
100重量部に対して、(ロ)のアミンフェノールが1
0〜30重量部、(ハ)のエポキシ化合物が20〜10
0重量部、に)のイミダゾール化合物が0.1〜2重量
部の範囲が適している。
The blending ratio of each component in (B) is 100 parts by weight of the simaleimide compound (A) to 1 part by weight of the amine phenol in (B).
0 to 30 parts by weight, 20 to 10 parts of the epoxy compound (c)
A range of 0.1 to 2 parts by weight of the imidazole compound is suitable.

本発明においては、以上の4つの配合成分を全て混合し
て反応させ、熱硬化性樹脂を製造するがその混合および
反応の順序は一通りに限定されない。しかし々から通常
は、(イ)のシマレイミド化合物の1種又は2種以上と
、(ロ)のアミンフェノールの1種又は2種以上とをま
ず付加反応させ、次いでこの付加反応物に(ハ)のエポ
キシ化合物とに)のイミダゾール化合物を混合し反応さ
せる方法が採られる。
In the present invention, a thermosetting resin is produced by mixing and reacting all of the above four ingredients, but the order of mixing and reaction is not limited to one particular order. However, usually, one or more of the simaleimide compounds in (a) and one or more of the amine phenols in (b) are first subjected to an addition reaction, and then this addition reaction product is reacted with (c). A method is adopted in which the epoxy compound (1) and the imidazole compound (2) are mixed and reacted.

本発明の組成物は、このようにして得られた熱硬化性樹
脂に、予めジメチルホルムアミド、ジメチルアセトアミ
ド、N−″メチルー2−ピロリドンのような有機極性溶
媒、或いにアセトン、メチルエチルケトン、ジオキサン
、エチレングリコール。
The composition of the present invention is prepared by adding an organic polar solvent such as dimethylformamide, dimethylacetamide, N-''methyl-2-pyrrolidone to the thermosetting resin thus obtained, or acetone, methyl ethyl ketone, dioxane, ethylene glycol.

モノメチルエーテルアセテート、シクロヘキサンのよう
な低沸点溶媒に溶解させたポリビニルホルマール樹脂を
均一に混合して得られる。その混合割合は、熱硬化性樹
脂95〜30重量%に対し、ポリビニルホルマール5〜
70重量%の割合とする。
It is obtained by uniformly mixing polyvinyl formal resin dissolved in a low boiling point solvent such as monomethyl ether acetate or cyclohexane. The mixing ratio is 5 to 30% by weight of polyvinyl formal to 95 to 30% by weight of thermosetting resin.
The proportion is 70% by weight.

配合の比率をこのような範囲に限定したのは、熱硬化性
樹脂が30重量係未満でFi(従ってポリビニルホルマ
ール樹脂の割合が70重量%を超える場合には)高温時
における接着強度が悪くなり、逆に95重量%を超える
と、(ポリビニルホルマール樹脂5重量饅未i)接着層
の可撓性が低くなり、゛また均一な層を作ることができ
ないためである。
The reason for limiting the blending ratio to this range is that if the thermosetting resin is less than 30% by weight, the adhesive strength at high temperatures will deteriorate (if the proportion of polyvinyl formal resin exceeds 70% by weight). On the other hand, if it exceeds 95% by weight, the flexibility of the adhesive layer decreases and a uniform layer cannot be formed.

〔発明の効果〕〔Effect of the invention〕

以上のようにして得られる本発明の耐熱接着剤用組成物
は耐熱性、半田耐熱性および接着性に優れ、軽量複合構
造体用の接着剤として好適なものである。
The heat-resistant adhesive composition of the present invention obtained as described above has excellent heat resistance, soldering heat resistance, and adhesive properties, and is suitable as an adhesive for lightweight composite structures.

〔発明の実施例〕[Embodiments of the invention]

次に本発明の実施例について記載する。 Next, examples of the present invention will be described.

実施例1〜4 第1表に示す重量割合の4,4′−ジフェニルメタンシ
マレイミドとm−アミノフェノールを、ジオキサンを反
応溶媒とし120〜130’Cで5時間反応させた後、
こfLにエポキシ樹脂と2−エチル−4−メチルイミダ
ゾールを加え、次いで予めジオキサンに溶解させたポリ
ビニルホルマー樹脂を均一[混合して、固形分30重量
係の樹脂溶液を得た。
Examples 1 to 4 After reacting 4,4'-diphenylmethanesimalimide and m-aminophenol in the weight proportions shown in Table 1 at 120 to 130'C using dioxane as a reaction solvent for 5 hours,
Epoxy resin and 2-ethyl-4-methylimidazole were added to this fL, and then polyvinylformer resin previously dissolved in dioxane was uniformly mixed to obtain a resin solution with a solid content of 30% by weight.

次に得られた溶液を、通常の塗布装置を用いて電解銅箔
の表面に塗布し、130’Cで10分間乾燥して36μ
の19.さの樹脂層を形成し、その」二に厚さ2211
1iのアルミニウム板を重ね、これを熱板プレスにより
180℃l(g/CJの条件で1時間加熱し、アルミニ
ウム基板を製造した。このアルミニウム基板の特性を次
の方法により測定した。
Next, the obtained solution was applied to the surface of the electrolytic copper foil using an ordinary coating device, and dried at 130'C for 10 minutes to form a 36μ
19. Form a resin layer with a thickness of 2211 mm.
1i aluminum plates were stacked and heated for 1 hour at 180° C.l (g/CJ) using a hot plate press to produce an aluminum substrate. The properties of this aluminum substrate were measured by the following method.

(剥離強反) 1c1nlI@に切断したものを、常温で、或いは18
0℃の恒温槽内で、90度方向に5Q wyp/min
の速度で引張り、銅箔とアルミニウム板が剥ガtした瞬
間の強度を測った。
(Strong peeling) Cut into 1c1nlI @ at room temperature or 18
5Q wyp/min in a 90 degree direction in a constant temperature oven at 0℃
The strength was measured at the moment the copper foil and aluminum plate were peeled off.

(半田耐熱性) 25mm角に切断した試料を260’Cおよび300℃
の半11槽に浮かべ、銅箔にふくれが発生するまでの時
間を測定した。
(Soldering heat resistance) Samples cut into 25 mm squares were heated at 260'C and 300°C.
The copper foil was floated in a half tank, and the time until blisters appeared on the copper foil was measured.

測定結果を第1表の下段に示した。The measurement results are shown in the lower part of Table 1.

比較例1〜3 第1表に示す配合割合によって実施例1〜4と同様に行
いかつ、特性を測定し、その結果を第1表に示した。
Comparative Examples 1 to 3 Comparative Examples 1 to 3 were conducted in the same manner as Examples 1 to 4 using the blending ratios shown in Table 1, and the characteristics were measured, and the results are shown in Table 1.

実施例5〜10 第2表に示す割合のN、N’−メチレンビスフェニルマ
レイミドとp−アミンフェノールを、ジオキサン溶媒中
120〜130℃の温度で5時間反応させた後、エポキ
シ樹脂と2−エチル−4−メチルイミダゾールを加え、
次いでこれに予めメチルエチルケトンに溶解させたポリ
ビニルアルコール樹脂ヲ均一に混合して、固形分35重
量係の樹脂溶液を得た。
Examples 5 to 10 After reacting N,N'-methylenebisphenylmaleimide and p-amine phenol in the proportions shown in Table 2 at a temperature of 120 to 130°C in a dioxane solvent for 5 hours, epoxy resin and 2- Add ethyl-4-methylimidazole,
Next, a polyvinyl alcohol resin preliminarily dissolved in methyl ethyl ketone was mixed uniformly into this to obtain a resin solution having a solid content of 35% by weight.

次に、得られた溶液を、塗布装置により、50μ厚さの
カプトン(米国デュポン社ポリイミドフィルムの商品名
)の両面に塗布し、120℃で20分間乾燥させた。こ
れを100騎X 25 TRm X l mmの軟鋼板
2枚の間に10ytrmオーバーラツプさせてはさみ込
み熱板プレスによ!l) 180℃、10に9/nJの
条件で30分間加熱した後、200℃で5時間アフター
キュアを行った。得られた基板の引張せん断強度を、高
滓製作所のオートグランIS −2000’i用いて測
定した。その結果を第2表の下段に示した。
Next, the obtained solution was applied to both sides of a 50 μm thick Kapton (trade name of a polyimide film manufactured by DuPont, USA) using a coating device and dried at 120° C. for 20 minutes. This was sandwiched between two mild steel plates of 100 x 25 TRm x 1 mm with an overlap of 10 ytrm, and then pressed using a hot plate press! l) After heating at 180° C. and 10 to 9/nJ for 30 minutes, after-curing was performed at 200° C. for 5 hours. The tensile shear strength of the obtained substrate was measured using Autogran IS-2000'i manufactured by Takasu Seisakusho. The results are shown in the lower part of Table 2.

比較例4〜6 第2表に示す割合によって実施例5〜1oと同様に行い
、特性を測定して結果を得たので第2表に示した。
Comparative Examples 4 to 6 Comparative Examples 4 to 6 were conducted in the same manner as Examples 5 to 1o using the ratios shown in Table 2, and the characteristics were measured and the results are shown in Table 2.

本発明の組成物は第1表および第2表かられかるように
剥離強度、半田耐熱性およびせん断引張強度に優れてい
た。
As shown in Tables 1 and 2, the composition of the present invention was excellent in peel strength, soldering heat resistance, and shear tensile strength.

Claims (1)

【特許請求の範囲】 (式中R1d、水素原子又はアルキル 基を、R2は−0 − 、−CH2−、 −SO2−。 又U−S−S−から選択される2価の有機基’r、R3
は水素原子又は・・ロゲン原子を表す。うで示されるン
マレイミ ト化合物と、 ←)一般式 (式中Rは、水素原子、・・ロゲン原 子又はアルキル基711ら選択される1価の原子又は基
を表す。)で示されるア ミノフェノールと、 (ハ)エポキシ化合物と、 に)一般式 (式中R−R1/j、水素原子又はアルキル基から選択
され2る同−又は異なる1価の原子又は基を表す。)で
示され るイミダゾール化合物とを必須出発成 分とする熱硬化性樹脂95〜30重量%と、 ([3)  ポリビニルホルマール樹脂5〜70重量%
と から成る耐熱接着剤用組成物。
[Claims] (In the formula, R1d represents a hydrogen atom or an alkyl group, and R2 represents a divalent organic group 'r selected from -0-, -CH2-, -SO2-. , R3
represents a hydrogen atom or a rogen atom. ←) an aminophenol represented by the general formula (wherein R represents a monovalent atom or group selected from a hydrogen atom, a rogen atom, or an alkyl group); (c) an epoxy compound; 95 to 30% by weight of a thermosetting resin whose essential starting components are ([3) 5 to 70% by weight of a polyvinyl formal resin.
A composition for a heat-resistant adhesive consisting of.
JP15002082A 1982-08-31 1982-08-31 Composition for heat-resistant adhesive Pending JPS5941358A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15002082A JPS5941358A (en) 1982-08-31 1982-08-31 Composition for heat-resistant adhesive

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15002082A JPS5941358A (en) 1982-08-31 1982-08-31 Composition for heat-resistant adhesive

Publications (1)

Publication Number Publication Date
JPS5941358A true JPS5941358A (en) 1984-03-07

Family

ID=15487729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15002082A Pending JPS5941358A (en) 1982-08-31 1982-08-31 Composition for heat-resistant adhesive

Country Status (1)

Country Link
JP (1) JPS5941358A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60210685A (en) * 1984-04-05 1985-10-23 Toshiba Chem Corp Heat-resistant adhesive composition
WO2007142140A1 (en) * 2006-06-06 2007-12-13 Hitachi Chemical Company, Ltd. Method for producing curing agent having acidic substituent and unsaturated maleimide group, thermosetting resin composition, prepreg, and laminate
JP2013157599A (en) * 2012-01-04 2013-08-15 Jnc Corp Heat radiation member, electronic device, and battery

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56104979A (en) * 1980-01-25 1981-08-21 Hitachi Ltd Thermosetting adhesive
JPS572328A (en) * 1980-06-05 1982-01-07 Toshiba Chem Corp Composition for adhesive

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56104979A (en) * 1980-01-25 1981-08-21 Hitachi Ltd Thermosetting adhesive
JPS572328A (en) * 1980-06-05 1982-01-07 Toshiba Chem Corp Composition for adhesive

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60210685A (en) * 1984-04-05 1985-10-23 Toshiba Chem Corp Heat-resistant adhesive composition
WO2007142140A1 (en) * 2006-06-06 2007-12-13 Hitachi Chemical Company, Ltd. Method for producing curing agent having acidic substituent and unsaturated maleimide group, thermosetting resin composition, prepreg, and laminate
US20120316263A1 (en) * 2006-06-06 2012-12-13 Shinji Tsuchikawa Method for Producing Curing Agent Having Acidic Substituent and Unsaturated Maleimide Group, Thermosetting Resin Composition, Prepreg, and Laminate
US8461332B2 (en) 2006-06-06 2013-06-11 Hitachi Chemical Company, Ltd. Method for producing curing agent having acidic substituent and unsaturated maleimide group, thermosetting resin composition, prepreg, and laminate
US8796473B2 (en) 2006-06-06 2014-08-05 Hitachi Chemical Company, Ltd. Method for producing curing agent having acidic substituent and unsaturated maleimide group, thermosetting resin composition, prepreg, and laminate
JP2013157599A (en) * 2012-01-04 2013-08-15 Jnc Corp Heat radiation member, electronic device, and battery

Similar Documents

Publication Publication Date Title
US4960860A (en) Imide compound and composition containing the same
TWI287553B (en) Polyphenol resin and manufacturing process thereof
US4284461A (en) Aluminum ion-containing polyimide adhesives
JP2016147946A (en) Resin composition, film, substrate, semiconductor device, adhesive material for thermal transfer roll and office equipment
JPS5941358A (en) Composition for heat-resistant adhesive
JPS60250026A (en) Epoxy resin composition
JPS648037B2 (en)
JPH04227936A (en) Method of bonding polyimide film, and printed circuit board
JPS60210685A (en) Heat-resistant adhesive composition
JPS62207322A (en) Thermosetting resin composition
JPH01123831A (en) Heat-resistant resin composition
JPH0337220A (en) Epoxy resin curing agent
JPS63312321A (en) Curable polymer composition
JPH073016A (en) Thermosetting resin composition and prepreg and laminated sheet using the same
JPS5962620A (en) Curing of epoxy resin
CA2047088A1 (en) Cyanamide-cured maleimide/epoxy resin compositions
JPH01149822A (en) Epoxy resin composition
JPS58138725A (en) Thermosetting resin composition
JPS58206674A (en) Adhesive composition
JPS63297419A (en) Imide-type prepolymer composition
JP2910957B2 (en) Unsaturated imide resin composition
JPS62177033A (en) Production of heat-resistant laminate
KR20230125176A (en) Resin compositions, sheet-like compositions, sheet cured products, laminates, laminated members, wafer holding bodies, and semiconductor manufacturing equipment
JPH0415215A (en) Thermosetting resin composition for laminate
JPH0319837A (en) Heat-resistant laminated sheet