JPS5845625A - Manufacture for magnetic recording medium - Google Patents

Abstract

PURPOSE:To obtain a vapor-deposited metal magnetic thin film type magnetic recording medium with homogeneous quality and excellent corrosion resistance, by jetting a gas containing oxygen from a mask for incident angle restriction facing vapor flow, at the vapor deposition of ferromagnetic substance. CONSTITUTION:A substrate 1 made of a high-polymer molding is carried along a rotary can 4 from a delivery shaft 10 to a winding shaft 11 in a vacuum tank 5, and a volatile and magnetic substance 2 from an evaporation vessel 3 is vapor-deposited by limiting an incident angle with a mask 8. During the vapor deposition, a gas containing oxygen is jetted from a nozzle with a small hole provided at a side 20 of the mask 8 facing the vapor flow. Thus, a magnetic recording medium with uniform performance in the broadwise and lengthwise directions can be obtained.

Description

【発明の詳細な説明】 本発明は、強磁性層が春着薄膜である磁気記録媒体の製
造方法に関し、抗磁力の制御を幅方向に均一化するとと
もに長手方向にも均一化する技術の提供を目的とするも
のである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a magnetic recording medium in which the ferromagnetic layer is a spring-coated thin film, and provides a technique for uniformizing the control of coercive force in the width direction as well as in the longitudinal direction. The purpose is to

更に具体的には、真空雰囲気の制御により高抗磁力を達
成する技術の改良であって、外部より。More specifically, it is an improvement in the technology of achieving high coercive force by controlling the vacuum atmosphere, from the outside.

強制的にガスを導入する方法の改良に関するものである
。This invention relates to an improvement in the method of forcibly introducing gas.

更に本発明は強磁性層を構成する元素の酸化物により保
護効果全改善した媒体を得るに適した方法の提供を目指
すものでもある。Furthermore, the present invention aims to provide a method suitable for obtaining a medium in which the protective effect is completely improved by using the oxide of the element constituting the ferromagnetic layer.

磁気記録に於て、短波長記録に５強磁性金属薄膜を磁気
記録層として用いることの有用性は１９６゜年代の後半
より実験的に確認され、良く知られるところである。In magnetic recording, the usefulness of using a ferromagnetic metal thin film as a magnetic recording layer for short wavelength recording has been experimentally confirmed since the latter half of the 1960s and is well known.

しかしかかる媒体を実用レベルで利用する時の問題は、
抗磁力を中心とした磁気特性の生産性を配慮した領域で
の制御と、得られる媒体の腐食、摩耗に対する耐性の改
良があげられる。However, the problems when using such media on a practical level are:
These include controlling magnetic properties centered on coercive force in the area of productivity, and improving the resistance of the resulting media to corrosion and abrasion.

従来この種の問題は、湿式めっき法、蒸着法のいずれの
方法で得た強磁性膜についても共通の課題であり１抗磁
力の制御には、湿式めっき法では主としてめっき浴の化
学組成の安定化、蒸着法ではいわゆる斜方蒸着（特公昭
４１−１９３８９号公報）が主としてとられていた。Conventionally, this type of problem has been common to ferromagnetic films obtained by either wet plating or vapor deposition methods. Among the chemical and vapor deposition methods, so-called oblique vapor deposition (Japanese Patent Publication No. 19389/1989) was mainly used.

しかし両者に共通していえる欠点は、生産性が極めて低
い点にある。例えば蒸着でＣｏ１００％のの磁性層で抗
磁力８００〔○　ｅ）を実現するには入射角の制限を７
６°〜８００にする必要があり、電子ビームを集束して
突沸寸前の電力密度を投入して、蒸発速度を高めても、
０．１５　ｍの磁性層を得るには２〜３　ｍ　／　ｍ　
ｉ　ｎの基板移動速度にしかならないことから伺い知れ
る。However, the common drawback of both is that productivity is extremely low. For example, to achieve a coercive force of 800 [○ e) with a 100% Co magnetic layer by vapor deposition, the incident angle must be limited to 7
6° to 800°, and even if the electron beam is focused and a power density on the verge of bumping is applied to increase the evaporation rate,
2-3 m/m to obtain a magnetic layer of 0.15 m
This can be seen from the fact that the substrate movement speed is only equal to in.

又一方、耐蝕性、耐摩耗性の問題の解決のために従来と
られた方法の多くは強磁性層の上に更に別の保護層を設
けるものであった。On the other hand, most of the conventional methods for solving the problems of corrosion resistance and abrasion resistance involve providing another protective layer on the ferromagnetic layer.

Ｎ１−Ｗ合金（特開昭５１−４３，１１０号公報）。N1-W alloy (JP-A-51-43,110).

Ｎ１・Ｂ合金（特開昭５２−２，４０５号公報）、Ｎｉ
合金層を熱処理により硬度をあげたもの（特開昭５１−
１０２，６０６号幻９．Ｎｉ−Ｃｒ韻（特開昭５３−７
３，１０８号公報）等の合金薄膜を保護層とするもの％
酸化物、炭化物（特開昭６０−１０４，６０２号公報）
、酸化物磁性体上にｇ−Ｆｅ２０３系薄膜を保護層とし
て配したもの（特開昭５１−５９．６０６号公報）、５
ｉ−８ｔ酸化物（特開昭６２−１２７．２０３号公報）
、磁性層との間にＣｒを介しての５ｉ−３ｉ酸化物（特
開昭６２−１２７，２０４号公報）、窒化ケイ素化合物
（特開昭５５−７３．９３１えは飽和脂肪酸の単分子層
（特開昭５０−７，５００号公報）、滑性液体層中に酸
化防止剤を含有させたもの（特開昭５１−２０，８０５
号公報）等が提案されている。N1・B alloy (JP-A-52-2,405), Ni
The hardness of the alloy layer is increased by heat treatment (JP-A-51-
No. 102,606 Phantom 9. Ni-Cr rhyme (JP-A-53-7
3,108 Publication) etc. with alloy thin film as a protective layer%
Oxides, carbides (Japanese Unexamined Patent Publication No. 104,602/1982)
, a g-Fe203 thin film disposed as a protective layer on an oxide magnetic material (Japanese Unexamined Patent Publication No. 51-59.606), 5
i-8t oxide (JP-A-62-127.203)
, 5i-3i oxide (JP-A-62-127-204), silicon nitride compound (JP-A-55-73-931, monomolecular layer of saturated fatty acid) with Cr interposed between the magnetic layer. (Japanese Unexamined Patent Publication No. 50-7,500), a lubricating liquid layer containing an antioxidant (Japanese Unexamined Patent Publication No. 51-20,805)
Publication No.) etc. have been proposed.

これらの技術も記録波長が数μｍの間は有効なものの、
１７１ｍ以下の記録波長になると、スペーシングロスの
制約から、これらの保趙層は極めて薄く仕上げることが
要求されることから保護効果が急激に失われてくる。Although these techniques are effective for recording wavelengths of several μm,
At a recording wavelength of 171 m or less, these protection layers are required to be made extremely thin due to spacing loss constraints, and therefore their protective effect is rapidly lost.

即ち５ｏ八へ１００八程度の前記層の厚みでは耐蝕性と
耐摩耗性の両者に優れた改善を与えにくく、このことは
、相対速度３　ｍ　／　Ｓｅｃ　−５ｍ／　ｓ　ｅｃと
いう高速で回転するヘッドとの摺動に於て、より深酷化
しているのである。In other words, it is difficult to provide excellent improvement in both corrosion resistance and wear resistance with a layer thickness of about 508 to 1008, and this means that a head rotating at a high relative speed of 3 m/sec -5 m/sec The situation is becoming more and more severe.

これらは強磁性層と保護層とが異なる材質である点と１
強磁性層の形成と独立の工程により保軸膜の形成を行っ
ていることに改善すべき問題点を有している。These include the fact that the ferromagnetic layer and the protective layer are made of different materials.
The fact that the axis-holding film is formed in a process independent of the formation of the ferromagnetic layer has a problem that should be improved.

の受けるダメージは、目視かん察上何の変化もみられな
くても、前記したように、高速回転するヘッドに当接し
た時、保護層のはくりを引き起すことが多く、この事実
は異なる物質量の界面の破壊を示しており改善が望まれ
るのである。As mentioned above, even if no change is seen visually, the protective layer often peels off when it comes into contact with a high-speed rotating head, and this fact indicates that different materials This indicates the destruction of the interface, and improvement is desired.

本発明は、前記した２点に主として考察を加え改良実験
を重ねた結果なされたもので２強磁性層そのものの酸化
物層を表面に形成する方法によるものである。The present invention was achieved by mainly considering the above two points and conducting repeated improvement experiments, and is based on a method of forming an oxide layer of the two ferromagnetic layers themselves on the surface.

この方法は、付加的な物質を使用しないことから安定性
、信頼性の面で後述する利点を有している０ なお本発明でいう蒸着には、真空蒸着、イオンブレーテ
ィング等を含むものである。This method has advantages in terms of stability and reliability, which will be described later, since no additional substances are used. Note that the term evaporation as used in the present invention includes vacuum evaporation, ion blating, and the like.

磁気テープの通常の製造工程は、５０ｃｍ以上の広幅の
基材上に連続して磁性層を形成してから所定の幅寸法に
スリットするのであるから、本発明の別の目的は５幅方
向、長手方向に酸化層の厚み質の制御を均一たらしめる
方法の提供にあることも前述の通りである。The normal manufacturing process for magnetic tape is to continuously form a magnetic layer on a wide base material of 50 cm or more and then slit it into a predetermined width dimension. Therefore, another object of the present invention is to form a magnetic layer in the 5 width directions, As mentioned above, the object of the present invention is to provide a method for uniformly controlling the thickness of an oxide layer in the longitudinal direction.

第１図は本発明を実施するための蒸着装置の一例を示す
。FIG. 1 shows an example of a vapor deposition apparatus for carrying out the present invention.

なお図においては上家６．下室７の二室分離形の捲き取
り式蒸着機と類似の構成例を示しであるが、これによら
ずとも後述の要件を満たす別の装置によっても実施でき
るのは勿論である。In addition, in the figure, upper house 6. Although an example of a configuration similar to that of a scroll-type vapor deposition machine with two separate lower chambers 7 is shown, it is needless to say that the present invention can be implemented with another apparatus that satisfies the requirements described later.

図に示すように、高分子成形物からなる基板１は真空容
器５内において送り送し軸１ｏより、捲き取り軸１１へ
移動する途中で、冷却用支持体に沿った状態で蒸着され
る。図では回転キャン４が支持と冷却の作用を行ってい
る。これに代るもので、エンドレスの例えば５ＵＳ３０
４のｏ、ｅｔを電子ビーム溶接して得られるような回転
ベルトに沿わせることも可能であＬ本発明に含まれる。As shown in the figure, a substrate 1 made of a polymer molded product is vapor-deposited along a cooling support while being moved from a feeding shaft 1o to a winding shaft 11 in a vacuum container 5. In the figure, the rotary can 4 performs support and cooling functions. An alternative to this is Endless, for example 5US30
It is also possible to run the parts 4 and 4 along a rotating belt such as that obtained by electron beam welding, and this is included in the present invention.

蒸発源は蒸発源容器３と蒸発材＊４２で模式的に示した
が、加熱は、誘導加熱、レーザビーム加熱。The evaporation source is schematically shown as an evaporation source container 3 and an evaporation material *42, and the heating is induction heating or laser beam heating.

抵抗加熱等があるが、電子ビーム加熱が最も適している
。蒸発材料は電子ビーム衝撃により加熱気化し、基板１
へ差し向けられる。基板１は矢印Ａ々に入射角が小さく
なり、磁性体の種類により必要な抗磁力、角形比の選択
を行い決定される入射角で蒸着が終るよう仕組まれる。There are resistance heating methods, but electron beam heating is the most suitable. The evaporation material is heated and vaporized by electron beam impact, and the substrate 1
be sent to. The substrate 1 is designed so that the incident angle decreases in the direction of the arrows A, and the deposition ends at the incident angle determined by selecting the necessary coercive force and squareness ratio depending on the type of magnetic material.

８はそのためのマスクである。９は仕切板である上室６
．下室７は夫々独立した排気系１２と１３で排気される
。8 is a mask for that purpose. 9 is the upper chamber 6 which is a partition plate
．． The lower chamber 7 is exhausted by independent exhaust systems 12 and 13, respectively.

上室６には必要に応じてグロー処理を施すためのグロー
処理装置を配することもできるが２図では略しである。A glow treatment device for performing glow treatment may be provided in the upper chamber 6 if necessary, but it is omitted in FIG.

さて本発明のポイントは、下室７へのガス導入にある。Now, the point of the present invention lies in the introduction of gas into the lower chamber 7.

それはマスク８の側面に設けられたノズル２０により達
成される。即ち１基板１０幅方向に対して、均一に特性
が得られるように工夫すべきであるのは勿論である。This is achieved by a nozzle 20 provided on the side of the mask 8. That is, it goes without saying that measures should be taken to obtain uniform characteristics in the width direction of one substrate 10.

第２図にマスクを示すように、マスクは背面１４と前面
１６とｇ４１ｊ面１７と図示せぬ２つの側面とＢＩＩＩ
　１ｌｆｌより構成されるジャケット構造となし、背面
１４には例えば銅パイプ１９をろう接して冷却水Ｗを流
し、過熱を防止する。ガス導入パイグ１８よりガスＧが
導入され、Ｂ側面！℃にあけられた小孔群１５より噴射
する。As shown in FIG. 2, the mask has a back surface 14, a front surface 16, a g41j surface 17, two side surfaces (not shown), and a BIII
It has a jacket structure composed of 1lfl, and a copper pipe 19, for example, is soldered to the back surface 14 to flow cooling water W to prevent overheating. Gas G is introduced from gas introduction pipe 18, B side! It is injected from a group of small holes 15 drilled at ℃.

ジャケット内部はガスが小孔群１５より均一に噴射され
るよう適宜仕切板を入れるなり、ジャケット形状を流体
力学的に最適化することで１本発明の効果はさらに発揮
される。The effects of the present invention can be further exhibited by inserting appropriate partition plates inside the jacket so that the gas is uniformly injected through the small hole group 15, and by optimizing the jacket shape from a hydrodynamic perspective.

ガス導入に関して行われる制御について、公知技術によ
り充分幅方向、長手方向の性能の均一化（実施例１〜３
の共通条件） 回転キャン直径１　ｍ　、幅６５ｃｍ。With regard to the control performed regarding gas introduction, performance was sufficiently uniformized in the width direction and longitudinal direction using known techniques (Examples 1 to 3).
Common conditions) Rotating can diameter 1 m, width 65 cm.

基板フィルム幅５０ｃｍ０ 離をρ　とするとβ。−２８Ｃｍ　、ρ１＝４５ｃｍ０
８面の小孔群１６は１′Ｂの孔を４　Ｃ１ｎ間隔に幅方
向に１７個配設した。If ρ is the substrate film width of 50 cm0, then β. -28Cm, ρ1=45cm0
In the small hole group 16 on eight sides, 17 1'B holes were arranged in the width direction at intervals of 4 C1n.

（実施例４〜５の共通条件） 実施例１〜３と異なりρ。＝　３１　ｃｍ　、君、　＝
３５ｃｍとし、１１φの孔を２Ｃｍ間隔に幅方向に３３
ケ配役した。他の条件は実施例１〜３と同じである。(Common conditions for Examples 4 and 5) Unlike Examples 1 and 3, ρ. = 31 cm, you, =
35cm, with 11φ holes spaced 2cm apart in the width direction.
He was cast. Other conditions are the same as in Examples 1-3.

〔実施例１〕 ポリエチレンテレフタレート１０．５μｍ　ｆ　２５　
ｍ／ｍｊｎの速度で捲き取りなからＣｏ１００係を電子
ビーム加熱により蒸発させ、酸素を圧力１．ｔｓＫｇ／
ｃｎｆ　″′ｃＯ−０３６１１／ｍ１ｎ導入し、０．１
５μｍ厚の磁性層を形成した。回転キャンの温度は循環
冷媒を−３０に保持して制御したつ 得られた磁性層を幅方向１２点、長さ方向１０点サンプ
リングして、磁気特性、酸化層厚み、酸化層の質、耐蝕
性、耐摩耗性を調べたところ、抗磁力、角形化は±６チ
以内、酸化層厚みは、±８係で、酸化層の質は同じであ
った。その結果耐蝕性は例えば６００９５％ＲＨ環境下
で８週間以上例の変化もなかった。[Example 1] Polyethylene terephthalate 10.5 μm f 25
After winding up at a speed of m/mjn, Co100 is evaporated by electron beam heating, and oxygen is heated to a pressure of 1.0 m/mjn. tsKg/
cnf ″′cO-03611/m1n was introduced, 0.1
A magnetic layer with a thickness of 5 μm was formed. The temperature of the rotating can was controlled by keeping the circulating coolant at -30°C, and the resulting magnetic layer was sampled at 12 points in the width direction and 10 points in the length direction, and magnetic properties, oxide layer thickness, oxide layer quality, and corrosion resistance were measured. When the properties and abrasion resistance were examined, the coercive force and squareness were within ±6 inches, the oxide layer thickness was within ±8 degrees, and the quality of the oxide layer was the same. As a result, there was no change in corrosion resistance for more than 8 weeks under a 60095% RH environment, for example.

〔実施例２〕 ポリエチレンテレフタレート１２．５μｍｆ　３０ｍ／
ｍｊｎで捲きとりながらＣ０８５％Ｎｉ１５％を電子ビ
ーム加熱により蒸発させ、酸素を圧力２に７／Ｃｒｌで
０　、０３１２　／ｍｉ　ｎ　導入し、０．１３μｍ厚
の磁性０ 層を形成した回転キャンの循環冷媒幅度は○Ｃとした。[Example 2] Polyethylene terephthalate 12.5μmf 30m/
C085%Ni15% was evaporated by electron beam heating while being rolled up by mjn, and oxygen was introduced at a pressure of 2 and 7/Crl at a rate of 0,0312/min to form a magnetic 0 layer with a thickness of 0.13 μm.The circulation of a rotating can. The refrigerant width was set to ○C.

実施例１と同じサンプリングをして調べた結果、磁性層
の抗磁力、角形比は±５％以内、酸化層厚みは±７係で
、酸化層の質は同一で、耐蝕性は６゜Ｃ９５％ＲＨで９
週間以−４二例の変化もなかった。As a result of the investigation using the same sampling as in Example 1, the coercive force and squareness ratio of the magnetic layer were within ±5%, the oxide layer thickness was within ±7%, the quality of the oxide layer was the same, and the corrosion resistance was 6°C95. 9 at %RH
There were no changes in the -42 cases since the week.

〔実施例３〕 ポリイミドフィルム２５μｍ上に３０ｍ　／　ｍ　ｉ　
ｎで酸素ｆ　０　、１４２　／ｍｉｎ　（圧力１　Ｋｇ
　／　ｃｉ　）導入しながら０．２μｍの厚さに形成し
た００７５％Ｎ１２５係からなる磁性層の抗磁カフｊ′
Ｐｋ角形比の安定性は±６％、酸化層厚みは±６係で酸
化層の質は同じであった。[Example 3] 30 m/mi on 25 μm polyimide film
n and oxygen f 0 , 142/min (pressure 1 Kg
/ci) Antimagnetic cuff j' of a magnetic layer made of 0075% N125 formed to a thickness of 0.2 μm while introducing
The stability of the Pk squareness ratio was ±6%, the thickness of the oxide layer was ±6%, and the quality of the oxide layer was the same.

その結果耐蝕性は６０Ｃ９５％ＲＨで９週間以上例の変
化もなかった。As a result, the corrosion resistance was 60C, 95% RH, and showed no change for over 9 weeks.

実施例１〜３において磁性層が形成された記録媒体ｆｆ
：３／’′／　　幅のテープとし１あらかじめλ−０，
８１１の記録を行い、１００”ずつリールに巻き込んで
、夫々前記環境下に放置したのち、６週間、１２週間径
過の時点で再生を行ったが、目づまり、ドロノプアウト
の増加はなく、耐摩耗性も極めて安定していた。Recording medium ff in which a magnetic layer was formed in Examples 1 to 3
:3/''/ Assuming the width of the tape is 1 in advance, λ-0,
811 was recorded, wound onto a reel in 100" increments, and left in the above environment, and then played back after 6 and 12 weeks. There was no increase in clogging or dropouts, and the wear resistance was excellent. Sexuality was also extremely stable.

この系でポリエチレンテレフタレートフィルム１２７１
ｍ厚」二に、Ｃｏ８０％Ｎｉ２Ｏ％、Ｃｏ７０％Ｎｉ　
３０％　、Ｃｏ５０％Ｆｅ５０％　、Ｃｏ９５％Ｒｈ５
％、Ｃｏ９５％ｖ６％の夫々について酸素導入量を０．
０２〜０．１５Ｂ、／ｍｉｎ　の範囲で変化させて、夫
々厚さ０．０６μｍの範囲の磁性層を形成した。In this system, polyethylene terephthalate film 1271
m thickness"2, Co80%Ni2O%, Co70%Ni
30%, Co50%Fe50%, Co95%Rh5
%, Co95%v6%, the amount of oxygen introduced was 0.
The magnetic layer thickness was varied within the range of 0.02 to 0.15 B,/min to form a magnetic layer having a thickness of 0.06 μm.

夫々の磁性層の性能は実施例１〜３の場合とほぼ同一で
あった。The performance of each magnetic layer was almost the same as in Examples 1-3.

又５本発明は、回転キャンの代りに、５ＵＳ３０４の０
．６ｔのエンドレスベルト（幅６０　Ｃｍ。In addition, the present invention uses the 0 of 5 US304 instead of the rotary can.
．． 6t endless belt (width 60cm).

筒長２”）ｋ冷却用支持体として、それに沿わせて高分
子成形物基板を移動させて、磁性層を形成しても効果は
同じであった。The effect was the same even if the polymer molded substrate was moved along the cooling support to form the magnetic layer.

又、イオンブレーティングとして、高周波コイル２ター
ン、直径ｅｏｃｒ、、をキャンと蒸発源とのほぼ中間位
置に配設し、フィルム幅５０ＣｍでＣＯ，８０係Ｎｉ２
Ｏ係、　Ｃｏ　９５％Ｗ６％、００１００％について夫
々導入酸素条件０．０１５ρ／ｍｉｎ　（入射角１５°
以上）で０．１７１ｍ厚の磁性層を形成した。In addition, as ion brating, a high-frequency coil with 2 turns and a diameter of eocr was placed approximately midway between the can and the evaporation source, and a film width of 50 cm was used to produce CO, 80% Ni2
For O, Co 95%W6%, 00100%, the introduced oxygen condition was 0.015ρ/min (incidence angle 15°
(above), a magnetic layer with a thickness of 0.171 m was formed.

その時のフィルム速度は１５ｍ／ｍｉｎ、高周波電力は
１３．６６ＭＨ２で４５０Ｗであった。The film speed at that time was 15 m/min, and the high frequency power was 13.66 MH2 and 450 W.

得られた膜は全く同様の性能を有することを確かめるこ
とができた。It could be confirmed that the obtained membranes had exactly the same performance.

〔実施例４〕 ポリエチレテレフタレートフィルム９．５１１ｍ１３５
　ｍ　／　ｍｉ　ｎで捲き取りながらＣｏ９０％Ｎｉ１
０％を電子ビーム加熱により蒸発させ、酸素全圧力Ｉ　
Ｋｇ　／　ａ７で０．４１／ｍｉｎ導入し、厚さ０．１
６μｍのａ付層を形成した。得られた磁性層の磁気特性
の均一性は±４％以内、酸化層厚みは±６％で、酸化層
の質は同一で耐蝕性は６０Ｃ９５％ＲＨ環境下で１０週
間以上何の変化もみられず安定した信頼性を示した。[Example 4] Polyethylene terephthalate film 9.511 m135
Co90%Ni1 while rolling with m/min
0% is evaporated by electron beam heating, and the total oxygen pressure I
Kg / a7, introduced at 0.41/min, thickness 0.1
A layer with a thickness of 6 μm was formed. The uniformity of the magnetic properties of the obtained magnetic layer was within ±4%, the thickness of the oxide layer was ±6%, the quality of the oxide layer was the same, and the corrosion resistance showed no change for more than 10 weeks in a 60C 95% RH environment. It showed stable reliability.

〔実施例５〕 ポリアミドフィルム８μｍを２５　ｍ　／　ｍｉ　ｎで
捲き取りながら００８３％Ｎ１１７係を電子ビームで加
熱蒸発さぜ酸素ｆ　０　、１　ｊ！　／ｍｉ　ｎ　（圧
力２　、１　Ｋｇ／面を０．１Ｔｏｒｒの酸素グローに
２．６秒間露呈した（グロー条件：６００Ｖ□、７７Ａ
　）結果、磁気特性の均一性は±６．６％、そして酸化
層厚みについてのばらつきは±６．６％、酸化層の質は
同一で耐蝕性は６０′Ｃ９６％ＲＨで１７週間にわたり
変化なしで、極めて信頼性が高い膜を得られることがわ
かる。[Example 5] While rolling up a polyamide film of 8 μm at a speed of 25 m/min, 0083% N117 was heated and evaporated with an electron beam, and oxygen f 0 , 1 j! /min (pressure 2, 1 Kg/surface was exposed to 0.1 Torr oxygen glow for 2.6 seconds (glow conditions: 600V□, 77A
) As a result, the uniformity of magnetic properties was ±6.6%, and the variation in oxide layer thickness was ±6.6%, the quality of the oxide layer was the same, and the corrosion resistance remained unchanged for 17 weeks at 60'C and 96%RH. It can be seen that an extremely reliable film can be obtained.

以上の各実施例において、蒸着長さが１０００ｍ以上に
なると更に有用性が明確であり、２０００ｍについては
λ−０，８μの記録再生により、出力の安定性±０．２
ｄＢを、３０００ｍについては±０．２３ｄＢ　、４０
００ｍについては±０．２ｄＢを達成できることが確認
された。In each of the above examples, the usefulness is clearer when the deposition length is 1000 m or more, and for 2000 m, the output stability is ±0.2 by recording and reproducing at λ-0.8μ.
dB, ±0.23dB for 3000m, 40
It was confirmed that ±0.2 dB could be achieved for 00 m.

以上のように、本発明は磁性層の品質が均一で耐蝕性に
すぐれる磁気記録媒体を生産性良く得るものであり、そ
の工業的価値は極めて大である０As described above, the present invention provides a magnetic recording medium with uniform magnetic layer quality and excellent corrosion resistance with high productivity, and its industrial value is extremely large.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明を実施するだめの蒸着装置の一例な示す
図、第２図は前記装置の要部をなすマス４ りの斜視図である。 １・・・・・基板、２・・・・・・蒸発材判、４・・・
・・回転キャン、６・・・・・・真空容器、８・・・・
・マスク、１６・・・・・小孔群、１８・・・・・・ガ
ス導入パイプ。FIG. 1 is a diagram showing an example of a vapor deposition apparatus for carrying out the present invention, and FIG. 2 is a perspective view of a mass 4 constituting the main part of the apparatus. 1...Substrate, 2...Evaporation material size, 4...
...Rotating can, 6...Vacuum container, 8...
・Mask, 16... Small hole group, 18... Gas introduction pipe.

Claims (1)

【特許請求の範囲】[Claims] 冷却用支持体に沿って移動する高分子成形物基板に入射
角制限用のマスクにより入射角を制限した強磁性材料の
蒸気流を向かわせ前記基板上に強磁性層を形成するに際
し、前記マスクの前記蒸気流に面する側から少なくとも
酸素を含むガスを噴出せしめることを特徴とする磁気記
録媒体の製造方法。When forming a ferromagnetic layer on the substrate by directing a vapor flow of a ferromagnetic material with an incident angle limited by a mask for limiting the incident angle onto a polymer molded substrate moving along a cooling support, the mask A method for manufacturing a magnetic recording medium, comprising ejecting a gas containing at least oxygen from the side facing the vapor flow.