JPS58125866A - Color sensor - Google Patents

Color sensor

Info

Publication number
JPS58125866A
JPS58125866A JP57009198A JP919882A JPS58125866A JP S58125866 A JPS58125866 A JP S58125866A JP 57009198 A JP57009198 A JP 57009198A JP 919882 A JP919882 A JP 919882A JP S58125866 A JPS58125866 A JP S58125866A
Authority
JP
Japan
Prior art keywords
face
color
film
substrate
red
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57009198A
Other languages
Japanese (ja)
Inventor
Yukinori Kuwano
桑野 幸徳
Shoichi Nakano
中野 昭一
Masaru Takeuchi
勝 武内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP57009198A priority Critical patent/JPS58125866A/en
Priority to GB08300968A priority patent/GB2115980B/en
Priority to FR8300882A priority patent/FR2520557B1/en
Publication of JPS58125866A publication Critical patent/JPS58125866A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Receiving Elements (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Solid State Image Pick-Up Elements (AREA)

Abstract

PURPOSE:To obtain simply the color sensor having high color detecting precision when the color sensor is to be produced by a method wherein amorphous semiconductor layers are used as thin film type photosensitive elements, the layers thereof are formed on the face on one side of a glass substrate, and filters of red, green, blue to face respectively with the semiconductor layers are formed on the face on another side. CONSTITUTION:The color sensor 10 containing the first-the third thin film type photosensitive elements 12R, 12G, 12B is formed on the face on one side of the transparent substrate 11 consisting of glass or plastics, etc., of about 0.3mm. thickness. Namely, a red color filter film 13R is fixed to the element 12R, a green color filter film 13G is fixed to the element 12G, and a blue color filter film 13B is fixed to the element 12B respectively. Then laminated bodies of a first electrode film 14, a photo active layer 15, a second electrode film 16 are formed making to face with the respective elements on the face of the substrate 11 on the opposite side to the elements thereof. At this time, a tin oxide film or an indium.tin oxide film is used for the electrode film 14, while aluminum, etc., is used for the electrode film 16, and the amorphous semiconductor of about 1mum thickness is used for the photo active layer 15 respectively.

Description

【発明の詳細な説明】 本発明aア七/I/ 77ス半導体を光活性層に用いた
色センサーに関するつ 光活性−に本結晶シリコン管用いた色センサーは既に知
られている。その原理的な構成は、第1図に示す如く、
単結晶シリコン基板(113面に複数の7 g )ダイ
オード領域+21. (31、(4)を設けると共に、
これら各惜域上に異なる色アイMり、例えば赤色アイ〃
り(51、緑色アイ〃り(61及び青t!3フィル!(
7)を配し、v!にその上に赤外力ットアイVり181
を配したもので、断るセンサーにおいて、各フィルタを
介して可視光が基板(11に入射すると、入射用視光の
含む色に応じてそれが赤ならダイオード領纜t2)に、
緑ならダイオードij*  f31に、文責ならダイオ
ード@植(4)K天々信tが出力される。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a color sensor using a semiconductor as a photoactive layer.A color sensor using a crystalline silicon tube as a photoactive layer is already known. Its basic configuration is as shown in Figure 1.
Single crystal silicon substrate (multiple 7 g on 113 planes) diode region +21. (31, (4) is provided, and
On each of these regions there is a different colored eye, for example a red eye.
ri (51, green eye 〃ri (61 and blue t! 3 fill!)
7) and v! Then apply infrared power on it.181
In the sensor, when visible light enters the substrate (11) through each filter, depending on the color included in the incident visual light, if it is red, it enters the diode area t2,
If it is green, the diode ij* f31 is output, and if it is the censor, the diode @suku (4) K Tentenshin t is output.

単結晶Vリコン自体の感光度特性は第2図の曲線AK示
す卯く、赤外領域にピークを呈する。一方、赤色フィル
タ(51は赤色帯域で透i度のピークを示すものの、そ
の帯埴特性の拡がりは通常減衰しながらも赤外@域にま
ですそ野を引いている。
The photosensitivity characteristic of single crystal V recon itself is shown by curve AK in FIG. 2, and exhibits a peak in the infrared region. On the other hand, although the red filter (51) exhibits a transmittance peak in the red band, the spread of its band characteristic generally attenuates, but extends to the infrared range.

従って光活t!FIIIK拳結晶シリコンを用いた場合
、赤色アイMりを通すだけでは、フォトダイオード領域
(21は、m衰しながらも共に入射する赤外光に本結晶
シリコン自体の感光度特性に応じて強く感応してし筐い
、正確な色情報を検出できない。上記従来の色センサー
における赤外カブトアイVり(81は、この様な入射赤
外光を除去するために設けられてお如、不可欠の存在で
ある。
Therefore, light activity t! When FIIIK crystalline silicon is used, if only the red eye is passed through, the photodiode region (21) will be strongly sensitive to incident infrared light, depending on the photosensitivity characteristics of the crystalline silicon itself, although it will attenuate. However, accurate color information cannot be detected.The infrared beetle eye (81) in the conventional color sensor is provided to remove such incident infrared light. It is.

しかしながら、断る赤外カットアイにりの存在はセンサ
ーの構成を複IIKするだけでなく、製造に際して、そ
のフィルタをシリコン基板上に1畳被着する工程で脆弱
なシリコン基板を破損しやすいといった欠点をもたらす
However, the presence of the infrared cut eye glue not only complicates the configuration of the sensor, but also has the drawback of easily damaging the fragile silicon substrate during the process of attaching the filter to the silicon substrate during manufacturing. bring about.

本発明は上記の点に纜みてなされたもので、以下本発明
をwm例において説明する。
The present invention has been made in view of the above points, and the present invention will be explained below using a wm example.

vgs図に木91FJ1例としての赤、緑、青の各色に
感光する色センサー〇〇を示す。この色セン貨−帥は厚
さ0.3ml!度のガフスfプラスチックなどからなる
透光性基板0に設けられ九11g1.第2.第5の薄膜
状感光素子(12R)、(12G)、(12B)を含む
。これらの各感光素子は基板a11の1主面に設けられ
た各素子に個有の色アイ〃り膜。
The vgs diagram shows the color sensor 〇〇, which is sensitive to each color of red, green, and blue, as an example of Wood 91FJ1. This colored coin is 0.3ml thick! The gaffs f are provided on a transparent substrate made of plastic or the like. Second. It includes fifth thin-film photosensitive elements (12R), (12G), and (12B). Each of these photosensitive elements has a unique color iris film provided on one principal surface of the substrate a11.

即ち、第1感光素子(12R)にけ赤色フィルタ膜(1
3R)、IIPJ2感光素子(12G)には緑色フィル
タl1lI(15G )、第5W&光素子(12B)に
は青色74にり#(1,5B)を有している。各フィル
タ膜としてはイーストマン・コダック社製のWRATT
IIDN  GIIGLATI!:N  1?’工I、
T ERが好適であシ、赤色7(A/夕膜(1,5R)
としてはその11h25、緑色フィルタ!II(15G
 )としては凪58、 又青色74 pvl膜(15B
)としテilr&47Bの各品番のものが用いられ、こ
れらは例見はカナダパルサンなどの透明樹脂接着材によ
り基板QIIJ:に固定される。
That is, the red filter film (1
3R), the IIPJ2 photosensitive element (12G) has a green filter l1lI (15G), and the 5th W&photo element (12B) has a blue color 74 filter # (1,5B). Each filter membrane is WRATT manufactured by Eastman Kodak Company.
IIDN GIIGLATI! :N1? 'Engineering I,
T ER is preferred, red 7 (A/Evening (1,5R)
As for 11h25, green filter! II (15G
) as Nagi 58, and Blue 74 pvl membrane (15B
) and 47B are used, and these are fixed to the substrate QIIJ: using a transparent resin adhesive such as Canada Pulsan.

11g1〜第5感光素子(12R)、(12G)、(1
2B)の夫々ハ、uM板Qll O他O主面[1けられ
た第1電giSα◆、光活性層(至)及び@2電砺Sa
aの積層体を備えておシ、これら横着体は夫々の感光素
子のフィルタ膜と個別に対向している。
11g1 to fifth photosensitive element (12R), (12G), (1
2B), respectively C, uM plate Qll O and other O main surfaces [1 deviated first electric wire Sα◆, photoactive layer (to) and @2 electric wire Sa
A laminated body is provided, and these horizontally attached bodies individually face the filter films of the respective photosensitive elements.

上記vg1電ffl寝α4け酸化錫やインジウム・錫酸
化物などの透明導電物からなり、第2電極膜CJ!Jに
アA/にラムなどからなる。
The second electrode film CJ! is made of a transparent conductive material such as tin oxide or indium tin oxide. It consists of J, A/, Ram, etc.

上記光活性−05框厚さ約1μmのア七Vプアスシリコ
ン半導体で構成され、第4図にその詳細が示されている
うこれを製造方法と共により具体的に説明すると、各素
子(12R)、(12G )。
The above-mentioned photoactive -05 frame is composed of an A7V poor silicon semiconductor with a thickness of about 1 μm, and the details are shown in FIG. (12G).

(12B)の第1電極α4のみを形改済みの基板[11
1を反応室に納め、シフンガスや不純物ガスからなる雰
囲叡中でのグロー放電によシ第1電極a4上にアモルフ
ァスシリコンからなるP3111(15a )工m+層
(151))及びN型層(150)を順次堆積して光活
性層(至)が形成される。その堆II儂域はマスクの便
用によ鯉所定部分に@定し得るものである・尚グロ″″
皺電によるア七IW 7 FスVリコン14 t−Y0
11WL1iA体は特公昭53−47718号公報に開
示されて−る橡Kjl知である。
(12B) The substrate [11
1 is placed in a reaction chamber, and a P3111 layer (15a) made of amorphous silicon (m+ layer (151)) and an N-type layer ( 150) are sequentially deposited to form a photoactive layer. The second part of the mask can be placed on a designated part of the mask for convenience.
A7 IW 7 Fsu V Recon 14 t-Y0 by Wanden
The 11WL1iA body is known as disclosed in Japanese Patent Publication No. 53-47718.

上記fp3セ>t−flOVcおいて、各きアイpvp
(15R)、(1!SG)、(13B)の存在に工りこ
れらアイvp*よ〉入射する光は、それ−Bs赤色を含
む場合、赤色アイVり(15B)及び基板GIIを介し
て第1感光素子(12R)K人動、ms子内の主に1m
19(151))で自由キ◆噂γを発生せしめる。この
自由年令リアは第1.第2電極鵠。
In the above fp3>t-flOVc, each eye pvp
Due to the existence of (15R), (1!SG), and (13B), if the light incident on these eyes contains red, it passes through the red eye (15B) and the substrate GII. 1st photosensitive element (12R) K human movement, mainly 1m in the ms element
19 (151)) generates free key◆rumor γ. This free year rear is the first. Second electrode mouse.

(至)に集められ、 1iillifllK電圧が発生
する。同様圧して、入射光が緑色を含む場合、又青色を
含む場合、夫々第2感党素子(12G )、第1感光素
子(12B)において第1、第2電極(ロ)、(至)間
に電圧が発生する。よってこれらの電圧を検出すること
によ砂入射光の色検出をなすことができる。
(to), and a voltage of 1iillifllK is generated. Similarly, when the incident light contains green color or blue color, the distance between the first and second electrodes (b) and (to) in the second photosensitive element (12G) and the first photosensitive element (12B), respectively. A voltage is generated. Therefore, by detecting these voltages, the color of the light incident on the sand can be detected.

1セルファス半導体の感光度特性は@2図の曲jlBに
示す如く、はとんど可視光領域に納する帯域を有してい
る。このため1本賽施例色センナーーでは、たとえ赤色
アイMり(15R)を通して赤外光が入ったとしても、
それハホとんど検出されず、従って従来必要としていた
赤外カットアイVターを用いろことなく正確な色情報を
検出することができる。又、本実施例色センサー(2)
Kありては、各色アイνり(15R)、(15G)、(
15B)は光活性層(2)とけ反対−の基板表面に取着
されるので、その取WW&に光活性@(至)を傷めるこ
ともない。
1. The photosensitivity characteristics of the Cellphas semiconductor have a band that mostly falls within the visible light region, as shown by curve jlB in Figure @2. For this reason, with a single color sensor, even if infrared light enters through the red eye M (15R),
Most of the colors are not detected, so accurate color information can be detected without using an infrared cut-eye, which was conventionally required. In addition, this example color sensor (2)
For K, each color eye is (15R), (15G), (
15B) is attached to the surface of the substrate opposite to the photoactive layer (2), so its attachment does not damage the photoactivity.

本発明実施例にこの様な優れた色センサ″−(13にお
いて、その色検出精度をより高めんとするものた点に特
徴を有する。第411光素子(12W)は他の素子と同
様の構成にして同様の方法で基板0に設けられるが、&
板Iの他の主面に対向して色アイyりを有していない点
で他の素子と異なっている。
Embodiments of the present invention are characterized in that they are designed to further enhance the color detection accuracy of such an excellent color sensor (13).The 411th optical element (12W) is similar to the other elements. The configuration is provided on substrate 0 in a similar manner, but &
This element differs from other elements in that it does not have a colored eyelid facing the other main surface of the plate I.

@4の感光素子(12W)は他の素子め出力の−正のた
めに使用され、その使用例を!!5図に示す。同図にて
第1.第2、第5の各感光素子(12R)、(12G)
、(12B)から出た出力は対応する増幅器<50R)
、(50G)、(50B)を経て最大値検出器61に入
る。最大値検出器611社比較器の集1りからなる周知
のw4成であり、各増幅器<5OR)、C30G)、(
50B)の出力の中から最も出力レベルの大きいものを
見つけ、それが赤に対応する場合、綴(52R)K。
The photosensitive element (12W) @4 is used for the -positive output of other elements. Here is an example of its use! ! It is shown in Figure 5. In the same figure, 1. Second and fifth photosensitive elements (12R), (12G)
, (12B) is output from the corresponding amplifier <50R)
, (50G), and (50B) and enters the maximum value detector 61. It is a well-known w4 configuration consisting of a collection of maximum value detectors and 611 comparators, each amplifier <5OR), C30G), (
Find the one with the highest output level among the outputs of 50B), and if it corresponds to red, Tsuzuki (52R)K.

緑に対応する場合、II(32G)に、文責に対応する
場合、Jil!(32B)に夫々出力を出す。このま\
では、@えは赤と緑の中間色であって、赤の方がやや強
い光が入射した場合、中間色であるKもかかわらず最大
値検出器3υは赤の判定出力を出してし1つ、この様な
出力状轢を避ける丸めに第4W&光素子(12W)の出
力が柑いられる。即ち。
When it corresponds to green, it corresponds to II (32G), and when it corresponds to Wénzaku, it corresponds to Jil! (32B) respectively. Konoma\
So, @e is an intermediate color between red and green, and when a light that is slightly stronger than red is incident, the maximum value detector 3υ outputs a judgment output of red even though K is an intermediate color. The output of the fourth W & optical element (12W) is rounded to avoid such an output condition. That is.

その出力は増幅器(!10W)を経た後、比較器(35
R)、<55G)、<55B)にて他の増幅器(!l0
R)、(,50G)、(40B)の出力と比較さり、b
。kill(55R)、(5,SG )、(35B)の
各々は、実質的に、夫々第1、第2、[W&光を子(1
2R)、 (12G )、(12B)の出力レベルが第
4W&光素子(12W)の出力レベyの所定割抄合いよ
り大きいときに出力を出し、その出力はオアゲート−を
経て最大1!検出器(2)の動作を葡効ならしめる。
The output passes through an amplifier (!10W) and then a comparator (35
R), <55G), <55B) with other amplifiers (!l0
R), (,50G), (40B) compared with the output, b
. kill(55R), (5,SG), and (35B) are substantially the first, second, and [W&light child(1), respectively.
When the output level of 2R), (12G), and (12B) is greater than a predetermined proportion of the output level y of the 4th W & optical element (12W), the output is outputted, and the output reaches a maximum of 1! after passing through an OR gate. The operation of the detector (2) is made effective.

第4W&光素子(1°2W)は色アイνりを有していな
いので、その出力レベA/ニ他の何れの感光素子のそれ
よ抄も大きい。そして、@1.@2.第5感光素子(1
2B)、(12G)、(12B)の出力レベ/L’H第
4感光雲+(12W)の出力レベVより低いが、入射光
が中間色である場合、更に低くなる。よって中間色でな
い場合の第1.@2、第5W&光素子(12R)−(1
2G)、(32B)の出力レベνと第4感光素子(12
W)の出力レベルの比を基準として、比較器<55E)
Since the fourth W & photo element (1° 2 W) has no color deviation, its output level A/D is greater than that of any other photosensitive element. And @1. @2. Fifth photosensitive element (1
2B), (12G), and (12B)/L'H fourth photosensitive cloud + output level V of (12W), but it becomes even lower when the incident light is an intermediate color. Therefore, the first case when the color is not intermediate. @2, 5th W & optical element (12R) - (1
2G) and (32B) and the fourth photosensitive element (12
Based on the ratio of the output levels of W), the comparator <55E)
.

(35G)、(33B)の各々は@1.第2、第511
111子(12R)、 (12G )、(12B)の出
力レベMが斯る基準より低φ場合、出力を出さない様設
計されているのである。この結果、上記の如く1例えば
赤と緑の中間色の光が色センサーαOに入射した場合、
最大値検出器−は働かず、何ら出力を生じない。
(35G) and (33B) are each @1. 2nd, 511th
The design is such that when the output level M of the 111 children (12R), (12G), and (12B) is lower than this standard, no output is output. As a result, as described above, 1, for example, when light of an intermediate color between red and green is incident on the color sensor αO,
The maximum value detector does not work and produces no output.

上記実施例では、各素子(12R)、(12G)、(1
2B)の光活性1IICJBはPINil会を含む光起
電力型であったが1例えば約5μm厚の1型の1七ルプ
1スシリコンのみで形成して光導電型の光活性層に変艷
することもできる。この場合。
In the above embodiment, each element (12R), (12G), (1
2B) Photoactivation 1ICJB was a photovoltaic type including PINil layer 1, but it is transformed into a photoconductive type photoactive layer by forming only, for example, 17 lupus silicon of type 1 with a thickness of about 5 μm. You can also do that. in this case.

:第6図に示す如く、光活性層(至)の表面に1対の電
極(16a)、(161))を被着する構成でも良い。
: As shown in FIG. 6, a structure may be adopted in which a pair of electrodes (16a), (161)) are adhered to the surface of the photoactive layer.

又、上faWIiM?H1光活性−05ト第1、第2電
ff1lla尋、αGは何れも各素子毎に分離されてい
るが、光活性muを分離することなく各素子(12R)
、(12G)、(12B)KMIRI、て設けることも
でき、及びあるいは、第1電1i11Q41又は第2電
極膜αeの何れか一方をやは抄分離することなく各素子
に連続して設けることもできる。崗、1七〜ファス半導
体からなる光活性maBσその厚でが極めて小さいので
、と紀の々口く各素子にiL!続して設けられても、各
素子間のクロストーク框はとんどない。
Also, upperfaWIiM? H1 photoactive-05 first and second electrodes, αG are separated for each element, but each element (12R) is separated without separating the photoactive mu.
, (12G), (12B) KMIRI, and alternatively, either the first electrode film 1i11Q41 or the second electrode film αe can be provided continuously in each element without being separated. can. Since the thickness of the photoactive maBσ made of a 17-fas semiconductor is extremely small, Kikuno says that each element has an iL! Even if they are installed in succession, there is little crosstalk between each element.

又、上記′4N施例の光活性層αeに用いた1七ルフア
スVリコンに代工てアモMファスシリコンカーバイドな
ど他のものをも使用し得、艷には1部に多結晶や微結晶
を混入することも司能である。
In addition, other materials such as amo Mfas silicon carbide may be used in place of the 17ruphas V recon used for the photoactive layer αe of the above '4N embodiment, and polycrystals or microcrystals may be used in some parts of the shell. It is also wise to mix in.

又、必曽に応じて感光素子の数を適宜増減し得νりの取
着の開部な色センサーを実現で裏、又その色検出精度を
高めることができる。
In addition, the number of photosensitive elements can be increased or decreased as required, thereby realizing a color sensor that can be easily mounted and improving its color detection accuracy.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従猥例を示す#面図、第2図は感光特性図、第
5図Aげ本発明実施例の平面図、第5図Bは同B−B断
面図、第 5図Cは四〇  (E断面図、第4図は参部
拡大l1lrIlii図、第5図は四略図。 第6図は他の実施例の要部断面図である。 (Ill・・・・・・基板、(12A)、(12B)、
(12C)・・・・・・第1.第2.8gAll光素子
、Q5・・・・・・光活性1゜ 第2図 波 長 (九m→ 7どQ        Iど9
Fig. 1 is a # side view showing an example, Fig. 2 is a photosensitive characteristic diagram, Fig. 5 is a plan view of an embodiment of the present invention shown in Fig. 5A, Fig. 5B is a sectional view taken along the line B-B, Fig. 5C is a 40 (E sectional view, FIG. 4 is an enlarged l1lrllii view of the part, and FIG. 5 is a schematic diagram of the fourth part. FIG. 6 is a sectional view of the main part of another embodiment. (Ill...Substrate , (12A), (12B),
(12C) 1st. 2.8g All optical element, Q5...Photoactivity 1° Fig. 2 Wavelength (9m→ 7doQ Ido9

Claims (1)

【特許請求の範囲】[Claims] (11透光性基板に設けられた複数の薄膜状感光素子を
含み、該素子の各々は、上記基板の1主面KRけられた
各素子に個育の1!3フイIレタ膜と、上記基板の他の
主面に設けられ定アそルア1ス半導にと記感光票子と同
様の構成にて上記基板に設けられ色アイyりWsf有さ
ない少なくとも1つの感光素子f@えることを特徴とす
る色センサー。
(Includes a plurality of thin-film photosensitive elements provided on a light-transmitting substrate 11, each of which has a 1!3 fill I letter film on each element formed on one main surface KR of the substrate, At least one photosensitive element (f) provided on the other main surface of the substrate and having a configuration similar to that of the photosensitive element and having no color eyelid Wsf and marked with a semiconductor having a constant aperture. A color sensor characterized by:
JP57009198A 1982-01-22 1982-01-22 Color sensor Pending JPS58125866A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57009198A JPS58125866A (en) 1982-01-22 1982-01-22 Color sensor
GB08300968A GB2115980B (en) 1982-01-22 1983-01-14 Color sensor
FR8300882A FR2520557B1 (en) 1982-01-22 1983-01-20 CHROMATIC SENSOR

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57009198A JPS58125866A (en) 1982-01-22 1982-01-22 Color sensor

Publications (1)

Publication Number Publication Date
JPS58125866A true JPS58125866A (en) 1983-07-27

Family

ID=11713800

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57009198A Pending JPS58125866A (en) 1982-01-22 1982-01-22 Color sensor

Country Status (1)

Country Link
JP (1) JPS58125866A (en)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4846280A (en) * 1971-10-05 1973-07-02
JPS5068787A (en) * 1973-10-22 1975-06-09
JPS562784A (en) * 1979-06-22 1981-01-13 Nippon Telegr & Teleph Corp <Ntt> Image pickup device
JPS5617085A (en) * 1979-07-20 1981-02-18 Sony Corp Solid imaging element
JPS56103573A (en) * 1980-01-22 1981-08-18 Canon Inc Color reading device
JPS56150879A (en) * 1980-04-23 1981-11-21 Canon Inc Photoelectric converter

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4846280A (en) * 1971-10-05 1973-07-02
JPS5068787A (en) * 1973-10-22 1975-06-09
JPS562784A (en) * 1979-06-22 1981-01-13 Nippon Telegr & Teleph Corp <Ntt> Image pickup device
JPS5617085A (en) * 1979-07-20 1981-02-18 Sony Corp Solid imaging element
JPS56103573A (en) * 1980-01-22 1981-08-18 Canon Inc Color reading device
JPS56150879A (en) * 1980-04-23 1981-11-21 Canon Inc Photoelectric converter

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