JPS59136474A - Capacity-coupling apparatus for glow discharge decomposition - Google Patents
Capacity-coupling apparatus for glow discharge decompositionInfo
- Publication number
- JPS59136474A JPS59136474A JP909883A JP909883A JPS59136474A JP S59136474 A JPS59136474 A JP S59136474A JP 909883 A JP909883 A JP 909883A JP 909883 A JP909883 A JP 909883A JP S59136474 A JPS59136474 A JP S59136474A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- drum
- mesh
- glow discharge
- conductive drum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
技術分野
本発明は、容量結合型グロー放電分解法に基づき、減圧
可能な反応室内で導電性ドラムの局面に感光層生成ガス
を吹き付けることにより、その周面上に感光層を生成す
るための容量結合型グロー放電分）剪装置に関するもの
である。Detailed Description of the Invention Technical Field The present invention is based on a capacitively coupled glow discharge decomposition method, in which a photosensitive layer forming gas is sprayed onto the surface of a conductive drum in a reaction chamber that can be depressurized. The present invention relates to a capacitively coupled glow discharge shearing device for producing layers.
従来技術
近年、電子写真感光体ドラムとして、導電性ドラムの周
面にアモルファスシリコン（ａｍｏｒｐｈｏｕｓｓｉｌ
ｉｃｏｎ 、以下ａ−８ｉと略す）感光層を生成してな
るものが開発されるに至っている。ところで、この様な
感光体ドラムは一般に容量結合型グロー放電分解法によ
り生成されるのが望ましいが、感光層
層の膜尋が均一になりにくいことに加え表面の荒れ、膜
中の欠陥、ピンホール等が発生し複写したときには良好
な画像が得られないという欠点がある。Prior Art In recent years, amorphous silicon has been used on the circumferential surface of a conductive drum as an electrophotographic photoreceptor drum.
A photosensitive layer (hereinafter abbreviated as a-8i) has been developed. Incidentally, such photoreceptor drums are generally preferably produced by a capacitively coupled glow discharge decomposition method, but in addition to the fact that the film thickness of the photoreceptor layer is difficult to achieve, it also suffers from surface roughness, defects in the film, and pin points. There is a drawback that a good image cannot be obtained when a copy is made due to the occurrence of holes or the like.
具体的に容量結合型グロー放電分解装置の一例として特
開昭５７−７８５４６号公報に示されるものがあるが、
これに示される装置は回転する導電性ドラムと同心的に
一定間隔を保って配置されるドラム電極を設け、ドラム
電極に高周波電力を印加してドラム電極と導電性ドラム
間に電界を形成し感光層生成ガスを分解して導電性ドラ
ム上に感光層を成膜するものである。ところか感光層の
成膜には生成ガス分解による活性種が重要であって電界
の形成により発生ずるイオンや電子は何ら寄与していな
い。然るに上記製造装置においてはドラム電極と導電性
ドラム間に電界を発生させ生成ガスを分解しているため
、活性種のみならずイオンや電子も導電性ドラム表面に
衝突する。つまり導電性ドラム表面は常にイオンや電子
の衝撃に露らされており成膜表面が荒れたり膜中に欠陥
が出きたり、更にピンホールが生じたりして良好な感光
体としては使用できないものであった。A specific example of a capacitively coupled glow discharge decomposition device is shown in Japanese Patent Application Laid-Open No. 57-78546.
The device shown here has a drum electrode arranged concentrically with a rotating conductive drum at a constant interval, and applies high frequency power to the drum electrode to form an electric field between the drum electrode and the conductive drum. A photosensitive layer is formed on a conductive drum by decomposing a layer forming gas. However, active species generated by decomposition of generated gas are important for forming the photosensitive layer, and ions and electrons generated by the formation of an electric field do not contribute at all. However, in the above manufacturing apparatus, an electric field is generated between the drum electrode and the conductive drum to decompose the generated gas, so that not only active species but also ions and electrons collide with the surface of the conductive drum. In other words, the surface of the conductive drum is constantly exposed to bombardment with ions and electrons, which can cause the surface of the film to become rough, defects in the film, and even pinholes, making it unsuitable for use as a good photoreceptor. there were.
発明の目的
本発明は以上の事実に鑑みて成されたもので、その目的
とするところは、均一な膜厚が得られ表面荒れ、膜中の
欠陥、ピンホール等の発生がなく電子写真特性に優れた
感光層を得ることのできる容量結合型グロー放電分解装
置を提供することにある。Purpose of the Invention The present invention has been made in view of the above facts, and its purpose is to obtain a uniform film thickness, eliminate surface roughness, defects in the film, pinholes, etc., and improve electrophotographic properties. An object of the present invention is to provide a capacitively coupled glow discharge decomposition device that can obtain a photosensitive layer with excellent properties.
発明の要旨
本発明の要旨は、アモルファス感光層を生成するための
容量結合型グロー放電分解装置において導電性ドラム周
面にその周面に沿った形状で導電性ドラムと一定間隔を
保って配置されるメツシュ状電極と、このメソシュ状電
極と離隔し高周波電力か印加される外部電極とを設け、
外部電極とメツシュ状電極間に高周波電界を発生させて
良好な感光層を得ることにある。SUMMARY OF THE INVENTION The gist of the present invention is that in a capacitively coupled glow discharge decomposition device for producing an amorphous photosensitive layer, a conductive drum is disposed along the circumferential surface of the conductive drum at a constant distance from the conductive drum. a mesh-like electrode, and an external electrode separated from the mesh-like electrode to which high-frequency power is applied;
The purpose of this method is to generate a high-frequency electric field between an external electrode and a mesh-like electrode to obtain a good photosensitive layer.
実施例
以下、実施例について説明するが、下記では導電性ドラ
ムの周面にａ−５ｉ光導電層を生成する場合について述
べる。しかし当然のことながら本発明に係るグロー放電
分解装置は他の感光層、例えばアモルファスシリコン−
ゲルマニウム等モ生成スることができる。EXAMPLES Examples will be described below, in which a case where an a-5i photoconductive layer is formed on the circumferential surface of a conductive drum will be described. However, it will be appreciated that the glow discharge decomposition device according to the present invention may also contain other photosensitive layers, such as amorphous silicon.
Germanium isomer can be produced.
第１図は本発明に係る容量結合型グロー放電分解装置の
一実施例の概略構成を示す図面であり、図中、第１〜４
タンク（１１（２＋ ＋３１ ＋４１の各々には、Ｈ２
、Ｓ ｉｌＩ＋、、 Ｂ２Ｈ６，０２ガスが封入されて
いる。これらのガスは後記の如く第３主管（２２）内で
合流されることにより各々混合されて感光層成生ガスを
構成するものであり、ｌ−Ｉ２ガスは５ｉｌ−Ｉ４ガス
のキャリア、及びＢ２ｒ−Ｉ６ガスのキャリアとして機
能する。ところで、これらのガスは、その各々に対応し
て設けられている第１〜４調整弁（５） （６） ＋７
） （８）を開放することによって放出され、その流量
がマスフローコントローラ （１５） （１６） （１
７） （１８）によって規制きれつつ、第１〜３タンク
ｔｌ） （２） （３）からのガスは第１主管（１３）
へと一方、第４タンク（４）からのガスは第２主管（１
４）へと送られる様になっている。なお、図中［９）
（１０） （１１）（１２） （１９） （２０）は止
め弁である。FIG. 1 is a drawing showing a schematic configuration of an embodiment of a capacitively coupled glow discharge decomposition device according to the present invention.
Each of the tanks (11 (2+ +31 +41) has H2
, S ilI+, , B2H6,02 gas is sealed. As described later, these gases are combined in the third main pipe (22) and mixed to form the photosensitive layer forming gas, and the l-I2 gas is the carrier of the 5il-I4 gas, and the - Functions as a carrier for I6 gas. By the way, these gases are controlled by the first to fourth regulating valves (5) (6) +7 provided correspondingly to each of them.
) (8), and the flow rate is adjusted to the mass flow controller (15) (16) (1
7) Although it is regulated by (18), the gas from 1st to 3rd tanks tl) (2) (3) is transferred to the 1st main pipe (13).
On the other hand, gas from the fourth tank (4) is transferred to the second main pipe (1
4). In addition, [9] in the figure
(10) (11) (12) (19) (20) are stop valves.
反応室（２１）は、減圧可能であると共に、その内部に
おいて導電性ドラム（２３）の周面に対して感光層生成
ガスを吹き付けることにより、容量結合型グロー放電分
解法に基づき、導電性ドラム（２３）の周面」二に感光
層を生成するためのものである。そして、この反応室（
２１）内において、前記第１．２主管（１，３） （１
４）を通じて流れるガスは第３主管（２２）で合流され
、また、導電性ドラム（２３）はドラム支持台（２５）
によって回転可能に支持される様になっている。前記導
電性ドラム（２３）は、アルミニウム、ステンレス、あ
るいはＮＥＳＡガラス等の導電相を円筒状に形成したも
のであり、この実施例の容量結合型グロー放電分解装置
によってその周面上に、ａ−５ｉ感光層が生成される。The reaction chamber (21) can be depressurized, and the conductive drum (23) is decomposed based on a capacitively coupled glow discharge decomposition method by spraying a photosensitive layer forming gas onto the circumferential surface of the conductive drum (23) inside the reaction chamber (21). (23) is for forming a photosensitive layer on the second peripheral surface. And this reaction chamber (
21), said 1.2 main pipe (1, 3) (1
4) are combined at the third main pipe (22), and the conductive drum (23) is connected to the drum support (25).
It is rotatably supported by. The conductive drum (23) is a cylindrical conductive phase made of aluminum, stainless steel, NESA glass, or the like, and a- A 5i photosensitive layer is produced.
一方、前記ドラム支持台（２５社、その台上に導電性ド
ラム（２３）が嵌装載置されるものであり、電気的に接
地若しくは直流バイアス電圧が印加されるようになって
いる。このため、このドラム支持台（２５）上に導電性
ドラム（２３）を嵌装載置した場合、導電性ドラム（２
３）はドラム支持台ｃ２５）を介して接地かノくイアス
ミ圧が印加される。また、前記ドラム支持台（２５）は
、駆動モータ（２４）に対して駆動連結されており、感
光層生成時において回転駆動され、導電性ドラムｃ２３
）をそのドラム軸を中心に回転する様になっている。On the other hand, a conductive drum (23) is placed on the drum support stand (25 companies) by a fitting device, and electrically grounded or a DC bias voltage is applied. Therefore, when the conductive drum (23) is placed on the drum support (25), the conductive drum (23)
3) is grounded via the drum support base c25), and an insulating pressure is applied thereto. Further, the drum support base (25) is drivingly connected to a drive motor (24), and is driven to rotate during the formation of the photosensitive layer, and is driven to rotate the conductive drum c23.
) rotates around its drum axis.
なお、導電性ドラム（２３）は感光層生成時において回
転されると同時に、図示されぬ加熱手段によって約１０
０〜４ｏｏ℃、好ましくけ１５０〜３ｏｏ℃ノ温度に均
一加熱はれる。Incidentally, the conductive drum (23) is rotated during the formation of the photosensitive layer, and at the same time is heated by heating means (not shown) for approximately 10 minutes.
Uniform heating is carried out to a temperature of 0 to 40°C, preferably 150 to 300°C.
前記反応室（２１）内には導電性ドラム（２３）を間に
して一対の平板電極が設けられ、生成ガスが噴出される
第１平板電極（２６）と分解ガスを吸引する第２平板電
極（２７）か平行配役はれており、第１平板電極（２６
）は第３主管（２２）に、第２平板電極（２７）は第４
主管（２８）に接続されている。第１平板電極（２６）
は内部が空洞の直方体形状で、第２図に示す如くドラム
（２３）に対向する面に生成ガスを噴出する噴出孔（２
９）を多数形成して構成されている。第２平板電極（２
７）も第１平板、電極（２６）と略同−構成で１図示り
ないがドラムと対向する面には多数の吸引孔が形成され
ており、吸引したガスを第４主管（２８）を介して排気
する。また、第１平板電極（２６）、第２平板電極（２
７）はともに導電性拐料で構成され電路（３０）を介し
て各々電気的に短絡されていると共に、００５〜２．Ｏ
ＫＲｌ の高周波電力が印加される高周波電源（３１）
に接続されている。A pair of flat plate electrodes are provided in the reaction chamber (21) with a conductive drum (23) in between, a first flat plate electrode (26) from which generated gas is ejected, and a second flat plate electrode which sucks decomposition gas. (27) is parallel to the electrode, and the first flat electrode (26
) is connected to the third main pipe (22), and the second plate electrode (27) is connected to the fourth main pipe (22).
It is connected to the main pipe (28). First plate electrode (26)
has a rectangular parallelepiped shape with a hollow interior, and as shown in FIG.
9). Second flat electrode (2
7) also has the same structure as the first flat plate and the electrode (26). Although not shown in the figure, a large number of suction holes are formed on the surface facing the drum, and the sucked gas is passed through the fourth main pipe (28). Exhaust through. In addition, the first flat electrode (26), the second flat electrode (2
7) are both made of conductive material and are electrically short-circuited via an electric path (30), and 005 to 2. O
High frequency power source (31) to which high frequency power of KRl is applied
It is connected to the.
前記第１平板電極（２６）と第２平板電極（２７）間に
は第３図及び第４図にも示される如く導電性ドラム（２
３）を包囲する関係に導電性のメツシュ状円筒電極（３
２）が設けられている。このメソシュ状円筒電極（３２
）はドラム（２３）とその中心が同じとなるように固設
されるとともに、第１平板電極（２６）と第２平板電極
（２７）より離隔して設けられ且つそれ自体、電気的に
接地されている。そして前述した通り、第１第２平板電
極（２６） 、 （２７）に高周波電力が印加されるこ
とにより、第１、第２平板電極（２６Ｌ（２７）とメツ
シュ状円筒電極（３２）との間でグロー放電が起こるよ
うになっている。尚、第１、第２平板電極（２６） 、
（２７）とメツシュ状電極（３２）間の距離は高周波
電源（３１）からの電力にもよるが最近接する部分で約
２０〜１００ｗｎ程度のギャップを保つのが望ましい。As shown in FIGS. 3 and 4, there is a conductive drum (2) between the first flat electrode (26) and the second flat electrode (27).
A conductive mesh-like cylindrical electrode (3) surrounds the conductive mesh-like cylindrical electrode (3).
2) is provided. This mesoche-like cylindrical electrode (32
) is fixed so that its center is the same as the drum (23), is spaced apart from the first flat electrode (26) and the second flat electrode (27), and is itself electrically grounded. has been done. As mentioned above, by applying high frequency power to the first and second flat plate electrodes (26) and (27), the first and second flat plate electrodes (26L (27) and the mesh-like cylindrical electrode (32) are connected to each other. Glow discharge occurs between the first and second flat electrodes (26),
The distance between (27) and the mesh electrode (32) depends on the power from the high frequency power source (31), but it is desirable to maintain a gap of approximately 20 to 100 wn at the closest portion.
これはギャップが２０間以下では余り高いＴｌＬ力を印
加することができずガスが完全に分解できなかったり感
光層の成膜速度が低下するためで、逆に１００箇以上の
ギャップではかなりの電力が必要となるためである。更
にメツシュ状電極（３２）は直流バイアス電圧か印加さ
れるよう構成されていてもよい。このバイアス電圧の印
加はメツシュ状電極（３２）によるイオンや電子の捕獲
効率を上げる。尚、メツシュ状電極（３２）とドラム（
２３）間の距離は特に制限はないが数箇から数１００
ｔｒｒｒｈに設定するのが望ましい。This is because when the gap is less than 20 points, it is not possible to apply a very high TIL force, and the gas cannot be completely decomposed, and the deposition rate of the photosensitive layer is reduced.On the other hand, when the gap is more than 100 points, a considerable amount of power is required. This is because it is necessary. Furthermore, the mesh-like electrode (32) may be configured to be applied with a DC bias voltage. Application of this bias voltage increases the efficiency of capturing ions and electrons by the mesh electrode (32). In addition, the mesh-like electrode (32) and the drum (
23) There is no particular limit to the distance between them, but it can range from several to several hundred.
It is desirable to set it to trrrh.
また、反応室（２１）の内部は、感光層生成時に高度の
真空状態、具体的には、０５〜２．ＱＴｏｒｒ程度の真
空状態を必要とすることにより回転ポンプ（３３）、拡
散ポンプ（３４）が反応室（２１）に対して連結されて
いる。なお、ガス吸引孔から吸引されたガスは、第４主
管（２８）を通じて回転ポンプ（３３）へと導かれる様
になっている。Further, the interior of the reaction chamber (21) is kept in a highly vacuum state during the formation of the photosensitive layer, specifically, from 05 to 2. A rotary pump (33) and a diffusion pump (34) are connected to the reaction chamber (21) because a vacuum state of about QTorr is required. Note that the gas sucked from the gas suction hole is guided to the rotary pump (33) through the fourth main pipe (28).
以上の構成の容量結合型グロー放電分解装置において、
ａ−５ｉ感光層を導電性ドラム（２３）の周面上に生成
するに際しては、第１．２調整弁＋５＋ （６１を開放
して適当な流量比で第１．２タンク＋１１ Ｆ２＋より
、Ｉ−Ｉ ２．５ｉｒ−１４ガスを、また必要に応じて
第４調整弁（８）を開放して第４タンク（４）より０２
ガスを、更に硼素を含有するときは第３ ｊ１４整弁（
７）を開放して第３タンク（３）よりＢ２ｌ−１６ガス
を放出する。放出量はマスフローコントローラ（１５）
（１，６）（１７） （１，８）により規制され、ト
Ｉ２をキャリアーガスとする５ｉＩ−Ｉ４ガス、あるい
はそれに１３２Ｈｅガスが混合されたガスが第１主管（
１３）を介して、一方、５ｉｌ（４に対し一定のモル比
にある０２ガスが第２主管（１４）を介して送られ、反
応室（２］）の内部の第３主管（２２）内でそれらが合
流されて感光層生成ガスが構成烙れる。この様な感光層
生成ガスは第１平板電極（２６）内へと送られ、その噴
出孔（２９）より噴出される。In the capacitively coupled glow discharge decomposition device with the above configuration,
When forming the a-5i photosensitive layer on the circumferential surface of the conductive drum (23), the 1.2 regulating valve +5+ (61 is opened and the I. -I 2.5ir-14 gas, and if necessary, open the fourth regulating valve (8) to supply 02.5ir-14 gas from the fourth tank (4).
When containing gas and boron, the 3rd j14 regulating valve (
7) to release B2l-16 gas from the third tank (3). The amount of release is determined by the mass flow controller (15)
The first main pipe (
13), while 02 gas in a constant molar ratio to 5il (4) is sent through the second main pipe (14) and into the third main pipe (22) inside the reaction chamber (2]). The gases are combined to form a photosensitive layer forming gas.Such a photosensitive layer forming gas is sent into the first flat electrode (26) and ejected from its ejection hole (29).
一方、反応室（２１）の内部か０５〜２．□Ｔｏｒｒ程
度の真空状態に、導電性ドラム（２３）の表面温度が１
００〜４００℃に、第１、第２平板電極（２６） 、
（２７）に高周波電源（３１）より印加されている高周
波電力が０．０５〜１．５ ＫｉｖＫ 、”！ ｆｔ周
波数カ１−５ＱＭＩ−１ｚ Ｋ 設５’ｊＬ サれてい
ると哄に、導電性ドラム（２３）が回動されることによ
り、第１、第２平板電極（２６） 、 （２７）とメツ
シー状電極（３２）との間でグロー放電が生じ、生成ガ
スが分解されることとなる。この際、感光層の成）俟に
必υ！な活性種が形成されるとともに成膜には寄与しな
いイオンや電子も発生する。ここで活性種はメツシュ状
電極を介して回転する導電性ドラム（２３）上に付着す
る一方、イオンや電子はその大部分がメツシュ状電極（
３２）によって捕獲される。然るに導電性ドラムはその
）成膜過程において成膜に寄与しないイオンや電子の衝
撃に晒される々いうことはなく、それによる膜厚の不均
一化、表面の荒れ、膜中の欠陥、ピンホールの発生等は
なく良好なａ−３ｉ感九層を得ることができる。尚メツ
シュ状電極（３２）は接地、バイアス電圧印加の何れの
場合でも有効にイオン、電子を捕獲する。On the other hand, inside the reaction chamber (21) 05-2. □In a vacuum state of about Torr, the surface temperature of the conductive drum (23) is 1
00 to 400°C, the first and second flat electrodes (26),
As soon as the high frequency power applied from the high frequency power source (31) to (27) is 0.05 to 1.5 KivK, "! ft frequency power 1-5QMI-1z K set 5'jL When the sexual drum (23) is rotated, glow discharge occurs between the first and second flat electrodes (26), (27) and the mesh electrode (32), and the generated gas is decomposed. At this time, active species necessary for the formation of the photosensitive layer are formed, as well as ions and electrons that do not contribute to film formation.Here, the active species rotate through the mesh-like electrode. While they adhere to the conductive drum (23), most of the ions and electrons are deposited on the mesh-like electrode (
32) is captured by However, conductive drums are not exposed to bombardment of ions and electrons that do not contribute to film formation during the film formation process, resulting in uneven film thickness, surface roughness, defects in the film, and pinholes. There is no occurrence of such problems, and a good nine-layer a-3i texture can be obtained. Note that the mesh-like electrode (32) effectively captures ions and electrons whether it is grounded or when a bias voltage is applied.
また導電性ドラム（２３）は接地でもバイアス電圧印加
でもよいが後者では活性種をドラム面に誘導する上でよ
り効果的である。こうしてドラム（２３）の周面上に、
少なくとも水素を含有したａ−５ｉ悪感光が約１〜５μ
ｍ／ｈｏｕｒの堅さで生成され、膜厚が均一で欠陥のな
いａ−８ｉ感光層が得られる。Further, the conductive drum (23) may be grounded or a bias voltage may be applied, but the latter is more effective in guiding active species to the drum surface. In this way, on the circumferential surface of the drum (23),
A-5i containing at least hydrogen has a negative sensitivity of about 1 to 5μ
The A-8I photosensitive layer is produced with a hardness of m/hour, has a uniform thickness, and has no defects.
以上の説明において、第１及び第２平板電極（２６）
、 （２７）はメツシュ状電極（３２）の周面に沿った
形状でもよく、例えＵ゛円弧状、円筒状にしてもよい。In the above description, the first and second flat electrodes (26)
, (27) may have a shape along the circumferential surface of the mesh-like electrode (32), for example, may have a U゛ arc shape or a cylindrical shape.
この場合、メソシュ状電極（３２）との間の電界は均一
となり、より良好な感光層を形成できる。In this case, the electric field between the mesoche electrode (32) becomes uniform and a better photosensitive layer can be formed.
また、本発明に係る容量結合凋グロー放電分解装置は第
５図に示すように量産用に適した構成とするとともでき
る。即ち、第１平板電極（２６）と第２平板電極（２７
）間に回転可能に支持された複数の導電性ドラム（２３
）各々を包囲する関係にメソシュ状円筒電極（３２）を
設けたものである。各メッ９゜状電極（３２）は生成ガ
スの噴出側及び吸引側で夫々平板電極（２６） 、 （
２７）と離隔して配設されており、第１、第２平板電極
は高周波電源（３１）と接続している。従ってこの場合
も前記と同様に平板電極とメソシュ状電極間でグロー放
電が起こり、良好な特性のａ−５ｉ悪感光が形成される
。Further, the capacitively coupled fading glow discharge decomposition apparatus according to the present invention can be configured to be suitable for mass production as shown in FIG. That is, the first flat electrode (26) and the second flat electrode (27)
) rotatably supported between a plurality of conductive drums (23
) A mesoche-like cylindrical electrode (32) is provided in a relationship surrounding each of the electrodes. Each mesh 9°-shaped electrode (32) has a flat plate electrode (26), (
27), and the first and second plate electrodes are connected to a high frequency power source (31). Therefore, in this case as well, glow discharge occurs between the flat plate electrode and the mesoche-like electrode, and a-5i ill-effect light with good characteristics is formed.
効 果
以上、説明したように本発明に係る容量結合型グロー放
電分解装置によれば、外部電極とメツシュ状電極との間
にグロー放電が生じるものであるから、感光層の成膜に
必要な活性種だけが導電性ドラムに付着し、イオンや電
子の衝撃による表面荒れ、膜中の欠陥、ピンポール等の
発生はない均一な膜厚の感光層を得ることができる。ま
た、製造装置自体も構成が簡素で条件設定も容易である
等、優れた効果を佇する。Effects As explained above, according to the capacitively coupled glow discharge decomposition device according to the present invention, glow discharge is generated between the external electrode and the mesh-like electrode. Only the active species adhere to the conductive drum, and it is possible to obtain a photosensitive layer with a uniform thickness without surface roughness, defects in the film, pinholes, etc. caused by ion or electron bombardment. In addition, the manufacturing equipment itself has excellent effects, such as a simple configuration and easy setting of conditions.
第１図は本発明に係る容量結合型グロー放電分解装置の
一実癩例の概略構成を示す図、第２図乃至第４図はその
実施例の要部を示す図、第５図は本発明の別実施例を示
す図である。
（２］）・・反応室 （２３）・・・導電性ドラ
ム（２５）・ ドラム支持台 （２６）・・第１平板電
極（２７）・第２平板電極 （３１）・・・高周波電源
（３２）・・メソシュ状円筒電極
出願人 ミノルタカメラ株式会社
第１図
１
第２図 第３図
第４図
第５図FIG. 1 is a diagram showing a schematic configuration of an actual example of a capacitively coupled glow discharge decomposition device according to the present invention, FIGS. 2 to 4 are diagrams showing main parts of the embodiment, and FIG. It is a figure which shows another Example of invention. (2])...Reaction chamber (23)...Conductive drum (25)/Drum support (26)...First plate electrode (27)/Second plate electrode (31)...High frequency power source ( 32)... Mesoche-shaped cylindrical electrode Applicant: Minolta Camera Co., Ltd. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5
Claims (2)
反応室内で導電性ドラムの周面に感光層生成ガスを吹き
付けることにより、その周面上に感光層を生成するため
の容量結合型グロー放電分解装置であって、前記反応室
内において導電性ドラムを回転可能に支持するドラム支
持手段と、導電性ドラムの周面に沿った形状をしている
とともに導電性ドラム周面より一定間隔を保って配置芒
れる導電性のメツシュ状電極と、メツシー状電極より更
に一定間隔を保って配置される外部電極と、メツシー状
電極と外部電極間に高周波電界を形成するｌこめの高周
波電源とを備えたことを特徴とする容量結合型グロー放
電分解装置。(1) A capacitively coupled glow discharge decomposition method to generate a photosensitive layer on the circumferential surface of a conductive drum by spraying photosensitive layer forming gas onto the circumferential surface of the conductive drum in a reaction chamber that can be depressurized. The electrical discharge decomposition apparatus includes: a drum support means for rotatably supporting a conductive drum in the reaction chamber; It is equipped with conductive mesh-like electrodes that are arranged in parallel with each other, external electrodes that are arranged at a constant interval from the mesh-like electrodes, and a large number of high-frequency power sources that form a high-frequency electric field between the mesh-like electrodes and the external electrodes. A capacitively coupled glow discharge decomposition device characterized by:
出部と感光層生成ガスを吸引する吸引部とが形成され、
前記メツシュ状電極は噴出部と吸引部間に設けられてい
ることを特徴とする特許請求の範囲第１項記載の容量結
合型グロー放電分解装置。(2) the external electrode is formed with a jetting part that sprays the photosensitive layer forming gas and a suction part that sucks the photosensitive layer forming gas;
2. The capacitively coupled glow discharge decomposition device according to claim 1, wherein said mesh-like electrode is provided between an ejection part and a suction part.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP909883A JPS59136474A (en) | 1983-01-21 | 1983-01-21 | Capacity-coupling apparatus for glow discharge decomposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP909883A JPS59136474A (en) | 1983-01-21 | 1983-01-21 | Capacity-coupling apparatus for glow discharge decomposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59136474A true JPS59136474A (en) | 1984-08-06 |
Family
ID=11711140
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP909883A Pending JPS59136474A (en) | 1983-01-21 | 1983-01-21 | Capacity-coupling apparatus for glow discharge decomposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59136474A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62103372A (en) * | 1985-10-25 | 1987-05-13 | バルツァース・アクティエンゲゼルシャフト | Apparatus for forming membrane by chemical vapor deposition using plasma and its use |
-
1983
- 1983-01-21 JP JP909883A patent/JPS59136474A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62103372A (en) * | 1985-10-25 | 1987-05-13 | バルツァース・アクティエンゲゼルシャフト | Apparatus for forming membrane by chemical vapor deposition using plasma and its use |
| JPH0541705B2 (en) * | 1985-10-25 | 1993-06-24 | Solems Sa |
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