JPS5855587A - Copper-tin alloy plating bath - Google Patents

Copper-tin alloy plating bath

Info

Publication number
JPS5855587A
JPS5855587A JP15176181A JP15176181A JPS5855587A JP S5855587 A JPS5855587 A JP S5855587A JP 15176181 A JP15176181 A JP 15176181A JP 15176181 A JP15176181 A JP 15176181A JP S5855587 A JPS5855587 A JP S5855587A
Authority
JP
Japan
Prior art keywords
copper
tin alloy
pref
bath
alloy plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15176181A
Other languages
Japanese (ja)
Inventor
Hiroshige Ikeno
池野 広重
Kenichi Ogawa
健一 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP15176181A priority Critical patent/JPS5855587A/en
Publication of JPS5855587A publication Critical patent/JPS5855587A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To impart uniform gloss to a copper-tin alloy plating layer, in a copper cyanide-alkali stannate type copper-tin alloy plating bath, by adding thiocyanate, polyethylene imine or a derivative thereof and a tin salt. CONSTITUTION:As thiocyanate added to a copper-tin alloy plating bath, for example, sodium thiocyanate is pref. used and the addition amount thereof to said bath is about 10-60g/l, pref., about 25-55g/l. Polyethylene imine is not a perfect linear high molecular polymer and has a branched structure having primary, secondary and tertiary amino nitrogens and the atomic ratio of nitrogens is about 1:2:1 and polyethylene imine or a derivative thereof is added to the bath in an amount of below about 0.03g/l, pref., 0.04-0.3g/l. A tin salt is added in an amount of 1-12mg/l, pref., 3-10mg/l in the case of an inorg. acid salt such as acetate and used in amount of 1-10mg/l, pref., 2-8mg/l in the case of an org. salt such as lead phenol sulfonate.

Description

【発明の詳細な説明】 本発明は銅−スズ合金めつ1浴に関するものでちゃ、光
沢のある銅−スズ合金めり龜を得るためのものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a copper-tin alloy bath, and is intended to obtain a shiny copper-tin alloy pot.

従来背化鋼−スズ酸アルカリを主成分とする銅−スズ合
金めり1浴に用いられる光沢剤としては酒石酸、クエン
酸、すりチル酸等のような有機酸類、エチレングリコー
ル、フェノール、−一ナフトール、ハイド胃キノン、8
−ハイドロ中シキノリンのようなアル;−ル、・フェノ
ール類、エチレントリアミン、ピリジン、キノリン、シ
リエタノ−ルア電ンなどのようなアミン窒素化合物類、
べ/ゼンスルホン酸、了−Fルエンスルホン酸、2.7
−ナツメレンジスルホン酸すFリクムのようなベン(ン
スルホン酸塩誘導体、2−メルカプトベンズチアゾール
、ニーメルカプトベンズイミダゾールのようなイオウ含
有複素環状化合物、界面活性1?4、更KI1% ビス
マス、アンチモン、セレン、テルルのよ5な金属化合物
等が知らnているが、こnらは単独添加し1′I−もの
も複合添加したものも半5を沢乃至は無光沢状のめっき
となシやす(、を九光沢があっても使用可能な電[密度
範囲が狭いなどの問題点が多く、工業的に使用すること
は困難であった。
Conventional brighteners used in the copper-tin alloy polishing bath, which mainly consists of alkali stannate, include organic acids such as tartaric acid, citric acid, and licylic acid, ethylene glycol, phenol, and stannic acid. naphthol, hyde gastric quinone, 8
- alcohols such as hydrochloride, phenols, amine nitrogen compounds such as ethylenetriamine, pyridine, quinoline, sylethanol, etc.;
Be/zenesulfonic acid, Ryo-F luenesulfonic acid, 2.7
- sulfur-containing heterocyclic compounds such as sulfonate derivatives, 2-mercaptobenzthiazole, niemercaptobenzimidazole, surface activity 1-4, KI 1%, bismuth, antimony, Five-dimensional metal compounds such as selenium and tellurium are known, but these can be added alone, added in combination, or added in combination. (Even if it was shiny, there were many problems such as a narrow range of usable electric density, making it difficult to use it industrially.

本発明は上記のような問題点を改善する為数々の実験と
研究を行なって亀た結果t−もとに、光沢のある良好な
銅−スズ合金めつき浴を特徴とする特殊な光沢剤を含む
實化鋼−スズ酸アルカリ系銅−スズ合金めり1浴【提供
すること上目的とするものである。
The present invention is based on the results of numerous experiments and studies in order to improve the above-mentioned problems.The present invention is based on a special brightening agent characterized by a copper-tin alloy plating bath with good gloss. It is an object of the present invention to provide a steel-stannic acid alkali-based copper-tin alloy milling bath.

本発1jIFi青化銅−スズ酸アルカリ系鋼−スズ合金
゛応つき浴においてチオシアン酸塩とポリエチレンイミ
ンあるいはその誘導体及び鉛塩を添加したこと’t%黴
とするものである。
The present invention is a 1j IFi copper cyanide-alkaline stannate steel-tin alloy which contains thiocyanate, polyethyleneimine or its derivatives, and lead salts in a reaction bath to reduce moldiness.

ここにいうチオシアン酸塩とは、青化銅−スズ酸アルカ
リ系鋼−スズ合金めっき浴に可溶のものであnばよ(、
特にチオシアン酸ナトリクムであることが好ましい。こ
のチオシアン酸塩を単独で使用した場合でも一応光沢効
果があるが、使用可能な電流密度範囲が狭いなどの問題
点が残る。しかし、ポリエチレンイミンあるいはその誘
導体及び鉛塩を併用することによ)使用可能な電流密度
範囲が著しく拡大するものであることを本発明はハルセ
ル試験を繰返して光沢状態゛などを観察し、膨大な添加
剤の光沢効果を検討した結果到達したものである。
The thiocyanate mentioned here is one that is soluble in a copper cyanide-alkaline stannate steel-tin alloy plating bath.
Particularly preferred is sodium thiocyanate. Even when this thiocyanate is used alone, there is a certain gloss effect, but there remain problems such as a narrow usable current density range. However, by using polyethyleneimine or its derivatives and lead salts in combination, the usable current density range is significantly expanded.The present invention has repeatedly conducted Hull cell tests and observed the gloss state, and has found that a vast amount of This was reached as a result of studying the gloss effect of additives.

ポリエチレンイミンは完全な線状高分子重合体ではな(
、Ml 、第2.第3級丁ミノ窒素を含む枝分かれ構造
tvしており、第1.2.3各級の窒素原子の比は大略
1:2:1なる分子形態であることは良く知らnている
。それ故、1級ア電ン化合物と同様に反応性に富み、オ
キシアルキル化ポリエチレンイミンなど種々の誘導体が
容易に得られる。
Polyethyleneimine is not a completely linear polymer (
, Ml, 2nd. It is well known that it has a branched structure containing tertiary nitrogen, and that the molecular form is such that the ratio of nitrogen atoms of each class 1, 2, and 3 is approximately 1:2:1. Therefore, like primary adenone compounds, it is highly reactive, and various derivatives such as oxyalkylated polyethyleneimine can be easily obtained.

鉛塩としては、實化鋼−スズ酸アルカリ系銅−スズ合金
めっき浴に可溶のものでTotLばよ(酢酸鉛、硫酸鉛
、硝酸鉛、クエン酸鉛などの無機酸塩及ヒフエノールス
ルホン酸鉛、アルカノールスルホンa鉛などのような1
機酸塩などが用いらnる本発明の浴へのチオシアン酸塩
の添加量としては、10−〇 〇 11/lであること
が好ましい、l0JI/を以下であると光沢効果があら
れれないし、また6 0 II/lt超えると高、低電
流密度部分よシ(も夛【生ずる。最も好ましくは25〜
559/lであることがよい。
Lead salts include those soluble in the steel-alkaline stannate copper-tin alloy plating bath (inorganic acid salts such as lead acetate, lead sulfate, lead nitrate, lead citrate, and hyphenolsulfone). 1 such as acid lead, alkanol sulfone a lead, etc.
The amount of thiocyanate added to the bath of the present invention in which thiocyanate is used is preferably 10-11/l; if it is less than 10JI/l, the gloss effect cannot be obtained. , and if it exceeds 60 II/lt, the high and low current density parts will be damaged. Most preferably, the
It is preferably 559/l.

ポリエチレンイミンあるいはその誘導体は青化銅−スズ
酸アルカリ系銅−スズ合金めっき浴に可溶のもので62
’Lばよ(、その添加量としては0゜03〜0.61/
lである。0.03#/を未満であると光沢効果があら
れ肚ないし、また0、611/l’に超凡ても光沢効果
の増大は望めない、最も好ましい添加量としては0.0
4〜o、stt/lである。
Polyethyleneimine or its derivatives are soluble in copper bronze-alkaline stannate copper-tin alloy plating baths62
'Lbayo (, the amount added is 0°03~0.61/
It is l. If the amount is less than 0.03#/l, the gloss effect is unbearable, and even if it exceeds 0.611/l', no increase in the gloss effect can be expected.The most preferable addition amount is 0.0
4-o, stt/l.

鉛塩の添加量としては酢酸鉛、硝酸鉛、(iIw&鉛、
クエン酸鉛などの無機酸塩は鉛塩として1〜12t4 
/ A テIる。フェノールスルホン酸鉛、アルカノー
ルスルホン酸鉛などの有機酸塩は鉛塩として1〜10 
ndl / tである。添加範囲以下だと効果があられ
れないし、また添加範囲以上だとめつき析出不良となる
。最も好ましい添2Kl童としては、無機酸塩が3〜1
0 vyi# / tでおる。有機酸塩は2〜8−/L
であることが好ましい。
The amount of lead salt added is lead acetate, lead nitrate, (iIw & lead,
Inorganic acid salts such as lead citrate are 1 to 12t4 as lead salts.
/ A teIru. Organic acid salts such as lead phenolsulfonate and lead alkanolsulfonate are 1 to 10 as lead salts.
ndl/t. If it is below the addition range, the effect will not be achieved, and if it is above the addition range, it will cause sticking and poor precipitation. The most preferred additive is 3 to 1 inorganic acid salts.
0 vyi # / t. Organic acid salts are 2-8-/L
It is preferable that

本発明による青化銅−スズ酸丁ルカリ系鋼−スズ合金め
っき浴でのめつき操作条件は、浴温45〜65C程度で
あるのがよい、陽極としては不溶性陽極が望ましく空気
攪拌を用いればより効果がある。
The plating operation conditions for the copper bronze-stannate-based steel-tin alloy plating bath according to the present invention are preferably a bath temperature of about 45 to 65C, and an insoluble anode is preferably used as the anode, and air stirring is used. It's more effective.

以下実施例によシ本発明をさらに詳細に説明する。The present invention will be explained in more detail with reference to Examples below.

実施例−1 スズ酸ナトリウム       1 o o tt/を
青化ナト、リウム        2B、5II/を實
化鋼           11,5JF/A水酸化す
)リウム        xoti7tチオシアン酸ナ
トリウム     4011/lボ9エチレンイ電ン<
”srs水溶液)0.2sL/L 酢酸鉛(鉛塩としてン        5−/を上記の
ようにめり1浴ta製し、浴温60℃、Pil13.5
.陽極としてカーボン板を用いて空気攪拌を行なうと、
銀白色の光沢めっきが0.5〜4ム/d−の電流密度範
囲に得らnた。
Example-1 Sodium stannate 1 o o tt/ to blue sodium chloride, lium 2B, 5II/ to ferrochlorinated steel 11,5JF/A hydroxide) lithium xoti7t sodium thiocyanate 4011/l bo9 ethylene ion<
"srs aqueous solution) 0.2 sL/L lead acetate (as lead salt) was prepared in one bath as described above, bath temperature 60℃, Pil 13.5
.. When air agitation is performed using a carbon plate as an anode,
A silvery white bright plating was obtained at a current density range of 0.5 to 4 μm/d.

実施f%−2 スズ酸ナシリウム        201/L青化ナト
リウム         2511/L育化鋼    
         201/を水酸化ナトリウム   
     101/lポリエチレンイζン(31溶1’
l[)0.3惧t7t フェノールスルホン酸鉛(鉛塩として〕411IJ/を 上記のようにめっき浴を調製し、浴温45℃、1)HI
3゜5、陽也としてカーボン板を用い空気攪拌でめつ1
iiを行なうと、黄金色の光沢めっきが0−5〜3−5
 A / dth嘗ノ11IcfIL密度範囲に得られ
た。
Implementation f%-2 Nasylium stannate 201/L Sodium cyanide 2511/L Growth steel
201/ Sodium hydroxide
101/l polyethylene ζ ion (31 mol 1'
l[) 0.3 t7t Lead phenolsulfonate (as lead salt) 411 IJ/ was prepared in a plating bath as described above, the bath temperature was 45°C, 1) HI
3゜5, Metsu 1 with air agitation using a carbon plate as Yoya
When performing ii, the golden glossy plating will be 0-5 to 3-5.
A/dth was obtained in the IcfIL density range of 11.

以上述べてきたように本発明によれば光沢電流密度範回
が広く長期安定性にすぐnlまた均一な光沢が得らオL
る。工業的にも利用しうるものである。
As described above, according to the present invention, it is possible to obtain a wide gloss current density range, long-term stability, and uniform gloss.
Ru. It can also be used industrially.

なお本発明は、種々の浴において実施できることはもち
ろんのこと、光沢剤についても本発明の範囲内において
適宜組合せて使用できることはいうまでもない。
It goes without saying that the present invention can be carried out in various baths, and that brighteners can also be used in appropriate combinations within the scope of the present invention.

以上that's all

Claims (1)

【特許請求の範囲】[Claims] 實化鋼−スズ酸アルカリ系鋼−スズ合金めっき浴Ksi
−いて、チオシアン酸塩とポリエチレンイミンあるいは
その紡導体シよび鉛塩を添加したことを特徴とする銅−
スズ合金めつ亀浴。
Realized steel - Alkaline stannate steel - Tin alloy plating bath Ksi
- Copper characterized by adding thiocyanate, polyethyleneimine or its spinneret, and lead salt -
Tin alloy turtle bath.
JP15176181A 1981-09-25 1981-09-25 Copper-tin alloy plating bath Pending JPS5855587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15176181A JPS5855587A (en) 1981-09-25 1981-09-25 Copper-tin alloy plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15176181A JPS5855587A (en) 1981-09-25 1981-09-25 Copper-tin alloy plating bath

Publications (1)

Publication Number Publication Date
JPS5855587A true JPS5855587A (en) 1983-04-01

Family

ID=15525713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15176181A Pending JPS5855587A (en) 1981-09-25 1981-09-25 Copper-tin alloy plating bath

Country Status (1)

Country Link
JP (1) JPS5855587A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02107795A (en) * 1988-10-14 1990-04-19 Tohoku Ricoh Co Ltd Copper-tin alloy plating bath
US5614327A (en) * 1994-09-09 1997-03-25 Sarthoise De Revetements Electrolytiques Process for protecting a silver or silver-coated part
EP1197587A2 (en) * 2000-10-13 2002-04-17 Shipley Co. L.L.C. Seed layer repair and electroplating bath
EP1260614A1 (en) * 2001-05-24 2002-11-27 Shipley Co. L.L.C. Tin plating
EP1479793A2 (en) * 2003-05-23 2004-11-24 Rohm and Haas Electronic Materials, L.L.C. Plating method

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02107795A (en) * 1988-10-14 1990-04-19 Tohoku Ricoh Co Ltd Copper-tin alloy plating bath
JPH0413434B2 (en) * 1988-10-14 1992-03-09 Tohoku Riko Kk
US5614327A (en) * 1994-09-09 1997-03-25 Sarthoise De Revetements Electrolytiques Process for protecting a silver or silver-coated part
EP1197587A2 (en) * 2000-10-13 2002-04-17 Shipley Co. L.L.C. Seed layer repair and electroplating bath
EP1197587A3 (en) * 2000-10-13 2002-05-15 Shipley Co. L.L.C. Seed layer repair and electroplating bath
US6682642B2 (en) 2000-10-13 2004-01-27 Shipley Company, L.L.C. Seed repair and electroplating bath
EP1260614A1 (en) * 2001-05-24 2002-11-27 Shipley Co. L.L.C. Tin plating
US6797142B2 (en) 2001-05-24 2004-09-28 Shipley Company, L.L.C. Tin plating
CN1296521C (en) * 2001-05-24 2007-01-24 希普列公司 Composition and method for tinplating
JP2009114548A (en) * 2001-05-24 2009-05-28 Rohm & Haas Electronic Materials Llc Tin plating
EP1479793A2 (en) * 2003-05-23 2004-11-24 Rohm and Haas Electronic Materials, L.L.C. Plating method
EP1479793A3 (en) * 2003-05-23 2008-02-13 Rohm and Haas Electronic Materials, L.L.C. Plating method

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