JPS58173161U - Low speed electron beam prevention slit - Google Patents
Low speed electron beam prevention slitInfo
- Publication number
- JPS58173161U JPS58173161U JP6993782U JP6993782U JPS58173161U JP S58173161 U JPS58173161 U JP S58173161U JP 6993782 U JP6993782 U JP 6993782U JP 6993782 U JP6993782 U JP 6993782U JP S58173161 U JPS58173161 U JP S58173161U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- speed electron
- low speed
- prevention slit
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の装置の主要部を示す図、第２図は本考案
の一実施例を示す図、第３図は第２図の一部拡大図、第
４図は第３図の作用を説明する図である。
１：対物レンズ上磁極、２：対物レンズ下磁極、３：試
料、４：ＥＤＳ、 ５：遮蔽体、６：筒状スリット、７
：内壁面、８：電気絶縁物。Fig. 1 shows the main parts of a conventional device, Fig. 2 shows an embodiment of the present invention, Fig. 3 is a partially enlarged view of Fig. 2, and Fig. 4 shows the operation of Fig. 3. FIG. 1: Objective lens upper magnetic pole, 2: Objective lens lower magnetic pole, 3: Sample, 4: EDS, 5: Shielding body, 6: Cylindrical slit, 7
: Inner wall surface, 8: Electrical insulator.
Claims (1)
をＸ線検出器により検出する装置において、前記試料と
Ｘ線検出器との間に筒状部材を設置上、該筒状部材の内
面部の少くとも一部を他部に対し電気的に絶縁し、該筒
状部材の本体部をアース電位に、又絶縁された内面部を
負の電位に保持してなる低速電子線防止スリット。 ２ 前記絶縁された内面部に負の直流電圧を印加した実
用新案登録請求の範囲第１項記載の低速゛電子線防止ス
リット。 ３ 前記絶縁された内面部は本体部分から浮いた状態に
あり、電子線の帯電により負の電位に保持される実用新
案登録請求の範囲第１項記載の低速電子線防止スリット
。[Claims for Utility Model Registration] 1. In an apparatus for projecting an electron beam onto a sample and detecting X-rays generated from the sample using an X-ray detector, a cylindrical member is provided between the sample and the X-ray detector. When installing, at least a part of the inner surface of the cylindrical member is electrically insulated from other parts, and the main body of the cylindrical member is at ground potential and the insulated inner surface is at a negative potential. A slit that prevents low-speed electron beams. 2. The low-speed electron beam prevention slit according to claim 1, wherein a negative DC voltage is applied to the insulated inner surface. 3. The low-velocity electron beam prevention slit according to claim 1, wherein the insulated inner surface is floating from the main body and is held at a negative potential by being charged by the electron beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6993782U JPS58173161U (en) | 1982-05-13 | 1982-05-13 | Low speed electron beam prevention slit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6993782U JPS58173161U (en) | 1982-05-13 | 1982-05-13 | Low speed electron beam prevention slit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58173161U true JPS58173161U (en) | 1983-11-19 |
Family
ID=30079636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6993782U Pending JPS58173161U (en) | 1982-05-13 | 1982-05-13 | Low speed electron beam prevention slit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58173161U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017094721A1 (en) * | 2015-12-03 | 2017-06-08 | 松定プレシジョン株式会社 | Charged particle beam device and scanning electron microscope |
| US10438770B2 (en) | 2015-01-30 | 2019-10-08 | Matsusada Precision, Inc. | Charged particle beam device and scanning electron microscope |
-
1982
- 1982-05-13 JP JP6993782U patent/JPS58173161U/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10438770B2 (en) | 2015-01-30 | 2019-10-08 | Matsusada Precision, Inc. | Charged particle beam device and scanning electron microscope |
| US10541106B2 (en) | 2015-01-30 | 2020-01-21 | Matsusada Precision, Inc. | Charged particle beam device and scanning electron microscope |
| WO2017094721A1 (en) * | 2015-12-03 | 2017-06-08 | 松定プレシジョン株式会社 | Charged particle beam device and scanning electron microscope |
| JPWO2017094721A1 (en) * | 2015-12-03 | 2018-05-31 | 松定プレシジョン株式会社 | Charged particle beam apparatus and scanning electron microscope |
| CN108292580A (en) * | 2015-12-03 | 2018-07-17 | 松定精度株式会社 | Charged particle line apparatus and scanning electron microscope |
| CN108292580B (en) * | 2015-12-03 | 2019-06-11 | 松定精度株式会社 | Charged particle line apparatus and scanning electron microscope |
| US10497535B2 (en) | 2015-12-03 | 2019-12-03 | Matsusada Precision, Inc. | Charged particle beam device and scanning electron microscope |
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