JPS5795823A - Manufacture of boron sheet - Google Patents

Manufacture of boron sheet

Info

Publication number
JPS5795823A
JPS5795823A JP16980380A JP16980380A JPS5795823A JP S5795823 A JPS5795823 A JP S5795823A JP 16980380 A JP16980380 A JP 16980380A JP 16980380 A JP16980380 A JP 16980380A JP S5795823 A JPS5795823 A JP S5795823A
Authority
JP
Japan
Prior art keywords
substrate
boron
chromium
titanium
boride layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16980380A
Other languages
Japanese (ja)
Other versions
JPS6251890B2 (en
Inventor
Masaki Aoki
Shigeru Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16980380A priority Critical patent/JPS5795823A/en
Publication of JPS5795823A publication Critical patent/JPS5795823A/en
Publication of JPS6251890B2 publication Critical patent/JPS6251890B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

PURPOSE: To efficiently obtain a boron sheet by forming prescribed substance layers on graphite, chemically vapor-depositing boron on the resulting substrate, and removing the substrate.
CONSTITUTION: A chromium or chromium boride layer is formed on graphite, and on the layer a titanium or titanium boride layer is formed to obtain a substrate. Boron is then deposited on the substrate by a chemical vapor deposition method, and the substrate is removed to obtain a boron sheet. The preferred thickness of the chromium or chromium boride layer is 0.5W10μm, and that of the titanium or titanium boride layer is 0.2W15μm.
COPYRIGHT: (C)1982,JPO&Japio
JP16980380A 1980-12-02 1980-12-02 Manufacture of boron sheet Granted JPS5795823A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16980380A JPS5795823A (en) 1980-12-02 1980-12-02 Manufacture of boron sheet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16980380A JPS5795823A (en) 1980-12-02 1980-12-02 Manufacture of boron sheet

Publications (2)

Publication Number Publication Date
JPS5795823A true JPS5795823A (en) 1982-06-14
JPS6251890B2 JPS6251890B2 (en) 1987-11-02

Family

ID=15893176

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16980380A Granted JPS5795823A (en) 1980-12-02 1980-12-02 Manufacture of boron sheet

Country Status (1)

Country Link
JP (1) JPS5795823A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60185490A (en) * 1984-03-02 1985-09-20 Onkyo Corp Diaphragm for electroacoustic transducer and its manufacture
FR2674718A1 (en) * 1991-03-28 1992-10-02 Commissariat Energie Atomique METHOD FOR MANUFACTURING AN ELECTRODYNAMIC SPEAKER MEMBRANE WITH HIGH INTERNAL LOSSES AND HIGH RIGIDITY.
JPH0528564U (en) * 1991-09-25 1993-04-16 三菱重工業株式会社 Articulated welding robot

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60185490A (en) * 1984-03-02 1985-09-20 Onkyo Corp Diaphragm for electroacoustic transducer and its manufacture
FR2674718A1 (en) * 1991-03-28 1992-10-02 Commissariat Energie Atomique METHOD FOR MANUFACTURING AN ELECTRODYNAMIC SPEAKER MEMBRANE WITH HIGH INTERNAL LOSSES AND HIGH RIGIDITY.
JPH0528564U (en) * 1991-09-25 1993-04-16 三菱重工業株式会社 Articulated welding robot

Also Published As

Publication number Publication date
JPS6251890B2 (en) 1987-11-02

Similar Documents

Publication Publication Date Title
JPS52123172A (en) Spin coating method
IL98431A0 (en) Coated cutting tool
EP0422243A4 (en) Method of forming polycrystalline film by chemical vapor deposition
GB1418644A (en) Metal coating
JPS5795823A (en) Manufacture of boron sheet
IL90778A0 (en) Production of a protective film on a magnesium based substrate
EP0301604A3 (en) Apparatus for coating a substrate by plasma-chemical vapour deposition or cathodic sputtering, and process using the apparatus
GB2003660A (en) Deposition of material on a substrate
IE842218L (en) Process for depositing metallic copper
JPS553863A (en) Treating method of prime coat by gas softening nitriding
JPS53149194A (en) Coating method for graphite substrate with silicon carbide
JPS5685711A (en) Manufacture of diffraction grating
JPS57120667A (en) Lamination coating material
JPS5435484A (en) High spped cutting tool coated with hard layer
JPS52123871A (en) Thin film forming method
JPS57200557A (en) Surface-coated hard alloy member
JPS56163266A (en) Manufacture of dial plate for timepiece
JPS57210972A (en) Formation of film
JPS5462984A (en) Masking deposition method
JPS5227826A (en) Process for producing composite fibrous materials
JPS55146454A (en) Electrophotographic receptor
JPS6439368A (en) Thin film forming vacuum device
JPS5735860A (en) Preparation of photomask
JPS57170818A (en) Manufacture of thin boron plate
Bardi et al. INITIAL STAGES OF OXIDATION OF THE AlNi 3 ALLOY: AN XPS AND LEISS STUDY ON THE(001) AND(111) ORIENTED SINGLE CRYSTAL SURFACES