JPS5921660U - Plasma CVD equipment - Google Patents

Plasma CVD equipment

Info

Publication number
JPS5921660U
JPS5921660U JP11682682U JP11682682U JPS5921660U JP S5921660 U JPS5921660 U JP S5921660U JP 11682682 U JP11682682 U JP 11682682U JP 11682682 U JP11682682 U JP 11682682U JP S5921660 U JPS5921660 U JP S5921660U
Authority
JP
Japan
Prior art keywords
base material
plasma cvd
end side
cvd apparatus
vacuum vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11682682U
Other languages
Japanese (ja)
Other versions
JPS6140772Y2 (en
Inventor
川上　伸男
横山　佳興
祐一 木村
Original Assignee
株式会社島津製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社島津製作所 filed Critical 株式会社島津製作所
Priority to JP11682682U priority Critical patent/JPS5921660U/en
Publication of JPS5921660U publication Critical patent/JPS5921660U/en
Application granted granted Critical
Publication of JPS6140772Y2 publication Critical patent/JPS6140772Y2/ja
Granted legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、従来例を示す概略説明図、第２図は本考案の
一実施例を示す概略説明図、第３図は同実施例における
減圧容器内部を示す斜視図である。 １・・・減圧容器、４・・・プラズマ放電場、５・・・
基材、６・・・基材送り出し機構、７・・・基材巻取機
構、９・・・基枠、１２・・・排気ガス導出口。FIG. 1 is a schematic explanatory diagram showing a conventional example, FIG. 2 is a schematic explanatory diagram showing an embodiment of the present invention, and FIG. 3 is a perspective view showing the inside of a vacuum container in the same embodiment. 1... Decompression vessel, 4... Plasma discharge field, 5...
Base material, 6... Base material feeding mechanism, 7... Base material winding mechanism, 9... Base frame, 12... Exhaust gas outlet.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 内部にプラズマ放電場を有してなる減圧容器の一端側に
基材送り出し機構と基材巻取り機構とを配設し、前記基
材送り出し機構から送り出される長尺な基材を前記プラ
ズマ放電場を通して一旦前記減圧容器の他端側へ導いた
後再び前記減圧容器の一端側へ帰還させて前記基材巻取
機構により巻取り得るように構成したプラズマＣＶＤ装
置において、前記減圧容器の他端部に該容器内の不要ガ
スを外部へ排出するための排気ガス導出口を設けたこと
を特徴とするプラズマＣＶＤ装置。A base material delivery mechanism and a base material winding mechanism are disposed on one end side of a reduced pressure container having a plasma discharge field therein, and a long base material sent out from the base material delivery mechanism is transported to the plasma discharge field. In the plasma CVD apparatus, the plasma CVD apparatus is configured such that the base material is once guided to the other end side of the vacuum vessel through the base material, and then returned to one end side of the vacuum vessel again so that the base material can be wound up by the base material winding mechanism. A plasma CVD apparatus characterized in that an exhaust gas outlet is provided for discharging unnecessary gas inside the container to the outside.
JP11682682U 1982-07-31 1982-07-31 Plasma CVD equipment Granted JPS5921660U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11682682U JPS5921660U (en) 1982-07-31 1982-07-31 Plasma CVD equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11682682U JPS5921660U (en) 1982-07-31 1982-07-31 Plasma CVD equipment

Publications (2)

Publication Number Publication Date
JPS5921660U true JPS5921660U (en) 1984-02-09
JPS6140772Y2 JPS6140772Y2 (en) 1986-11-20

Family

ID=30269160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11682682U Granted JPS5921660U (en) 1982-07-31 1982-07-31 Plasma CVD equipment

Country Status (1)

Country Link
JP (1) JPS5921660U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61288074A (en) * 1985-06-17 1986-12-18 Canon Inc Deposited film forming device by cvd method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61288074A (en) * 1985-06-17 1986-12-18 Canon Inc Deposited film forming device by cvd method

Also Published As

Publication number Publication date
JPS6140772Y2 (en) 1986-11-20

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