JPS583540B2 - Kankouseijiyushibanno Rokohouhou - Google Patents
Kankouseijiyushibanno RokohouhouInfo
- Publication number
- JPS583540B2 JPS583540B2 JP50021846A JP2184675A JPS583540B2 JP S583540 B2 JPS583540 B2 JP S583540B2 JP 50021846 A JP50021846 A JP 50021846A JP 2184675 A JP2184675 A JP 2184675A JP S583540 B2 JPS583540 B2 JP S583540B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- exposure
- cover film
- relief
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
【発明の詳細な説明】
本発明は感光性樹脂組成物を用いて凸版用レリーフや平
版凹版用グラビヤレリーフを製作するに当り、レリーフ
面を形成するための露光方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an exposure method for forming a relief surface when producing relief for letterpress or gravure relief for planographic intaglio using a photosensitive resin composition.
近年、新聞紙面用や各種印刷物用などのレリー一フは、
従来より使用されて来た金属版に代わって感光性樹脂を
利用した感光性樹脂版が使用されるようになってきた。In recent years, reliefs for newspapers and various printed materials have become
Photosensitive resin plates using photosensitive resin have come to be used in place of the conventionally used metal plates.
この感光性樹脂としては、例えばＡＰＲ（商品名，旭化
成工業■製） ， Ｄｙｃｒｉ １ （商品名，ＤｕＰ
ｏｎｔ社製） ， Ｔｉ Ｊｏｎ（商品名，Ｔｉｍｅ社
製），ゾンネ（商品名，関西ペイント■製）など多くの
会社で種々の特性を有するものが製造されているが、い
ずれもこの感光性樹脂にネガフイルムなどの透明画像担
体を通して光を照射して部分的に重合させるレリーフ露
光によって感光硬化させてウオツシュアウト液に対して
不溶化せしめて後、感光硬化した部分以外をウオツシュ
アウト工程で除去して感光硬化した感光性樹脂をそのま
まレリーフとするものである。Examples of this photosensitive resin include APR (trade name, manufactured by Asahi Kasei Corporation), Dycri 1 (trade name, DuP
Products with various characteristics are manufactured by many companies, such as Ti Jon (trade name, manufactured by Time Corporation), Sonne (trade name, manufactured by Kansai Paint), but all of them are based on this photosensitive resin. Light is irradiated through a transparent image carrier such as a negative film to cause partial polymerization. After photocuring by relief exposure and making it insoluble in the washout liquid, the parts other than the photocured areas are removed in a washout process. The photosensitive resin that has been photocured is used as a relief as it is.
このような感光性樹脂版は、従来使用されて来た金属版
の製版よりその製版作業を著しく短縮し得る他、金属版
腐蝕液による作業環境の不良化の改善および廃液処理の
簡易化など多多の利点を有しているが、その反面感光性
樹脂を支持する合成樹脂などの支持体と感光性樹脂との
接着面において、レリーフに形成される文字や図形など
が点状であったり、細い線状であったりするとその接着
面積は非常に小さいためにレリーフとして使用中に支持
体からその点状や細い線状の凸部などがずれたり剥離し
たりする欠点があった。Such a photosensitive resin plate can significantly shorten the plate-making process compared to the conventionally used metal plate, and has many other benefits such as improving the working environment caused by metal plate corrosive liquid and simplifying waste liquid disposal. However, on the other hand, on the adhesive surface between the photosensitive resin and the support such as synthetic resin that supports the photosensitive resin, the letters and figures formed on the relief may be dotted or thin. If it is linear, the adhesion area is very small, so there is a drawback that the dotted or thin linear protrusions may be displaced or peeled off from the support during use as a relief.
このような欠点を除去する方法として感光性樹脂を支持
する支持体に活性光線に対して透過性の良い合成樹脂フ
イルムなどを使用し、レリーフ面を形成するためのレリ
ーフ露光のみならず、支持体側からも露光を行なって支
持体との接着面側に感光性樹脂の基礎層を形成するベー
ス露光方法が近年行なわれるようになってきた。As a method to eliminate such defects, a synthetic resin film that is highly transparent to actinic rays is used as the support that supports the photosensitive resin, and in addition to relief exposure to form a relief surface, it is also possible to In recent years, a base exposure method has come into use in which a base layer of photosensitive resin is formed on the adhesive side of the support by exposing the substrate to light.
ここで言う活性光線とは感光性樹脂を重合硬化させるに
有効な波長を有する光線を言い、旭化成工業■製の感光
性樹脂ＡＰＲでは通常５，０００〜２，０００Åの波長
を有する光線である。The actinic light herein refers to a light beam having a wavelength effective for polymerizing and curing a photosensitive resin, and in the case of the photosensitive resin APR manufactured by Asahi Kasei Kogyo ■, it usually has a wavelength of 5,000 to 2,000 Å.
かかるベース露光とレリーフ露光との両露光を行なう場
合に、従来は第１図に示す如くガラス１を装着した枠２
上に透明画像担体３、カバーフイルム４、感光性樹脂５
、支持体６の順で積層し、更に支持体６上にガラス７を
載置し、両側のガラス１と７とで中間の感光性樹脂５な
どを確実に俳持した状態で上方の光源１１よりベース露
光を、また下方の光源１４よりレリーフ露光を同一の場
所で行なう方式が用いられていた。When performing both base exposure and relief exposure, conventionally, as shown in FIG.
A transparent image carrier 3, a cover film 4, and a photosensitive resin 5 are placed on top.
, support 6 are laminated in this order, and glass 7 is further placed on support 6, and the upper light source 11 is placed while the glasses 1 and 7 on both sides securely hold the photosensitive resin 5 in the middle. A method has been used in which base exposure is performed from a lower light source 14 and relief exposure from a lower light source 14 is performed at the same location.
しかしながら、このようなベース露光とレリーＶ露光と
を同一のゾーンで行なう方式では本特許出願Åが先に特
願昭４７−４４０５４号として自動製版装置の出願を行
なったような感光性樹脂版の製造を一連の装置として製
作すると、ベース露光とレリーフ露光とを同じ位置で行
なうことはその露光ゾーンにおける作業時間が長くなっ
て装置の製版能力を飛躍的には向上せしめ得ない欠点が
あった。However, such a system in which base exposure and Relay V exposure are performed in the same zone makes it difficult to produce photosensitive resin plates, such as the one for which the present patent application A previously filed an application for an automatic plate making apparatus in Japanese Patent Application No. 47-44054. When manufacturing is performed as a series of devices, performing base exposure and relief exposure at the same position increases the working time in the exposure zone, which has the disadvantage that the plate-making ability of the device cannot be dramatically improved.
また、ベース露光とレリーフ露光とを同一ゾーンで停止
した状態で行なう方式では、支持体６側から感光性樹脂
５などを確実に保持する素材はベース露光を行なわねば
ならない関係上透明で且つ剛性の大きな比較的硬い素材
でなければならないからガラス１と７とが用いられてい
たが、ベース露光は通常１０〜２０秒程度の比較的短時
間の露光であって露光量も少ないためにそれ程問題はな
いが、レリーフ露光は４０〜５０秒と比較的長時間の露
光であって露光量も多いため、感光性樹脂５の重合反応
熱も多量に発生するので製作される感光性樹脂版にシワ
やたるみが発生しないように感光性樹脂５などを押さえ
付けているガラス１や７が熱によって割れる現象がしば
しば発生する。In addition, in a method in which base exposure and relief exposure are stopped in the same zone, the material that securely holds the photosensitive resin 5 etc. from the support 6 side is transparent and rigid because the base exposure must be performed. Glasses 1 and 7 were used because the material had to be large and relatively hard, but since the base exposure is a relatively short exposure of about 10 to 20 seconds and the amount of exposure is small, it is not that much of a problem. However, since relief exposure is a relatively long exposure of 40 to 50 seconds and the amount of exposure is large, a large amount of heat from the polymerization reaction of the photosensitive resin 5 is also generated, which may cause wrinkles or wrinkles on the photosensitive resin plate produced. Glasses 1 and 7, which hold down the photosensitive resin 5 and the like to prevent sagging, often break due to heat.
更にガラス１と７との間に感光性樹脂５などを保持した
状態で感光性樹脂５に露光を行なう場合に感光性樹脂５
全面に一度に露光を行なっても透明画像担体３に照射さ
れる光が全面に亘って均一にはならないと共に、ダンボ
ール印刷の如く１５ ０ ０ ｍｍ前後の大きなレリー
フを製作する場合にはガラス１および７のサイズを大き
くせねばならずその結果ガラスの表面精度が悪くなって
製作されたレリーフの版厚精度が悪く印刷上問題となる
などの欠点があった。Furthermore, when exposing the photosensitive resin 5 with the photosensitive resin 5 held between the glasses 1 and 7, the photosensitive resin 5
Even if the entire surface is exposed at once, the light irradiated onto the transparent image carrier 3 will not be uniform over the entire surface, and when producing a large relief of around 1500 mm, such as in cardboard printing, the glass 1 and 7 had to be enlarged, and as a result, the surface precision of the glass deteriorated, resulting in poor plate thickness precision of the manufactured relief, which caused problems in printing.
本発明はかかる欠点を除去することを目的としたもので
あって、活性光線に対して透過性の良い素材より成るカ
バーフイルム上に感光性樹脂を一定厚に制御して塗布し
更に該感光性樹脂上に活性光線に対して透過性の良い素
材より成る支持体を積層し、該カバーフイルムを移動さ
せて該感光性樹脂と該支持体とを一体として移動させる
過程で、該支持体側よりベース露光を行ない次に活性光
線に対して透過性の良い素材より成り該カバーフイルム
と同速で移動するキャリャフイルムに密着させて移動さ
せて来た透明画像担体を該カバーフイルムに密着させて
透明画像担体側よりレリーフ露光を行なうことを特徴と
する感光性樹脂版の露光方法に関するものである。The present invention is aimed at eliminating such drawbacks, and involves applying a photosensitive resin to a certain thickness on a cover film made of a material that is highly transparent to actinic rays, and then applying the photosensitive resin to a certain thickness. A support made of a material that is highly transparent to actinic rays is laminated on the resin, and in the process of moving the cover film and moving the photosensitive resin and the support as one, the base is removed from the support side. After exposure, a transparent image carrier, which is made of a material that is highly transparent to actinic rays and is moved in close contact with a carrier film that moves at the same speed as the cover film, is brought into close contact with the cover film to form a transparent image carrier. The present invention relates to an exposure method for a photosensitive resin plate, characterized in that relief exposure is performed from the image carrier side.
すなわち、本発明は第２図に示す如く連続体を成し且つ
活性光線に対して透過性の良い素材より成るカバーフイ
ルム８上に感光性樹脂９を一定厚に制御して塗布し、更
にその感光性樹脂９上に活性光線に対して透過性の良い
素材より成る比較的厚牟の合成樹脂フイルムなどより成
る支持体１０を積層し、感光性樹脂９と支持体１０とを
カバーフイルム８と一体としてカバーフイルム８に一定
の張力をかけてシワが発生しない状態にしてカバーフイ
ルム８を移動せしめ、その移動過程においてカバーフイ
ルム８を移動させながらまたはカバーフイルム８の移動
を一時停止して支持体１０側より光源１１によりベース
露光を行ない、次にカバーフイルム８の移動速度と同速
度で移動する透明画像担体移動用の活性光線に対して透
過性の良い素材より成るキャリャフイルム１ ２ （
以下単ニフイルム１２と略称する）に透明画像担体１３
を密着させて透明画像担体１３をカバーフィルム８と同
速度で移動させつつ感光性樹脂９が塗布されている部分
の反対側のカバーフィルム８の面に透明画像担体１３を
密着させ、フイルム１２側すなわち透明画像担体１３側
より光源１４によってレリーフ露光を行なう方法に関す
るものである。That is, in the present invention, as shown in FIG. 2, a photosensitive resin 9 is coated to a constant thickness on a cover film 8 which forms a continuous body and is made of a material that is highly transparent to actinic rays. A support 10 made of a relatively thick synthetic resin film made of a material with good transparency to actinic rays is laminated on the photosensitive resin 9, and the photosensitive resin 9 and the support 10 are combined into a cover film 8. The cover film 8 is moved as a unit under a condition in which a certain tension is applied to the cover film 8 so that no wrinkles occur, and during the movement process, the cover film 8 is moved or the movement of the cover film 8 is temporarily stopped and the cover film 8 is moved as a support. Base exposure is performed from the light source 11 from the 10 side, and then a carrier film 1 2 ( made of a material that is transparent to actinic light for moving a transparent image carrier that moves at the same speed as the cover film 8 )
Transparent image carrier 13 (hereinafter abbreviated as single film 12)
While moving the transparent image carrier 13 at the same speed as the cover film 8, the transparent image carrier 13 is brought into close contact with the surface of the cover film 8 opposite to the part coated with the photosensitive resin 9, and That is, the present invention relates to a method of performing relief exposure using the light source 14 from the transparent image carrier 13 side.
なお、本発明方法において、光源１１および１４よりの
光をスリットを通して露光を行なう構造にすること、レ
リーフ露光を行なっている部分の反対側に圧気冷却ノズ
ル１５を設けて支持体１０に冷却用圧気を吹き付けて感
光性樹脂９が感光重合する際に生ずる反応熱を冷却する
こと、カバーフィルム８の移動方向を水平に対して傾斜
せしめることは本発明の要旨を変更するものではない。In addition, in the method of the present invention, the structure is such that the light from the light sources 11 and 14 is exposed through a slit, and the pressure air cooling nozzle 15 is provided on the opposite side of the part where the relief exposure is being performed, so that the pressure air for cooling is applied to the support 10. Cooling the reaction heat generated when the photosensitive resin 9 is photopolymerized by spraying the photosensitive resin 9 or tilting the moving direction of the cover film 8 with respect to the horizontal do not change the gist of the present invention.
かくしてベース露光とレリーフ露光とが完了すれば、フ
イルム１２に密着させて移動されて来た透明画像担体１
３をカバーフイルム８から剥離した後に、感光性樹脂９
とカバーフイルム８とを剥離して感光性樹脂９と支持体
１０とを一体とした状態で感光硬化していない感光性樹
脂９をウオツシュアウト工程で除去すればレリーフが完
了する．以上詳述した如き本発明に係る感光性樹脂版の
露光方法によれば、
１）レリーフ露光ゾーンではカバーフイルムに密着して
透明画像担体が移動する過程でのみレリーフ露光を行な
って、レリーフ露光が完了すれば透明画像担体はカバー
フイルムより引き離せばよいので、レリーフ露光ゾーン
の長さをレリーフの大きさに関係なく短かくすることが
可能となり装置を小型化することができる。When the base exposure and relief exposure are completed in this way, the transparent image carrier 1 that has been moved in close contact with the film 12
After peeling off the photosensitive resin 9 from the cover film 8
The relief is completed by peeling off the cover film 8 and removing the uncured photosensitive resin 9 in a washout step with the photosensitive resin 9 and the support 10 integrated. According to the method of exposing a photosensitive resin plate according to the present invention as detailed above, 1) relief exposure is performed only in the process of moving the transparent image carrier in close contact with the cover film in the relief exposure zone; Once completed, the transparent image carrier can be separated from the cover film, so the length of the relief exposure zone can be shortened regardless of the size of the relief, and the apparatus can be made smaller.
２）レリーフ露光ゾーンの長さを短かくするのにレリー
フ露光をスリット光源による強力な露光によって行ない
、感光性樹脂の樹脂重合による反応熱を冷却圧気によっ
て冷却すれば更にレリーフ露光ゾーンの長さを短かくす
ることができる。2) In order to shorten the length of the relief exposure zone, the length of the relief exposure zone can be further shortened by performing the relief exposure using strong exposure using a slit light source, and by cooling the reaction heat due to resin polymerization of the photosensitive resin with cooling pressure air. Can be shortened.
３）レリーフ露光ゾーンが短かくて済むため、大きなレ
リーフを高精度に行なうことができる。3) Since the relief exposure zone can be short, large reliefs can be formed with high precision.
４）従来のレリーフ露光ではレリーフ全面に均等な露光
を行なわねばならなかったが、本発明では狭い露光ゾー
ンで順次露光を行なえるので露光精度が向上する。4) In conventional relief exposure, the entire surface of the relief must be exposed uniformly, but in the present invention, exposure can be performed sequentially in a narrow exposure zone, thereby improving exposure accuracy.
５）ベース露光もカバーフィルムを移動させながら行な
うことによってベース露光ゾーンの長さも短かくするこ
とができるため、装置を小型化することができる。5) By performing base exposure while moving the cover film, the length of the base exposure zone can be shortened, so the apparatus can be downsized.
６）従来の如くカバーフィルムと感光性樹脂と支持体と
を一体に保持する枠やガラスが不要となり透明画像担体
を移動させるためのカバーフイルムと同速で移動するキ
ャリャフイルムが必要となるだけであるのでレリーフ製
作装置が小型化されると共に安価に製作できる。6) There is no need for a frame or glass to hold the cover film, photosensitive resin, and support together as in the past, and only a carrier film that moves at the same speed as the cover film to move the transparent image carrier is required. Therefore, the relief production device can be miniaturized and manufactured at low cost.
７）ベース露光およびレリーフ露光を連続して行ない得
るため感光性樹脂版を多数連続して製造する際に１ケ所
に感光性樹脂が長時間停滞しなくなるため製版能力が向
上する。7) Since base exposure and relief exposure can be performed continuously, when a large number of photosensitive resin plates are manufactured in succession, the photosensitive resin does not stay in one place for a long time, so plate making ability is improved.
８）露光を行なう際に感光性樹脂をガラスで挾持しなく
て良いから感光性樹脂の感光重合の反応熱でガラスが割
れる現象に対する配慮が不要となる。8) Since it is not necessary to hold the photosensitive resin between glasses during exposure, there is no need to take into account the phenomenon of the glass breaking due to the reaction heat of photopolymerization of the photosensitive resin.
など種々の利点があり、感光性樹脂版の連続製版におけ
る本発明の寄与する工業的価値は非常に大きなものがあ
る。There are various advantages such as, and the industrial value contributed by the present invention in continuous plate making of photosensitive resin plates is extremely large.
第１図は従来の感光性樹脂版の露光方法を示す説明図、
第２図は本発明に係る感光性樹脂版の露光方法を示す説
明図である。
（従来法）、１……ガラス、２……枠、３……透明画像
担体、４……カバーフィルム、５……感光性樹脂、６…
…支持体、７……ガラス、（本発明法）、８……カバー
フィルム、９……感光性樹脂、１０……支持体、１１…
…ベース露光光源、１２……キャリャフ・イルム、１３
……透明画像担体、１４……レリーフ露光光源、１５…
…圧気冷却ノズル。Figure 1 is an explanatory diagram showing a conventional exposure method for a photosensitive resin plate;
FIG. 2 is an explanatory diagram showing a method of exposing a photosensitive resin plate according to the present invention. (Conventional method), 1... Glass, 2... Frame, 3... Transparent image carrier, 4... Cover film, 5... Photosensitive resin, 6...
... Support, 7... Glass, (method of the present invention), 8... Cover film, 9... Photosensitive resin, 10... Support, 11...
...Base exposure light source, 12...Caryaf ilm, 13
...Transparent image carrier, 14...Relief exposure light source, 15...
...Pressure air cooling nozzle.
Claims (1)
フイルム上に感光性樹脂を一定厚に制御して塗布し更に
該感光性樹脂上に活性光線に対して透過性の良い素材よ
り成る支持体を積層し、該カバーフイルムを移動させて
該感光性樹脂と該支持体とを一体として移動させる過程
で、該支持体側よりベース露光を行ない次に活性光線に
対して透過性の良い素材より成り該カバーフイルムと同
速で移動するキャリャフイルムに密着させて移動させて
来た透明画像担体を該カバーフイルムに密着させて透明
画像担体側よりレリーフ露光を行なうことを特徴とする
感光性樹脂版の露光方法。1. A photosensitive resin is coated to a controlled thickness on a cover film made of a material that is highly transparent to actinic rays, and then a support made of a material that is highly transparent to actinic rays is coated on the photosensitive resin. In the process of laminating the photosensitive resin and the support by moving the cover film, base exposure is performed from the support side, and then the photosensitive resin is made of a material that is transparent to actinic rays. A photosensitive resin plate characterized in that a transparent image carrier that has been moved in close contact with a carrier film that moves at the same speed as the cover film is brought into close contact with the cover film, and relief exposure is performed from the transparent image carrier side. exposure method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50021846A JPS583540B2 (en) | 1975-02-24 | 1975-02-24 | Kankouseijiyushibanno Rokohouhou |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50021846A JPS583540B2 (en) | 1975-02-24 | 1975-02-24 | Kankouseijiyushibanno Rokohouhou |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5198504A JPS5198504A (en) | 1976-08-30 |
| JPS583540B2 true JPS583540B2 (en) | 1983-01-21 |
Family
ID=12066447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50021846A Expired JPS583540B2 (en) | 1975-02-24 | 1975-02-24 | Kankouseijiyushibanno Rokohouhou |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS583540B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60185953A (en) * | 1984-03-05 | 1985-09-21 | Toyobo Co Ltd | Method and device for continuous engraving of photosensitive resin plate |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS495617A (en) * | 1972-05-02 | 1974-01-18 |
-
1975
- 1975-02-24 JP JP50021846A patent/JPS583540B2/en not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS495617A (en) * | 1972-05-02 | 1974-01-18 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5198504A (en) | 1976-08-30 |
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