JPS58116521A - Manufacture of electrochromic display element - Google Patents
Manufacture of electrochromic display elementInfo
- Publication number
- JPS58116521A JPS58116521A JP56213677A JP21367781A JPS58116521A JP S58116521 A JPS58116521 A JP S58116521A JP 56213677 A JP56213677 A JP 56213677A JP 21367781 A JP21367781 A JP 21367781A JP S58116521 A JPS58116521 A JP S58116521A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- electrochromic display
- display element
- coloring
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on an electrochromic effect
- G02F1/153—Constructional details
- G02F1/1533—Constructional details structural features not otherwise provided for
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
Description
【発明の詳細な説明】
（４）技術の分野
本発明はエレクトロタ０ミフ２表示素子の製造法に関し
、特に、イオン導電層がリチウＡ （Ｌｉ ）添加物を
含むエレクトロクロミック表示素子の製造法に関する。DETAILED DESCRIPTION OF THE INVENTION (4) Field of Technology The present invention relates to a method for manufacturing an electrochromic display element, and more particularly to a method for manufacturing an electrochromic display element in which the ion conductive layer contains a lithium A (Li) additive. Regarding.
（６）技術の背景
電極間にエレクトロクロミック層と、電解質のイオン導
電層を設けたエレクトロクロミック表示素子が知られて
おり、電極間に選択的に電圧を印加して、所望の表示パ
ターンを得るようにしている。(6) Background of the technology Electrochromic display elements are known in which an electrochromic layer and an ion-conductive layer of electrolyte are provided between electrodes, and a desired display pattern is obtained by selectively applying a voltage between the electrodes. That's what I do.
ロ 従来技術と問題点
第１図はエレクトロクロミック表示素子の構成を示し、
ガラス基板１上に透明電極２、酸化タングステン（ＷＯ
ｓ ）を含むエレクトロクロミック（ＥＣ）層３、電解
質性のイオン導電層４、対向電極５が積層される。B. Prior art and problems Figure 1 shows the structure of an electrochromic display element.
A transparent electrode 2 and tungsten oxide (WO
An electrochromic (EC) layer 3 containing s), an electrolytic ion conductive layer 4, and a counter electrode 5 are laminated.
イオン導電層物質としてはＬｉ を含む遷移金属酸化物
を添加した。電子及びホール又は電子の不透過性物質が
用いられる。A transition metal oxide containing Li was added as the ion conductive layer material. Electron and hole or electron opaque materials are used.
このＬｉ添加は、着色効果を高め、消色応答特性の高速
化のためである。従来ＥＣ層、電解質層祉、基板を室温
（２５℃）に保ったまま真空［１０Ｔｏｒｒ〜ｌ ＯＴ
ｏｒｒの下で蒸着法によ層形成していた。The purpose of this Li addition is to enhance the coloring effect and speed up the decoloring response characteristics. Conventionally, the EC layer, electrolyte layer, and substrate were kept at room temperature (25°C) and vacuum [10 Torr~l OT
The layer was formed by a vapor deposition method under orr.
ところがイオン導電層４中のＬｉが１０層３中へ拡散し
、自然着色を生じ又、１０層３中に存在するＬｌ トラ
ップのため残留着色が生じるという欠点があった
（至）発明の目的
本発明祉上記従来の欠点に鑑みＬｉ拡散による自然着色
及びＥＣ層中のＬｉ ）ラップによる残留着色を解消
しうるエレクトロクロミック表示素子の製造法を提供す
ることを目的とする。However, Li in the ion conductive layer 4 diffuses into the 10 layer 3, causing natural coloring, and residual coloring occurs due to Ll traps present in the 10 layer 3. SUMMARY OF THE INVENTION In view of the above-mentioned conventional drawbacks, an object of the present invention is to provide a method for manufacturing an electrochromic display element that can eliminate natural coloring due to Li diffusion and residual coloring due to Li wrapping in the EC layer.
（ト）発明の構成
そして仁の目的は本発明によればリチウム（Ｌｉ ）を
含む遷移金属酸化物が少なくとも１種類含有された電解
質を用いたエレクトロクロミック表示素子の製造法にお
いて、エレクトロクロミック層の形成を１０ Ｔｏｒ
ｒ以上の高真空中で蒸着によシ行っ九ことを特徴とする
エレクトロクロミック表示素子の製造法を提供すること
により達成される。(G) Structure and object of the invention According to the present invention, in a method for manufacturing an electrochromic display element using an electrolyte containing at least one type of transition metal oxide including lithium (Li), an electrochromic layer is formed. Formation at 10 Tor
This is achieved by providing a method for manufacturing an electrochromic display element, characterized in that vapor deposition is carried out in a high vacuum of r or more.
（ロ）発明の実施例 以下図面を参照しながら本発明の実施例をｉ＃述する。(b) Examples of the invention Embodiments of the present invention will be described below with reference to the drawings.
ｔａ１図により説明する。電解質層として、Ｌｉ、ＷＯ
４、ＥＣ層とし一’ｒ ｗｏ、 を用いた。This will be explained using the ta1 diagram. As an electrolyte layer, Li, WO
4. The following was used as the EC layer.
まず、ガラス基板ｌを用意し、この上に酸化インジ’ｙ
ム（Ｉｎｔ Ｏｘ ） ＫｘＸ （Ｓｎ ）ｔ ）’
−プして形成したこの透明電極２を設け、さらにこの上
にＷｏ３層３を４００ ＯＡ’の層厚に、次イテコノ上
Ｋ Ｌ ｉ ｔ ＷＯ４４１４ｆ ２５００ Ａ’層厚
に形成する。そして、Ｌ ｌｚ ＷＯａ層４上に電極層
５として、金（Ａｕ）を１５０ＯＡ”Ｏ層厚に形成し、
最後に外気通弊のためｗｏ８層６を３００ ＯＡ’の層
厚に形成した。First, a glass substrate l is prepared, and indium oxide is placed on it.
(Int Ox) KxX (Sn)t)'
This transparent electrode 2 is provided, and a Wo3 layer 3 is formed thereon to a thickness of 400 OA', and then a Wo3 layer 3 is formed thereon to a thickness of 2500 A'. Then, gold (Au) is formed as an electrode layer 5 on the L lz WOa layer 4 to a thickness of 150OA"O,
Finally, a WO8 layer 6 was formed to a thickness of 300 OA' for ventilation of outside air.
これらガラス基板上のＷＯｓ層、Ｌｉ、ＷＯ，層、Ａｕ
層、および遮弊用ｗｏ３層は真空蒸着にょ層形成した。WOs layer, Li, WO, layer, Au on these glass substrates
The WO3 layer and the WO3 shielding layer were formed by vacuum evaporation.
第２図は真空蒸着時における真空度と、自然着色＃１度
との関係を示す図であって、真空度が１０ Ｔｏｒｒ
以下の場合自然着色１１１ｆ／ｒｉ極めて低くなってい
る。Figure 2 is a diagram showing the relationship between the degree of vacuum during vacuum evaporation and natural coloring #1 degree, when the degree of vacuum is 10 Torr.
Natural coloration 111f/ri is extremely low in the following cases.
第３図および第４図は電極２，５間に一３ｖの電圧を印
加したとき、および両電極２．５間を短絡したときの消
色特性を示す。FIGS. 3 and 4 show the decoloring characteristics when a voltage of -3 V is applied between the electrodes 2 and 5, and when both electrodes 2.5 are short-circuited.
これらの図において、添字Ａ−Ｃは次の蒸着条件を示す
。In these figures, subscripts A-C indicate the following deposition conditions.
Ａ：真空度が１０ Ｔｏｒｒ、ＷＯｓ層形成時の基板
温度１６０℃、Ｌ ｉ ２ ＷＯ４層形成時の基板温度
２５℃の下での蒸着。A: Vapor deposition at a vacuum degree of 10 Torr, a substrate temperature of 160° C. when forming the WOs layer, and a substrate temperature of 25° C. when forming the Li 2 WO4 layer.
Ｂ：真空度が１．０ Ｔｏｒｒ、ＷＯｓ層およびＬ
ｉ ２ＷＯ，層形成時の基板温度２５℃の下での蒸着Ｏ
Ｃ：真！！Ｉ！＆が１０ ＴｏｒｒＸＷＯｓ層および
Ｌｉ２ＷＯ４層形成時の基板！度２５℃の下での蒸着。B: Vacuum degree is 1.0 Torr, WOs layer and L
i 2WO, evaporation at a substrate temperature of 25°C during layer formation O C: True! ! I! & is 10 TorrXWOs layer and Li2WO4 layer formation substrate! Deposition under 25 degrees Celsius.
第３図、第４図から明らかなよう［１０’Ｔｏｒｒの真
空下でＷＯｊ層、Ｌ ｉ ２ ＷＯ４層の形成を行えば
残留着色は低減される０
さらに、ＷＯＩ層形成時に基板加熱を行えは、残留着色
は更に低減することが判る。As is clear from FIGS. 3 and 4, residual coloring can be reduced if the WOj layer and Li 2 WO 4 layer are formed under a vacuum of 10'Torr. Furthermore, it is not possible to heat the substrate when forming the WOI layer. , it can be seen that the residual coloring is further reduced.
このように自然着色、残留着色が低減する理由は、ＥＣ
層中に存在するＬｉ ）ラップレベルが低減するため
であると考えられる。The reason why natural coloring and residual coloring are reduced is that EC
This is thought to be due to a reduction in the Li (Li) wrap level present in the layer.
第５図（ａ）は両電極２，５間に第５図（ｂ）に示す駆
動波形を印加した場合の表示部の着色濃度へ〇、Ｄを示
すものである。このような受渡駆動では本来その平均化
作用により着色濃度は添字Ａで示す曲線のように零に近
いはずであるが、添字Ｂ、Ｃで示すように時間とともに
着色濃度が増大する。FIG. 5(a) shows the coloring density of the display section when the driving waveform shown in FIG. 5(b) is applied between both electrodes 2 and 5. In such a transfer drive, the coloring density should originally be close to zero as shown by the curve indicated by subscript A due to the averaging effect, but the coloring density increases with time as shown by subscripts B and C.
これは条件Ｂ、Ｃの場合、ＥＣ層中のＬｉトラップレベ
ルのためであると考えられる。This is considered to be due to the Li trap level in the EC layer in the case of conditions B and C.
Ｑ 発明の詳細
な説明したように本発明によれば、電解質層としてＬｉ
を含むエレクトロクロミック表示素子は自然着色がな
く、かつ残留着色の少なくなる。Q As described in detail, according to the present invention, Li is used as the electrolyte layer.
An electrochromic display element containing the above has no natural coloring and has less residual coloring.
第１図扛エレクトロクロミック表示素子の構成図、第２
図は真空度と自然着色との関係図、第３図、および第４
図は消色特性図、第５図は着色変化を示す図である。
１：基板、２：透明電極、３：ＥＣ物質層、４：電解質
層、５：電極。
７ ｌ プ
寥 ２ 名
具 ９曳 （Ｔｏ ｒｒ ）
第 ３ 粘
Ｐ合間（ｍＳ）
第４ 粘
時 間 （Ｓン
第 ５ ＶFigure 1: Configuration diagram of the electrochromic display element, Figure 2:
The diagram shows the relationship between vacuum degree and natural coloring, Figures 3 and 4.
The figure is a decoloring characteristic diagram, and FIG. 5 is a diagram showing coloring changes. 1: Substrate, 2: Transparent electrode, 3: EC material layer, 4: Electrolyte layer, 5: Electrode. 7 l Pump 2 Megu 9 Torr (Torr) 3rd viscosity P interval (mS) 4th viscosity time (Sn 5th V
Claims (1)
が少なくとも１種類含有された電解質を用いたエレクト
ロクロミック表示素子の製造法において、エレクトロク
ロミック層の形成を１Ｏ−６Ｔｏｒｒ以上の高真空中で
蒸着により行ったことを特徴とするエレクトロクロミッ
ク表示素子の製造法。 （２）前記、エレク）ｏクロミック層の形成時に１００
℃以上の基板加熱を行ったことを特徴とする特許請求の
範１ｉＪＩ（１）項に記載のエレクトロクロミック表示
素子の製造法。[Scope of Claims] 1<1> In a method for manufacturing an electrochromic display element using an electrolyte containing at least one transition metal oxide containing v tium (Li), the electrochromic layer is formed at 1O-6 Torr. A method for producing an electrochromic display element, characterized in that it is carried out by vapor deposition in a high vacuum as described above. (2) 100% when forming the chromic layer (above)
The method for manufacturing an electrochromic display element according to claim 1iJI(1), characterized in that the substrate is heated to a temperature of .degree. C. or higher.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56213677A JPS58116521A (en) | 1981-12-29 | 1981-12-29 | Manufacture of electrochromic display element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56213677A JPS58116521A (en) | 1981-12-29 | 1981-12-29 | Manufacture of electrochromic display element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58116521A true JPS58116521A (en) | 1983-07-11 |
Family
ID=16643137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56213677A Pending JPS58116521A (en) | 1981-12-29 | 1981-12-29 | Manufacture of electrochromic display element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58116521A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013525860A (en) * | 2010-04-30 | 2013-06-20 | ビュー， インコーポレイテッド | Electrochromic devices |
-
1981
- 1981-12-29 JP JP56213677A patent/JPS58116521A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013525860A (en) * | 2010-04-30 | 2013-06-20 | ビュー， インコーポレイテッド | Electrochromic devices |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4350414A (en) | All solid state electrochromic device | |
| US4294520A (en) | Electrochromic display device | |
| JPS6326373B2 (en) | ||
| US4233339A (en) | Method for making electrochromic films having improved etch resistance | |
| JPS5979225A (en) | Whole solid-state type electrochromic element | |
| US5919571A (en) | Counterelectrode layer | |
| JPS58116521A (en) | Manufacture of electrochromic display element | |
| JPS5827484B2 (en) | display cell | |
| US4605285A (en) | Electrochromic device | |
| JPS6153706B2 (en) | ||
| JPS6033255B2 (en) | electrochromic display device | |
| JPS6355686B2 (en) | ||
| JPH05158005A (en) | Optical waveguide function element and production thereof | |
| JPS5925743B2 (en) | Sealing method for ceramics and glass | |
| JPS5961820A (en) | Fully solid-state type electrochromic element | |
| JPS6175325A (en) | Display cell | |
| JPS5875119A (en) | Electrochromic display element | |
| US4902109A (en) | Electrochromic device | |
| JPS6118165B2 (en) | ||
| JPS5844422A (en) | Electrochromic display element | |
| JPS58168037A (en) | Electrochromic display element and its manufacture | |
| JPS6332166B2 (en) | ||
| JPH058277B2 (en) | ||
| JPS61103981A (en) | Electrochromic element | |
| JPS60242429A (en) | Control system for electrochromic element |